Cymer, Inc. is engaged in developing lithography light sources. The Company is a part of ASML Holding N.V. Its light sources are used by chipmakers to pattern semiconductor chips. Its technologies include deep ultra violet (DUV) lithography and extreme ultraviolet (EUV) lithography. Its products include DUV light sources, EUV light sources and OnPulse services. Its DUV range of products includes Argon fluoride (ArF) immersion light sources, ArF dry light sources and Krypton fluoride (KrF) light sources. Its ArF immersion light sources include XLR 600i, XLA 400, XLA 300, XLR 600ix, XLR 500i and XLR 700ix. Its laser-produced plasma (LPP) EUV light sources include the installed base for TWINSCAN NXE:3100 and NXE:3300B platforms, and source for the EUV volume production platform, the TWINCSCAN NXE:3350B. Its OnPulse is a light source support model. Its OnPulse services include Cymer OnLine (COL), synchronized preventative maintenance, Tactical Operations (TacOps) and OnPulse Source Center.