CA2054050A1 - Method and Apparatus for Making Grit and Abrasive Media - Google Patents

Method and Apparatus for Making Grit and Abrasive Media

Info

Publication number
CA2054050A1
CA2054050A1 CA2054050A CA2054050A CA2054050A1 CA 2054050 A1 CA2054050 A1 CA 2054050A1 CA 2054050 A CA2054050 A CA 2054050A CA 2054050 A CA2054050 A CA 2054050A CA 2054050 A1 CA2054050 A1 CA 2054050A1
Authority
CA
Canada
Prior art keywords
grit
strip
deposition system
diamond
diamond film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2054050A
Other languages
French (fr)
Other versions
CA2054050C (en
Inventor
Louis K. Bigelow
Frank J. Csillag
James T. Hoggins
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Abrasives Inc
Original Assignee
Louis K. Bigelow
Frank J. Csillag
James T. Hoggins
Norton Company
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Louis K. Bigelow, Frank J. Csillag, James T. Hoggins, Norton Company filed Critical Louis K. Bigelow
Publication of CA2054050A1 publication Critical patent/CA2054050A1/en
Application granted granted Critical
Publication of CA2054050C publication Critical patent/CA2054050C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/276—Diamond only using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/04—Diamond

Abstract

Synthetic diamond film produced by chemical vapor deposition can be crushed to obtain diamond grit which has useful abrasive properties. The flexibility of CVD
deposition processes in determining diamond film properties means that CVD diamond grit properties can be tailored to particular abrasive applications. In a disclosed embodiment, the grit particles are coated with a magnetic material. The coated grit particles can then be aligned with a magnetic field, and the coated grit particles are bonded to a matrix while aligned. In a further disclosed form of the invention, a chemical vapor deposition system, such as an arc jet plasma deposition system, is provided in a chamber. A carrier strip and the deposition system are moved with respect to each other, and the deposition system is caused to deposit diamond film on the carrier strip. The strip can be of a flexible material, such as a copper or woven graphite material, and can be wound onto supply and take-up spools, respectively, before and after diamond deposition. Diamond film can be removed from the strip, such as by flexing the strip, and then crushed to obtain grit. The deposition system can also be utilized to produce other superabrasive grit, such as cBN, C3N4 or B22O.
CA002054050A 1990-11-16 1991-10-23 Method and apparatus for making grit and abrasive media Expired - Fee Related CA2054050C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US61490090A 1990-11-16 1990-11-16
US614,900 1990-11-16

Publications (2)

Publication Number Publication Date
CA2054050A1 true CA2054050A1 (en) 1992-05-17
CA2054050C CA2054050C (en) 1998-07-07

Family

ID=24463180

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002054050A Expired - Fee Related CA2054050C (en) 1990-11-16 1991-10-23 Method and apparatus for making grit and abrasive media

Country Status (3)

Country Link
US (1) US5364423A (en)
JP (1) JPH05132665A (en)
CA (1) CA2054050C (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995014553A1 (en) * 1993-11-23 1995-06-01 Plasmoteg Engineering Center An abrasive material for precision surface treatment and a method for the manufacturing thereof
US5643343A (en) * 1993-11-23 1997-07-01 Selifanov; Oleg Vladimirovich Abrasive material for precision surface treatment and a method for the manufacturing thereof
US5711773A (en) * 1994-11-17 1998-01-27 Plasmoteg Engineering Center Abrasive material for precision surface treatment and a method for the manufacturing thereof
CN115449344A (en) * 2022-06-13 2022-12-09 石家庄学院 Solid diamond grinding agent for superhard material and preparation method thereof

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US5374414A (en) * 1991-05-10 1994-12-20 The United States Of America As Represented By The Secretary Of The Navy Self-supporting diamond filaments
CA2112308C (en) * 1993-01-22 2000-08-15 Louis K. Bigelow Method of making white diamond film
US5472370A (en) * 1994-07-29 1995-12-05 University Of Arkansas Method of planarizing polycrystalline diamonds, planarized polycrystalline diamonds and products made therefrom
US5976206A (en) * 1995-05-19 1999-11-02 Saint-Gobain/Norton Industrial Ceramics Corporation Method of making white diamond film
US5759623A (en) * 1995-09-14 1998-06-02 Universite De Montreal Method for producing a high adhesion thin film of diamond on a Fe-based substrate
US6284315B1 (en) 1996-07-29 2001-09-04 Aurburn University Method of polishing diamond films
US9238207B2 (en) 1997-04-04 2016-01-19 Chien-Min Sung Brazed diamond tools and methods for making the same
US9463552B2 (en) 1997-04-04 2016-10-11 Chien-Min Sung Superbrasvie tools containing uniformly leveled superabrasive particles and associated methods
US9199357B2 (en) 1997-04-04 2015-12-01 Chien-Min Sung Brazed diamond tools and methods for making the same
US9868100B2 (en) 1997-04-04 2018-01-16 Chien-Min Sung Brazed diamond tools and methods for making the same
US9409280B2 (en) 1997-04-04 2016-08-09 Chien-Min Sung Brazed diamond tools and methods for making the same
US9221154B2 (en) 1997-04-04 2015-12-29 Chien-Min Sung Diamond tools and methods for making the same
US6558742B1 (en) 1999-02-10 2003-05-06 Auburn University Method of hot-filament chemical vapor deposition of diamond
US20030217869A1 (en) * 2002-05-21 2003-11-27 Snyder Shelly Rosemarie Polycrystalline diamond cutters with enhanced impact resistance
US7384436B2 (en) * 2004-08-24 2008-06-10 Chien-Min Sung Polycrystalline grits and associated methods
US9724802B2 (en) 2005-05-16 2017-08-08 Chien-Min Sung CMP pad dressers having leveled tips and associated methods
US8678878B2 (en) 2009-09-29 2014-03-25 Chien-Min Sung System for evaluating and/or improving performance of a CMP pad dresser
US8393934B2 (en) 2006-11-16 2013-03-12 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US8622787B2 (en) 2006-11-16 2014-01-07 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US8398466B2 (en) 2006-11-16 2013-03-19 Chien-Min Sung CMP pad conditioners with mosaic abrasive segments and associated methods
US9138862B2 (en) 2011-05-23 2015-09-22 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
US7553344B2 (en) * 2005-06-07 2009-06-30 Adico, Asia Polydiamond Company, Ltd. Shaped thermally stable polycrystalline material and associated methods of manufacture
US8641999B2 (en) * 2005-07-11 2014-02-04 SCIO Diamond Technology Corporation Carbon grit
KR20100106328A (en) 2007-11-13 2010-10-01 치엔 민 성 Cmp pad dressers
TWI388402B (en) 2007-12-06 2013-03-11 Methods for orienting superabrasive particles on a surface and associated tools
US8079428B2 (en) 2009-07-02 2011-12-20 Baker Hughes Incorporated Hardfacing materials including PCD particles, welding rods and earth-boring tools including such materials, and methods of forming and using same
SA111320374B1 (en) 2010-04-14 2015-08-10 بيكر هوغيس انكوبوريتد Method Of Forming Polycrystalline Diamond From Derivatized Nanodiamond
US10258959B2 (en) 2010-08-11 2019-04-16 Unit Cell Diamond Llc Methods of producing heterodiamond and apparatus therefor
WO2012040374A2 (en) 2010-09-21 2012-03-29 Ritedia Corporation Superabrasive tools having substantially leveled particle tips and associated methods
CN103329253B (en) 2011-05-23 2016-03-30 宋健民 There is the CMP pad dresser at planarization tip
WO2014081654A1 (en) 2012-11-21 2014-05-30 National Oilwell DHT, L.P. Fixed cutter drill bit cutter elements including hard cutting tables made from cvd synthetic diamonds
US9140072B2 (en) 2013-02-28 2015-09-22 Baker Hughes Incorporated Cutting elements including non-planar interfaces, earth-boring tools including such cutting elements, and methods of forming cutting elements
US20180163298A1 (en) * 2016-12-14 2018-06-14 National Chung-Shan Institute Of Science And Technology Device for producing continuous-growth type large-area transparent and conductive graphene film
JP2019210444A (en) * 2018-06-01 2019-12-12 博 石塚 Super fine abrasive having highly irregular shape
WO2023248626A1 (en) * 2022-06-24 2023-12-28 信越半導体株式会社 Method for growing diamond layer, and microwave plasma cvd device

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US4487162A (en) * 1980-11-25 1984-12-11 Cann Gordon L Magnetoplasmadynamic apparatus for the separation and deposition of materials
US4471003A (en) * 1980-11-25 1984-09-11 Cann Gordon L Magnetoplasmadynamic apparatus and process for the separation and deposition of materials
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US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
US4691662A (en) * 1983-02-28 1987-09-08 Michigan State University Dual plasma microwave apparatus and method for treating a surface
US4585668A (en) * 1983-02-28 1986-04-29 Michigan State University Method for treating a surface with a microwave or UHF plasma and improved apparatus
US4776861A (en) * 1983-08-29 1988-10-11 General Electric Company Polycrystalline abrasive grit
US4828582A (en) * 1983-08-29 1989-05-09 General Electric Company Polycrystalline abrasive grit
US4630566A (en) * 1984-08-16 1986-12-23 Board Of Trustees Operating Michigan State University Microwave or UHF plasma improved apparatus
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JPH01242141A (en) * 1988-03-23 1989-09-27 Hitachi Ltd High pressure microwave plasma reactor
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US5024680A (en) * 1988-11-07 1991-06-18 Norton Company Multiple metal coated superabrasive grit and methods for their manufacture
JPH02248397A (en) * 1989-03-20 1990-10-04 Onoda Cement Co Ltd Method and device for producing diamond

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995014553A1 (en) * 1993-11-23 1995-06-01 Plasmoteg Engineering Center An abrasive material for precision surface treatment and a method for the manufacturing thereof
US5643343A (en) * 1993-11-23 1997-07-01 Selifanov; Oleg Vladimirovich Abrasive material for precision surface treatment and a method for the manufacturing thereof
US5711773A (en) * 1994-11-17 1998-01-27 Plasmoteg Engineering Center Abrasive material for precision surface treatment and a method for the manufacturing thereof
CN115449344A (en) * 2022-06-13 2022-12-09 石家庄学院 Solid diamond grinding agent for superhard material and preparation method thereof

Also Published As

Publication number Publication date
US5364423A (en) 1994-11-15
CA2054050C (en) 1998-07-07
JPH05132665A (en) 1993-05-28

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