CA2058393A1 - Photochromic benzothioxanthone oxides, process for their preparation and the use thereof - Google Patents
Photochromic benzothioxanthone oxides, process for their preparation and the use thereofInfo
- Publication number
- CA2058393A1 CA2058393A1 CA002058393A CA2058393A CA2058393A1 CA 2058393 A1 CA2058393 A1 CA 2058393A1 CA 002058393 A CA002058393 A CA 002058393A CA 2058393 A CA2058393 A CA 2058393A CA 2058393 A1 CA2058393 A1 CA 2058393A1
- Authority
- CA
- Canada
- Prior art keywords
- formula
- compound
- phenyl
- benzyl
- iii
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000002360 preparation method Methods 0.000 title claims abstract description 9
- ACTJJIKMSGWIHS-UHFFFAOYSA-N 7-oxo-10,12-dihydrobenzo[a]thioxanthen-9-one Chemical class C1=CC=C2C(CC3=CCC(C=C3S3=O)=O)=C3C=CC2=C1 ACTJJIKMSGWIHS-UHFFFAOYSA-N 0.000 title abstract description 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 87
- -1 C1-C12alkylthio Chemical group 0.000 claims abstract description 28
- 239000000203 mixture Substances 0.000 claims abstract description 23
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 17
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims abstract description 15
- 230000002441 reversible effect Effects 0.000 claims abstract description 14
- 230000003287 optical effect Effects 0.000 claims abstract description 7
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 6
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 6
- 230000031700 light absorption Effects 0.000 claims abstract description 6
- 150000002367 halogens Chemical class 0.000 claims abstract description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims abstract description 3
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims abstract description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims abstract description 3
- 125000006711 (C2-C12) alkynyl group Chemical group 0.000 claims abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 229920000642 polymer Polymers 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000007800 oxidant agent Substances 0.000 claims description 5
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 claims description 4
- 125000000304 alkynyl group Chemical group 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 claims description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 claims 1
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 abstract 1
- 125000006710 (C2-C12) alkenyl group Chemical group 0.000 abstract 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 54
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 27
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 14
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 14
- 239000000243 solution Substances 0.000 description 14
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 13
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- 229910052938 sodium sulfate Inorganic materials 0.000 description 12
- 235000011152 sodium sulphate Nutrition 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000001704 evaporation Methods 0.000 description 11
- 230000008020 evaporation Effects 0.000 description 11
- 239000012074 organic phase Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 239000010410 layer Substances 0.000 description 10
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical group OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 229910000027 potassium carbonate Inorganic materials 0.000 description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 229960000583 acetic acid Drugs 0.000 description 6
- 235000011181 potassium carbonates Nutrition 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- 239000000741 silica gel Substances 0.000 description 6
- 229910002027 silica gel Inorganic materials 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 5
- 125000001309 chloro group Chemical group Cl* 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 239000012362 glacial acetic acid Substances 0.000 description 5
- 238000001819 mass spectrum Methods 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- 238000001953 recrystallisation Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 125000001246 bromo group Chemical group Br* 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- VPOMSPZBQMDLTM-UHFFFAOYSA-N 3,5-dichlorophenol Chemical compound OC1=CC(Cl)=CC(Cl)=C1 VPOMSPZBQMDLTM-UHFFFAOYSA-N 0.000 description 2
- 229910015845 BBr3 Inorganic materials 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 229960004756 ethanol Drugs 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- NUVBSKCKDOMJSU-UHFFFAOYSA-N ethylparaben Chemical compound CCOC(=O)C1=CC=C(O)C=C1 NUVBSKCKDOMJSU-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 150000002440 hydroxy compounds Chemical class 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000002427 irreversible effect Effects 0.000 description 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 2
- 125000006178 methyl benzyl group Chemical group 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000006862 quantum yield reaction Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- ZYVYEJXMYBUCMN-UHFFFAOYSA-N 1-methoxy-2-methylpropane Chemical compound COCC(C)C ZYVYEJXMYBUCMN-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- LKZZYVKEDGBRTB-UHFFFAOYSA-N 10,12-dihydrobenzo[a]thioxanthen-9-one Chemical compound C1=CC2=CC=CC=C2C2=C1SC1=CC(=O)CC=C1C2 LKZZYVKEDGBRTB-UHFFFAOYSA-N 0.000 description 1
- SFRDXVJWXWOTEW-UHFFFAOYSA-N 2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)CO SFRDXVJWXWOTEW-UHFFFAOYSA-N 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- PADQWCNUAYWRGW-UHFFFAOYSA-N 6,11-diphenoxytetracene-5,12-dione Chemical compound C12=CC=CC=C2C(OC=2C=CC=CC=2)=C2C(=O)C3=CC=CC=C3C(=O)C2=C1OC1=CC=CC=C1 PADQWCNUAYWRGW-UHFFFAOYSA-N 0.000 description 1
- SFHYNDMGZXWXBU-LIMNOBDPSA-N 6-amino-2-[[(e)-(3-formylphenyl)methylideneamino]carbamoylamino]-1,3-dioxobenzo[de]isoquinoline-5,8-disulfonic acid Chemical compound O=C1C(C2=3)=CC(S(O)(=O)=O)=CC=3C(N)=C(S(O)(=O)=O)C=C2C(=O)N1NC(=O)N\N=C\C1=CC=CC(C=O)=C1 SFHYNDMGZXWXBU-LIMNOBDPSA-N 0.000 description 1
- OCGVZYMCHVTNLH-UHFFFAOYSA-N 6-phenoxytetracene-5,12-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C1C=CC=CC1=C2OC1=CC=CC=C1 OCGVZYMCHVTNLH-UHFFFAOYSA-N 0.000 description 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 1
- 229940126062 Compound A Drugs 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 239000007832 Na2SO4 Substances 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000004904 UV filter Substances 0.000 description 1
- ORLQHILJRHBSAY-UHFFFAOYSA-N [1-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1(CO)CCCCC1 ORLQHILJRHBSAY-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- GPWHDDKQSYOYBF-UHFFFAOYSA-N ac1l2u0q Chemical compound Br[Br-]Br GPWHDDKQSYOYBF-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 150000001356 alkyl thiols Chemical class 0.000 description 1
- 239000002168 alkylating agent Substances 0.000 description 1
- 229940100198 alkylating agent Drugs 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- KMGBZBJJOKUPIA-UHFFFAOYSA-N butyl iodide Chemical compound CCCCI KMGBZBJJOKUPIA-UHFFFAOYSA-N 0.000 description 1
- 238000003490 calendering Methods 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000003857 carboxamides Chemical class 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N cinnamic acid group Chemical group C(C=CC1=CC=CC=C1)(=O)O WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 239000000549 coloured material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 125000002704 decyl group Chemical class [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 235000010228 ethyl p-hydroxybenzoate Nutrition 0.000 description 1
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000003187 heptyl group Chemical class [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical class [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 1
- 125000002960 margaryl group Chemical class [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N methylene hexane Natural products CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 1
- 125000001421 myristyl group Chemical class [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001400 nonyl group Chemical class [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical class [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 125000000913 palmityl group Chemical class [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical class [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical class C(CCCC)* 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 125000003884 phenylalkyl group Chemical group 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 235000015320 potassium carbonate Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical class [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- BALXUFOVQVENIU-KXNXZCPBSA-N pseudoephedrine hydrochloride Chemical compound [H+].[Cl-].CN[C@@H](C)[C@@H](O)C1=CC=CC=C1 BALXUFOVQVENIU-KXNXZCPBSA-N 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 231100000489 sensitizer Toxicity 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000004079 stearyl group Chemical class [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical group C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical class [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
- C09B57/14—Benzoxanthene dyes; Benzothioxanthene dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
- G11B7/2531—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising glass
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
- G11B7/2533—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins
Abstract
Photochromic benzothioxanthone oxides, process for their preparation and the use thereof Abstract of the Disclosure Compounds of formula I or III or mixtures thereof
Description
Photochromic benzothioxanthone oxides, process for their preparation and the use thereof The present invention relates to 6,7-benzothioxanthone oxides which are substituted in ~-position by aryloxy groups and in 5-position by a hydroxyl group or a derivatised hydroxyl group, to a process for their preparation and to the use thereof as photochromic systems for contrast formation, for light absorption and for recording information, as well as to novel benzothioxanthone oxides.
In Zhurnal Organicheskoi Khimii, Vol. 7, No. 11, pp. 2413-2415 (1971), Yu. F.
Gerasimenko et al. describe 6-phenoxynaphthacene-5,12-dione as a reversible photo-chromic compound which, when subjected to irradiation with light, forms the orange S-phenoxynaphthacene-6,12-dione (anaquinone). In Zhumal Organicheskoi Khimii, Vol.
16, No. 9, pp. 1938-1945 (1980),Yu. E~. Gerasimenko et al. describe 6,1 l-diphenoxy-naphthacene-5,12-dione, whose photoisomerisation is used for synthesising 6-amino derivatives of 12-phenoxynaphthacene-5,11-dione.
In one of its aspects, the present invention relates to compounds s)f formula I, or rnixtures thereof, RO O
~/ 1 ~ (I), R10 (~X
wherein -R is unsubstituted C6-Cl4aryl or C6-CI4aryl which is substituted by Cl-Cl2alkyl,Cl-Cl2alkoxy, Cl-Cl2alkylthio, phenyl, benzyl, -CN, -CF3, halogen or -COOR3, x is 1 or 2, and Rl is H, linear or branched Cl-Cl2alkyl, C2-Cl2alkenyl or C2-Cl2alkynyl, C7-Cl6aralkyl, Cg-Cl6alkaralkyl, -CH2COOR3 or Cl-C12acyl, wherein R3 is H, i , 2~
Cl-Cl8alkyl, cyclohexyl, cyclopentyl, phenyl, Cl-Cl2alkylphenyl, benzyl or Cl-CI2al-kylbenzyl.
~ in formula I is preferably unsubstituted or substituted C6-ClOalyl such as phenyl, or 1-or 2-naphthyl. Preferably R is unsubstitued or substituted phenyl.
The group R may be substituted by one or more, preferably by 1 to 3, substituents. If R is substituted by alkyl, aLkoxy or alkylthiol, these radicals may be linear or branched and preferably contain 1 to 6, most preferably 1 to 4, carbon atoms. Exemplary of such radicals are methyl, ethyl, the isomers of propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, and the corresponding aL~coxy and alkylthio radicals. Preferred radicals are methyl, ethyl, n- and isopropyl, n-, iso- and tert-butyl, methoxy, ethoxy, methylthio and ethylthio.
If R is substituted by halogen, preferred halogens are bromo, chloro and fluoro.
Rs as alkyl may be linear or branched. Further examples of the alkyl radicals mentioned above are the isomers of tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl and octadecyl. Rs as alkyl preferably contains 1 to 12, most preferably 1 to 6, carbon atoms.
Rs as alkylphenyl is preferably Cl-C6alkylphenyl, most prefeTably Cl-C4aLIcylphenyl, for example dodecylphenyl, octylphenyl, hexylphenyl, n-, iso- or tert-butylphenyl, n- or iso-propylphenyl, ethylphenyl or methylphenyl. Rs as alkylben~yl is preferably Cl-C6alkylbenzyl, most preferably Cl-C4alkylbenzyl, for example dodecylbenzyl, octylbenzyl, hexylbenzyl, n-, iso- or tert-butylphenyl, n- or isopropylbenzyl, ethylbenzyl or methylbenzyl. R5 is preferably H or Cl-CI8alkyl, most preferably Cl-Cl2aL~yl.
In a preferred embodiment of the invention, R in formula I is unsubstituted or substituted by Cl-C4alkyl, Cl-C4alkoxy, Cl-C4alkylthio, -F, -Cl, -Br or -COOR3, and R3 is H or Cl-Cl8alkyl.
In a particularly prefeIred embodiment of the invention, R in formula I is phenyl which is unsubstituted or substituted by -Cl, -COC)CH3 or -COOC2Hs. Illustrative examples of such radicals include phenyl, p-chlorophenyl, 3,5-dichlorophen-l~yl, p-(carbomethoxy)-phenyl and p-(carbethoxy)phenyl.
Rl as alkyl preferably contains 1 to 8, most preferably 1 to 6, carbon atoms, and is preferably linear alkyl. Exemplary of such groups are preferably methyl, ethyl, n-propyl, n-butyl, n-pentyl and n-hexyl.
Rl as aLtcenyl preferably contains 2 to 6 carbon atoms and is preferably linear alkenyl.
Allyl is especially prefelTed.
Rl as alkynyl preferably contains 2 to 6 carbon atoms and is preferably linear alkynyl.
Propargyl is especially preferred.
Rl as aralkyl preferably contains 7 to 12 carbon atoms and is preferably phenylalkyl containing 1 to 4 carbon atoms in the alkyl moiety. Exemplary of such radicals are phenylbutyl, phenylpropyl, phenylethyl and, preferably, benzyl.
Rl as alkaralkyl preferably contains 8 to 12 carbon atoms and is preferably (Cl-C4aLlcyl)benzyl, typically ethylbenzyl and methylbenzyl.
In a preferred embodiment of the invention, Rl in formula I is Cl-C6alkyl, benzyl or (Cl-C4alkyl)benzyl.
In the compounds of formula I x is preferably 2.
A preferred embodiment of the invention relates to compounds of formula I, wherein R is phenyl, Rl is H, Cl-C6alkyl, more particularly Cl-C4alkyl, or benzyl, and x is 1 or 2 An especially preferred embodiment of the invention relates to compounds of formula I, wherein R is phenyl, Rl is methyl, butyl or benzyl, and x is 2.
In another of its aspects, the invention relates to a process for the preparation of compounds of formula l, which comprises reacting a compound of formula II
RO O
; ' ' .
3~3 wherein R and Rl are as previously defined, with an oxidising agent which donates oxygen.
Examples of suitable oxidising agents are oxygen, by itself or together with a metal compound as catalyst, as well as inorganic and organic per compounds, swch as peracids or salts thereof, and peroxides. A preferred oxidising agent is hydrogen peroxide. The reaction is conveniently ca~ried out in an inert solvent, as in a halogenated hydrocarbon (methylene chloride, chloroforrn, carbon tetrachloride, 191,2,2-tetrachloroethane, mono- or dichlorobenzene), a sulfone (tetramethylenesulfone, dime~hyl sulfone) as well as a carboxamide (dimethyl formamide). If hydrogen peroxide is the oxidising agent, it is advantageous to use an organic acid, such as glacial acetic acid, or an aqueous acid as solvent, such as acetic acid.
The formation of mono- and dioxides can norrnally be controlled, when using hydrogen peroxide, by the choice of temperature under otherwise identical reaction conditions. The monooxides (x in formula I = 1) are predominantly formed at temperatures of up to about 30C and the dioxides (x in formula I = 2) at temperatures of over about 50C.
In yet another of its aspects, the invention relates to compounds of formula II
RO O
wherein R and Rl are as previously defined. The compounds of formula II, when irradiated in solution, undergo only an irreversible colour change to pale green.
The compounds of formula II can be prepared as follows: The reaction of the known 1,4-dihydroxy-3-(2'-carboxyl-1'-phenylthio)naphthalene with an alkylating agent, for example an aLIcyl iodide (methyl or ethyl iodide), in the presence of a metal base such as potassium carbonate, gives 1 ,4-dialkoxy-3-(2'-carbalkoxy- 1 '-phenylthio)naphthalene. The : .. .. .. ;
' .
2~
- ~ -saponification of this compound wit,h, for example, an alkali metal hydroxide in alcoholic solution, leads to the corresponding acid, which is reacted wlth phosphoroxy trichloride or tribromide to a benzothioxanthone of formula A
X O
:: X ) (A), AlkylO
wherein X is -Cl or -Br.
The compound A can be reacted direct with a phenol of formula ROH, in the absence or presence of an aLlcali metal base, an aLkali metal carbonate or a tertiary amine, to a compound of formula II, wherein Rl is alkyl. It is, however, also possible to convert the group ALIcylO- in the compounds of formula A into an -OH group, as with a hydrogen halide, in order subsequently to derivatise the -OH group with a compound RlY, in which Y is a leaving group such as halogen, and Rl, with the exception of H and alkyl, is as previously defined, and only then carrying out the reaction with the phenol.
Compounds of forrnula I, in which Rl is methyl, can be converted in the manner described above into other compounds of formula I. Removal of the methyl group gives the hydroxy compounds of formula I, wherein Rl is H, which can be derivatised with a compound of formula RlY (Rl, with the exception of methyl, is as previously defined). The hydroxy compounds of formula I can be converted by reaction with BBr3 in methylene chloride into the compounds of formula B
Br O
(B) OH
., ,. .
the hydroxyl group of which is derivatised with a compound of forrnula RIY and then converted with a phenol of formula ROH into a compound of formula I. Further particulars respecting these reactions will be found in the Examples.
The compounds of formula I are crystalline, thermally stable and colourless to pale yellow in colour. They are soluble in organic solvents. They are effective photoinitiators and photosensitisers for photopolymerisable systems which contain ethylenically unsaturated double bonds. ~urther, the compounds of formula I are reversibly photochromic compounds.
When the compounds of formula I are irradiated, alone or incorporated in a substrate, with light of wavelength ca. 300 to 450 nm, a pronounced change in colour towards yellow is obsen~ed. In comparison with 6,11-diphenoxynaphthacene-5,12-dione, the light absorption is displaced to a lower wavelength. The change in colour derives from the photochemical conversion of the compounds of formula I into the compounds of formula III. The rate of conversion is surprisingly high and, depending on the amount, thickness of the sample and irradiation intensity, can be less than 3 seconds.
The invention further relates to the compounds of formula III
O OR
C~ ~ I ~ ~ ~ (III), R10 ()x wherein R, Rl and x are as previously de~med, including the preferred meanings.
The compounds of formula III can be obtained, after irradiating solutions of thecompounds of for.nula I, by removing the solvent, and, as required, puri~led by conventional methods.
The change in colour is reversible. Renewed irradiation with light of wavelength ca. 450 to 550 nm gives the original colour. It is especially advantageous that this procedure can be repeated several times. The stability of the photochemical forward and reverse reaction ' ' " ' Z~ 3 is surprisingly high and the fatigue evel~ in air or in substrates is correspondingly low.
Thus virtually no changes are observed in more than 200 cycles. It is also advantageous that the light absorption necessary for the photochemical conversion lies in the range of the wavelength of commercially available lasers.
The invention further relates to the use of compounds of formula I or III as reversible photochromic structures for contrast formation or light absorption.
The compounds of formula I can be used as photoinitiators and, preferably, as photosensitisers in photopolymerisible systems, in which case they act simultaneously as colour indicators. Thus it is possible to mark irradiated products (for example protective layers, printing plates, offset printing plates, printed circuits, solder masks) and to distinguish them from non-irradiated products and, in product con~rol, to sort out imperfectly irradiated products before or after development.
The major advantage in using the compounds of formula I or III as colour indicators lies in the increase of the sensitiser action. Components norrnally used as colour change systems generally effect a diminution of the photosensitivity.
The compounds of formula I or III can also be used by themselves, in solution orincorporated in polymers, as photochemically modifiable colour indicators or as photochemically modi~1able circuit components.
The compounds of formula I can also be used in organic or inorganic glass as photochemically modifiable colour filters, for example in glass for sunglasses, contac~
lenses, windows and mirrors.
The invention further relates to a radiation-sensitive composition comprising a) a radiation-sensitive organic material, and b) at least one compound of formula I or III or a mi~cture thereof.
The compounds of formulae I and III or mixtures thereof may be present in an amount of 0.001 to 20 % by weight, preferably 0.001 to 10 % by weight and, most preferably, 0.01 to 5 % by weight, based on component a).
Radiation-sensitive and hence also photostructurable materials are known. They may be :: : , ; ; ,, ",,, - B -positive or nega~ve systems. Such matenals are described, for example, by E. Green et al.
in J. Macromol. Sci.; Revs. Macromol. and Chem., C21(2), 187-273 (1981 to 1982) and by G.A. Delzenne in Adv. Photochem., 11, S. 1-103 (1979).
The radiation-sensitive organic material is preferably al) a non-volatile monomeric, oligomeric or polymeric substrate containing photopolymerisable or photodimerisable ethylenically unsaturated groups, a2) a cationically curable system, or a3) photocrosslinkable polyimides.
Photopolymerisable substances are typically acrylates and, preferably, methacrylates of polyols, for example ethylene glycol, propanediol, butanediol, hexanediol, bis(hydroxy-methyl)cyclohexane, polyoxyalkylenediols such as di-, tri- or tetraethylene glycol, di- or tri-1,2-propylene glycol, trimethylolmethane, trimethylolethane or trimethylolpropane and pentaerythritol, which may be used by themselves, in mixtures and in admixture with binders.
Exemplary of photodimerisable substances are homo- and copolymers which contain cinnamic acid groups or substituted maleimidyl compounds in side groups or chalcone groups in the polymer chain.
Preferred compositions are those wherein component al) is a homo- or copolymer of acrylates, methacrylates or maleates whose ester groups contain a radical of formula o 7~c ~C
R C
wherein A is linear or branched unsubstituted or hydroxyl-substituted C2-CI2alkylene, cyclohexylene or phenylene, and R7 and R8 are each independently of the other chloro or bromo, phenyl or Cl-C4alkyl, or R7 and R8, when taken together, are trimethylene, (CH2)2 tetramethylene or ~
Such polymers are disclosed, for example, in US patent specification 4 193 927.
2~ 9~
g The photopoly~nerisable or photodimerisable substances can contain further additives customarily used for processing or application, as well as other photoinitiators or photosensitisers .
The cationically curable systems are preferably epoxy compounds containing at least two epoxy groups in the molecule and in which a photoinitiator is incorporated. Suitable photoinitiators are typically cyclopentadienylarene metal salts, cyclopentadienyl metal carbonyl salts and onium salts which are described in the above mentioned publications.
The curable systems may contain additives customarily used for processing and application.
Photosensitive polyimides are disclosçd, for example, in DE-A-l 962 588, EP-A-0 132 221, EP-A- 0 134 752, EP-A-0 162 017, EP-A-0 181 37 and EP-A-0 182 745.
The composition cf this invention is applied by known methods as layer to substrates and either a protective layer is produced by irradiation over the surface7 or a relief image is produced by irradiation through a photomask or by locally defined irradiation with a guided laser beam or by holographic methods and subsequent development.
In another of its aspects, the invention relates to a composition comprising a) a colourless organic solvent~ a polymer or an organic glass or a compound glass, and b) dissolved, incorporated therein or present as layer on at least one surface, a compound of formula I or III or a mixture thereof. Component b) is preferably present in an amount of 0.001 to 20 % by weight, preferably 0.001 to 10 % by weight and. most preferably, 0.01 to 5 % by weight, based on componen~ a). Organic solutions can be used for coating other substances, for example solid substrates such as inorganic glasses which can then be used as photochemically modifiable substrates. The compounds of formula I or III can also be sublimed on to substrates. The coated substrates can be provided with a protective layer of, for example, transparent polymers. Solid substrates can also be coated with compositions which contain a polymer and at least one compound of forrnula I or III.
Suitable solvents are typically hydrocarbons, halogenated hydrocarbons, ketones,carboxylic acid esters and lactones, N-alkylated acid amides and lactams, alkanols and ethers.
Exemplary of suitable polymers are thermoset plastics, thermoplastics and structurally crosslinked polymers. The polymers are preferably transparent. Such polymers and 2~ 3 organic glasses are known to those skilled in the art. The incorporation of the compounds of the invention is effected by known methods, for example by dissolving methods and removing the solvent, calendering or extrusion. The compounds of this invention can also be incorporated in the substrates before, during or after their synthesis.
The inven~ion also relates to a process for the preparation of coloured materials under the influence of light, which comprises incorporating a compound of formula I or III in the material and then ilTadiating said material with light.
The invention further relates to the use of compounds of formula I as photosensitisers and colour indicators or photochemically modifiable colour filters under the influence of light.
In yet another of its aspects, the invention relates to the use of a compound of formula I or III for the reversible optical storage of information, which information is written with light, preferably laser light, into a memory-active layer containing said compound. The information can be erased, preferably with laser light, thus affording the possibility of cyclic inputting and erasing.
To produce a memory-active layer, the cornpound of formula I or III can be dissolved in a transparent matrix by methods desribed above and applied in a thin layer to a flat substrate. The thickness of the memory-active layer is ca. 0.1-100 ,um, preferably 0.3-3 ,um.
The information can be written by scanned, holographic or photographic irradiation of the memory-acdve layer wi~h spectral, preferably coherent, laser light in the wa~lelength range of 440-550 nm, preferably 480-530 nm.
Reading out can be effected with reduced irradiation intensity at the wavelength in which the information is input via the locally altered transmission, reflectance, refraction or fluorescence of the memory-active layer.
Erasure can be made by pin-point or spread irradiation of the memory-active layer containing the compounds of folmula I andlor III in the wavelength range of 300-450 nm, preferably 300-420 nm.
One advantage of the utility of this invention is that the wavelengths necessary for . ~
,, ~ ,, ` . !, '~
inputting, reading OUt and erasing are in the range of commercially available lasers (for example argon ion lasers: 488/514 nm and 351/363 nm; HeCd lasers: 325 and 442 nm);
preferably diode lasers with frequency doubling of wavelength ca. 420-430 nm andca. 370-390 nm.
A further advantage is the high contrast of absorption obtainable between the input and erased state in the range of 450-550 nm and the wide dynamic range associated therewith of the memory-active layer.
Another advantage is that the quantum yield when inputting is fairly low, so that the danger of overwriting when reading out is greatly diminished.
Conversely, it is also advantageous that the quantum yield when erasing is fairly high, thus making possible a rapid erasure over a large area.
Another advantage is the high photochemical stability of the compound of formula I or III
and the great number of inputting/erasing cycles thereby obtainable.
Finally, yet another advantage is the possibility of cyclic data refreshing by admixture of a suitable quantum of light of the erasure wavelength dunng reading out.
The invention is illustrated by the following Examples, in which, unless otherwise indicated, percentages are molar percentages (yields) or volume percentages (eluants).
A) Preparation of the starting compounds Example A 1: 6,7-Benzo-5-methoxy- 8-phenoxythioxanthone.
a) 1,4-Dimethoxy-3-(1'-carbomethoxy-2'-phenylthio)naphtha!ene.
In Zhurnal Organicheskoi Khimii, Vol. 7, No. 11, pp. 2413-2415 (1971), Yu. F.
Gerasimenko et al. describe 6-phenoxynaphthacene-5,12-dione as a reversible photo-chromic compound which, when subjected to irradiation with light, forms the orange S-phenoxynaphthacene-6,12-dione (anaquinone). In Zhumal Organicheskoi Khimii, Vol.
16, No. 9, pp. 1938-1945 (1980),Yu. E~. Gerasimenko et al. describe 6,1 l-diphenoxy-naphthacene-5,12-dione, whose photoisomerisation is used for synthesising 6-amino derivatives of 12-phenoxynaphthacene-5,11-dione.
In one of its aspects, the present invention relates to compounds s)f formula I, or rnixtures thereof, RO O
~/ 1 ~ (I), R10 (~X
wherein -R is unsubstituted C6-Cl4aryl or C6-CI4aryl which is substituted by Cl-Cl2alkyl,Cl-Cl2alkoxy, Cl-Cl2alkylthio, phenyl, benzyl, -CN, -CF3, halogen or -COOR3, x is 1 or 2, and Rl is H, linear or branched Cl-Cl2alkyl, C2-Cl2alkenyl or C2-Cl2alkynyl, C7-Cl6aralkyl, Cg-Cl6alkaralkyl, -CH2COOR3 or Cl-C12acyl, wherein R3 is H, i , 2~
Cl-Cl8alkyl, cyclohexyl, cyclopentyl, phenyl, Cl-Cl2alkylphenyl, benzyl or Cl-CI2al-kylbenzyl.
~ in formula I is preferably unsubstituted or substituted C6-ClOalyl such as phenyl, or 1-or 2-naphthyl. Preferably R is unsubstitued or substituted phenyl.
The group R may be substituted by one or more, preferably by 1 to 3, substituents. If R is substituted by alkyl, aLkoxy or alkylthiol, these radicals may be linear or branched and preferably contain 1 to 6, most preferably 1 to 4, carbon atoms. Exemplary of such radicals are methyl, ethyl, the isomers of propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, and the corresponding aL~coxy and alkylthio radicals. Preferred radicals are methyl, ethyl, n- and isopropyl, n-, iso- and tert-butyl, methoxy, ethoxy, methylthio and ethylthio.
If R is substituted by halogen, preferred halogens are bromo, chloro and fluoro.
Rs as alkyl may be linear or branched. Further examples of the alkyl radicals mentioned above are the isomers of tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl and octadecyl. Rs as alkyl preferably contains 1 to 12, most preferably 1 to 6, carbon atoms.
Rs as alkylphenyl is preferably Cl-C6alkylphenyl, most prefeTably Cl-C4aLIcylphenyl, for example dodecylphenyl, octylphenyl, hexylphenyl, n-, iso- or tert-butylphenyl, n- or iso-propylphenyl, ethylphenyl or methylphenyl. Rs as alkylben~yl is preferably Cl-C6alkylbenzyl, most preferably Cl-C4alkylbenzyl, for example dodecylbenzyl, octylbenzyl, hexylbenzyl, n-, iso- or tert-butylphenyl, n- or isopropylbenzyl, ethylbenzyl or methylbenzyl. R5 is preferably H or Cl-CI8alkyl, most preferably Cl-Cl2aL~yl.
In a preferred embodiment of the invention, R in formula I is unsubstituted or substituted by Cl-C4alkyl, Cl-C4alkoxy, Cl-C4alkylthio, -F, -Cl, -Br or -COOR3, and R3 is H or Cl-Cl8alkyl.
In a particularly prefeIred embodiment of the invention, R in formula I is phenyl which is unsubstituted or substituted by -Cl, -COC)CH3 or -COOC2Hs. Illustrative examples of such radicals include phenyl, p-chlorophenyl, 3,5-dichlorophen-l~yl, p-(carbomethoxy)-phenyl and p-(carbethoxy)phenyl.
Rl as alkyl preferably contains 1 to 8, most preferably 1 to 6, carbon atoms, and is preferably linear alkyl. Exemplary of such groups are preferably methyl, ethyl, n-propyl, n-butyl, n-pentyl and n-hexyl.
Rl as aLtcenyl preferably contains 2 to 6 carbon atoms and is preferably linear alkenyl.
Allyl is especially prefelTed.
Rl as alkynyl preferably contains 2 to 6 carbon atoms and is preferably linear alkynyl.
Propargyl is especially preferred.
Rl as aralkyl preferably contains 7 to 12 carbon atoms and is preferably phenylalkyl containing 1 to 4 carbon atoms in the alkyl moiety. Exemplary of such radicals are phenylbutyl, phenylpropyl, phenylethyl and, preferably, benzyl.
Rl as alkaralkyl preferably contains 8 to 12 carbon atoms and is preferably (Cl-C4aLlcyl)benzyl, typically ethylbenzyl and methylbenzyl.
In a preferred embodiment of the invention, Rl in formula I is Cl-C6alkyl, benzyl or (Cl-C4alkyl)benzyl.
In the compounds of formula I x is preferably 2.
A preferred embodiment of the invention relates to compounds of formula I, wherein R is phenyl, Rl is H, Cl-C6alkyl, more particularly Cl-C4alkyl, or benzyl, and x is 1 or 2 An especially preferred embodiment of the invention relates to compounds of formula I, wherein R is phenyl, Rl is methyl, butyl or benzyl, and x is 2.
In another of its aspects, the invention relates to a process for the preparation of compounds of formula l, which comprises reacting a compound of formula II
RO O
; ' ' .
3~3 wherein R and Rl are as previously defined, with an oxidising agent which donates oxygen.
Examples of suitable oxidising agents are oxygen, by itself or together with a metal compound as catalyst, as well as inorganic and organic per compounds, swch as peracids or salts thereof, and peroxides. A preferred oxidising agent is hydrogen peroxide. The reaction is conveniently ca~ried out in an inert solvent, as in a halogenated hydrocarbon (methylene chloride, chloroforrn, carbon tetrachloride, 191,2,2-tetrachloroethane, mono- or dichlorobenzene), a sulfone (tetramethylenesulfone, dime~hyl sulfone) as well as a carboxamide (dimethyl formamide). If hydrogen peroxide is the oxidising agent, it is advantageous to use an organic acid, such as glacial acetic acid, or an aqueous acid as solvent, such as acetic acid.
The formation of mono- and dioxides can norrnally be controlled, when using hydrogen peroxide, by the choice of temperature under otherwise identical reaction conditions. The monooxides (x in formula I = 1) are predominantly formed at temperatures of up to about 30C and the dioxides (x in formula I = 2) at temperatures of over about 50C.
In yet another of its aspects, the invention relates to compounds of formula II
RO O
wherein R and Rl are as previously defined. The compounds of formula II, when irradiated in solution, undergo only an irreversible colour change to pale green.
The compounds of formula II can be prepared as follows: The reaction of the known 1,4-dihydroxy-3-(2'-carboxyl-1'-phenylthio)naphthalene with an alkylating agent, for example an aLIcyl iodide (methyl or ethyl iodide), in the presence of a metal base such as potassium carbonate, gives 1 ,4-dialkoxy-3-(2'-carbalkoxy- 1 '-phenylthio)naphthalene. The : .. .. .. ;
' .
2~
- ~ -saponification of this compound wit,h, for example, an alkali metal hydroxide in alcoholic solution, leads to the corresponding acid, which is reacted wlth phosphoroxy trichloride or tribromide to a benzothioxanthone of formula A
X O
:: X ) (A), AlkylO
wherein X is -Cl or -Br.
The compound A can be reacted direct with a phenol of formula ROH, in the absence or presence of an aLlcali metal base, an aLkali metal carbonate or a tertiary amine, to a compound of formula II, wherein Rl is alkyl. It is, however, also possible to convert the group ALIcylO- in the compounds of formula A into an -OH group, as with a hydrogen halide, in order subsequently to derivatise the -OH group with a compound RlY, in which Y is a leaving group such as halogen, and Rl, with the exception of H and alkyl, is as previously defined, and only then carrying out the reaction with the phenol.
Compounds of forrnula I, in which Rl is methyl, can be converted in the manner described above into other compounds of formula I. Removal of the methyl group gives the hydroxy compounds of formula I, wherein Rl is H, which can be derivatised with a compound of formula RlY (Rl, with the exception of methyl, is as previously defined). The hydroxy compounds of formula I can be converted by reaction with BBr3 in methylene chloride into the compounds of formula B
Br O
(B) OH
., ,. .
the hydroxyl group of which is derivatised with a compound of forrnula RIY and then converted with a phenol of formula ROH into a compound of formula I. Further particulars respecting these reactions will be found in the Examples.
The compounds of formula I are crystalline, thermally stable and colourless to pale yellow in colour. They are soluble in organic solvents. They are effective photoinitiators and photosensitisers for photopolymerisable systems which contain ethylenically unsaturated double bonds. ~urther, the compounds of formula I are reversibly photochromic compounds.
When the compounds of formula I are irradiated, alone or incorporated in a substrate, with light of wavelength ca. 300 to 450 nm, a pronounced change in colour towards yellow is obsen~ed. In comparison with 6,11-diphenoxynaphthacene-5,12-dione, the light absorption is displaced to a lower wavelength. The change in colour derives from the photochemical conversion of the compounds of formula I into the compounds of formula III. The rate of conversion is surprisingly high and, depending on the amount, thickness of the sample and irradiation intensity, can be less than 3 seconds.
The invention further relates to the compounds of formula III
O OR
C~ ~ I ~ ~ ~ (III), R10 ()x wherein R, Rl and x are as previously de~med, including the preferred meanings.
The compounds of formula III can be obtained, after irradiating solutions of thecompounds of for.nula I, by removing the solvent, and, as required, puri~led by conventional methods.
The change in colour is reversible. Renewed irradiation with light of wavelength ca. 450 to 550 nm gives the original colour. It is especially advantageous that this procedure can be repeated several times. The stability of the photochemical forward and reverse reaction ' ' " ' Z~ 3 is surprisingly high and the fatigue evel~ in air or in substrates is correspondingly low.
Thus virtually no changes are observed in more than 200 cycles. It is also advantageous that the light absorption necessary for the photochemical conversion lies in the range of the wavelength of commercially available lasers.
The invention further relates to the use of compounds of formula I or III as reversible photochromic structures for contrast formation or light absorption.
The compounds of formula I can be used as photoinitiators and, preferably, as photosensitisers in photopolymerisible systems, in which case they act simultaneously as colour indicators. Thus it is possible to mark irradiated products (for example protective layers, printing plates, offset printing plates, printed circuits, solder masks) and to distinguish them from non-irradiated products and, in product con~rol, to sort out imperfectly irradiated products before or after development.
The major advantage in using the compounds of formula I or III as colour indicators lies in the increase of the sensitiser action. Components norrnally used as colour change systems generally effect a diminution of the photosensitivity.
The compounds of formula I or III can also be used by themselves, in solution orincorporated in polymers, as photochemically modifiable colour indicators or as photochemically modi~1able circuit components.
The compounds of formula I can also be used in organic or inorganic glass as photochemically modifiable colour filters, for example in glass for sunglasses, contac~
lenses, windows and mirrors.
The invention further relates to a radiation-sensitive composition comprising a) a radiation-sensitive organic material, and b) at least one compound of formula I or III or a mi~cture thereof.
The compounds of formulae I and III or mixtures thereof may be present in an amount of 0.001 to 20 % by weight, preferably 0.001 to 10 % by weight and, most preferably, 0.01 to 5 % by weight, based on component a).
Radiation-sensitive and hence also photostructurable materials are known. They may be :: : , ; ; ,, ",,, - B -positive or nega~ve systems. Such matenals are described, for example, by E. Green et al.
in J. Macromol. Sci.; Revs. Macromol. and Chem., C21(2), 187-273 (1981 to 1982) and by G.A. Delzenne in Adv. Photochem., 11, S. 1-103 (1979).
The radiation-sensitive organic material is preferably al) a non-volatile monomeric, oligomeric or polymeric substrate containing photopolymerisable or photodimerisable ethylenically unsaturated groups, a2) a cationically curable system, or a3) photocrosslinkable polyimides.
Photopolymerisable substances are typically acrylates and, preferably, methacrylates of polyols, for example ethylene glycol, propanediol, butanediol, hexanediol, bis(hydroxy-methyl)cyclohexane, polyoxyalkylenediols such as di-, tri- or tetraethylene glycol, di- or tri-1,2-propylene glycol, trimethylolmethane, trimethylolethane or trimethylolpropane and pentaerythritol, which may be used by themselves, in mixtures and in admixture with binders.
Exemplary of photodimerisable substances are homo- and copolymers which contain cinnamic acid groups or substituted maleimidyl compounds in side groups or chalcone groups in the polymer chain.
Preferred compositions are those wherein component al) is a homo- or copolymer of acrylates, methacrylates or maleates whose ester groups contain a radical of formula o 7~c ~C
R C
wherein A is linear or branched unsubstituted or hydroxyl-substituted C2-CI2alkylene, cyclohexylene or phenylene, and R7 and R8 are each independently of the other chloro or bromo, phenyl or Cl-C4alkyl, or R7 and R8, when taken together, are trimethylene, (CH2)2 tetramethylene or ~
Such polymers are disclosed, for example, in US patent specification 4 193 927.
2~ 9~
g The photopoly~nerisable or photodimerisable substances can contain further additives customarily used for processing or application, as well as other photoinitiators or photosensitisers .
The cationically curable systems are preferably epoxy compounds containing at least two epoxy groups in the molecule and in which a photoinitiator is incorporated. Suitable photoinitiators are typically cyclopentadienylarene metal salts, cyclopentadienyl metal carbonyl salts and onium salts which are described in the above mentioned publications.
The curable systems may contain additives customarily used for processing and application.
Photosensitive polyimides are disclosçd, for example, in DE-A-l 962 588, EP-A-0 132 221, EP-A- 0 134 752, EP-A-0 162 017, EP-A-0 181 37 and EP-A-0 182 745.
The composition cf this invention is applied by known methods as layer to substrates and either a protective layer is produced by irradiation over the surface7 or a relief image is produced by irradiation through a photomask or by locally defined irradiation with a guided laser beam or by holographic methods and subsequent development.
In another of its aspects, the invention relates to a composition comprising a) a colourless organic solvent~ a polymer or an organic glass or a compound glass, and b) dissolved, incorporated therein or present as layer on at least one surface, a compound of formula I or III or a mixture thereof. Component b) is preferably present in an amount of 0.001 to 20 % by weight, preferably 0.001 to 10 % by weight and. most preferably, 0.01 to 5 % by weight, based on componen~ a). Organic solutions can be used for coating other substances, for example solid substrates such as inorganic glasses which can then be used as photochemically modifiable substrates. The compounds of formula I or III can also be sublimed on to substrates. The coated substrates can be provided with a protective layer of, for example, transparent polymers. Solid substrates can also be coated with compositions which contain a polymer and at least one compound of forrnula I or III.
Suitable solvents are typically hydrocarbons, halogenated hydrocarbons, ketones,carboxylic acid esters and lactones, N-alkylated acid amides and lactams, alkanols and ethers.
Exemplary of suitable polymers are thermoset plastics, thermoplastics and structurally crosslinked polymers. The polymers are preferably transparent. Such polymers and 2~ 3 organic glasses are known to those skilled in the art. The incorporation of the compounds of the invention is effected by known methods, for example by dissolving methods and removing the solvent, calendering or extrusion. The compounds of this invention can also be incorporated in the substrates before, during or after their synthesis.
The inven~ion also relates to a process for the preparation of coloured materials under the influence of light, which comprises incorporating a compound of formula I or III in the material and then ilTadiating said material with light.
The invention further relates to the use of compounds of formula I as photosensitisers and colour indicators or photochemically modifiable colour filters under the influence of light.
In yet another of its aspects, the invention relates to the use of a compound of formula I or III for the reversible optical storage of information, which information is written with light, preferably laser light, into a memory-active layer containing said compound. The information can be erased, preferably with laser light, thus affording the possibility of cyclic inputting and erasing.
To produce a memory-active layer, the cornpound of formula I or III can be dissolved in a transparent matrix by methods desribed above and applied in a thin layer to a flat substrate. The thickness of the memory-active layer is ca. 0.1-100 ,um, preferably 0.3-3 ,um.
The information can be written by scanned, holographic or photographic irradiation of the memory-acdve layer wi~h spectral, preferably coherent, laser light in the wa~lelength range of 440-550 nm, preferably 480-530 nm.
Reading out can be effected with reduced irradiation intensity at the wavelength in which the information is input via the locally altered transmission, reflectance, refraction or fluorescence of the memory-active layer.
Erasure can be made by pin-point or spread irradiation of the memory-active layer containing the compounds of folmula I andlor III in the wavelength range of 300-450 nm, preferably 300-420 nm.
One advantage of the utility of this invention is that the wavelengths necessary for . ~
,, ~ ,, ` . !, '~
inputting, reading OUt and erasing are in the range of commercially available lasers (for example argon ion lasers: 488/514 nm and 351/363 nm; HeCd lasers: 325 and 442 nm);
preferably diode lasers with frequency doubling of wavelength ca. 420-430 nm andca. 370-390 nm.
A further advantage is the high contrast of absorption obtainable between the input and erased state in the range of 450-550 nm and the wide dynamic range associated therewith of the memory-active layer.
Another advantage is that the quantum yield when inputting is fairly low, so that the danger of overwriting when reading out is greatly diminished.
Conversely, it is also advantageous that the quantum yield when erasing is fairly high, thus making possible a rapid erasure over a large area.
Another advantage is the high photochemical stability of the compound of formula I or III
and the great number of inputting/erasing cycles thereby obtainable.
Finally, yet another advantage is the possibility of cyclic data refreshing by admixture of a suitable quantum of light of the erasure wavelength dunng reading out.
The invention is illustrated by the following Examples, in which, unless otherwise indicated, percentages are molar percentages (yields) or volume percentages (eluants).
A) Preparation of the starting compounds Example A 1: 6,7-Benzo-5-methoxy- 8-phenoxythioxanthone.
a) 1,4-Dimethoxy-3-(1'-carbomethoxy-2'-phenylthio)naphtha!ene.
6 g (19.2 mmol) of 1,4-dihydroxy-3-(1'-carboxyl-2'-phenylthio)naphthalene, 13.6 g (96 mmol) of methyl iodide, 13.27 g (96 mmol~ of potassium carbonate and 60 ml of dimethyl formamide are stiIred for 20 minutes at 25C. The mixture is then taken up in aqueous hydrochloric acid/toluene and the organic phase is separated, washed twice with water, dried over sodium sulfate and then concentrated by evaporation. The residue is stirred in methanol to give 5.05 g (74 %) of crystalline product with a melting point (m.p.) of 123-125C.
3~
b) 1,4-Dimethoxy-3-(1'-carboxyl-2'-phenylthio~naphthalene.
85 g (240 mmol) of the compound obtained in a), 40.37 g (720 mmol) of KOH and 700 ml of ethanol are stirred for 15 minutes at 80C. After cooling, the reaction mixture is poured into dilute hydrochloric acid and the suspension is extracted with tetrahydrofuran/toluene.
The separated organic phases are dried over sodium sulfate and then concentrated by evaporation. Recrystallisation from toluene gives 76.9 g (94 %) of crystalline product Wit}
a melting point of 185-187C.
c) 6,7-Benzo-S-methoxy-8-chlorothioxanthone.
30 g (88.1 mmol) of the compound obtained in b) are stirred under reflux for 6 hours in 400 ml of o-dichlorobenzene and 40 ml of phosphoroxy trichloride. The reaction mixture is poured ;nto mixture of ice/water, stilTed, and then extracted with tetrahydrofuran/etha-nol (1:1). The separated organic phases are washed with an aqueous solution of sodium carbonate, dried over sodium sulfate and then concentrated by evaporation. The crude product is filtered over silica gel with methylene chloride and the filtrate is concentrated by evaporation. The residue is stined in pentane and filtered, giving 23.2 g (81 %) of crystalline product with a melting point of 162-164C.
d) 3 g (9.18 mmol) of the compound obtained in c), 1.12 g (11.93 mmol) of phenol, 2.54 g (18.36 mmol) of potassium carbonate and 30 ml of dimethyl sulfoxide are stirred for 2.5 hours at 120C. After cooling, the reaction mixture is taken up in a mixture of tetrahydrofuran/toluene/2N aqueous HCI and the organic phase is separated, dried ovPr sodium sulfate and concentrated by evaporation. The crude product is filtered over silica gel with methylene chloride and the solvent is then evaporated, giving 2.1 g (60 %) of yellow crystals of the title compound with a melting point of 235-238C.
When irradiated, a solution of the compound in toluene undergoes an irreversible colour change from pale yellow to pale green.
Example A2: 6,7-Benzo-5-methoxy-8-chlorothioxanthone sulfodioxide.
3 g (9.18 mmol) of the compound of Al c), 6 ml of 30 % H2O2/H20 and 30 ml of glacial acetic acid are stirred for 2 hours at 90C. The mixture is poured into 200 ml of water, and the crystals are isolated by filtration, washed with water, dried and recrystallised from toluene, giving 2.9 g (88 %) of pure product with a melting point of 160-162 C.
2~ 93 B~ Preparation of the inventive compounds Example B 1: 6,7-Benzo-5-methoxy-8-phenoxythioxanthone sulfoxide.
0.5 g (1.3 mmol) of compound Al, 2 ml of an aqueous solution of hydrogen peroxide (30 %) and 50 ml of glacial acetic acid are stirred for 2 hours at 25C. Then a mixture of tetrahydrofuran/toluene (1:1) is added, and the organic phase is separated, washed with water, dried over sodium sulfate and concentrated by evaporation. The residue ischromatographed over silica gel (eluant: 3 % acetone in methylene chloride), giving 0.23 g (44 %) of yellow crystals of the title compound with a melting point of 230-233C.
Mass spectrum: 400 (M~).
When irradiated, a solution of the compound in toluene undergoes a reversible colour change from colourless to yellow.
Example B2: 6,7-Benzo-5-methoxy-8-phenoxythioxanthone sulfodioxide.
0.5 g (1.3 mmol) of compound Al, 1 ml of an aqueous solution of hydrogen peroxide (30 %) and 10 ml of glacial acetic acid are stirred for 3 hours at 80C. Then a mixture of tetrahydrofuranltoluene (1:1) is added, and the organic phase is separated, washed with water, dried over sodium sulfate and concentrated by evaporation. The residue ischromatographed over silica gel (eluant: 3 % acetone in methylene chloride), giving 0.46 g (44 %) of yellow crystals of the title compound with a melting point of 210-213C.
Mass spectrum: 416 (M+).
When irradiated, a solution of the compound in toluene undergoes a reversible colour change from colourless to yellow.
Example B3: 6,7-Benzo-S-benzyloxy-8-phenoxythioxanthone sulfodioxide.
a) S-Hydroxy-8-phenoxythioxanthone sulfodioxide.
3 g (7~2 mmol) of compound B2 and 30 ml of HBr solution in glacial acetic acid (30 %) are kept for 1 day at 130C in an autoclave. After cooling, the mixture is poured into water, the precipitate is isolated by filtration and then dissolved in tetrahydrofuran/toluene (1:1). The solution is washed with 2N NaOH, dried over sodium sulfate and then concentrated by evaporation. The residue is afterwards taken up in methylene chloride and the solution is filtered over silica gel, giving 1.2 g (42 %) of orange crystals of the product.
b) 1 g (2.48 mmol) of the above product, 2.13 g (12.43 mmol) of benzyl bromide, 2.06 g (14.91 mmol) of potassium carbonate and 10 ml of dimethyl formamide are stirred for 25 minutes at 50C and the reaction mixture is poured into a mixture of tetrahydrofuran/toluene /2N HCl. The organic phase is dried over sodium sulfate and filtered over basic alumina. Recrystallisation from methylene chloride/pentane (1: 1) gives 1 g (82 %) of the title compound of m.p. 155-160C. Mass spectrum: 492 (M+).
When irradiated, a solution of the compolmd in toluene undergoes a reversible colour change from colourless to yellow.
Example B4: 6,7-Benzo-S-butoxy-8-phenoxythioxanthone sulfodioxide.
a) 6,7-Benzo-S-hydroxy-8-bromothioxanthone sulfodioxide.
2.08 g (S mmol) of compound B2 in 50 ml of methylene chlonde are treated at 5C with 0.35 ml of BBr3. The reaction mixture is warmed to 25C and stirred for 10 minutes. Then water is slowly added dropwise, followed by extraction with $etrahydrofuran/toluene (1:1).
The organic phase is washed with water, dried over sodium sulfate and concentrated by evaporation. The residue is dissolved in toluene and the solution is filtered hot and then crystallised, giving 1.75 g (90 %) of the compound. Mass syectrum: 388/390 (M+).
b) 6,7-Benzo-S-butoxy-8-bromothioxanthone sulfodioxide.
0.53 g (1.36 mmol) of compound a3, 0.56 g (4.09 mmol) of potassium carbonate, 0.38 g (2.04 mmol) of butyl iodide and 10 ml of N-methylpyrrolidone are stirred for 18 hours at 60C. The reaction rnixture is poured into water and afterwards extracted with tetrahydrofuran/toluene (1:1). The organic phase is washed with waterS dried over sodium sulfate and filtered over silica gel. Recrystallisation from methylene chloride/hexane (1:1) gives 0.3 g (50 %) of the title compound of m.p. 157-158C. Mass spec-trum: 444/446 (M and 388/390 (base peak).
c) 0.2 g (0.45 mmol) of compound b), 0.13 g (1.35 mmol) of phenol, 0.25 g (1.8 mmol) of potassium carbonate and S ml of N-methylpylTolidone are stirred for 4 hours at 70C. The reaction mixture is poured into 2N hydrochloric acid and extracted toluene. The organic phase is washed with 2N NaOH and then with water, dired over sodium sulfate and concentrated by evaporation. Recrystallisation from methylene chlolide/hexane gives 158 g (77 %) of the title compound of m.p. 172-173C. Mass spectrum: 458 (M+) and 402 (base peak).
Example B5: 6,7-Benzo-S-methoxy-8-(3,5-dichlorophenoxy)thioxanthone sulfodioxide.
1 g (2.79 rnmol) of compound A2, 0.SS g (3.34 mmol) of 3,5-dichlorophenol, 0.77 g (5.57 mmol) K2CO3 and 10 ml of dimethyl sulfoxide are stirred for 25 minutes at 100C.
,, , The mixture is ta~cen up in 2N HCl/toluene and the organic phase is separated, d;ied over Na2SO4 and concentrated by evaporation. Recrystallisation from toluene gives 0.96 g (71 %) of pure product; m.p.: 207-210C.
Example B6:
6,7-Benzo-S-methoxy-8-(p-ethoxycarbonylphenoxy)thioxanthonesulfodioxide.
This compound is prepared in accordance with the general procedure of Exanlple B5, using ethyl 4-hydroxybenzoate in place of the 3,5-dichlorophenol, giving 0.88 g (65 %) of pure product of m.p. 178-180C.
C) Use Examples 25 mg of compound B2 and 2.5 g of polystyrene are dissolved at 60C under argon and excluding light. The solution is cooled to room temperature and applied with a doctor knife to a wet film thickness of 200 ~,lm on a glass plate and dried at 80C for 60 minutes in a circulating air drier to give a homogeneous, transparent and free-standing film. The film is mounted on a quartz plate in the testing chamber of a spectrophotometer and irradiated with a 300 W xenon lamp through glass fibres and a UV hlter (Schott UGl l).
The integral iIradiation intensity is 0.8 mW/cm2. The irradiation is disocontinued at 60 second intervals and the absorption spectrum is measured. The spectrum of the sample changes from colourless (optical density 0.6 at 300 nm, 0.3 at 375 nm and zero above 420 nm) to yellow, caused by a broad absorption band in the range of 350-500 nm (maximum optical density 0.5 at 430 nm). The time constant of the change is 130 s.
For the reverse reaction, the UV filter is replaced by a yellow cut-on filter (Schott GG 455) with transmission above about 400 nm. The integral intensity of irradiation in the range ~rom 400-500 nm is 2.5 mW/cm2. The iIradiation causes the long-wave absorption band to disappear at 350-500 nm to a maximum optical density of 0.1. The time constant of the reverse reaction is 200 s.
In further irradiation cycles these critical values of the optical density remain constant (at 430 nm: about 0.1/0.5).
Example C2:
The film of Example Cl is placed between two quartz glass plates in the film plane of a halographic recorder. Two even beams (O and R), each having an irradiation intensity of 2.5 mW/cm2, are forrned from an expanded, wave-guided argon laser beam (454 nm, ~
c. 0.5 cm) and brought to coincidence at an angle of 3 in the plane of the film. A bundle of UV light (0.5 mW/cm2), coincident with O and R, is directed on to the plane of the film -, ' ~' 2~ 3 from a 300 W xenon lamp through a UV ~llter (Schott UGl 1) and a quartz filamentBehind the plane of the film, a detector for measuring the diffraction efficiency is mounded in the direction of the ~Irst order of diffraction of R and of the second of O. The film is converted into the yello~,v form by irradiating it for 10 minutes with UV light. After activating O and R, there occurs a monotonic increase in the diffraction efficiency from 0 to c. 0.1 % (writing) over 60 s. After discountinuing O, the diffraction efficiency increases sharply to c. 0.12 % (suppression of the destructively interfering second diffraction order of 0) and then decreases approximately exponentially with a time constant of ca. 60 s (overwriting). Erasure is effected by renewed UV irradiation. No diminution of the diffraction efficiency can be determined after 10 cycles. Simultaneous writing and erasing (holographic short-time memory) gives a stationary diffration efficiency of ca. 0.05 %.
~, .
,
3~
b) 1,4-Dimethoxy-3-(1'-carboxyl-2'-phenylthio~naphthalene.
85 g (240 mmol) of the compound obtained in a), 40.37 g (720 mmol) of KOH and 700 ml of ethanol are stirred for 15 minutes at 80C. After cooling, the reaction mixture is poured into dilute hydrochloric acid and the suspension is extracted with tetrahydrofuran/toluene.
The separated organic phases are dried over sodium sulfate and then concentrated by evaporation. Recrystallisation from toluene gives 76.9 g (94 %) of crystalline product Wit}
a melting point of 185-187C.
c) 6,7-Benzo-S-methoxy-8-chlorothioxanthone.
30 g (88.1 mmol) of the compound obtained in b) are stirred under reflux for 6 hours in 400 ml of o-dichlorobenzene and 40 ml of phosphoroxy trichloride. The reaction mixture is poured ;nto mixture of ice/water, stilTed, and then extracted with tetrahydrofuran/etha-nol (1:1). The separated organic phases are washed with an aqueous solution of sodium carbonate, dried over sodium sulfate and then concentrated by evaporation. The crude product is filtered over silica gel with methylene chloride and the filtrate is concentrated by evaporation. The residue is stined in pentane and filtered, giving 23.2 g (81 %) of crystalline product with a melting point of 162-164C.
d) 3 g (9.18 mmol) of the compound obtained in c), 1.12 g (11.93 mmol) of phenol, 2.54 g (18.36 mmol) of potassium carbonate and 30 ml of dimethyl sulfoxide are stirred for 2.5 hours at 120C. After cooling, the reaction mixture is taken up in a mixture of tetrahydrofuran/toluene/2N aqueous HCI and the organic phase is separated, dried ovPr sodium sulfate and concentrated by evaporation. The crude product is filtered over silica gel with methylene chloride and the solvent is then evaporated, giving 2.1 g (60 %) of yellow crystals of the title compound with a melting point of 235-238C.
When irradiated, a solution of the compound in toluene undergoes an irreversible colour change from pale yellow to pale green.
Example A2: 6,7-Benzo-5-methoxy-8-chlorothioxanthone sulfodioxide.
3 g (9.18 mmol) of the compound of Al c), 6 ml of 30 % H2O2/H20 and 30 ml of glacial acetic acid are stirred for 2 hours at 90C. The mixture is poured into 200 ml of water, and the crystals are isolated by filtration, washed with water, dried and recrystallised from toluene, giving 2.9 g (88 %) of pure product with a melting point of 160-162 C.
2~ 93 B~ Preparation of the inventive compounds Example B 1: 6,7-Benzo-5-methoxy-8-phenoxythioxanthone sulfoxide.
0.5 g (1.3 mmol) of compound Al, 2 ml of an aqueous solution of hydrogen peroxide (30 %) and 50 ml of glacial acetic acid are stirred for 2 hours at 25C. Then a mixture of tetrahydrofuran/toluene (1:1) is added, and the organic phase is separated, washed with water, dried over sodium sulfate and concentrated by evaporation. The residue ischromatographed over silica gel (eluant: 3 % acetone in methylene chloride), giving 0.23 g (44 %) of yellow crystals of the title compound with a melting point of 230-233C.
Mass spectrum: 400 (M~).
When irradiated, a solution of the compound in toluene undergoes a reversible colour change from colourless to yellow.
Example B2: 6,7-Benzo-5-methoxy-8-phenoxythioxanthone sulfodioxide.
0.5 g (1.3 mmol) of compound Al, 1 ml of an aqueous solution of hydrogen peroxide (30 %) and 10 ml of glacial acetic acid are stirred for 3 hours at 80C. Then a mixture of tetrahydrofuranltoluene (1:1) is added, and the organic phase is separated, washed with water, dried over sodium sulfate and concentrated by evaporation. The residue ischromatographed over silica gel (eluant: 3 % acetone in methylene chloride), giving 0.46 g (44 %) of yellow crystals of the title compound with a melting point of 210-213C.
Mass spectrum: 416 (M+).
When irradiated, a solution of the compound in toluene undergoes a reversible colour change from colourless to yellow.
Example B3: 6,7-Benzo-S-benzyloxy-8-phenoxythioxanthone sulfodioxide.
a) S-Hydroxy-8-phenoxythioxanthone sulfodioxide.
3 g (7~2 mmol) of compound B2 and 30 ml of HBr solution in glacial acetic acid (30 %) are kept for 1 day at 130C in an autoclave. After cooling, the mixture is poured into water, the precipitate is isolated by filtration and then dissolved in tetrahydrofuran/toluene (1:1). The solution is washed with 2N NaOH, dried over sodium sulfate and then concentrated by evaporation. The residue is afterwards taken up in methylene chloride and the solution is filtered over silica gel, giving 1.2 g (42 %) of orange crystals of the product.
b) 1 g (2.48 mmol) of the above product, 2.13 g (12.43 mmol) of benzyl bromide, 2.06 g (14.91 mmol) of potassium carbonate and 10 ml of dimethyl formamide are stirred for 25 minutes at 50C and the reaction mixture is poured into a mixture of tetrahydrofuran/toluene /2N HCl. The organic phase is dried over sodium sulfate and filtered over basic alumina. Recrystallisation from methylene chloride/pentane (1: 1) gives 1 g (82 %) of the title compound of m.p. 155-160C. Mass spectrum: 492 (M+).
When irradiated, a solution of the compolmd in toluene undergoes a reversible colour change from colourless to yellow.
Example B4: 6,7-Benzo-S-butoxy-8-phenoxythioxanthone sulfodioxide.
a) 6,7-Benzo-S-hydroxy-8-bromothioxanthone sulfodioxide.
2.08 g (S mmol) of compound B2 in 50 ml of methylene chlonde are treated at 5C with 0.35 ml of BBr3. The reaction mixture is warmed to 25C and stirred for 10 minutes. Then water is slowly added dropwise, followed by extraction with $etrahydrofuran/toluene (1:1).
The organic phase is washed with water, dried over sodium sulfate and concentrated by evaporation. The residue is dissolved in toluene and the solution is filtered hot and then crystallised, giving 1.75 g (90 %) of the compound. Mass syectrum: 388/390 (M+).
b) 6,7-Benzo-S-butoxy-8-bromothioxanthone sulfodioxide.
0.53 g (1.36 mmol) of compound a3, 0.56 g (4.09 mmol) of potassium carbonate, 0.38 g (2.04 mmol) of butyl iodide and 10 ml of N-methylpyrrolidone are stirred for 18 hours at 60C. The reaction rnixture is poured into water and afterwards extracted with tetrahydrofuran/toluene (1:1). The organic phase is washed with waterS dried over sodium sulfate and filtered over silica gel. Recrystallisation from methylene chloride/hexane (1:1) gives 0.3 g (50 %) of the title compound of m.p. 157-158C. Mass spec-trum: 444/446 (M and 388/390 (base peak).
c) 0.2 g (0.45 mmol) of compound b), 0.13 g (1.35 mmol) of phenol, 0.25 g (1.8 mmol) of potassium carbonate and S ml of N-methylpylTolidone are stirred for 4 hours at 70C. The reaction mixture is poured into 2N hydrochloric acid and extracted toluene. The organic phase is washed with 2N NaOH and then with water, dired over sodium sulfate and concentrated by evaporation. Recrystallisation from methylene chlolide/hexane gives 158 g (77 %) of the title compound of m.p. 172-173C. Mass spectrum: 458 (M+) and 402 (base peak).
Example B5: 6,7-Benzo-S-methoxy-8-(3,5-dichlorophenoxy)thioxanthone sulfodioxide.
1 g (2.79 rnmol) of compound A2, 0.SS g (3.34 mmol) of 3,5-dichlorophenol, 0.77 g (5.57 mmol) K2CO3 and 10 ml of dimethyl sulfoxide are stirred for 25 minutes at 100C.
,, , The mixture is ta~cen up in 2N HCl/toluene and the organic phase is separated, d;ied over Na2SO4 and concentrated by evaporation. Recrystallisation from toluene gives 0.96 g (71 %) of pure product; m.p.: 207-210C.
Example B6:
6,7-Benzo-S-methoxy-8-(p-ethoxycarbonylphenoxy)thioxanthonesulfodioxide.
This compound is prepared in accordance with the general procedure of Exanlple B5, using ethyl 4-hydroxybenzoate in place of the 3,5-dichlorophenol, giving 0.88 g (65 %) of pure product of m.p. 178-180C.
C) Use Examples 25 mg of compound B2 and 2.5 g of polystyrene are dissolved at 60C under argon and excluding light. The solution is cooled to room temperature and applied with a doctor knife to a wet film thickness of 200 ~,lm on a glass plate and dried at 80C for 60 minutes in a circulating air drier to give a homogeneous, transparent and free-standing film. The film is mounted on a quartz plate in the testing chamber of a spectrophotometer and irradiated with a 300 W xenon lamp through glass fibres and a UV hlter (Schott UGl l).
The integral iIradiation intensity is 0.8 mW/cm2. The irradiation is disocontinued at 60 second intervals and the absorption spectrum is measured. The spectrum of the sample changes from colourless (optical density 0.6 at 300 nm, 0.3 at 375 nm and zero above 420 nm) to yellow, caused by a broad absorption band in the range of 350-500 nm (maximum optical density 0.5 at 430 nm). The time constant of the change is 130 s.
For the reverse reaction, the UV filter is replaced by a yellow cut-on filter (Schott GG 455) with transmission above about 400 nm. The integral intensity of irradiation in the range ~rom 400-500 nm is 2.5 mW/cm2. The iIradiation causes the long-wave absorption band to disappear at 350-500 nm to a maximum optical density of 0.1. The time constant of the reverse reaction is 200 s.
In further irradiation cycles these critical values of the optical density remain constant (at 430 nm: about 0.1/0.5).
Example C2:
The film of Example Cl is placed between two quartz glass plates in the film plane of a halographic recorder. Two even beams (O and R), each having an irradiation intensity of 2.5 mW/cm2, are forrned from an expanded, wave-guided argon laser beam (454 nm, ~
c. 0.5 cm) and brought to coincidence at an angle of 3 in the plane of the film. A bundle of UV light (0.5 mW/cm2), coincident with O and R, is directed on to the plane of the film -, ' ~' 2~ 3 from a 300 W xenon lamp through a UV ~llter (Schott UGl 1) and a quartz filamentBehind the plane of the film, a detector for measuring the diffraction efficiency is mounded in the direction of the ~Irst order of diffraction of R and of the second of O. The film is converted into the yello~,v form by irradiating it for 10 minutes with UV light. After activating O and R, there occurs a monotonic increase in the diffraction efficiency from 0 to c. 0.1 % (writing) over 60 s. After discountinuing O, the diffraction efficiency increases sharply to c. 0.12 % (suppression of the destructively interfering second diffraction order of 0) and then decreases approximately exponentially with a time constant of ca. 60 s (overwriting). Erasure is effected by renewed UV irradiation. No diminution of the diffraction efficiency can be determined after 10 cycles. Simultaneous writing and erasing (holographic short-time memory) gives a stationary diffration efficiency of ca. 0.05 %.
~, .
,
Claims (16)
1. A compound of formula I or a mixture thereof (I), wherein R is unsubstituted C6-CI4aryl or C6-CI4aryl which is substituted by Cl-CI2alkyl,Cl-CI2alkoxy, Cl-C12alkylthio, phenyl, benzyl, -CN, -CF3, halogen or -COOR3, x is 1 or
2, and Rl is H, linear or branched Cl-CI2alkyl, C2-CI2alkenyl or C2-C12alkynyl, C7-Cl6aralkcyl, C8-CI6alkaralkyl, -CH2COOR3 or Cl-CI2acyl, wherein R3 is H, Cl-CI8alkyl, cyclohexyl, cyclopentyl, phenyl, Cl-CI2alkylphenyl, benzyl or Cl-CI2al kylbenzyl.
2. A compound of formula I, wherein R in formula I is unsubstituted or substituted C6-CI0aryl.
2. A compound of formula I, wherein R in formula I is unsubstituted or substituted C6-CI0aryl.
3. A compound according to claim 1, wherein R in formula I is unsubstituted or substitu-ted phenyl.
4. A compound according to claim 1, wherein R in formula I is unsubstituted or substituted by Cl-C4alkyl, Cl-C4alkoxy, Cl-C4alkylthio, -F, -C1, -Br or -COOR3, wherein R3 is H or Cl-Cl8alkyl.
5. A compound according to claim 1, wherein R in formula I is unsubstituted phenyl or phenyl which is substituted by -Cl, -COOCH3 od -COOC2H5.
6. A compound according to claim 1, wherein Rl in formula I is alkyl of 1 to 8 carbon atoms, alkenyl or alkynyl, each of 2 to 6 carbon atoms, aralkyl of 7 to 12 carbon atoms or alkaralkyl of 8 to 12 carbon atoms.
7. A compound according to claim I, wherein Rl in formula I is Cl-C6alkyl, benzyl or (Cl-C4alkyl)benzyl.
8. A compound according to claim 1, wherein x in formula I is 2.
9. A compound according to claim 1, wherein R in formula I is phenyl, Rl is methyl, butyl or benzyl, and x is 2.
10. A compound according to claim 1, wherein R in formula I is phenyl, p-chlorophenyl, 3,5-dichlorophen-1-yl, p-(carbomethoxy)phenyl or p-(carbethoxy)phenyl.
11. A process for the preparation of a compound of formula I, which comprises reacting a compound of formula II
(II), wherein R and Rl are as defined in claim 1, with an oxidising agent which donates oxygen.
(II), wherein R and Rl are as defined in claim 1, with an oxidising agent which donates oxygen.
12. A compound of formula II
(II), wherein R and Rl are as defined in claim 1.
(II), wherein R and Rl are as defined in claim 1.
13. A compound of formula III
(III), wherein R, Rl and x are as defined in claim 1.
(III), wherein R, Rl and x are as defined in claim 1.
14. A composition comprising a) a colourless organic solvent, a polymer or an organic glass or a compound glass, and b) dissolved, incorporated therein or present as a layer on at least one surface, a compound of formula I or III according to either claim 1 or claim 12 or a mixture thereof.
15. Use of a compound of formula I or III according to either claim 1 or claim 12, or a mixture thereof, as reversible photochromic system for contrast formation or light absorption.
16. Use of a compound of formula I or III according to either claim 1 or clairn 12, or a mixture thereof, for the reversible optical storage of information.
FD 4.6/DA/ms*
FD 4.6/DA/ms*
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH291 | 1991-01-03 | ||
CH2/91-7 | 1991-01-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2058393A1 true CA2058393A1 (en) | 1992-07-04 |
Family
ID=4177196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002058393A Abandoned CA2058393A1 (en) | 1991-01-03 | 1991-12-31 | Photochromic benzothioxanthone oxides, process for their preparation and the use thereof |
Country Status (5)
Country | Link |
---|---|
US (1) | US5177218A (en) |
EP (1) | EP0494048A1 (en) |
JP (1) | JPH0559039A (en) |
KR (1) | KR920014795A (en) |
CA (1) | CA2058393A1 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2735718B1 (en) * | 1995-06-22 | 1997-08-08 | Photomeca Egg | PROCESS FOR PRODUCING PHOTOPOLYMER PLATES BY SELECTIVE PHOTOTRANSFORMATION |
GB9522176D0 (en) * | 1995-10-30 | 1996-01-03 | Iaf Biochem Int | Morphinan derivatives having neuroprotective activity |
US5712401A (en) * | 1996-04-29 | 1998-01-27 | First Chemical Corporation | Processes for preparing thioxanthone and derivatives thereof |
US6770687B1 (en) | 1996-11-21 | 2004-08-03 | Ncr Corporation | Water-based dual security ink |
US5883043A (en) * | 1997-08-27 | 1999-03-16 | Ncr Corporation | Thermal paper with security features |
US6106910A (en) * | 1998-06-30 | 2000-08-22 | Ncr Corporation | Print media with near infrared fluorescent sense mark and printer therefor |
US6165937A (en) * | 1998-09-30 | 2000-12-26 | Ncr Corporation | Thermal paper with a near infrared radiation scannable data image |
US6803344B2 (en) | 2001-12-21 | 2004-10-12 | Ncr Corporation | Thermal paper with preprinted indicia |
US7897296B2 (en) * | 2004-09-30 | 2011-03-01 | General Electric Company | Method for holographic storage |
US7645719B2 (en) * | 2004-10-13 | 2010-01-12 | Ncr Corporation | Thermal paper with security features |
US20060078802A1 (en) * | 2004-10-13 | 2006-04-13 | Chan Kwok P | Holographic storage medium |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4585876A (en) * | 1982-11-25 | 1986-04-29 | Ciba-Geigy Corporation | Novel xanthones and thioxanthones |
EP0430881A3 (en) * | 1989-11-29 | 1991-10-23 | Ciba-Geigy Ag | Photochromic compounds, process for their preparation and their use |
-
1991
- 1991-12-16 EP EP91810982A patent/EP0494048A1/en not_active Ceased
- 1991-12-26 JP JP3356666A patent/JPH0559039A/en active Pending
- 1991-12-30 US US07/814,945 patent/US5177218A/en not_active Expired - Fee Related
- 1991-12-31 CA CA002058393A patent/CA2058393A1/en not_active Abandoned
- 1991-12-31 KR KR1019910025608A patent/KR920014795A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
KR920014795A (en) | 1992-08-25 |
US5177218A (en) | 1993-01-05 |
EP0494048A1 (en) | 1992-07-08 |
JPH0559039A (en) | 1993-03-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5208354A (en) | Photochromic naphthacenequinones, process for their preparation and the use thereof | |
US5623040A (en) | Polymerisable photochromic naphthacenediones, polymers of these monomers, process for their preparation and the use thereof | |
US5300663A (en) | Photochromic naphthacenequinones, process for their preparation and the use thereof | |
CA2058393A1 (en) | Photochromic benzothioxanthone oxides, process for their preparation and the use thereof | |
GB2320027A (en) | New a-Aminoacetophenone Photoinitiators for Photopolymerisation | |
KR100501829B1 (en) | Diarylethene derivatives and the photochromic thin film using of them | |
EP0530369B1 (en) | Crystal comprising indolinospirobenzothiopyran derivative and ring-opening isomer thereof | |
US5206395A (en) | Photochromic naphthacenequinones, process for their preparation and the use thereof | |
KR100424862B1 (en) | New photochromic diarylethene substituted with isoxazol group | |
US4207107A (en) | Novel ortho-quinone diazide photoresist sensitizers | |
US5225525A (en) | Photochromic benzothioxanthone oxides, process for their preparation and the use thereof | |
US5776375A (en) | Electro-optical device stable in the 600-1600 nanometer wavelength range | |
JPH0576947B2 (en) | ||
JPH05105685A (en) | Photochromic and photosensitive compound | |
US5468874A (en) | Benzothiophene/indole-substituted maleimide derivatives, photochromic material comprising said derivatives and optical recording material using the same material | |
EP0529100B1 (en) | Indolinospirobenzopyran derivative | |
JPH0413354B2 (en) | ||
Cha et al. | Preparation of polymers with pendant quinonoid groups and their photocrosslinking with visible light irradiation | |
JPH0586955B2 (en) | ||
EP0438819B1 (en) | Photochromatic compound, a method for its preparation, and articles which contain it | |
WO1989001181A1 (en) | Nonlinear optical material | |
JPH0126635B2 (en) | ||
KR100756068B1 (en) | Novel squaraine compounds as near infrared absorbing blue dyes | |
JP2722636B2 (en) | Photochromic material | |
JPH0796553B2 (en) | Spiropyran compound |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FZDE | Discontinued |