CA2149302A1 - Power laser system - Google Patents

Power laser system

Info

Publication number
CA2149302A1
CA2149302A1 CA002149302A CA2149302A CA2149302A1 CA 2149302 A1 CA2149302 A1 CA 2149302A1 CA 002149302 A CA002149302 A CA 002149302A CA 2149302 A CA2149302 A CA 2149302A CA 2149302 A1 CA2149302 A1 CA 2149302A1
Authority
CA
Canada
Prior art keywords
gases
housing
regulated
anode
collar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002149302A
Other languages
French (fr)
Other versions
CA2149302C (en
Inventor
Palash Parijat Das
Donald G. Larson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2149302A1 publication Critical patent/CA2149302A1/en
Application granted granted Critical
Publication of CA2149302C publication Critical patent/CA2149302C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A housing in a laser system encloses a cathode and a displaced anode and gases ionizable and reactive chemically when a voltage pulse produces a cathode-anode electrical discharge. Moving air cools the components (capacitors, thyratron and triggering circuitry) for producing the voltage pulses. The laser gas temperature is continuously regulated at a particular value whether or note there is an electrical discharge. The concentration of one of the gases in the chamber is regulated to values alternately on opposite sides of an optimal value to provide an optimal energy in each chemical reaction of the gases. The gases are recirculated as by a fan driven on a shaft by a pair of motors and are filtered during recirculation. The shaft speed is regulated at a particular value and the motor currents are regulated to be equal. Any ozone formed in a compartment holding the high voltage terminals is purged by passing a neutral gas (nitrogen) through the compartment to the atmosphere. The neutral gas is passed into the housing through a hose which also holds a high voltage wire in insulated relationship to other electrical components. A collar arrangement at one wire end provides for the introduction of voltage from the collar to the anode of the thyratron with the hose coupled to the housing and grounds the collar with the wire decoupled from the housing. The different high voltage components are sequentially tested for their operability by a system and method unique to this invention.
CA002149302A 1992-11-13 1993-11-09 Power laser system Expired - Fee Related CA2149302C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US07/975,652 1992-11-13
US07/975,652 US5377215A (en) 1992-11-13 1992-11-13 Excimer laser
PCT/US1993/010805 WO1994011932A2 (en) 1992-11-13 1993-11-09 Power laser system

Publications (2)

Publication Number Publication Date
CA2149302A1 true CA2149302A1 (en) 1994-05-26
CA2149302C CA2149302C (en) 2004-06-22

Family

ID=25523253

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002149302A Expired - Fee Related CA2149302C (en) 1992-11-13 1993-11-09 Power laser system

Country Status (6)

Country Link
US (2) US5377215A (en)
EP (1) EP0669048A1 (en)
JP (1) JPH08505006A (en)
CA (1) CA2149302C (en)
SG (1) SG52274A1 (en)
WO (1) WO1994011932A2 (en)

Families Citing this family (93)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4426723A1 (en) * 1994-07-22 1996-01-25 Atl Lasertechnik & Accessoires Sliding discharge preionization for gas lasers
US5661746A (en) * 1995-10-17 1997-08-26 Universal Laser Syatems, Inc. Free-space gas slab laser
US5748656A (en) 1996-01-05 1998-05-05 Cymer, Inc. Laser having improved beam quality and reduced operating cost
CA2190697C (en) * 1996-01-31 2000-07-25 Donald Glenn Larson Blower motor with adjustable timing
US5646954A (en) 1996-02-12 1997-07-08 Cymer, Inc. Maintenance strategy control system and monitoring method for gas discharge lasers
US6283955B1 (en) 1996-05-13 2001-09-04 Edwards Lifesciences Corp. Laser ablation device
US5807383A (en) * 1996-05-13 1998-09-15 United States Surgical Corporation Lasing device
JP3813269B2 (en) * 1996-11-01 2006-08-23 株式会社半導体エネルギー研究所 Laser irradiation system
JP3917698B2 (en) * 1996-12-12 2007-05-23 株式会社半導体エネルギー研究所 Laser annealing method and laser annealing apparatus
US5771258A (en) * 1997-02-11 1998-06-23 Cymer, Inc. Aerodynamic chamber design for high pulse repetition rate excimer lasers
US5848089A (en) * 1997-07-11 1998-12-08 Cymer, Inc. Excimer laser with magnetic bearings supporting fan
US5991324A (en) * 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US5901167A (en) * 1997-04-30 1999-05-04 Universal Laser Systems, Inc. Air cooled gas laser
US5881087A (en) * 1997-04-30 1999-03-09 Universal Laser Systems, Inc. Gas laser tube design
US5867517A (en) * 1997-04-30 1999-02-02 Universal Laser Systems, Inc. Integrated gas laser RF feed and fill apparatus and method
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer
US6330261B1 (en) * 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
JP3697036B2 (en) * 1997-10-03 2005-09-21 キヤノン株式会社 Exposure apparatus and semiconductor manufacturing method using the same
US5978406A (en) * 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
JP3880314B2 (en) * 1998-01-30 2007-02-14 サイマー， インコーポレイテッド Fluorine control system with fluorine monitor
US6240117B1 (en) * 1998-01-30 2001-05-29 Cymer, Inc. Fluorine control system with fluorine monitor
CA2322005C (en) * 1998-03-04 2003-03-18 Cymer, Inc. Reliable, modular, production quality narrow-band krf excimer laser
US6135996A (en) * 1998-04-17 2000-10-24 Baxter International, Inc. Controlled advancement lasing device
JP2000058944A (en) * 1998-05-20 2000-02-25 Cymer Inc Highly reliable modular manufacture high-quality narrow band high repeat rate f2 laser
US6285701B1 (en) 1998-08-06 2001-09-04 Lambda Physik Ag Laser resonator for improving narrow band emission of an excimer laser
US6526085B2 (en) 1998-10-05 2003-02-25 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6466599B1 (en) 1999-04-07 2002-10-15 Lambda Physik Ag Discharge unit for a high repetition rate excimer or molecular fluorine laser
US6490307B1 (en) 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters
US6212214B1 (en) 1998-10-05 2001-04-03 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6843306B2 (en) 1998-07-27 2005-01-18 Cymer, Inc. Compact ductless cooling with heat exchangers
US6188709B1 (en) * 1998-09-18 2001-02-13 Cymer, Inc. Aerodynamic electrode support bar
DE19942455A1 (en) 1998-10-05 2000-04-06 Lambda Physik Gmbh Power control method for gas discharge laser comprises comparing property of laser output beam as function of voltage applied to discharge chamber for optimal, current gas mixture states
US6965624B2 (en) 1999-03-17 2005-11-15 Lambda Physik Ag Laser gas replenishment method
US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6700915B2 (en) 1999-03-12 2004-03-02 Lambda Physik Ag Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections
US6727731B1 (en) 1999-03-12 2004-04-27 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
US6243406B1 (en) 1999-03-12 2001-06-05 Peter Heist Gas performance control system for gas discharge lasers
US6714577B1 (en) 1999-03-17 2004-03-30 Lambda Physik Ag Energy stabilized gas discharge laser
JP4041264B2 (en) * 1999-03-19 2008-01-30 サイマー， インコーポレイテッド F2 laser with visible red and IR control
JP3766230B2 (en) * 1999-04-21 2006-04-12 株式会社荏原製作所 Excimer laser equipment
US6801560B2 (en) * 1999-05-10 2004-10-05 Cymer, Inc. Line selected F2 two chamber laser system
US6034978A (en) * 1999-05-12 2000-03-07 Cymer, Inc. Gas discharge laser with gas temperature control
US6546036B1 (en) 1999-06-08 2003-04-08 Lambda Physik Ag Roof configuration for laser discharge electrodes
US6609540B1 (en) * 1999-06-24 2003-08-26 Showa Denko Kabushiki Kaisha Method and apparatus for supplying fluorine gas
US6498801B1 (en) 1999-08-05 2002-12-24 Alexander E. Dudelzak Solid state laser for microlithography
US6785316B1 (en) 1999-08-17 2004-08-31 Lambda Physik Ag Excimer or molecular laser with optimized spectral purity
US6735232B2 (en) * 2000-01-27 2004-05-11 Lambda Physik Ag Laser with versatile output energy
US6782029B1 (en) * 2000-02-22 2004-08-24 Tuilaser Ag Dedusting unit for a laser optical element of a gas laser and method for assembling
US6570901B2 (en) 2000-02-24 2003-05-27 Lambda Physik Ag Excimer or molecular fluorine laser having lengthened electrodes
US7006546B2 (en) * 2000-03-15 2006-02-28 Komatsu Ltd. Gas laser electrode, laser chamber employing the electrode, and gas laser device
US6216618B1 (en) 2000-04-07 2001-04-17 Pulse Microsystems Ltd. Embroidery system utilizing windows CE based GUI
WO2001084678A2 (en) 2000-04-18 2001-11-08 Lambda Physik Ag Stabilization technique for high repetition rate gas discharge lasers
US6697695B1 (en) * 2000-04-25 2004-02-24 Komatsu Ltd. Laser device management system
US6862307B2 (en) 2000-05-15 2005-03-01 Lambda Physik Ag Electrical excitation circuit for a pulsed gas laser
US7132123B2 (en) * 2000-06-09 2006-11-07 Cymer, Inc. High rep-rate laser with improved electrodes
US6690706B2 (en) * 2000-06-09 2004-02-10 Cymer, Inc. High rep-rate laser with improved electrodes
US6711202B2 (en) * 2000-06-09 2004-03-23 Cymer, Inc. Discharge laser with porous insulating layer covering anode discharge surface
RU2206186C2 (en) 2000-07-04 2003-06-10 Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований Method and device for producing short-wave radiation from gas-discharge plasma
US6603789B1 (en) 2000-07-05 2003-08-05 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with improved beam parameters
US6721345B2 (en) 2000-07-14 2004-04-13 Lambda Physik Ag Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers
US6570899B1 (en) * 2000-08-28 2003-05-27 Komatsu Ltd. Gas laser device
US6801561B2 (en) 2000-09-25 2004-10-05 Lambda Physik Ag Laser system and method for spectral narrowing through wavefront correction
US7230965B2 (en) * 2001-02-01 2007-06-12 Cymer, Inc. Anodes for fluorine gas discharge lasers
US6804327B2 (en) * 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
DE20110048U1 (en) 2001-06-18 2001-08-16 Lambda Physik Ag Gas discharge laser with means for removing gas contaminants
US7095774B2 (en) * 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
EP1436866A4 (en) * 2001-09-13 2009-10-28 Cymer Inc High rep-rate laser with improved electrodes
KR100624081B1 (en) * 2002-01-31 2006-09-19 캐논 가부시끼가이샤 Laser apparatus, exposure apparatus and method
DE10209161B4 (en) 2002-02-26 2009-09-17 Xtreme Technologies Gmbh Method for regulating the energy of pulsed gas-discharge-pumped radiation sources
US7301980B2 (en) * 2002-03-22 2007-11-27 Cymer, Inc. Halogen gas discharge laser electrodes
US6814931B2 (en) * 2002-12-20 2004-11-09 Steris Inc. Method and apparatus for treating an object with ozone
US7164703B2 (en) * 2003-02-20 2007-01-16 Lambda Physik Ag Temperature control systems for excimer lasers
US7633989B2 (en) 2005-06-27 2009-12-15 Cymer, Inc. High pulse repetition rate gas discharge laser
US20070035777A1 (en) * 2005-08-11 2007-02-15 Kintner Michael J Portable bottomless laser engraver
US7706424B2 (en) * 2005-09-29 2010-04-27 Cymer, Inc. Gas discharge laser system electrodes and power supply for delivering electrical energy to same
US20070071047A1 (en) * 2005-09-29 2007-03-29 Cymer, Inc. 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements
US7369596B2 (en) * 2006-06-05 2008-05-06 Cymer, Inc. Chamber for a high energy excimer laser source
JP4146867B2 (en) * 2006-06-22 2008-09-10 ファナック株式会社 Gas laser oscillator
US8202272B2 (en) * 2007-07-19 2012-06-19 Avedro, Inc. Eye therapy system
US8992516B2 (en) 2007-07-19 2015-03-31 Avedro, Inc. Eye therapy system
US8409189B2 (en) * 2008-01-23 2013-04-02 Avedro, Inc. System and method for reshaping an eye feature
US8348935B2 (en) 2008-01-23 2013-01-08 Avedro, Inc. System and method for reshaping an eye feature
US8469952B2 (en) * 2008-01-23 2013-06-25 Avedro, Inc. System and method for positioning an eye therapy device
US20090275936A1 (en) * 2008-05-01 2009-11-05 David Muller System and method for applying therapy to an eye using energy conduction
US8398628B2 (en) * 2008-09-19 2013-03-19 Avedro, Inc. Eye therapy system
JP2012504472A (en) 2008-10-01 2012-02-23 アヴェドロ・インコーポレーテッド Eye treatment system
EP2355739A4 (en) 2008-11-11 2014-03-12 Avedro Inc Eye therapy system
WO2010075254A2 (en) * 2008-12-22 2010-07-01 Ams Research Corporation Laser resonator
US8712536B2 (en) 2009-04-02 2014-04-29 Avedro, Inc. Eye therapy system
US8177778B2 (en) * 2009-10-30 2012-05-15 Avedro, Inc. System and method for stabilizing corneal tissue after treatment
US9295967B2 (en) * 2011-10-04 2016-03-29 Toshiba Mitsubishi-Electric Industrial Systems Corporation Nitrogen-free ozone generating unit
CN102810810A (en) * 2012-03-02 2012-12-05 中国科学院光电研究院 Single-cavity dual-electrode discharging cavity and quasimolecule laser

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4007430A (en) * 1969-10-14 1977-02-08 Nasa Continuous plasma laser
US4229709A (en) * 1978-06-12 1980-10-21 Mcmahan William H Laser device
US4707837A (en) * 1983-05-06 1987-11-17 Coherent, Inc. Distributive lasing system
US4760583A (en) * 1983-05-06 1988-07-26 Coherent, Inc. Laser delivery system
US4502145A (en) * 1983-05-06 1985-02-26 Coherent, Inc. Power supply for a laser
US4547885A (en) * 1983-05-06 1985-10-15 Coherent, Inc. Active pressure regulator for a gas laser
US4661958A (en) * 1983-05-06 1987-04-28 Coherent, Inc. Laser
US4611327A (en) * 1983-11-25 1986-09-09 Amoco Corporation Gas transport laser system
US5315611A (en) * 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
DE3714503C2 (en) * 1987-04-30 1995-07-27 Lambda Physik Forschung Control circuit for a pulsed gas laser and method for initializing the control circuit
WO1989002175A1 (en) * 1987-08-25 1989-03-09 Kabushiki Kaisha Komatsu Seisakusho Device for controlling the output of excimer laser
US4959840A (en) * 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
IT1229210B (en) * 1988-03-31 1991-07-25 Central Glass Co Ltd METHOD AND DEVICE FOR ANALYZING GASES CONTAINING FLUORINE.
EP0414736A1 (en) * 1988-04-22 1991-03-06 Siemens Aktiengesellschaft Pre-ionization device, in particular for x-ray pre-ionization in discharge-pumped gas lasers, in particular excimer lasers
JPH01273375A (en) * 1988-04-25 1989-11-01 Fuji Electric Co Ltd Discharge excitation excimer laser device
US4977573A (en) * 1989-03-09 1990-12-11 Questek, Inc. Excimer laser output control device
JP2782893B2 (en) * 1990-01-31 1998-08-06 株式会社島津製作所 Excimer laser device
JPH03227081A (en) * 1990-01-31 1991-10-08 Shimadzu Corp Excimer laser device
DK167083B1 (en) * 1990-10-08 1993-08-23 Pbi Dev As CIRCUIT FOR THE CONTROL OF THE THYRATRON IN A PULSE CONTROLLED METAL DAMPLASER

Also Published As

Publication number Publication date
EP0669048A1 (en) 1995-08-30
JPH08505006A (en) 1996-05-28
WO1994011932A3 (en) 1994-07-21
US5377215A (en) 1994-12-27
WO1994011932A2 (en) 1994-05-26
CA2149302C (en) 2004-06-22
US5586134A (en) 1996-12-17
SG52274A1 (en) 1998-09-28

Similar Documents

Publication Publication Date Title
CA2149302A1 (en) Power laser system
EP1036429B1 (en) Method and device for ion generation
US4086152A (en) Ozone concentrating
Miichi et al. Generation of radicals using discharge inside bubbles in water for water treatment
WO1992015336A1 (en) Gas sterilisation
Schoenbach et al. Concepts for optical control of diffuse discharge opening switches
CA2180266A1 (en) Improved pulsed discharge systems
EP1238943A2 (en) Method of and apparatus for producing ozone
Neuhauser et al. Hydrogenlike Rydberg electrons orbiting molecular clusters
JPH0515737A (en) Oxidative removal of no
WO1996017803A1 (en) Method of evolving negatively charged oxygen atoms and equipment therefor
Rachdi et al. Lithium doping of (CH) x molecular diffusion of the dopant
Broyer et al. One-photon ionization of K2 and Na3
Tsukamoto et al. NO/sub x/and SO/sub 2/removal by pulsed power at a thermal power plant
Hackam Effects of steady‐state electrical discharge on the separation of gas constituents in helium‐argon mixture
Varey et al. Molecular dissociation in a constricted glow discharge
JP3106181B2 (en) Discharge suction type gas treatment method
KR940007364B1 (en) Device for metal heat treatment
Hakiai et al. Characteristics of ozone generation by a diffuse glow discharge at atmospheric pressure using a double discharge method
Kirkici et al. Spontaneous UV-emission from nitrogen and rare-gas halogen excimers in a fast-flowing crossed-beam plasma-mixing device for pollution control
Kucerovsky A closed solution for the corona field and charge transfer phenomena and the transformation of the results into an arbitrary electrode system
Berezina et al. Pulsed plasmachemistry of COx, NOx, SOx
RU810032C (en) Method of making generation in metal-vapor laser
Rahman et al. Effect of Temperature on the Performance Characteristics of a Pin-Cylinder Discharge Type Ozonizer
TOODLE Mass spectrometry of the CO 2 laser plasma[Final Report, Jul. 1975- Sep. 1979]

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed