CA2197829A1 - Surface Acoustic Wave Device - Google Patents
Surface Acoustic Wave DeviceInfo
- Publication number
- CA2197829A1 CA2197829A1 CA2197829A CA2197829A CA2197829A1 CA 2197829 A1 CA2197829 A1 CA 2197829A1 CA 2197829 A CA2197829 A CA 2197829A CA 2197829 A CA2197829 A CA 2197829A CA 2197829 A1 CA2197829 A1 CA 2197829A1
- Authority
- CA
- Canada
- Prior art keywords
- acoustic wave
- surface acoustic
- wave device
- electrode
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010897 surface acoustic wave method Methods 0.000 title abstract 2
- 229910003460 diamond Inorganic materials 0.000 abstract 4
- 239000010432 diamond Substances 0.000 abstract 4
- 239000010409 thin film Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02582—Characteristics of substrate, e.g. cutting angles of diamond substrates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02637—Details concerning reflective or coupling arrays
- H03H9/02685—Grating lines having particular arrangements
- H03H9/02716—Tilted, fan shaped or slanted grating lines
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02637—Details concerning reflective or coupling arrays
- H03H9/02795—Multi-strip couplers as track changers
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
- H03H9/72—Networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/74—Multiple-port networks for connecting several sources or loads, working on the same frequency or frequency band, to a common load or source
- H03H9/76—Networks using surface acoustic waves
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Abstract
A surface acoustic wave device comprises a diamond layer (12) or a substrate (11) with a diamond layer (12) formed thereon, an A1 electrode (13) formed on the diamond layer (12), and a ZnO piezoelectric thin film layer (14) formed on the diamond layer (12) with the A1 electrode (13) covered by the ZnO piezoelectric thin film layer (14). The ZnO piezoelectric thin film layer (14) has a thickness hl within a range defined by 0.65 ~ khl ~ 0.75 while the A1 electrode (13) has a thickness h2 within a range defined by 0.03 ~ kh2 ~ 0.04, where k is given by k = 2.pi. /.lambda.and .lambda. represents an electrode period.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8056992A JPH09223943A (en) | 1996-02-19 | 1996-02-19 | Surface acoustic wave device |
JP56992/1996 | 1996-02-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2197829A1 true CA2197829A1 (en) | 1997-08-20 |
CA2197829C CA2197829C (en) | 2000-05-16 |
Family
ID=13042999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002197829A Expired - Lifetime CA2197829C (en) | 1996-02-19 | 1997-02-18 | Surface acoustic wave device |
Country Status (5)
Country | Link |
---|---|
US (1) | US5888646A (en) |
EP (1) | EP0790705A1 (en) |
JP (1) | JPH09223943A (en) |
KR (1) | KR100289784B1 (en) |
CA (1) | CA2197829C (en) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19758198A1 (en) | 1997-12-30 | 1999-08-19 | Siemens Ag | Surface wave (SAW) device on pyroelectric single crystal substrate |
DE19758195C2 (en) * | 1997-12-30 | 2000-05-18 | Siemens Ag | Surface wave (SAW) component on in particular lithium tantalate or niobate substrate |
JP3941502B2 (en) * | 1999-10-15 | 2007-07-04 | セイコーエプソン株式会社 | Surface acoustic wave device |
US6972508B2 (en) * | 2000-04-28 | 2005-12-06 | Murata Manufacturing Co., Ltd. | Surface acoustic wave device |
US7518284B2 (en) * | 2000-11-02 | 2009-04-14 | Danfoss A/S | Dielectric composite and a method of manufacturing a dielectric composite |
WO2004027970A1 (en) * | 2002-09-20 | 2004-04-01 | Danfoss A/S | An elastomer actuator and a method of making an actuator |
US7548015B2 (en) * | 2000-11-02 | 2009-06-16 | Danfoss A/S | Multilayer composite and a method of making such |
US8181338B2 (en) * | 2000-11-02 | 2012-05-22 | Danfoss A/S | Method of making a multilayer composite |
US6717327B2 (en) * | 2001-04-23 | 2004-04-06 | Murata Manufacturing Co., Ltd. | Surface acoustic wave device |
AUPR507601A0 (en) * | 2001-05-21 | 2001-06-14 | Microtechnology Centre Management Limited | Surface acoustic wave sensor |
JP2003037467A (en) | 2001-07-24 | 2003-02-07 | Murata Mfg Co Ltd | Surface acoustic wave device |
DE60224844T2 (en) * | 2001-12-21 | 2009-01-08 | Danfoss A/S | DIELECTRIC ACTUATOR OR SENSOR STRUCTURE AND MANUFACTURING METHOD |
US7274909B2 (en) * | 2002-10-31 | 2007-09-25 | Nokia Corporation | Method and system for selecting data items for service requests |
ES2309502T3 (en) | 2003-02-24 | 2008-12-16 | Danfoss A/S | ELECTROACTIVE ELASTIC COMPRESSION BANDING. |
US7880371B2 (en) * | 2006-11-03 | 2011-02-01 | Danfoss A/S | Dielectric composite and a method of manufacturing a dielectric composite |
US7732999B2 (en) * | 2006-11-03 | 2010-06-08 | Danfoss A/S | Direct acting capacitive transducer |
CN102165237A (en) * | 2008-04-30 | 2011-08-24 | 丹佛斯多能公司 | A power actuated valve |
EP2294317B1 (en) * | 2008-04-30 | 2013-04-17 | Danfoss Polypower A/S | A pump powered by a polymer transducer |
US8692442B2 (en) | 2012-02-14 | 2014-04-08 | Danfoss Polypower A/S | Polymer transducer and a connector for a transducer |
US8891222B2 (en) | 2012-02-14 | 2014-11-18 | Danfoss A/S | Capacitive transducer and a method for manufacturing a transducer |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0340510A (en) * | 1989-07-06 | 1991-02-21 | Murata Mfg Co Ltd | Elastic surface wave device |
JP2885349B2 (en) * | 1989-12-26 | 1999-04-19 | 住友電気工業株式会社 | Surface acoustic wave device |
JPH04358410A (en) * | 1991-06-05 | 1992-12-11 | Sumitomo Electric Ind Ltd | Surface acoustic wave element and production thereof |
JP3132078B2 (en) * | 1991-09-19 | 2001-02-05 | 住友電気工業株式会社 | Surface acoustic wave device and method of manufacturing the same |
JP3205976B2 (en) * | 1992-09-14 | 2001-09-04 | 住友電気工業株式会社 | Surface acoustic wave device |
US5576589A (en) * | 1994-10-13 | 1996-11-19 | Kobe Steel Usa, Inc. | Diamond surface acoustic wave devices |
-
1996
- 1996-02-19 JP JP8056992A patent/JPH09223943A/en active Pending
-
1997
- 1997-02-18 CA CA002197829A patent/CA2197829C/en not_active Expired - Lifetime
- 1997-02-18 EP EP97102583A patent/EP0790705A1/en not_active Ceased
- 1997-02-18 KR KR1019970004905A patent/KR100289784B1/en not_active IP Right Cessation
- 1997-02-19 US US08/808,956 patent/US5888646A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2197829C (en) | 2000-05-16 |
KR970063917A (en) | 1997-09-12 |
EP0790705A1 (en) | 1997-08-20 |
KR100289784B1 (en) | 2001-05-15 |
JPH09223943A (en) | 1997-08-26 |
US5888646A (en) | 1999-03-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA2197829A1 (en) | Surface Acoustic Wave Device | |
TW330341B (en) | Metallic thin film and method of manufacturing the same and surface acoustic wave device using the metallic thin film and the same thereof | |
EP1061645A3 (en) | Surface acoustic wave element, method for producing the same and surface acoustic wave device using the same | |
DE50015713D1 (en) | MASS-SENSITIVE SENSOR | |
EP1056202A3 (en) | Surface acoustic wave device and method of producing the same | |
WO2001087005A3 (en) | Cylindrical transducer apparatus | |
CA2337081A1 (en) | Resilient abrasive article with hard anti-loading size coating | |
TW241398B (en) | ||
CA2002449A1 (en) | Pressure-sensitive article with priming layer | |
CA2053192A1 (en) | Use of amorphous carbon to promote adhesion between electroactive polymer films and conductive substrates | |
AUPQ234599A0 (en) | Hydrophobic material | |
EP0721205A3 (en) | Method of etching an oxide layer with simultaneous deposition of a polymer layer | |
CA2279841A1 (en) | Method and apparatus for the coating of substrates for pharmaceutical use | |
CA2237732A1 (en) | Glancing angle deposition of thin films | |
CA2190231A1 (en) | Method and Apparatus for Coating A Substance with Diamond Film | |
AU1539900A (en) | Method of fabrication of a ferro-electric capacitor and method of growing a pzt layer on a substrate | |
EP1081853A3 (en) | Surface acoustic wave device and method for manufacturing the same | |
CA2020411A1 (en) | Surface acoustic wave device | |
EP0820143A3 (en) | Surface acoustic wave device | |
EP0910120A3 (en) | Method of producing a ferroelectric thin film containing bismuth | |
EP0389451A3 (en) | Durable electrode for use in electrolysis and process for producing the same | |
EP0981171A3 (en) | Process for fabricating device comprising lead zirconate titanate | |
DE69617593T2 (en) | Acoustic surface wave arrangement with diamond ZnO with a relatively thin piezoelectric ZnO layer | |
CA2177244A1 (en) | Metal layer pattern forming method | |
CA2269741A1 (en) | Method for tackifying surface of soft layer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKEX | Expiry |
Effective date: 20170220 |