CA2205918A1 - Epitaxial growth of silicon carbide and resulting silicon carbide structures - Google Patents

Epitaxial growth of silicon carbide and resulting silicon carbide structures

Info

Publication number
CA2205918A1
CA2205918A1 CA002205918A CA2205918A CA2205918A1 CA 2205918 A1 CA2205918 A1 CA 2205918A1 CA 002205918 A CA002205918 A CA 002205918A CA 2205918 A CA2205918 A CA 2205918A CA 2205918 A1 CA2205918 A1 CA 2205918A1
Authority
CA
Canada
Prior art keywords
silicon carbide
epitaxial layer
micropipe defects
melt
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002205918A
Other languages
French (fr)
Other versions
CA2205918C (en
Inventor
Vladimir A. Dmitriev
Svetlana V. Rendakova
Vladimir A. Ivantsov
Calvin H. Carter, Jr.
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wolfspeed Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23360251&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CA2205918(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Individual filed Critical Individual
Publication of CA2205918A1 publication Critical patent/CA2205918A1/en
Application granted granted Critical
Publication of CA2205918C publication Critical patent/CA2205918C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00—Liquid-phase epitaxial-layer growth
    • C30B19/02—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux
    • C30B19/04—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux the solvent being a component of the crystal composition
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/931—Silicon carbide semiconductor

Abstract

A method is disclosed for producing epitaxial layers of silicon carbide that are substantially free of micropipe defects. The method comprises growing an epitaxial layer of silicon carbide on a silicon carbide substrate by liquid phase epitaxy from a melt of silicon carbide in silicon and an element that enhances the solubility of silicon carbide in the melt. The atomic percentage of that element predominates over the atomic percentage of silicon in the melt. Micropipe defects propagated by the substrate into the epitaxial layer are closed by continuing to grow the epitaxial layer under the proper conditions until the epitaxial layer has a thickness at which micropipe defects present in the substrate are substantially no longer reproduced in the epitaxial layer, and the number of micropipe defects in the epitaxial layer is substantially reduced.
CA002205918A 1994-11-30 1995-11-22 Epitaxial growth of silicon carbide and resulting silicon carbide structures Expired - Fee Related CA2205918C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/346,618 US5679153A (en) 1994-11-30 1994-11-30 Method for reducing micropipe formation in the epitaxial growth of silicon carbide and resulting silicon carbide structures
US08/346,618 1994-11-30
PCT/US1995/015276 WO1996017112A1 (en) 1994-11-30 1995-11-22 Epitaxial growth of silicon carbide and resulting silicon carbide structures

Publications (2)

Publication Number Publication Date
CA2205918A1 true CA2205918A1 (en) 1996-06-06
CA2205918C CA2205918C (en) 2002-01-29

Family

ID=23360251

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002205918A Expired - Fee Related CA2205918C (en) 1994-11-30 1995-11-22 Epitaxial growth of silicon carbide and resulting silicon carbide structures

Country Status (11)

Country Link
US (1) US5679153A (en)
EP (1) EP0795049B2 (en)
JP (2) JP4065021B2 (en)
KR (1) KR100420182B1 (en)
CN (1) CN1069935C (en)
AT (1) ATE180023T1 (en)
AU (1) AU4369196A (en)
CA (1) CA2205918C (en)
DE (1) DE69509678T3 (en)
RU (1) RU2142027C1 (en)
WO (1) WO1996017112A1 (en)

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Also Published As

Publication number Publication date
JP4414992B2 (en) 2010-02-17
CN1069935C (en) 2001-08-22
EP0795049B1 (en) 1999-05-12
EP0795049B2 (en) 2007-09-12
JP4065021B2 (en) 2008-03-19
JP2007091589A (en) 2007-04-12
RU2142027C1 (en) 1999-11-27
AU4369196A (en) 1996-06-19
US5679153A (en) 1997-10-21
EP0795049A1 (en) 1997-09-17
WO1996017112A1 (en) 1996-06-06
JPH10509943A (en) 1998-09-29
CA2205918C (en) 2002-01-29
DE69509678D1 (en) 1999-06-17
DE69509678T3 (en) 2008-02-28
ATE180023T1 (en) 1999-05-15
KR100420182B1 (en) 2004-05-27
DE69509678T2 (en) 1999-12-02
CN1167511A (en) 1997-12-10

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