CA2321005A1 - Multiple corner kirkpatrick-baez beam conditioning optic assembly - Google Patents

Multiple corner kirkpatrick-baez beam conditioning optic assembly Download PDF

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Publication number
CA2321005A1
CA2321005A1 CA002321005A CA2321005A CA2321005A1 CA 2321005 A1 CA2321005 A1 CA 2321005A1 CA 002321005 A CA002321005 A CA 002321005A CA 2321005 A CA2321005 A CA 2321005A CA 2321005 A1 CA2321005 A1 CA 2321005A1
Authority
CA
Canada
Prior art keywords
optic assembly
beam conditioning
multiple corner
baez
kirkpatrick
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002321005A
Other languages
French (fr)
Other versions
CA2321005C (en
Inventor
George Gutman
Licai Jiang
Boris Verman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osmic Inc
Original Assignee
Osmic, Inc.
George Gutman
Licai Jiang
Boris Verman
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osmic, Inc., George Gutman, Licai Jiang, Boris Verman filed Critical Osmic, Inc.
Publication of CA2321005A1 publication Critical patent/CA2321005A1/en
Application granted granted Critical
Publication of CA2321005C publication Critical patent/CA2321005C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Aerials With Secondary Devices (AREA)
  • Particle Accelerators (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Sorption Type Refrigeration Machines (AREA)

Abstract

An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein said x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.
CA002321005A 1998-02-19 1999-02-18 Multiple corner kirkpatrick-baez beam conditioning optic assembly Expired - Lifetime CA2321005C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/026,391 1998-02-19
US09/026,391 US6014423A (en) 1998-02-19 1998-02-19 Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
PCT/US1999/003304 WO1999043008A1 (en) 1998-02-19 1999-02-18 Multiple corner kirkpatrick-baez beam conditioning optic assembly

Publications (2)

Publication Number Publication Date
CA2321005A1 true CA2321005A1 (en) 1999-08-26
CA2321005C CA2321005C (en) 2008-12-02

Family

ID=21831575

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002321005A Expired - Lifetime CA2321005C (en) 1998-02-19 1999-02-18 Multiple corner kirkpatrick-baez beam conditioning optic assembly

Country Status (9)

Country Link
US (1) US6014423A (en)
EP (1) EP1060478B1 (en)
JP (1) JP4391019B2 (en)
AT (1) ATE241848T1 (en)
AU (1) AU3295099A (en)
CA (1) CA2321005C (en)
CZ (1) CZ301383B6 (en)
DE (1) DE69908311T2 (en)
WO (1) WO1999043008A1 (en)

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JP3734366B2 (en) * 1998-03-20 2006-01-11 株式会社リガク X-ray analyzer
US6389100B1 (en) 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
US6421417B1 (en) 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
US6580940B2 (en) * 2000-02-02 2003-06-17 George Gutman X-ray system with implantable needle for treatment of cancer
US6504902B2 (en) * 2000-04-10 2003-01-07 Rigaku Corporation X-ray optical device and multilayer mirror for small angle scattering system
US6493421B2 (en) 2000-10-16 2002-12-10 Advanced X-Ray Technology, Inc. Apparatus and method for generating a high intensity X-ray beam with a selectable shape and wavelength
US6870896B2 (en) 2000-12-28 2005-03-22 Osmic, Inc. Dark-field phase contrast imaging
DE10107914A1 (en) * 2001-02-14 2002-09-05 Fraunhofer Ges Forschung Arrangement for X-ray analysis applications
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
JP3762665B2 (en) * 2001-07-03 2006-04-05 株式会社リガク X-ray analyzer and X-ray supply device
DE10160472B4 (en) 2001-12-08 2004-06-03 Bruker Axs Gmbh X-ray optical system and method for imaging a radiation source
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
JP3699998B2 (en) * 2002-03-20 2005-09-28 国立大学法人東北大学 X-ray fluorescence holography apparatus, X-ray fluorescence holography, and local structure analysis method
DE10254026C5 (en) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflector for X-radiation
EP1597737B1 (en) * 2003-02-28 2006-11-22 Osmic, Inc. X-ray optical system with adjustable convergence
JP3697246B2 (en) * 2003-03-26 2005-09-21 株式会社リガク X-ray diffractometer
US7280634B2 (en) * 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
DE602004012562T2 (en) * 2003-06-13 2009-04-16 Osmic, Inc., Auburn Hills BEAM TREATMENT SYSTEM
US7139366B1 (en) 2005-05-31 2006-11-21 Osmic, Inc. Two-dimensional small angle x-ray scattering camera
JP4814782B2 (en) * 2006-12-28 2011-11-16 株式会社ジェイテック X-ray focusing method and apparatus using phase recovery method
US7706503B2 (en) * 2007-11-20 2010-04-27 Rigaku Innovative Technologies, Inc. X-ray optic with varying focal points
CN105044139B (en) * 2008-03-05 2019-04-23 X射线光学系统公司 With the XRF system of multiple excitation energy bands in the packaging of altitude calibration
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
JP5237186B2 (en) * 2009-04-30 2013-07-17 株式会社リガク X-ray scattering measuring apparatus and X-ray scattering measuring method
US8537967B2 (en) * 2009-09-10 2013-09-17 University Of Washington Short working distance spectrometer and associated devices, systems, and methods
US8249220B2 (en) * 2009-10-14 2012-08-21 Rigaku Innovative Technologies, Inc. Multiconfiguration X-ray optical system
US8126117B2 (en) * 2010-02-03 2012-02-28 Rigaku Innovative Technologies, Inc. Multi-beam X-ray system
US8406374B2 (en) 2010-06-25 2013-03-26 Rigaku Innovative Technologies, Inc. X-ray optical systems with adjustable convergence and focal spot size
KR101332502B1 (en) * 2011-06-14 2013-11-26 전남대학교산학협력단 An X-ray Needle Module for Local Radiation Therapy
JP2013221882A (en) * 2012-04-18 2013-10-28 Hitachi Ltd Measuring apparatus
US9031203B2 (en) 2012-06-08 2015-05-12 Rigaku Innovative Technologies, Inc. X-ray beam system offering 1D and 2D beams
WO2013184999A1 (en) * 2012-06-08 2013-12-12 Rigaku Innovative Technologies, Inc. Dual mode small angle scattering camera
KR20150090048A (en) * 2012-09-24 2015-08-05 컨버젠트 알.엔.알 리미티드 X-ray reflective lens arrangement
JP6857400B2 (en) * 2018-03-01 2021-04-14 株式会社リガク X-ray generator and X-ray analyzer
JP2022069273A (en) * 2020-10-23 2022-05-11 株式会社リガク Image forming type x-ray microscope

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4242588A (en) * 1979-08-13 1980-12-30 American Science And Engineering, Inc. X-ray lithography system having collimating optics
US4525853A (en) * 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
US4958363A (en) * 1986-08-15 1990-09-18 Nelson Robert S Apparatus for narrow bandwidth and multiple energy x-ray imaging
US4912737A (en) * 1987-10-30 1990-03-27 Hamamatsu Photonics K.K. X-ray image observing device
JPH01263599A (en) * 1988-04-15 1989-10-20 Nec Corp Manufacture of semiconductor
JPH01292297A (en) * 1988-05-19 1989-11-24 Toshiba Corp X-ray mirror and its manufacture
JPH0225737A (en) * 1988-07-15 1990-01-29 Hitachi Ltd Method and apparatus for surface analysis
US4951304A (en) * 1989-07-12 1990-08-21 Adelphi Technology Inc. Focused X-ray source
US5027377A (en) * 1990-01-09 1991-06-25 The United States Of America As Represented By The United States Department Of Energy Chromatic X-ray magnifying method and apparatus by Bragg reflective planes on the surface of Abbe sphere
JP2968996B2 (en) * 1990-11-30 1999-11-02 株式会社リコー X-ray focusing device
DE4407278A1 (en) * 1994-03-04 1995-09-07 Siemens Ag X-ray analyzer
AU2641495A (en) * 1994-05-11 1995-12-05 Regents Of The University Of Colorado, The Spherical mirror grazing incidence x-ray optics
US5646976A (en) * 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons

Also Published As

Publication number Publication date
EP1060478B1 (en) 2003-05-28
US6014423A (en) 2000-01-11
AU3295099A (en) 1999-09-06
DE69908311T2 (en) 2003-12-11
CZ20003041A3 (en) 2001-05-16
DE69908311D1 (en) 2003-07-03
WO1999043008A1 (en) 1999-08-26
JP2002504692A (en) 2002-02-12
EP1060478A1 (en) 2000-12-20
CA2321005C (en) 2008-12-02
JP4391019B2 (en) 2009-12-24
CZ301383B6 (en) 2010-02-10
ATE241848T1 (en) 2003-06-15

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Effective date: 20190218