CA2402040A1 - Chemical vapor deposition apparatus and method - Google Patents

Chemical vapor deposition apparatus and method Download PDF

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Publication number
CA2402040A1
CA2402040A1 CA002402040A CA2402040A CA2402040A1 CA 2402040 A1 CA2402040 A1 CA 2402040A1 CA 002402040 A CA002402040 A CA 002402040A CA 2402040 A CA2402040 A CA 2402040A CA 2402040 A1 CA2402040 A1 CA 2402040A1
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CA
Canada
Prior art keywords
coating
gas
conduit
zone
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002402040A
Other languages
French (fr)
Other versions
CA2402040C (en
Inventor
Bruce M. Warnes
Andrew L. Purvis
Daniel L. Near
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Howmet Corp
Original Assignee
Howmet Research Corp
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Filing date
Publication date
Application filed by Howmet Research Corp filed Critical Howmet Research Corp
Publication of CA2402040A1 publication Critical patent/CA2402040A1/en
Application granted granted Critical
Publication of CA2402040C publication Critical patent/CA2402040C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction

Abstract

Chemical vapor deposition apparatus and method are provided with coating gas distribution and exhaust systems that provide more uniform coating gas temperature and coating gas flow distribution among a plurality of distinct coating zones disposed along the length of a coating chamber.

Claims (33)

1. Chemical vapor deposition apparatus, comprising a heated coating chamber, and a coating gas supply conduit disposed along a length of said coating chamber so that said coating gas is preheated, and a gas distribution conduit disposed about said conduit for distributing preheated coating gas to said chamber.
2. The apparatus of claim 1, wherein said conduit includes a gas discharge opening proximate a bottom of said gas distribution conduit.
3. The apparatus of claim 1, including a gas manifold above said coating chamber upstream of said conduit and communicated to said conduit, said gas manifold having a heater device therein to heat said coating gas prior to its entering said conduit.
4. The apparatus of claim 1, including one or more radiant heat shields above said coating chamber.
5. Chemical vapor deposition apparatus, comprising a heated retort having a coating chamber therein, said coating chamber having a plurality of coating zones along its length in said retort, a coating gas supply conduit disposed along said length of said coating chamber so that said coating gas is preheated, and a gas distribution conduit disposed about said conduit for distributing preheated coating gas to said coating zones.
6. The apparatus of claim 5, wherein said conduit includes a gas discharge opening to said gas distribution conduit proximate a lowermost coating zone.
7. The apparatus of claim 5, including a gas manifold in said retort above said coating chamber and communicated to said conduit, said gas manifold having a heater device therein to heat said coating gas prior to its entering said conduit.
8. The apparatus of claim 5, including one or more radiant heat shields in said retort above said coating chamber.
9. The apparatus of claim 5, wherein said conduit includes a bleed opening communicated to said gas distribution conduit above a lower primary gas discharge opening.
10. The apparatus of claim 9, wherein said conduit includes a plurality of bleed openings along a length of said gas distribution conduit.
11. The apparatus of claim 9, wherein said gas distribution conduit includes a plurality of gas discharge openings at each coating zone to supply preheated coating gas thereto.
12. The apparatus of claim 11, wherein said gas discharge openings are located at the mid-point of each said coating zone.
13. The apparatus of claim 11, including a manifold wall opposing said gas discharge openings at each coating zone, said manifold wall having a plurality of gas flow openings that are out of alignment with said gas discharge openings at each coating zone such that there is no line-of-sight gas flow path from said gas discharge openings to said gas flow openings at each coating zone.
14. The apparatus of claim 5, including a baffle about each coating zone, said baffle including openings through which spent coating gas is exhausted from each coating zone.
15. Chemical vapor deposition apparatus, comprising a heated retort having a coating chamber therein, said coating chamber having a plurality of coating zones along its length in said retort, a preheat conduit for providing a coating gas to said coating chamber, a gas distribution conduit disposed about said preheat conduit in said coating chamber to receive preheated coating gas from said preheat conduit and supplying it to said coating zones, said gas distribution conduit includes a plurality of gas discharge openings at each coating zone to supply preheated coating gas thereto.
16. The apparatus of claim 15, wherein said gas discharge openings are located at the mid-point of each said coating zone.
17. The apparatus of claim 16, including a manifold wall opposing said gas discharge openings at each coating zone, said manifold wall having a plurality of gas flow openings that are out of alignment with said gas discharge openings at each coating zone such that there is no line-of-sight gas flow path from said gas discharge openings to said gas flow openings at each coating zone.
18. The apparatus of claim 15, including a baffle about each coating zone, said baffle including openings through which spent coating gas is exhausted from each coating zone.
19. A method of chemical vapor deposition, comprising flowing coating gas into a heated coating chamber along a length thereof, heating said coating gas as it flows through said conduit, and discharging the preheated coating gas into a gas distribution conduit in said coating chamber.
20. The method of claim 19, including heating said coating chamber by disposing it in a heated retort.
21. The method of claim 19, including discharging the preheated coating gas at a lower end of said conduit.
22. The method of claim 19, including preheating the coating gas before it enters said conduit.
23. The method of claim 22, wherein the coating gas is preheated in a gas manifold disposed outside said coating chamber upstream of said conduit.
24. The method of claim 19, including also discharging the preheated coating gas through a bleed opening above said lower end of said conduit.
25. The method of claim 24, including discharging the preheated coating gas from said gas distribution conduit disposed to each of plurality of coating zones along a length of said coating chamber.
26. The method of claim 25, including discharging the preheated coating gas from gas distribution conduit at a mid-point of each said coating zone.
27. The method of claim 25, including discharging the preheated coating gas from gas distribution conduit at an opposing manifold wall at each coating zone, said manifold wall having a plurality of gas flow openings that are out of alignment with said gas discharge openings at each coating zone such that there is no line-of-sight gas flow path from said gas discharge openings to said gas flow openings at each coating zone.
28. The method of claim 25, including exhausting spent coating gas from each coating zone through openings in a baffle disposed about each coating zone.
29. The method of claim 19, including reflecting radiant heat from said coating chamber back toward said coating chamber.
30. A method of chemical vapor deposition, comprising flowing coating gas in a conduit into a heated coating chamber, discharging the coating gas into a gas distribution conduit disposed about said conduit in said coating chamber, and supplying said coating gas from said gas distribution conduit to a plurality of coating zones along a length of said coating chamber.
31. The method of claim 30, including discharging the coating gas from gas distribution conduit at a mid-point of each said coating zone.
32. The method of claim 30, including discharging the coating gas from gas distribution conduit at an opposing manifold wall at each coating zone, said manifold wall having a plurality of gas flow openings that are out of alignment with said gas discharge openings at each coating zone such that there is no line-of-sight gas flow path from said gas discharge openings to said gas flow openings at each coating zone.
33. The method of claim 30, including exhausting spent coating gas from each coating zone through openings in a baffle disposed about each coating zone.
CA2402040A 2001-09-10 2002-09-09 Chemical vapor deposition apparatus and method Expired - Lifetime CA2402040C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/950,013 2001-09-10
US09/950,013 US6793966B2 (en) 2001-09-10 2001-09-10 Chemical vapor deposition apparatus and method

Publications (2)

Publication Number Publication Date
CA2402040A1 true CA2402040A1 (en) 2003-03-10
CA2402040C CA2402040C (en) 2011-05-10

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Family Applications (1)

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CA2402040A Expired - Lifetime CA2402040C (en) 2001-09-10 2002-09-09 Chemical vapor deposition apparatus and method

Country Status (6)

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US (2) US6793966B2 (en)
JP (1) JP4327427B2 (en)
CA (1) CA2402040C (en)
DE (1) DE10241964B4 (en)
FR (1) FR2829507B1 (en)
GB (1) GB2379450B (en)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6986814B2 (en) * 2001-12-20 2006-01-17 General Electric Company Gas distributor for vapor coating method and container
US7390535B2 (en) * 2003-07-03 2008-06-24 Aeromet Technologies, Inc. Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings
US7153586B2 (en) * 2003-08-01 2006-12-26 Vapor Technologies, Inc. Article with scandium compound decorative coating
FR2882064B1 (en) * 2005-02-17 2007-05-11 Snecma Propulsion Solide Sa PROCESS FOR THE DENSIFICATION OF THIN POROUS SUBSTRATES BY CHEMICAL VAPOR PHASE INFILTRATION AND DEVICE FOR LOADING SUCH SUBSTRATES
US20070026205A1 (en) 2005-08-01 2007-02-01 Vapor Technologies Inc. Article having patterned decorative coating
US7597797B2 (en) * 2006-01-09 2009-10-06 Alliance Process Partners, Llc System and method for on-line spalling of a coker
US20090136664A1 (en) * 2007-08-02 2009-05-28 United Technologies Corporation Method for forming aluminide diffusion coatings
US20090134035A1 (en) * 2007-08-02 2009-05-28 United Technologies Corporation Method for forming platinum aluminide diffusion coatings
US20090035485A1 (en) * 2007-08-02 2009-02-05 United Technologies Corporation Method for forming active-element aluminide diffusion coatings
US20090317547A1 (en) * 2008-06-18 2009-12-24 Honeywell International Inc. Chemical vapor deposition systems and methods for coating a substrate
DE102008034330A1 (en) 2008-07-23 2010-01-28 Ionbond Ag Olten CVD reactor for the separation of layers of a reaction gas mixture on workpieces
US9353625B2 (en) * 2009-01-13 2016-05-31 General Electric Technology Gmbh Device for cleaning oxidized or corroded components in the presence of a halogenous gas mixture
US10689753B1 (en) * 2009-04-21 2020-06-23 Goodrich Corporation System having a cooling element for densifying a substrate
JP5791594B2 (en) 2009-05-20 2015-10-07 ハウメット コーポレイションＨｏｗｍｅｔ Ｃｏｒｐｏｒａｔｉｏｎ Pt-Al-Hf / Zr coating and coating method
CN102485953B (en) * 2010-12-01 2014-07-30 北京北方微电子基地设备工艺研究中心有限责任公司 Pallet device and crystallized film growth device
US8541069B2 (en) 2011-04-11 2013-09-24 United Technologies Corporation Method of guided non-line of sight coating
US9068260B2 (en) 2012-03-14 2015-06-30 Andritz Iggesund Tools Inc. Knife for wood processing and methods for plating and surface treating a knife for wood processing
US9840918B2 (en) 2013-04-26 2017-12-12 Howmet Corporation Internal airfoil component electroplating
CA2866479C (en) 2013-12-20 2021-08-17 Will N. Kirkendall Internal turbine component electroplating
US11427904B2 (en) 2014-10-20 2022-08-30 Raytheon Technologies Corporation Coating system for internally-cooled component and process therefor
TWI624554B (en) * 2015-08-21 2018-05-21 弗里松股份有限公司 Evaporation source
WO2017033053A1 (en) 2015-08-21 2017-03-02 Flisom Ag Homogeneous linear evaporation source
EP3464677A4 (en) * 2016-06-02 2020-02-19 Applied Materials, Inc. Continuous chemical vapor depositioin (cvd) multi-zone process kit
DE102018202297A1 (en) * 2018-02-15 2019-08-22 MTU Aero Engines AG Apparatus and method for gas phase coating of workpieces
CN112752864B (en) * 2018-10-26 2024-01-26 洛佩诗公司 Deposition reactor with inductor and electromagnetic shield
DE102018130139A1 (en) 2018-11-28 2020-05-28 Aixtron Se Gas inlet device for a CVD reactor
DE102018221579A1 (en) * 2018-12-13 2020-06-18 MTU Aero Engines AG Device and method for the gas phase coating of workpieces
DE102018133362A1 (en) * 2018-12-21 2020-06-25 Eisenmann Se Injection device for dispensing a gas, process gas system for supplying a process gas, and device and method for the thermal or thermo-chemical treatment of material

Family Cites Families (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US989733A (en) 1910-09-12 1911-04-18 Jaburg Bros Mixer.
US2567932A (en) 1948-04-30 1951-09-18 Hydrocarbon Research Inc Stagewise process for the hydrogenation of carbon monoxide
US2849293A (en) 1954-11-26 1958-08-26 Cabot Godfrey L Inc Metal halide generator
NL294879A (en) 1962-07-11 1900-01-01
US3492097A (en) 1966-10-14 1970-01-27 Nat Lead Co Metal halide generator
US3764371A (en) 1970-11-18 1973-10-09 Alloy Surfaces Co Inc Formation of diffusion coatings on nickel containing dispersed thoria
US4108106A (en) 1975-12-29 1978-08-22 Tylan Corporation Cross-flow reactor
US4132816A (en) 1976-02-25 1979-01-02 United Technologies Corporation Gas phase deposition of aluminum using a complex aluminum halide of an alkali metal or an alkaline earth metal as an activator
US4052530A (en) 1976-08-09 1977-10-04 Materials Technology Corporation Co-deposited coating of aluminum oxide and titanium oxide and method of making same
GB1586959A (en) 1976-08-11 1981-03-25 Dunlop Ltd Method and apparatus for the production of carbon/carbon composite material
US4264682A (en) 1978-10-27 1981-04-28 Hitachi Metals, Ltd. Surface hafnium-titanium compound coated hard alloy material and method of producing the same
US4401689A (en) 1980-01-31 1983-08-30 Rca Corporation Radiation heated reactor process for chemical vapor deposition on substrates
US4421786A (en) 1981-01-23 1983-12-20 Western Electric Co. Chemical vapor deposition reactor for silicon epitaxial processes
FR2508063A1 (en) 1981-06-18 1982-12-24 Snecma STEAM PROCESS FOR THE DEPOSITION OF A PROTECTIVE COATING ON A METAL PART, DEVICE FOR IMPLEMENTING SAME AND PARTS OBTAINED ACCORDING TO SAID METHOD
FR2526141B1 (en) 1982-04-30 1988-02-26 Electricite De France METHOD AND INSTALLATION FOR HEATING A FLUIDIZED BED BY PLASMA INJECTION
US4468283A (en) 1982-12-17 1984-08-28 Irfan Ahmed Method for etching and controlled chemical vapor deposition
JPS60110475A (en) 1983-11-21 1985-06-15 Konishiroku Photo Ind Co Ltd Thermal recording head
EP0173715B1 (en) 1984-02-13 1992-04-22 SCHMITT, Jerome J. III Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby
US4580524A (en) 1984-09-07 1986-04-08 The United States Of America As Represented By The United States Department Of Energy Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition
JPS61191015A (en) * 1985-02-20 1986-08-25 Hitachi Ltd Semiconductor vapor growth and equipment thereof
CA1251100A (en) 1985-05-17 1989-03-14 Richard Cloutier Chemical vapor deposition
US4698244A (en) 1985-10-31 1987-10-06 Air Products And Chemicals, Inc. Deposition of titanium aluminides
JPS62290121A (en) 1986-06-09 1987-12-17 Nippon Telegr & Teleph Corp <Ntt> Molecular beam epitaxy device
US5154907A (en) 1986-10-15 1992-10-13 The Carborundum Company Process for the continuous production of high purity, ultra-fine, aluminum nitride powder by the carbo-nitridization of alumina
US4926793A (en) * 1986-12-15 1990-05-22 Shin-Etsu Handotai Co., Ltd. Method of forming thin film and apparatus therefor
US4890574A (en) 1987-01-20 1990-01-02 Gte Laboratories Incorporated Internal reactor for chemical vapor deposition
US5062386A (en) 1987-07-27 1991-11-05 Epitaxy Systems, Inc. Induction heated pancake epitaxial reactor
US4895108A (en) 1988-06-22 1990-01-23 The Babcock & Wilcox Company CVD apparatus and process for the preparation of fiber-reinforced ceramic composites
US5227195A (en) 1989-04-04 1993-07-13 Sri International Low temperature method of forming materials using one or more metal reactants and a halogen-containing reactant to form one or more reactive intermediates
JPH03107635A (en) 1989-09-22 1991-05-08 Kayaba Ind Co Ltd Cushion device of hydraulic bumper
HU207670B (en) 1989-10-02 1993-05-28 Richter Gedeon Vegyeszet Method and apparatus for controlling the temperature of chemical reactions
US5250323A (en) 1989-10-30 1993-10-05 Kabushiki Kaisha Toshiba Chemical vapor growth apparatus having an exhaust device including trap
US5279670A (en) 1990-03-31 1994-01-18 Tokyo Electron Sagami Limited Vertical type diffusion apparatus
US5146869A (en) * 1990-06-11 1992-09-15 National Semiconductor Corporation Tube and injector for preheating gases in a chemical vapor deposition reactor
US5071678A (en) 1990-10-09 1991-12-10 United Technologies Corporation Process for applying gas phase diffusion aluminide coatings
DE4119967C1 (en) 1991-06-18 1992-09-17 Mtu Muenchen Gmbh
US5263530A (en) 1991-09-11 1993-11-23 Howmet Corporation Method of making a composite casting
US5362228A (en) 1991-11-04 1994-11-08 Societe Europeenne De Propulsion Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method using the apparatus
US5221354A (en) 1991-11-04 1993-06-22 General Electric Company Apparatus and method for gas phase coating of hollow articles
US5264245A (en) * 1991-12-04 1993-11-23 Howmet Corporation CVD method for forming uniform coatings
US5261963A (en) 1991-12-04 1993-11-16 Howmet Corporation CVD apparatus comprising exhaust gas condensation means
EP0572150A3 (en) 1992-05-26 1993-12-29 General Electric Company Chemical vapour-deposition of aluminide coatings
US5385689A (en) 1993-06-29 1995-01-31 Novapure Corporation Process and composition for purifying semiconductor process gases to remove Lewis acid and oxidant impurities therefrom
JP3024449B2 (en) * 1993-07-24 2000-03-21 ヤマハ株式会社 Vertical heat treatment furnace and heat treatment method
US5348774A (en) 1993-08-11 1994-09-20 Alliedsignal Inc. Method of rapidly densifying a porous structure
US6689422B1 (en) 1994-02-16 2004-02-10 Howmet Research Corporation CVD codeposition of A1 and one or more reactive (gettering) elements to form protective aluminide coating
US5976919A (en) 1994-06-10 1999-11-02 Matsushita Electric Industrial Co., Ltd. Apparatus and method of manufacturing semiconductor element
US5658614A (en) 1994-10-28 1997-08-19 Howmet Research Corporation Platinum aluminide CVD coating method
US5480678A (en) 1994-11-16 1996-01-02 The B. F. Goodrich Company Apparatus for use with CVI/CVD processes
FR2733254B1 (en) 1995-04-18 1997-07-18 Europ Propulsion CHEMICAL VAPOR INFILTRATION PROCESS FOR THE DENSIFICATION OF POROUS SUBSTRATES DISPOSED IN RING STACKS
DE19514663A1 (en) 1995-04-20 1996-10-24 Kronos Titan Gmbh Metal chloride generator
US5916633A (en) 1995-05-19 1999-06-29 Georgia Tech Research Corporation Fabrication of carbon/carbon composites by forced flow-thermal gradient chemical vapor infiltration
US5837320A (en) 1996-02-27 1998-11-17 The University Of New Mexico Chemical vapor deposition of metal sulfide films from metal thiocarboxylate complexes with monodenate or multidentate ligands
US5741363A (en) 1996-03-22 1998-04-21 Advanced Technology Materials, Inc. Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition
JPH09330884A (en) * 1996-06-07 1997-12-22 Sony Corp Epitaxial growth device
TW336333B (en) 1996-06-24 1998-07-11 Nat Denki Kk A substrate processing apparatus
US5989733A (en) 1996-07-23 1999-11-23 Howmet Research Corporation Active element modified platinum aluminide diffusion coating and CVD coating method
DE19730007C1 (en) 1997-07-12 1999-03-25 Mtu Muenchen Gmbh Method and device for the gas phase diffusion coating of workpieces made of heat-resistant material with a coating material
US5928725A (en) 1997-07-18 1999-07-27 Chromalloy Gas Turbine Corporation Method and apparatus for gas phase coating complex internal surfaces of hollow articles
US5948300A (en) 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
US5993599A (en) 1998-05-13 1999-11-30 Sony Corporation Easy access chemical chamber window and frame
US6302964B1 (en) * 1998-06-16 2001-10-16 Applied Materials, Inc. One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system
US6143361A (en) 1998-10-19 2000-11-07 Howmet Research Corporation Method of reacting excess CVD gas reactant
US6224941B1 (en) 1998-12-22 2001-05-01 General Electric Company Pulsed-vapor phase aluminide process for high temperature oxidation-resistant coating applications
US6144802A (en) * 1999-06-29 2000-11-07 Hyundai Electronics Industries Co., Ltd. Fluid heater for semiconductor device
WO2001034871A1 (en) 1999-11-12 2001-05-17 Far West Electrochemical, Inc. Apparatus and method for performing simple chemical vapor deposition
KR100783841B1 (en) 2000-05-31 2007-12-10 동경 엘렉트론 주식회사 Heat treatment system
US7458974B1 (en) 2000-07-25 2008-12-02 Endovascular Technologies, Inc. Apparatus and method for electrically induced thrombosis
US6451692B1 (en) * 2000-08-18 2002-09-17 Micron Technology, Inc. Preheating of chemical vapor deposition precursors
US6602356B1 (en) 2000-09-20 2003-08-05 General Electric Company CVD aluminiding process for producing a modified platinum aluminide bond coat for improved high temperature performance
EP1909655A2 (en) 2005-06-20 2008-04-16 Sutura, Inc. Method and apparatus for applying a knot to a suture

Also Published As

Publication number Publication date
US20050000439A1 (en) 2005-01-06
US6911234B2 (en) 2005-06-28
US20030049374A1 (en) 2003-03-13
FR2829507B1 (en) 2006-06-09
JP2003113473A (en) 2003-04-18
US6793966B2 (en) 2004-09-21
GB0220898D0 (en) 2002-10-16
GB2379450B (en) 2005-06-15
JP4327427B2 (en) 2009-09-09
CA2402040C (en) 2011-05-10
DE10241964B4 (en) 2019-06-27
GB2379450A (en) 2003-03-12
FR2829507A1 (en) 2003-03-14
DE10241964A1 (en) 2003-03-27

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