CA2431625A1 - Semiconductor acceleration sensor using doped semiconductor layer as wiring - Google Patents

Semiconductor acceleration sensor using doped semiconductor layer as wiring Download PDF

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Publication number
CA2431625A1
CA2431625A1 CA002431625A CA2431625A CA2431625A1 CA 2431625 A1 CA2431625 A1 CA 2431625A1 CA 002431625 A CA002431625 A CA 002431625A CA 2431625 A CA2431625 A CA 2431625A CA 2431625 A1 CA2431625 A1 CA 2431625A1
Authority
CA
Canada
Prior art keywords
wiring
acceleration sensor
beams
resistor element
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002431625A
Other languages
French (fr)
Other versions
CA2431625C (en
Inventor
Hitoshi Yoshida
Kazushi Kataoka
Daisuke Wakabayashi
Koji Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works, Ltd.
Hitoshi Yoshida
Kazushi Kataoka
Daisuke Wakabayashi
Koji Goto
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works, Ltd., Hitoshi Yoshida, Kazushi Kataoka, Daisuke Wakabayashi, Koji Goto filed Critical Matsushita Electric Works, Ltd.
Publication of CA2431625A1 publication Critical patent/CA2431625A1/en
Application granted granted Critical
Publication of CA2431625C publication Critical patent/CA2431625C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/12Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802Details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/12Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance
    • G01P15/123Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance by piezo-resistive elements, e.g. semiconductor strain gauges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/18Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration in two or more dimensions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0822Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
    • G01P2015/084Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass the mass being suspended at more than one of its sides, e.g. membrane-type suspension, so as to permit multi-axis movement of the mass
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0822Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
    • G01P2015/084Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass the mass being suspended at more than one of its sides, e.g. membrane-type suspension, so as to permit multi-axis movement of the mass
    • G01P2015/0842Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass the mass being suspended at more than one of its sides, e.g. membrane-type suspension, so as to permit multi-axis movement of the mass the mass being of clover leaf shape

Abstract

A semiconductor acceleration sensor is provided, which has the capability of preventing a situation that detection accuracy of acceleration deteriorates due to undesirable thermal stress induced when a metal layer wiring is used in the acceleration sensor. This sensor comprises a frame, a weight, at least one pair of beams made of a semiconductor material, via which said weight is supported in the frame, and at least one resistor element formed on each of the beams to thereby detect acceleration according to piezoelectric effect of the resistor element. The sensor also includes a doped semiconductor layer formed in a top surface of each of the beams as a wiring for electrically connecting with the resistor element.
CA002431625A 2002-07-26 2003-06-10 Semiconductor acceleration sensor using doped semiconductor layer as wiring Expired - Fee Related CA2431625C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002-217359 2002-07-26
JP2002217359 2002-07-26

Publications (2)

Publication Number Publication Date
CA2431625A1 true CA2431625A1 (en) 2004-01-26
CA2431625C CA2431625C (en) 2007-08-14

Family

ID=29997283

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002431625A Expired - Fee Related CA2431625C (en) 2002-07-26 2003-06-10 Semiconductor acceleration sensor using doped semiconductor layer as wiring

Country Status (6)

Country Link
US (1) US20040016981A1 (en)
EP (1) EP1385010B1 (en)
KR (1) KR100580440B1 (en)
CN (1) CN1275043C (en)
CA (1) CA2431625C (en)
DE (1) DE60322479D1 (en)

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* Cited by examiner, † Cited by third party
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US7461559B2 (en) * 2005-03-18 2008-12-09 Citizen Holdings Co., Ltd. Electromechanical transducer and method of fabricating the same
US20090212665A1 (en) * 2005-03-24 2009-08-27 Hur Koser Power harvesting scheme based on piezoelectricity and nonlinear deflections
AU2006315079B2 (en) * 2005-11-18 2011-03-24 Ewise Systems Pty Ltd A method and apparatus for facilitating a secure transaction
US8026594B2 (en) * 2005-11-25 2011-09-27 Panasonic Electric Works Co., Ltd. Sensor device and production method therefor
WO2007061054A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Wafer level package structure and sensor device obtained from such package structure
EP3257809A1 (en) * 2005-11-25 2017-12-20 Panasonic Intellectual Property Management Co., Ltd. Wafer level package structure and production method therefor
US7674638B2 (en) * 2005-11-25 2010-03-09 Panasonic Electric Works Co., Ltd. Sensor device and production method therefor
CN100399032C (en) * 2006-05-29 2008-07-02 东南大学 Athermal flow speed-direction sensor based on micro mechanical system
DE102008007345B4 (en) * 2008-02-04 2016-10-06 Robert Bosch Gmbh Micromechanical component and method for producing the same
JP4687736B2 (en) * 2008-03-25 2011-05-25 株式会社村田製作所 Manufacturing method of external force detection device and external force detection device
JP6166185B2 (en) * 2014-01-06 2017-07-19 アルプス電気株式会社 MEMS sensor
JP6531281B2 (en) * 2014-01-27 2019-06-19 パナソニックIpマネジメント株式会社 Acceleration sensor
US10036765B2 (en) * 2015-07-10 2018-07-31 Honeywell International Inc. Reducing hysteresis effects in an accelerometer
US10350056B2 (en) * 2016-12-23 2019-07-16 Shifamed Holdings, Llc Multi-piece accommodating intraocular lenses and methods for making and using same
JP2019045287A (en) * 2017-09-01 2019-03-22 セイコーエプソン株式会社 Physical quantity sensor, electronic apparatus and mobile body
US10340290B2 (en) * 2017-09-15 2019-07-02 Globalfoundries Inc. Stacked SOI semiconductor devices with back bias mechanism
US10410934B2 (en) * 2017-12-07 2019-09-10 Micron Technology, Inc. Apparatuses having an interconnect extending from an upper conductive structure, through a hole in another conductive structure, and to an underlying structure

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0691265B2 (en) * 1986-08-01 1994-11-14 株式会社日立製作所 Semiconductor pressure sensor
JPS6341080A (en) * 1986-08-06 1988-02-22 Nissan Motor Co Ltd Semiconductor acceleration sensor
JP2586359B2 (en) * 1990-12-17 1997-02-26 日本電気株式会社 Semiconductor acceleration sensor and method of manufacturing the same
US5408112A (en) * 1991-06-03 1995-04-18 Nippondenso Co., Ltd. Semiconductor strain sensor having improved resistance to bonding strain effects
JP3391841B2 (en) * 1993-05-26 2003-03-31 松下電工株式会社 Semiconductor acceleration sensor
JPH08145683A (en) * 1994-11-16 1996-06-07 Nikon Corp Acceleration/angular acceleration detector
US5834646A (en) * 1995-04-12 1998-11-10 Sensonor Asa Force sensor device
JPH0945937A (en) * 1995-07-26 1997-02-14 Matsushita Electric Works Ltd Fabrication of triaxial acceleration sensor
EP0899574B1 (en) * 1997-02-21 2004-07-21 Matsushita Electric Works, Ltd. Acceleration sensor element and method of its manufacture
JP2002340713A (en) * 2001-05-10 2002-11-27 Denso Corp Semiconductor pressure sensor

Also Published As

Publication number Publication date
US20040016981A1 (en) 2004-01-29
KR20040010394A (en) 2004-01-31
CA2431625C (en) 2007-08-14
EP1385010A2 (en) 2004-01-28
KR100580440B1 (en) 2006-05-15
CN1275043C (en) 2006-09-13
DE60322479D1 (en) 2008-09-11
CN1480733A (en) 2004-03-10
EP1385010A3 (en) 2004-05-12
EP1385010B1 (en) 2008-07-30

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MKLA Lapsed

Effective date: 20140610