CN100572032C - 减少贴合区与模具图案之间的粘合的方法 - Google Patents

减少贴合区与模具图案之间的粘合的方法 Download PDF

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CN100572032C
CN100572032C CNB200480016523XA CN200480016523A CN100572032C CN 100572032 C CN100572032 C CN 100572032C CN B200480016523X A CNB200480016523X A CN B200480016523XA CN 200480016523 A CN200480016523 A CN 200480016523A CN 100572032 C CN100572032 C CN 100572032C
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崔炳镇
F·Y·徐
N·A·斯泰西
V·N·柴斯盖特
M·P·C·瓦茨
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Canon Nanotechnologies Inc
University of Texas System
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Molecular Imprints Inc
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
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Abstract

本发明提供一种减少基片上的贴合区与模具的图案之间的粘合的方法,其中所述模具有选择地与贴合区发生接触。该方法的特点在于在基片上形成贴合材料,并将整合材料与表面接触。整理由贴合材料形成一整理层。整理层具有第一和第二子部分,第一子部分被固化,第二子部分对于表面具有第一吸引力,对于第一子部分具有第二吸引力。第一吸引力比第二吸引力大。在此方式下,在模具从整理层中分离后,第二子部分的子集保持与模具接触,从而减少了形成在整理层中的图案被破坏的可能性。

Description

减少贴合区与模具图案之间的粘合的方法
技术领域
本发明一般涉及结构的细微制造。本发明尤其涉及在基片做图案以促进结构的形成。
背景技术
细微制造涉及制造非常小的结构,例如,具有微米级或更小的形貌构造(features)的结构。细微制造具有相当大影响的一个领域是在集成电路的加工中。半导体加工工业一直以来都在不断努力期望获得更大的生产率,而同时又增加在基片上每单位面积的电路,所以细微制造的重要性不断增加。细微制造规定更强的过程控制,而同时又可使所形成的结构的最小形貌构造的尺寸降低。已应用细微制造而发展的其它领域包括生物技术、光学技术、机械体系等。
示范性的细微制造技术描述在美国专利第6334960号中,发明人为Willson等。Willson等揭示了一种在结构中形成浮雕图像(relief image)的方法。此方法包括形成带有转移层的基片。转移层被可聚合流体组合物覆盖。模具与可聚合流体接触。模具具有浮雕结构,可聚合流体组合物填充在浮雕结构中。然后将可聚合流体组合物置于使其固化和聚合的条件之下,在转移层上形成固化的聚合物材料,该聚合材料中含有与模具的浮雕结构互补的浮雕结构。然后将模具与固体聚合材料分离,这样模具中的浮雕结构的复制品就在固化的聚合材料中形成。转移层和固化的聚合材料置于一定环境中,用以有选择地相对于固化的聚合材料来刻蚀转移层,从而在转移层中形成浮雕图像。
在聚合材料中精确地形成图案的一个重要的特征在于减少聚合材料和/或转移层在模具上的粘合,如果不能避免的话。这被称为释放特性。如此,记录在聚合材料和/或转移层中的图案在与模具分离的过程中不会变形。为了改善释放特性,Willson等在模具表面上形成一释放层。释放层通常是疏水性的和/或表面能较低的。释放层粘附模具,并粘附转移层或者聚合材料。提供改善释放特性的转移层能最大程度地减少记录在聚合材料和/或转移层中的由于模具分离所引起的图案变形。为了本发明讨论的目的,此类释放层称为事前释放层(priori release layer),即固化在模具上的释放层。
试图改善释放特性的另一种现有技术是Bender等描述在“MultipleImprinting in UV-based Nanoimprint Li thography:Related MaterialIssues”一文中,Microelectronic Engineering 61-62(2002)的第407-413页。具体地,Bender等采用的是具有事前释放层的模具与氟处理过的UV(紫外)可固化材料。为此目的,通过旋涂200CPS UV可固化流体形成UV可固化层,将UV可固化层施涂到基片上。UV可固化层富含氟,以改善释放特性。
但是,事前释放层通常使用寿命有限。因此,一个模具可能要用事前释放层涂敷多次。这会导致一个给定的模具要停工若干小时,就降低了生产量。另外,事前释放层的分子结构会限制所印出的小形貌构造尺寸的最小化。
因此,需要改善在平版印刷工艺中所使用的模具的释放特性。
发明内容
本发明提供一种减少基片和模具图案之间的粘合的方法。本方法的特点在于在基片上形成贴合材料,并将贴合材料与表面接触。一整理层由贴合材料形成。该整理层具有第一和第二子部,第一子部被固化,第二子部对于表面具有第一亲合力,对于第一子部具有第二亲合力。第一亲合力大于第二亲合力。在此模式中,模具刚从整理层分离时,第二子部的一部分保持与模具的接触,从而减少了形成在整理层中的图案有所损坏的可能性。这里描述这些和其它实施方式。
附图说明
图1是依据本发明的平版印刷体系的透视图;
图2是图1所示的平版印刷体系的垂直切面简化图;
图3是组成图2所示的印刷层的材料在聚合和交联之前的简化表示;
图4是图3所示的材料在被辐射后转变成的交联聚合物材料的简化表示;
图5是在印刷层被加上图案之后与印刷层分开的图1所示的模具的垂直切面简化图;
图6是依据本发明设置在基片上的印刷材料的垂直切面简化图;
图7是依据另一个实施方式设置在基片上的印刷材料的垂直切面简化图;
图8是图6所示的印刷材料在与模具接触后的垂直切面简化图;以及
图9是表示依据本发明的另一个实施方式的图案底涂的流程图。
具体实施方式
图1表示的是依据本发明的一个实施方式的平版印刷体系10,其包括一对间隔的桥式支座12,桥14和台座16在这对桥式支座间延伸。桥14和台座16是间隔开的。与桥14耦合的是从桥14向台座16延伸的印刻头18。设置在台座16上并与印刻头面对面的是移动台20。移动台20被设定成可沿着X轴和Y轴相对于台座16移动。辐射源22与系统10耦联,用来将光辐射引到移动台20上。如图所示,辐射源22与桥14耦联,并包括与辐射源22相连的发电机23。
参考附图1和附图2,连接到印刻头18上的是模板26,模板26上具有模具28。模具28包括由多个间隔开的凹陷28a和凸起28b所限定的多个形貌构造。这多个形貌构造限定出一个原始图案,该图案可以转移到设置在移动台20上的基片31上。基片31可包括裸晶圆或在其上设置有一层或多层的晶圆。为此目的,使印刻头18可沿着z轴移动,整理而改变模具28和基片31之间的距离“d”。这样,模具28上的形貌构造就可印入到基片31的贴合区域中,下文中将更全面地进行讨论。设置辐射源22,使模具28位于辐射源22和基片31之间。结果,模具28由能够使它对于辐射源22产生的辐射基本透明的材料制成。
参考图2和图3,贴合区域如印刷层34设置呈平整轮廓的表面32的一部分上。应理解的是,贴合区域可通过使用任何已知的技术在表面上产生贴合材料来形成,诸如授予Chou的美国专利第5772905中所揭示的用热模压印浮雕图案的方法,其全文通过引用包括于此,或者是由Chou等描述在2002年6月的“Ultrafast and Direct Imprint of Nanostructure in Silicon”一文,Nature,417卷,第835-837页的一类激光辅助直接印刷(LADI)法。但是,在本发明的实施方式中,贴合区域由印刷层34组成,印刷层以多个间隔开的不连续的材料36a的液滴36的形式沉积在基片31上,下文中将更全面地进行讨论。印刷层34由材料36a形成,材料36a可选择地进行聚合和交联,以在其中记录原始图案,形成纪录图案。材料36a示于图4中,在点36b处发生交联,形成交联聚合材料36c。
参考图2、3和5,记录在印刷层34中的图案部分地是通过与模具28进行机械接触产生的。为此目的,印刻头18减少距离“d”,从而允许印刷层34与模具28发生机械接触,将液滴36展开,从而在面32上用材料36a的邻接成型来形成印刷层34。在一个实施方式中,缩短距离“d”,以使印刷层34的子部34a进入并填充凹陷28a。
为了方便对凹陷28a的填充,材料36a要具备在用邻接材料36a的成型覆盖面32的同时,能完全填充凹陷28a所必需的性质。在本发明的实施方式中,叠加在凸起28b上的印刷层34的子部34b在达到期望的、通常为最小距离“d”后依然保留,使子部34a的厚度为t1、子部34b的厚度为t2。取决于应用,厚度“t1”和“t2”可为任意所需的厚度。通常,选择t1,使其不超过子部34a的宽度u的两倍,即t1≤2u,图5中表示得更加清楚。
参考图2、3和4,在达到所需的距离“d”后,辐射源22产生光化辐射,用来聚合和交联材料36a,形成聚合材料36c,其中聚合材料36c的大部分发生交联。结果,材料36a转变为固体,形成印刷层34的材料36c,如图5所示。具体地,材料36c凝固,以使印刷层34的面34c具有与模具28的面28c形状相贴合的形状,使印刷层34具有凹陷30。如图4所示,在印刷层34转变为由材料36c所组成后,如图2所示的印刻头18移动以增加距离“d”,使模具28和印刷层34分开来。
参考图5,可采用额外的加工来完成在基片31上的图案形成。例如,可对基片31和印刷层34进行刻蚀,以使印刷层34中的图案转移到基片31中,形成图案化表面(未示出)。为了便于刻蚀,形成印刷层34的材料可变化,以根据需要用来限定相对于基片的相对刻蚀速率。
为此目的,可向印刷层34提供相对于有选择地设置于其上的光阻材料(未示出)的刻蚀差异。该光阻材料(未示出)可采用已知技术来提供以进一步在印刷层34形成图案。取决于所需的刻蚀速率和形成基片31和印刷层34的下层的组成成份,可采用任何刻蚀方法。示范性的刻蚀方法可包括激光刻蚀、活性离子刻蚀、化学湿刻蚀等。
参考图1和图2,示范性的辐射源22可产生紫外辐射;但是,也可使用任何已知的辐射源。用来激发印刷层34中材料聚合的辐射的选用,是本领域技术人员所已知的,通常是取决于所需的具体应用。而且,模具28上的多个形貌构造表现为沿着与凸起28b平行的方向延伸的凹陷28a,使模具28的横截面为锯齿状。但是,凹陷28a和凸起28b可实际对应于产生集成电路所需的任何形貌构造,可小到只有十分之几个纳米。
参考图1、2和5,通过本发明的图案成形技术产生的图案可转移到基片31中,提供纵横比高达30∶1的形貌构造。为此目的,在模具28的一个实施方式中,具有纵横比在1∶1至10∶1范围内的凹陷28a。具体地,凸起28b的宽度W1在约10纳米至约5000微米的范围内,而凹陷28a的宽度W2在约10纳米至约5000微米的范围内。结果,模具28和/或模板26可由不同的常规材料形成,例如但不限于,熔融氧化硅、石英、硅、有机聚合物、硅氧烷聚合物、硼硅酸盐玻璃、碳氟聚合物、金属、硬蓝宝石等。
参考图1、图2和图3,材料36a的特性对于根据所采用的独特沉积方法在基片31有效地形成图案是非常重要的。如上所述,材料36a以多个不连续的、间隔开的液滴36沉积在基片31上。液滴36的总体积要使材料36a适当地分布在形成印刷层34的面32上。结果,印刷层的涂布和图案成形同时进行,随后通过暴露在如紫外辐射之类的辐射中,使图案定型在印刷层34中。作为沉积过程的结果,期望材料36a具有一定的性质,能够便于液滴36中的材料36a快速、均匀地覆盖在面32上,使所有的厚度t1是基本上均一的,且所有的厚度t2是基本上均一的。期望的性质包括低粘度,例如在0.5厘泊至5厘泊(csp),以及润湿基片31和/或模具28的表面的能力和避免随后在聚合后形成凹陷或孔洞的能力。满足这些特性,印刷层34可被制造得足够薄,并同时避免在如图5所示的子部34b之类的较薄区域中形成凹陷或孔洞。
形成材料36a以提供上述特性的组成成分会不相同。这是因为基片31是由各种不同的材料形成的。结果,面32的化学组成依据形成基片31的材料的不同而改变。例如,基片31可由硅、塑料、镓砷化物、碲汞化物和它们的复合物形成。另外,基片31可在子部34b中包括一层或多层,例如,介电层、金属层、半导体层、平面化层等。
参考图1、2和3,材料36a的示例性组合物如下:
组合物1
丙烯酸异冰片酯
丙烯酸正己酯
二丙烯酸乙二醇酯
2-羟基-2-甲基-1-苯基-丙-1-酮
在示例性的组合物中,组合物中包括大约55%的丙烯酸异冰片酯、大约27%的丙烯酸正己酯、大约15%的二丙烯酸乙二醇酯和大约3%的2-羟基-2-甲基-1-丙基-丙-1-酮。引发剂是商品为1173,来自纽约Tarryton的
Figure C20048001652300112
上述组合物还包括化学领域中众所周知的稳定剂,用来提高组合物的使用寿命。为了提供合适的释放特性,组合物1通常是和模板一块使用,其中的模板处理成具有疏水性和/或低表面能的模具表面,即事前释放层。
为了改善模具28和印刷层34的释放特性、且确保印刷层34不粘附在模具28上,形成材料36a的组合物可包括用来降低组合物1的表面张力的添加剂。为此目的,材料36a可包括作为添加剂的表面活性剂。为了本发明的目的,“表面活性剂”定义为任何分子,其一端是疏水性的。表面活性剂可以在表面活性剂分子中含有氟-例如包括氟链,或者不包括氟。一示例性表面活性剂可以商品名ZONYL
Figure C20048001652300113
从DUPONTTM购得,通式为R1R2,其中R1=F(CF2CF2)Y,Y在1至7的范围内,包括1和7,R2=CH2CH2O(CH2CH2O)XH,其中X在0至15的范围内,包括0和15。可用下列组合物来形成材料36a:
组合物2
丙烯酸异冰片酯
丙烯酸正己酯
二丙烯酸乙二醇酯
2-羟基-2-甲基-1-苯基-丙-1-酮
RfCH2CH2O(CH2CH2O)XH,
组合物中包含少于1%的ZONYL
Figure C20048001652300121
添加剂,其余组分的相对量如同就组合物1在上文所讨论。但是,ZONYL
Figure C20048001652300122
的百分数可超过1%。
组合物2提供的一个优点是它消除了对事前释放层的需要,即消除了对位于模具28上的单独的、疏水性和/或低表面能的释放层的需要。具体地,组合物2对模具28和释放层34提供了所需的释放特性,以致如图4所示的材料36c不会以足以造成记录在其中的图案变形的力粘附在模具28上。如图3所示,据信ZONYL
Figure C20048001652300123
浓缩在材料36a的第一区。可聚合的化合物浓缩在材料36a的第二区。
参考图6,与区137相比,ZONYL
Figure C20048001652300124
添加剂浓度在液滴36的区136中较高,可聚合化合物浓缩在区137中。如图7所示,假如采用旋涂技术,添加剂就会浓缩在区236中,而可聚合化合物就会浓缩在区237中。
参考图3、4和8,不管涉及何种沉积方法,与材料36a接触并暴露在光化学辐射中后,材料36a转变为材料36c,第一界面136a限定在区136和模具28之间。第二界面137a形成在区136和137之间。据信,与区136相关联的材料36c的某个部分-如果不是全部的话-对于模具28亲和力要大于该部分和与材料137相关联的材料36c之间的吸引力。结果,在模具从材料36c上分离时,如图5所示,子部34a和34b中的一个分段或其全部从区137上分离,由此最大程度地减少了由于模具28和材料36c之间的粘合力所造成的对记录在材料36c中的图案的破坏。
具体地,界面136a限定了与之相关的第一界面能级,第二界面137a限定了第二界面能级,第一界面能级比第二界面能级要高。第一界面能级由模具28的表面能与材料36c在区136中的表面张力的差值限定。第二界面能级由与区136相关联的材料36c对与区137结合的材料36c的粘合力限定。在本实施例中,组合物2给区136提供在20-35毫牛顿/米范围内的表面张力,1毫焦/平方厘米=1毫牛顿/米。结果,界面136a上的界面能级大到足够克服界面137上的界面能级。
参考图2,组合物2提供的其它优点在于可减少润湿模具28-因此涂布液滴36-的时间。具体地,因为模具28上不再需要事前释放层,模具28的表面可具有较高的表面能,例如,60-250毫牛顿/米。由接触角方法所规定的组合物2对于模具28表面的润湿性可在10度或更小一点的范围内。这最大程度地减少了填充模具28上的图案形貌构造所需的时间。而且,ZONYL
Figure C20048001652300131
添加剂使由接触角方法规定的组合物2的润湿性在75度至90度的范围內,因而增加了模具28的润湿性,进一步减少了涂布液滴36所需的时间。当然,组合物2可与现有技术已知的事前释放层一起使用,来进一步改善释放特性。
改善模具28的释放性质的另一种方法包括通过将模具28的图案暴露在整理混合物中来将其加以整理,其中的整理混合物包括会留在模具28上以减少模具表面的表面能的添加剂。示例性添加剂是表面活性剂。
在一个具体的实施例中,模具28暴露在一混合物中,该混合物包括大约0.1%或更多的ZONYL
Figure C20048001652300132
其余的包括异丙醇(IPA)。图案的暴露实际上可通过现有技术中已知的任何方法来实现,包括将图案浸入到整理混合物中、用浸透整理混合物的布擦拭图案和将整理混合物的蒸汽喷涂到表面上。然后,使整理混合物中的IPA在模具28使用前蒸发。这样,IPA有助于于从图案中移去不利的污染物,而同时留下添加剂,从而整理图案的表面。整理混合物可与组合物2一起使用,用来加强组合物2所提供的释放特性的改善。整理混合物中的添加剂可与组合物2中的添加剂相同或不同。或者,整理混合物可与组合物1或任何其它适用于平版印刷、以及其它印刷方法如热浮雕和激光辅助印刷方法的可聚合材料一起使用。
用来整理模具28图案的另一种技术是使用图案底涂(patternpriming)。图案底涂通过有选择地使贴合区域与图案接触足够多的次数、以在贴合区中准确地复制与原始图案互补的图案来实现。具体地,已发现,通过反复接触图3所示的印刷材料36a所形成的互补图案因每一连续印刻而改进。在印刻了足够多的次数后,在模具28中形成图案精确互补的复制品。图案底涂技术可与上述的整理混合物和组合物1或组合物2组合使用,或单独与组合物2组合使用,即只使用组合物2而不用整理混合物。据信,在与图案精确互补的复制品产生之前所需要进行的印刻次数与组合物2中的添加剂的数量成反比。具体地,通过提高组合物2中添加剂的量,在形成与图案精确互补的复制品之前所需的印刻的次数减少。
参考图2和图9,在操作中,印刻底涂包括在第一基片上形成贴合材料、形成经底涂的基片(步骤300)。在步骤302,模具28与贴合区接触足够多的次数以在经底涂的基片上的贴合材料中准确地复制模具28上的图案。在一个实施例中,将模具28与贴合材料的第一子部接触。随后,使第一子部聚合,模具28从其上分离。然后将模具28同与该第一子部分开的贴合材料的第二子部接触。使与第二子部相关联的贴合材料聚合,该过程重复直到与模具28上的图案精确互补的图案记录在贴合材料中为止。这样就产生了一个经底涂的模具。在步骤304中,经底涂的模具(primed mold)与称为工艺基片的第二基片上的贴合材料接触。在此之后,通过使用众所周知的平版印刷技术聚合贴合材料将图案记录于其中。这样,可用经底涂的模具来完成工艺基片的图案成形。
以上描述的本发明的实施例是示范性的。可在本发明的范围内对上述的说明书进行多种变动和修改。因此,本发明的范围并不参照上述说明来限定,而应依据所附的权利要求书及其全范围的等同文件来限定。

Claims (27)

1.一种减少基片和表面具有图案区域的模具之间的粘合力的方法,所述方法包括:
在所述基片上形成贴合材料;
将所述贴合材料与所述表面接触;以及
由所述贴合材料形成具有第一子部和在所述第一子部表面上的第二子部的整理层,所述第一子部被固化,所述第二子部对于所述表面具有第一亲和力、对于所述第一子部具有第二亲和力,所述第一亲和力大于所述第二亲和力。
2.如权利要求1所述的方法,其特征在于,形成所述贴合材料的步骤还包括在所述表面与所述贴合材料接触的同时形成所述整理层,所述方法还包括将所述表面从所述整理层分离,而所述第二子部的一部分保持与所述贴合材料的接触,从而该部分第二子部与所述第一子部分开。
3.如权利要求1所述的方法,其特征在于,还包括整理所述模具使其在与所述贴合材料接触之前具备亲水性。
4.如权利要求1所述的方法,其特征在于,还包括在将所述表面与所述贴合材料接触之前所述方法还包括在异丙醇和表面活性剂混合物中整理所述模具的步骤。
5.如权利要求4所述的方法,其特征在于,处理所述表面还包括用异丙基醇和
Figure C2004800165230002C1
FSO-100的混合物配制所述整理剂。
6.如权利要求1所述的方法,其特征在于,形成所述贴合材料的步骤还包括沉积一种组合物,它包括可聚合化合物和表面活性剂,并且接触所述贴合材料的步骤还包括在所述表面和所述组合物之间形成界面,所述界面的绝大部分带有所述表面活性剂。
7.如权利要求1所述的方法,其特征在于,形成所述贴合材料的步骤还包括由丙烯酸异冰片酯、丙烯酸正己酯、乙二醇二丙烯酸酯、2-羟基-2-甲基-1-苯基-1-丙酮和F(CF2CF2)yCH2CH2O(CH2CH2O)xH形成所述贴合组合物,其中y在1-7的范围内包括1和7,X在0-15的范围内包括0和15。
8.如权利要求1所述的方法,其特征在于,形成所述贴合材料的步骤还包括在所述基片上沉积许多所述贴合组合物的液滴。
9.如权利要求1所述的方法,其特征在于,形成所述贴合材料的步骤还包括使用旋涂技术在所述基片上沉积所述贴合组合物。
10.如权利要求1所述的方法,还包括依次接触所述贴合组合物足够多的次数,以在所述贴合组合物中准确地复制与所述图案区的形状互补的记录图案。
11.一种减少基片上的贴合材料与具有原始图案的模具之间的粘合力的方法,所述方法包括:
通过在所述基片上沉积贴合组合物而在所述基片上形成所述贴合材料,所述贴合组合物包括可聚合化合物和表面活性剂分子,所述表面活性剂分子浓缩在所述贴合组合物的第一区中,而所述可聚合化合物浓缩在所述贴合组合物的第二区中,并且所述第一区位于所述第二区的表面上;
将所述贴合材料与所述模具接触;以及
固化所述可聚合化合物。
12.如权利要求11所述的方法,还包括整理所述模具使其具备亲水性。
13.如权利要求11所述的方法,还包括将所述模具置于异丙醇和表面活性剂的混合物中来整理所述模具。
14.如权利要求11所述的方法,其特征在于,形成所述贴合材料的步骤还包括在所述基片上沉积多个所述贴合组合物的液滴。
15.如权利要求11所述的方法,其特征在于,形成所述贴合材料的步骤还包括采用旋涂技术在所述基片上沉积所述贴合组合物。
16.如权利要求11所述的方法,还包括依次接触所述贴合组合物足够多的次数,以在所述贴合组合物中准确地复制与所述原始图案互补的记录图案。
17.如权利要求11所述的方法,其特征在于,形成所述贴合材料的步骤还包括由丙烯酸异冰片酯、丙烯酸正己酯、乙二醇二丙烯酸酯、2-羟基-2-甲基-1-苯基-1-丙酮和F(CF2CF2)yCH2CH2O(CH2CH2O)xH形成所述贴合组合物,其中y在1-7的范围内包括1和7,X在0-15的范围内包括0和15。
18.一种减少基片上的贴合区与其上具有原始图案的模具之间的粘合力的方法,所述方法包括:
沉积含有可聚合化合物和表面活性剂的组合物,所述表面活性剂浓缩在所述组合物的第一区中,所述可聚合化合物浓缩在所述组合物的第二区中,所述第一区位于所述第二区和所述模具之间,从而在所述基片上形成所述贴合区;
将所述贴合区的足够多的不同子部与所述模具依次接触和固化,以在所述贴合区的其它子部准确地复制出与所述原始图案互补的记录图案。
19.如权利要求18所述的方法,还包括将所述原始图案置于异丙醇和表面活性剂的混合物中来整理所述模具。
20.如权利要求18所述的方法,其特征在于,沉积所述组合物的步骤还包括用所述可聚合化合物和所述表面活性剂形成所述组合物,所述可聚合化合物包括丙烯酸异冰片酯、丙烯酸正己酯、乙二醇二丙烯酸酯和2-羟基-2-甲基-1-苯基-1-丙酮,所述表面活性剂包含F(CF2CF2)yCH2CH2O(CH2CH2O)xH,其中y在1-7的范围内包括1和7,X在0-15的范围内包括0和15。
21.如权利要求18所述的方法,其特征在于,形成所述贴合区的步骤还包括在所述基片上沉积多个贴合组合物的液滴。
22.如权利要求18所述的方法,其特征在于,形成所述贴合区的步骤还包括采用旋涂技术在所述基片上沉积所述贴合组合物。
23.一种用表面包含有原始图案的模具在工艺基片上形成记录图案的方法,所述方法包括:
沉积含有可聚合化合物和添加剂的组合物,所述添加剂浓缩在所述组合物的第一区中,所述可聚合化合物浓缩在所述组合物的第二区中,所述第一区在所述第二区的表面上,从而在经底涂的基片上形成贴合材料;
通过使所述贴合材料足够多的不同子部与所述模具依次接触和固化而在所述经底涂的基片上准确地复制所述记录图案,形成经底涂的模具;以及
使所述经底涂的模具接触所述工艺基片上的贴合材料,以形成与所述原始图案互补的转移图案。
24.如权利要求23所述的方法,其特征在于,形成所述贴合材料的步骤还包括在所述基片上沉积具有可聚合化合物和表面活性剂的组合物。
25.如权利要求23所述的方法,其特征在于,形成所述贴合材料的步骤还包括沉积一包含丙烯酸异冰片酯、丙烯酸正己酯、乙二醇二丙烯酸酯、2-羟基-2-甲基-1-苯基-1-丙酮和F(CF2CF2)yCH2CH2O(CH2CH2O)xH的组合物,其中y在1-7的范围内包括1和7,X在0-15的范围内包括0和15。
26.如权利要求23所述的方法,其特征在于,形成所述贴合材料的步骤还包括在所述基片上沉积多个所述贴合材料的液滴。
27.如权利要求23所述的方法,其特征在于,形成所述贴合材料还包括采用旋涂技术沉积所述贴合材料。
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