CN102132403B - 模制超薄半导体管芯封装和使用该封装的系统及其制造方法 - Google Patents

模制超薄半导体管芯封装和使用该封装的系统及其制造方法 Download PDF

Info

Publication number
CN102132403B
CN102132403B CN200980134103.4A CN200980134103A CN102132403B CN 102132403 B CN102132403 B CN 102132403B CN 200980134103 A CN200980134103 A CN 200980134103A CN 102132403 B CN102132403 B CN 102132403B
Authority
CN
China
Prior art keywords
semiconductor element
lead frame
conductive member
lead
wire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200980134103.4A
Other languages
English (en)
Other versions
CN102132403A (zh
Inventor
Y·刘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fairchild Semiconductor Corp
Original Assignee
Fairchild Semiconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fairchild Semiconductor Corp filed Critical Fairchild Semiconductor Corp
Publication of CN102132403A publication Critical patent/CN102132403A/zh
Application granted granted Critical
Publication of CN102132403B publication Critical patent/CN102132403B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49572Lead-frames or other flat leads consisting of thin flexible metallic tape with or without a film carrier
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49517Additional leads
    • H01L23/4952Additional leads the additional leads being a bump or a wire
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/19Manufacturing methods of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/20Structure, shape, material or disposition of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/10Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L25/105Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being of a type provided for in group H01L27/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/50Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/0401Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04105Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/20Structure, shape, material or disposition of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/10All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/1011All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
    • H01L2225/1017All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support
    • H01L2225/1029All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support the support being a lead frame
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/10All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/1011All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
    • H01L2225/1047Details of electrical connections between containers
    • H01L2225/1058Bump or bump-like electrical connections, e.g. balls, pillars, posts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01078Platinum [Pt]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/014Solder alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15172Fan-out arrangement of the internal vias
    • H01L2924/15173Fan-out arrangement of the internal vias in a single layer of the multilayer substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15192Resurf arrangement of the internal vias
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • H01L2924/1533Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
    • H01L2924/15331Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18162Exposing the passive side of the semiconductor or solid-state body of a chip with build-up interconnect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19105Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

公开涉及模制超薄半导体管芯封装、包含这种封装的系统以及制造这种封装的方法。示例性封装包括引线框,其具有在引线框的第一面和第二面之间形成的孔径以及置成与孔径相邻的多条引线。该封装还包括置于引线框的孔径中的其顶面与引线框的第一面基本齐平的半导体,以及在半导体管芯的至少一个侧面和引线框的至少一条引线之间的至少一个间隙。电绝缘体置于至少一个间隙中。多个导电构件使引线框的引线与管芯顶面上的导电区互连,其中至少一个导电构件具有的一部分置于绝缘材料体的至少一部分上。

Description

模制超薄半导体管芯封装和使用该封装的系统及其制造方法
相关申请的交叉引用
不适用
背景技术
诸如蜂窝电话、个人数据助理、数码相机、膝上型计算机等的个人便携式电子产品通常由组装到互连衬底的若干封装半导体IC芯片和表面安装部件组成,互连衬底诸如印刷电路板和柔性衬底。将更多功能性和特征纳入到个人便携式电子产品而在同时缩小这种装置的大小的需求在不断增加。这又使得对互连衬底的设计、大小、和组件的需求不断增加。随着组装部件的数量增多,衬底面积和成本增大,同时对更小形状因数的需求增加。
发明内容
作为发明的一部分,发明人已认识到需要解决这些问题且认识到找到能够使电子产品的功能性和特征增多而不造成衬底面积和成本增加以及产品成品率降低的方法是有利的。作为发明的又一部分,发明人已认识到许多电子产品具有具体为半导体管芯的若干部件,它们可归组为提供特定功能的若干小群组。作为发明的又一部分,发明人已发现电路群组所需衬底面积通过以模制超薄封装来封装半导体管芯和其它部件显著减小,模制超薄封装可在彼此堆叠来减小板空间并增加功能性,其中这种封装各自可与其所容纳的半导体管芯一样薄。
相应地,根据本发明的第一一般实施例涉及宽泛地包括引线框的半导体管芯封装,该引线框具有第一面、第二面、置于引线框的第一面和第二面之间的孔径、以及置成与该孔径相邻的多条引线。该半导体管芯封装还包括半导体管芯,其具有顶面、底面、在顶面和底面之间的至少一个侧面,以及置于半导体管芯的顶面上的多个导电区。半导体管芯置于引线框的孔径中,其顶面基本上与引线框的第一面齐平。该封装还包括在半导体管芯的至少一个侧面和引线框的至少一条引线之间的至少一个间隙,以及置于该至少一个间隙的至少一部分中的电绝缘材料体。该封装还包括多个导电构件,各导电构件具有电耦合到半导体管芯的导电区的第一端以及电耦合到引线框的引线的第二端。至少一个导电构件具有的至少一部分置于电绝缘材料体的至少一部分上。
对于这种示例性构造而言,半导体管芯封装可与其所容纳的半导体管芯一样薄,其中发往以及来自管芯的信号由引线和导电构件传递,其包括沉积导电层或者诸如楔形导线接合的低高度引线接合。具有公共引线图案的封装可彼此堆叠以便电互连若干半导体管芯,从而在单个半导体管芯封装的覆盖区域内提供增多的功能性。封装之间的导电构件布局可变化以在堆叠半导体管芯之间提供所需互连。作为本发明的该示例性实施例的另一好处,具有相同电路或者部件的半导体管芯可堆叠以及平行地电耦合以在单个封装的覆盖区域内提供附加性能,这与使用较大覆盖区域封装中所封装的大管芯相反。举例而言,在个别管芯上的小型功率开关MOSFET晶体管可容纳在具有同样小覆盖区域的类似封装中,且可堆叠以及平行地电耦合以提供容纳于较大覆盖区域封装中的大得多的MOSFET器件的功率处理性能。
根据本发明的另一一般实施例涉及一种一个或多个半导体管芯的半导体管芯封装的制造方法。各半导体管芯包括正面和背面,且正面具有多个导电区。该方法宽泛地包括构建一组件,该组件具有置于载体膜上的其有源表面面向该载体膜的至少一个半导体管芯、置成与半导体管芯相邻的多条引线、以及在半导体管芯和至少一条引线之间的至少一个间隙。该方法还包括将电绝缘材料体置于至少一个间隙内,以使该主体凝固并粘附到半导体管芯以及至少一条引线。用管芯和引线框的引线来组装导电构件以在管芯的导电区和引线之间设置电耦合。诸如在组装该管芯之前通过将导电构件置于载体膜上来构建该组件时可组装该导电构件,或者在之后组装。在后一情况下,载体膜可被移除,且导电构件可置于管芯的第一面和引线框之上。
本发明还涵盖包括根据本发明的封装的系统,这种系统各自具有互连衬底以及根据本发明的附连到互连衬底的半导体管芯封装,且半导体管芯封装和互连衬底之间有电连接。
结合附图在详细描述中更详细地描述本发明的以上一般实施例和其它实施例。在附图中,相同的附图标记可指示相同的元件,且可能不重复对一些元件的描述。
附图简述
图1是根据本发明的半导体管芯封装的第一实施例的俯视图。
图2是根据本发明的半导体管芯封装的第一实施例的截面图。
图3是包括根据本发明的半导体管芯封装的示例性系统的截面图。
图4是根据本发明的导电构件的示例性布局的俯视图。
图5是根据本发明的导电构件的另一示例性布局的俯视图。
图6是示出置于根据本发明的示例性封装上的球栅阵列的示例性封装的仰视图。
图7-18示出根据本发明示例性实施例的各种制造阶段期间的封装组件的诸视图。
具体实施方式
以下将具体参照其中示出本发明的示例性实施例的附图来更全面地描述本发明。然而,本发明可按照许多不同形式体现并且不应当解释成对本文所述实施例构成限制。相反,提供这些实施例以便使公开更彻底和完整,且向本领域普通技术人员全面地传达本发明的范围。在附图中,为清楚起见可能放大诸层的厚度和区域。贯穿说明书使用相同附图标记表示相同元件。诸元件对于不同实施例可具有不同相互间关系和不同位置。
还应理解的是,当一个层被称为在另一个层或衬底“之上”时,它可以直接在另一个层或衬底之上,或也可存在中间层。在附图中,为清楚起见放大诸层和区域的厚度和大小,且附图中相似附图标记表示相似元件。还要理解当诸如层、区域或者衬底的一个元件为在另一元件“之上”、“连接至”、“电连接至”、“耦合至”、或者“电耦合至”另一元件时,其可能是直接在上面,连接至或者耦合至另一元件,或可存在一个或多个中间元件。相反,当一元件称为位于另一元件或层的“直接上方”、“直接连接至”或者“直接耦合至”另一元件或层时,不存在中间元件或层。本文中使用的术语“和/或”包括相关联所列条目的任一个以及一个或多个的所有组合。
本文中所使用的术语仅出于对本发明的说明性目的,且不应被解释成对本发明的内涵或范围的限制。如在说明书中所使用,除非根据上下文明确指出,否则单数形式可包括复数形式。另外,本说明书中所使用的表达“包括”和/或“包括了”既不定义所提及的形状、数量、步骤、动作、操作、构件、元件、和/或这些的群组,也不排除增加一个或多个其它不同形状、数量、步骤、操作、构件、元件、和/或这些的群组的存在或者添加,或者这些的添加。诸如“之上”、“上方”、“上”、“下方”、“之下”、“下”、“低”等的空间相关术语可在本文中使用以易于描述如附图所示的一个元件或者特征与另一(诸)元件或(诸)特征的关系。可以理解这些空间相关术语旨在包含在使用或者操作中的器件(例如封装)的不同取向以及附图中所描述的取向。举例而言,如果附图中的器件被颠倒,描述为在其它元件或者特征“下方”或“之下”或“下”的元件则取向为在其它元件或特征“之上”或“上方”。因此,示例性术语“上方”可包含上方和下方取向两者。
如本文中所使用地,诸如“第一”、“第二”等的术语用于描述各种构件、部件、区域、层、和/或部分。然而,很显然不应由这些术语定义构件、部件、区域、层、和/或部分。这些术语仅用于区别一个元件、部件、区域、层或部分与另一构件、部件、区域、层或部分区。因此,在不背离本发明范围的情况下,将要描述的第一构件、部件、区域、层或部分还可被称为第二构件、部件、区域、层或部分。
图1是根据本发明的半导体管芯封装的第一实施例100的俯视图,且图2是其沿着图1所示的线2-2获得的截面图。参考图1和图2两者,半导体管芯封装100包括引线框110,其具有第一面111、第二面112、置于引线框的第一面和第二面之间的孔径113、以及置成与孔径113相邻的多条引线114a-114f。封装100还包括半导体管芯120,其具有顶面121、底面122、顶面和底面之间的一个或多个侧面123、以及置于管芯顶面121之上的多个导电区124a-124f。半导体管芯120典型地具有四个侧面。(在极少情况下,其可具有仅有一个侧面的圆形形状,或者具有三个侧面的三角形形状。)管芯的顶面121经常被称作有源表面,因为导电区124置于该面上,且因为多数电子部件在该面上形成。半导体管芯120置于引线框的孔径113中且其顶面121与引线框的第一面111基本齐平。为了基本齐平,表面121和111之间的高度差不大于50微米。该高度差通常不大于25微米,且优选为不大于半导体管芯120厚度的10%(对于具有100微米厚度的管芯而言,将不大于10微米。)管芯120的底面122优选为与引线框的第二面112基本齐平或者低于引线框的第二面112的水平面,但是可以高于第二面122的水平面。为了基本齐平,表面122和112之间的高度差不大于50微米。在典型实施例中,管芯120的底面122比引线框的第二面112高出不大于25微米。
封装100还包括置于半导体管芯120的至少一个侧面123和引线框110的至少一条引线114之间的至少一个间隙140。典型地,管芯120基本上置于孔径113和引线114的中间,且间隙140环绕管芯120。然而,管芯120可放置成与一行引线邻接,在这种情况下间隙环绕管芯的三侧。在另一示例中,引线114可分布在管芯120的所有四侧周围以提供矩形孔径,且管芯可放置成与孔径的角隅邻接。在这种情况下,间隙将包围管芯的两侧。在矩形孔径示例的另一实现方式中,管芯和引线框可具有精确尺寸,且管芯的两个相对侧面可邻接相对两行的引线,其在管芯的另两个相对侧面以及另外相对两行引线之间提供间隙。
封装100还包括置于至少一部分间隙140中的电绝缘材料体145,且优选为基本上置于所有间隙140中。电绝缘材料体还可置于引线114a-114f之间的间隙中。电绝缘材料体145优选为以液态置于间隙140中,然后诸如通过应用热处理(诸如在沉积之前或之后加热)、紫外光处理、和/或化学处理(例如化学反应)来凝固。电绝缘材料体145优选具有能使其在凝固后机械地附连到半导体管芯120的各侧123和引线114a-114f侧面的粘合性能。电绝缘材料体145可包括环氧树脂(诸如环氧模制化合物)、硅树脂、和/或聚酰亚胺(即,其可包括这些材料的一个或多个)。电绝缘材料体145优选形成为具有与管芯顶面121和引线框的第一面111基本齐平的顶面,以及与管芯底面122和引线框第二面112的一个或两个基本齐平的底面。为了基本齐平,高度差不大于50微米。典型地,高度差不大于25微米。
封装100还包括多个导电构件130a-130f,各导电构件130具有电耦合到半导体管芯的导电区124的第一端、以及电耦合到引线框110的引线114的第二端。典型地导电构件130具有的至少一部分置于电绝缘材料体145的至少一部分上。导电构件130a-130f各自可包括在由引线框110、管芯120和电绝缘材料体145共同设置的表面上通过常规沉积方法形成的导电层(例如,金属层)。它们的厚度典型地在2微米至20微米的范围之间。导电构件130a-130f各自还可包括基本平坦导线接合或者基本平坦带状接合,其中一端楔形接合到引线框110的引线114,且另一端楔形接合到管芯120的导电区124,且楔形接合之间的驰隙(slack)最小(例如,所谓的“无高度”环)。这种平坦导线接合的厚度的范围典型地在25微米(~1密耳)至100微米(~4密耳)之间。
封装100还包括置于导电构件130a-130f和由引线框110、管芯120以及电绝缘材料体145提供的表面上的电绝缘材料层160。层160可包括聚酰亚胺、环氧树脂、硅树脂、苯并环丁烯(BCB)等,且可通过印刷(例如,丝网印刷)、通过施加膜、或者通过其它常规方法来布置。绝缘层160保护导电构件130a-130f和管芯120的顶面121,电绝缘这些元件并延缓这些元件的腐蚀。可从在引线114a-114f之上的区域略去层160,其实现彼此堆叠的封装100的实例,其中它们的引线通过焊料体电耦合(如下文所示)。在这种堆叠排列中,层160使半导体管芯相互电绝缘。层160可具有10微米至110微米范围内的厚度。层160的最大值110微米与平坦楔形接合的最大高度110微米相关。
对于该构造而言,制成的封装可具有与管芯厚度基本相同的厚度,由此提供超薄半导体管芯封装。举例而言,在管芯厚度为100微米的情况下,该封装可制成大致110微米至120微米那么薄。举例而言,在管芯厚度为250微米的情况下,该封装可制成大致260微米至300微米那么薄。该超薄封装通过最小化管芯和外部热沉之间的距离来提供极佳的热性能,且通过最小化互连距离和引线距离来提供极佳电特性。此外,引线114a-114f可配置成其外面部分符合产业标准引脚输出。引线114和/或导电构件130还可从管芯(诸如对于小管芯而言)向外扇出以将芯片的互连衬垫重新分布成产业标准图案。所有这些特征使封装100对于便携式装置和需要超薄部件的装置而言是极佳选择。
除以上所述之外,多个实例封装100可在彼此堆叠以便在板区域的给定覆盖区域内提供增多的电路功能性和/或性能。图3是包括互连板310的示例系统300的截面图,该互连板310具有多个电互连衬垫315、置于互连板310顶面上的半导体管芯封装(其第二面112面向板310)、置于封装100之上的第二半导体管芯封装100a、置于第二封装100a之上的第三半导体管芯封装100b。半导体管芯封装100的引线114通过相应导电粘合体305电耦合到相应衬垫315,导电粘合剂可包括焊料、导电聚合物等。系统300还包括也通过粘合体305电耦合到相应衬垫315的电封装304。封装304可包括无源电子部件,或者可包括具有与封装100相同或者不同结构的半导体管芯封装,且可通过置于互连衬底310之中或之上的一条或多条电迹线311电耦合到封装100。封装100可安装成如图3所示使其第二面112面向互连衬底310,或者可安装成使其第一面111面向互连衬底310。在前一情况下,管芯120的背面可通过粘合体305电耦合到衬底310的衬垫315(未示出)以制成电连接或者增强管芯冷却。在后一情况下,当封装100相反取向时,层130的在引线114上的部分优选被移除。然而,因为焊料粘合体305可粘附到引线114的侧面移除不是必要的(虽然这会增大封装的有效覆盖区域)。
封装100a和120b包括与封装100基本相同的构造,且包括相应的半导体管芯120a和120b,它们可具有与管芯120相同的部件和电路或者可具有不同的部件和电路。封装100a和100b的导电构件130可具有与封装100的导电构件130相同的配置和布局或者可具有不同配置和布局。第二封装100a的第二面112可置于第一封装100之上,且在其第二面112上的引线114部分可通过导电粘合体320电耦合到封装100的相应引线114。粘合体320可包括焊料、导电聚合物等。第二封装100a还可具有相反取向,其中其第一面111可置于第一封装100之上,在第一面111上的引线114部分可通过粘合体320电耦合到封装100的相应引线114。在该情况下,优选移除层160的在第二封装110a的引线114之上的部分。
以类似方式,第三封装100b的第二面112可置于第二封装100a的第一面111之上,且在其第二面112上的引线114部分可通过导电粘合体320电耦合到第二封装100a的相应引线114。第三封装100b还可具有相反取向,其中其第一面111可置于第二封装100b之上,在第一面111上的引线114部分可通过粘合体320电耦合到第二封装100a的相应引线114。在该情况下,优选移除层160的在第三封装110b的引线114之上的部分。
封装100、100a和100b可具有相同电路(以及半导体管芯),在这种情况下其相应电路平行地电耦合。诸如通过增大功率处理电路的电流处理能力,平行互连可在封装100的覆盖区域内提供提高的电路性能。作为另一可能性,两个封装可具有相同电路且可具有功率处理器件,而第三封装具有不同电路,诸如用于控制另外两个封装中的功率处理器件的控制电路。该配置可用于提高封装100的覆盖区域内的电路性能以及功能性。作为另一可能性,所有三个封装可具有不同电路。该配置可用于增多封装100的覆盖区域内的电路功能性。为了便于不同封装的堆叠互连,封装的导电构件130的布局可不同于图2所示的布局。作为示例,在图4中示出用于第三封装100b的这种更改布局。封装100和100a还可具有更改布局,其可不同于图4所示的布局。
可在将封装100、100a和100b组装到互连衬底310之前将它们组装在一起,在这种情况下,粘合体320可具有高于粘合体305的回流温度。作为另一方法,封装100可首先组装到衬底310之上,然后将封装100a和100b组装到封装100之上。在该情况下,粘合体320可具有低于粘合体305的回流温度。封装100、100a和100b可分别被焊接,或者可按照组装形式焊接,如图3所示。
如以上所述,半导体封装的引线114和/或导电构件130还可从管芯(诸如对于小管芯而言)向外扇出以将芯片的互连衬垫重新分布为产业标准图案。该扇出由图5中的封装200示出。这种扇出还可用于允许球栅阵列在封装的任一面的使用,如图6所示。
图7-11示出制造封装100、100a和100b的示例性方法。参考图7和8,示例性方法包括构建一组件400,该组件400具有:置于载体膜410上的其有源表面121面向该载体膜410的至少一个半导体管芯120、置成与半导体管芯120相邻的多条引线114、以及半导体管芯120和至少一条引线114之间的至少一个间隙140。图7示出组件400的截面图,而图8示出俯视图。引线114优选在引线框110中设置在一起,且临时由系杆119连接在一起(图8所示)。可通过组装引线框110与载体膜410、且然后将半导体管芯120组装到载体膜之上来构建组件400。典型地,引线框100和载体膜410各自以带状材料层卷的形式提供,其中载体膜410具有施加到材料层一侧的薄粘合层。成卷引线框110和载体膜410可对准并在解开卷时通过常规基于辊的设备结合在一起。对于薄管芯而言,有可能使用带式自动接合(TAB)条,其可以组装形式提供载体膜410和引线框100两者。在该情况下,TAB膜的引线可配置成提供引线114、且通过取放设备用薄粘合涂层将管芯120粘附在载体膜表面上。作为另一方法,有可能组装半导体管芯120与载体膜410,且然后组装引线框110与载体膜410和管芯120。该组装方法要求引线框和载体膜更精确对准。
参考图9,示例性方法还包括将电绝缘材料体置于至少一个间隙140内,以使该主体凝固并粘附到半导体管芯120以及至少一条引线114。该动作可通过将组件400放置在具有上元件和下元件的模制工具440中来容易地实现,其中上元件可具有容纳管芯120和引线110的腔体,而下元件可包括平板。在模制工具440的元件已安置成与组件400接触之前或者之后,绝缘材料体145以液体形式注入到间隙140,且允许凝固(诸如通过冷却、加热、化学反应、和/或暴露于紫外光,这取决于材料特性)。可使用任何已知的模制材料、模制器、以及模制方法。绝缘材料体还可使用任何已知封装印刷方法(类似于丝网印刷)置于间隙140中。
在放置电绝缘材料体145之后,该示例性方法还包括从组件400移除载体膜410,并在管芯120和引线框110的第一面处形成导电构件130,如图10所示。导电构件130可按照多种方式形成。作为第一方式,可将临时电镀掩模丝网印刷到或以其它方式粘附到组件正面,其中电镀掩模具有在构件130位置处的孔径。然后,金属可无电地电镀到组件正面,填充孔径并形成导电构件130。然后可通过常规方法移除电镀掩模。作为另一方式,在没有电镀掩模的情况下金属可以无电地电镀到组件正面。之后,可将蚀刻掩模丝网印刷到导电构件130的位置上,且然后组件可暴露于蚀刻溶液用于移除没有被蚀刻掩模覆盖的电镀材料,从而留下导电构件130。蚀刻掩模之后可移除或者可原位保留。作为又一方式,可将导电粘合材料丝网印刷到导电构件130的位置上,且之后诸如通过加热、暴露于紫外光、和/或化学反应处理来形成构件130。作为另一方式,可在管芯120的导电区124和引线114之间接合高度低的导线接合和/或带状接合。作为一优选而非任何要求,导线接合可用于互连数据和控制信号,且带状接合可用于互连电源线。还可使用形成导电构件130的其它已知方式。
在形成导电构件130之后,该示例性方法包括将电绝缘材料层160置于导电构件130之上和组件400顶面之上,如图11所示。可通过施加具有粘合表面的固体膜、通过喷涂、通过丝网印刷、和/或任何其它已知层沉积处理来放置层160。然后通过沿着系杆19切割,从组件400分离封装100。可使用诸如激光器和/或锯的任何已知切割工具。
图12-14示出制造封装100、100a和100b的另一示例性方法。在该示例性方法中,在组装半导体管芯120和引线框110与载体膜410之前,在组件400’中组装导电构件130与载体膜410,如图12所示。可通过将导电材料层置于载体膜410表面之上来组装导电构件130,诸如通过电镀或者片层叠来布置导电材料层,随后进行图案蚀刻。导电材料可包括铜。还可通过使用取放设备将导电条直接装在载体膜410的胶粘表面上将导电构件130与载体膜410组装。导电条可具有约为25微米的厚度,其对于功率半导体应用是适合的。如图12所示,粘合材料体435可置于导电构件130的暴露表面之上。粘合体435可包括焊料,且可帮助将导电构件130电耦合到管芯120的导电区124和引线框110的引线114。然而,还可使用不需要粘合体的其它接合处理。
如图13所示,示例性方法还包括组装引线框110和管芯120与载体膜410和导电构件130。部件110和120的组装可按照任何顺序发生,其中引线114的部分和管芯120的导电区接触相应粘合材料体435。然后可处理粘合体435以将它们粘附到导电构件130、引线114、以及管芯120的导电部分。当粘合体435包括焊膏时,该处理可包括在其中主体被加热至回流温度且然后被冷却的回流工艺。当粘合体130包括导电聚合物材料时,该处理可包括化学反应、加热至固化温度、和/或紫外光应用(诸如穿过载体膜410)。
如图14所生活,示例性方法还包括将电绝缘材料体145置于至少一个间隙140内,以使该主体凝固并粘附到各半导体管芯120以及至少一条引线114。该动作可通过在具有上元件和下元件的模制工具440中放置组件400’来容易地实现,其中上元件可具有容纳管芯120和引线框110的腔体,而下元件可包括平板。在模制工具440的元件已放置成与组件400’接触之前或者之后,可将绝缘材料体145以液体形式注入到间隙140中,且能够凝固(诸如通过冷却、加热、化学反映、和/或暴露于紫外光,这取决于材料特性)。可使用任何已知模制材料、模制器、以及模制方法。绝缘材料体还可使用任何已知封封印刷方法(已知密封印刷方法)置于间隙140中。
在放置电绝缘材料体145之后,可将最终形态的封装从组件400’分离。在该示例性方法中,可由载体膜410提供绝缘层160。
图15-17示出制造封装100、100a和100b的另一示例性方法。在该示例性方法中,导电构件130和引线框110整体地形成且与载体膜410在基本同一时间组装。如本文中所使用地,术语“整体地形成”意味着导电构件130和引线框110的引线114的至少一些部分由至少一个公共材料体形成。参考图15,诸如铜的导电材料层415置于载体膜410上以提供起始组件400”,其中导电材料层通过诸如膜层叠或者无电电镀和电解电镀的组合布置。参考图16,对导电层415进行图案化以形成导电构件130、引线框110和引线114。可使用两个图案蚀刻步骤:一个步骤用于限定引线114,且另一步骤用于限定导电构件130。当通过电镀布置导电层415时,电镀动作和图案化动作可交织。举例而言,可执行无电电镀处理以形成层,将从该层形成导电构件130,以及引线114和引线框110的初始厚度;然后,图案掩模可置于无电镀层之上以限定将要形成引线114和引线框110的位置。然后可穿过图案掩模执行电解电镀处理以形成引线114和引线框110的残余厚度。可移除该掩模,并可将蚀刻掩模置于无电镀层上以在无电镀层中限定导电构件130,以及引线114和引线框110的初始厚度的图案。掩模化结构然后可被蚀刻以从无电镀层全面限定导电构件130,引线114和引线框110的初始厚度,由此从公共材料体(例如,无电镀层)整体地形成导电构件130,引线114和引线框110的初始厚度。
如图17所示,该示例性方法还包括将粘合体435置于部分导电构件130上,且组装管芯120与载体膜410、导电构件130、引线框110,其中管芯120的导电区124接触相应粘合体435。然后可处理粘合体435以将它们粘附到导电构件130、管芯120的导电部分,如上所述。
该示例性方法还包括将电绝缘材料体145置于至少一个间隙140内,以使该电绝缘材料体凝固并粘附到各半导体管芯120以及至少一条引线114。可通过如图14所示在模制工具440中安置组件400”,并在模制工具440的元件已安置成与组件400”接触之前或之后以液体形式将电绝缘材料注入到间隙140,且允许材料凝固(诸如通过冷却、加热、化学反应、和/或暴露于紫外光,这取决于材料特性)来容易地实现该动作。可使用任何已知模制材料、模制器、以及模制方法。绝缘材料体还可使用任何已知封装印刷方法(类似于丝网印刷)置于间隙140中。图18中示出作为结果的组件400”。
在布置电绝缘材料体145之后,可将最终形态的封装从组件400”分离。在该示例性方法中,可由载体膜410提供绝缘层160。
因此,要理解可按照各种时间顺序将载体膜410、引线框110、半导体管芯120和导电构件130组装在一起,包括一些部件的基本同步组装。相应地,要理解本文中公开和要求保护的任何方法的动作执行不预示另一动作的完成,可相对于另一动作以任何时间序列(例如,时间顺序)执行动作,包括同步执行和各种动作的交替执行。(举例而言,当以混合方式执行部分的两个或更多动作时可发生交替式执行。)因此可以理解,虽然本申请的方法权利要求阐述了相应的各组动作,但是方法权利要求不限于在权利要求语言中所列出的动作的顺序,而代替地涵盖所有以上可能的顺序,包括同步和交替地执行动作以及其他以上未明确描述的可能的顺序,除非权利要求语言另有所指(诸如通过明确陈述一个动作继续或接着另一动作)。
上述的半导体管芯封装可用在包括其上安装有封装的电路板的电气组件中。它们还可被用在诸如电话、计算机等之类的系统中。可理解在引线框110的各孔径113内可组装有一个以上的半导体管芯以便提供更多功能性和电路密度。
上述示例中的一些涉及诸如MLP型封装的其中引线的线端不延伸超过模制材料的侧面边缘的“无引线”型封装。本发明的各实施例还可包括其中引线延伸到模制材料的侧面之外的有引线封装。
对“一”、“一个”和“该”的叙述旨在表示一个或多个,除非具体指明为相反情况。
在此已采用的术语和表达是用作描述的而非限制性的术语,并且使用这些术语和表达并不旨在排除所示和所描述特征的等效特征,可认为各种修改有可能在要求保护的本发明范围内。
此外,本发明一个或多个实施例的一个或多个特征可与本发明其他实施例的一个或多个特征组合,而不背离本发明的范围。
虽然已关于所例示的各实施例特别描述了本发明,但是将理解可基于本公开内容作各种变更、修改、改变以及等效安排,并且旨在落于本发明及所附权利要求书的范围之内。

Claims (25)

1.一种半导体管芯封装,包括:
引线框,其具有第一面、第二面、置于所述引线框的第一面和第二面之间的孔径、以及置成与所述孔径相邻的多条引线;
半导体管芯,其具有顶面、底面、在所述顶面和底面之间的至少一个侧面、以及置于所述半导体管芯顶面上的多个导电区,所述半导体管芯在其顶面与所述引线框的第一面基本齐平的情况下置于所述引线框的孔径中,为了基本齐平,所述半导体管芯的所述顶面和所述引线框的第一面之间的高度差不大于50微米;
至少一个间隙,其在所述半导体管芯的至少一个侧面和所述引线框的至少一条引线之间;
电绝缘材料体,其置于所述至少一个间隙的至少一部分中;以及
多个导电构件,各导电构件具有电耦合到所述半导体管芯的导电区的第一端以及电耦合到所述引线框的引线的第二端,至少一个导电构件具有的一部分置于电绝缘材料体的至少一部分上。
2.如权利要求1所述的半导体封装,其特征在于,所述电绝缘材料体机械地附连到所述半导体管芯的至少一个侧面和所述引线框的至少一条引线。
3.如权利要求1所述的半导体封装,其特征在于,所述半导体管芯的所述顶面包括有源表面且置成与所述引线框的第一面基本齐平,为了基本齐平,所述半导体管芯的所述顶面和所述引线框的第一面之间的高度差不大于50微米。
4.如权利要求3所述的半导体封装,其特征在于,所述半导体管芯的所述底面与所述引线框的第二面基本齐平或者低于所述引线框的第二面的水平面,为了基本齐平,所述半导体管芯的所述底面和所述引线框的第二面之间的高度差不大于50微米。
5.如权利要求3所述的半导体封装,其特征在于,所述半导体管芯的所述底面高出所述引线框的第二面不超过50微米。
6.如权利要求1所述的半导体封装,其特征在于,所述半导体管芯的顶面和所述引线框的第一面的所述高度差不大于25微米。
7.如权利要求1所述的半导体封装,其特征在于,所述电绝缘材料体包括以下的一个或多个:环氧树脂、硅树脂、聚酰亚胺。
8.如权利要求3所述的半导体封装,其特征在于,所述电绝缘材料体具有与所述半导体管芯的顶面基本齐平的顶面,为了基本齐平,所述电绝缘体和所述半导体管芯的所述顶面之间的高度差不大于50微米。
9.如权利要求1所述的半导体封装,其特征在于,至少一个导电构件包括导电材料层。
10.如权利要求9所述的半导体封装,其特征在于,所述导电材料层具有不大于20微米的厚度。
11.如权利要求1所述的半导体封装,其特征在于,至少一个导电构件包括导线接合。
12.如权利要求11所述的半导体封装,其特征在于,所述导线接合包括在各端处具有楔形接合的两个端。
13.如权利要求1所述的半导体封装,其特征在于,还包括置于多个导电构件上的电绝缘材料层。
14.一种封装堆叠,包括如权利要求1所述的半导体封装和部件封装,所述部件封装包括:
第二引线框,其具有第一面、第二面、置于所述第二引线框的第一面和第二面之间的孔径、以及置成与所述第二引线框的孔径相邻的多条第二引线;
电气部件,其具有顶面、底面、在所述顶面和底面之间的至少一个侧面、置于所述电气部件顶面上的多个导电区,所述电气部件在其顶面与所述第二引线框的第一面基本齐平的情况下置于所述第二引线框的孔径中,为了基本齐平,所述电气部件的所述顶面与所述第二引线框的第一面之间的高度差不大于50微米;
至少一个辅助间隙,其在所述电气部件的至少一个侧面和所述第二引线框的至少一条引线之间;
第二电绝缘材料体,其置于所述至少一个辅助间隙的至少一部分中;以及
多个第二导电构件,每个第二导电构件具有电耦合到所述电气部件的导电区的第一端和电耦合到所述第二引线框的引线的第二端,至少一个导电构件具有的一部分置于所述第二电绝缘材料体的至少一部分上;以及
其中,半导体封装和所述部件封装彼此堆叠,且其中所述部件封装的多条引线电耦合到所述半导体封装的相应多条引线。
15.如权利要求14所述的封装堆叠,其特征在于,所述电气部件包括半导体管芯;以及
其中所述半导体封装的导电构件具有第一布局,其中所述部件封装的导电构件具有第二布局,且其中所述第一和第二布局基本相同。
16.一种制造具有半导体管芯的封装的方法,所述半导体管芯具有正面和背面,正面具有多个导电区,所述方法包括:
构建组件,所述组件具有置于载体膜上的其正面面向所述载体膜的至少一个半导体管芯、置成与至少一个半导体管芯相邻的多条引线、以及所述半导体管芯和至少一条引线之间的至少一个间隙;以及
将电绝缘材料体置于至少一个间隙内,以使所述电绝缘材料体凝固并粘附到至少一个半导体管芯和至少一条引线。
17.如权利要求16所述的方法,其特征在于,还包括:
从所述载体膜分离所述半导体管芯和所述多条引线;以及
形成至少一个导电构件,所述导电构件具有电耦合到所述半导体管芯的导电区的第一端以及电耦合到引线的第二端。
18.如权利要求17所述的方法,其特征在于,形成至少一个导电构件包括电镀导电材料。
19.如权利要求17所述的方法,其特征在于,形成至少一个导电构件包括印刷导电材料。
20.如权利要求17所述的方法,其特征在于,形成至少一个导电构件包括接合导线接合或者带状接合的至少一个。
21.如权利要求16所述的方法,其特征在于,构建所述组件包括将所述半导体芯片置于载体膜上,所述载体膜具有置于其上的引线。
22.如权利要求21所述的方法,其特征在于,所述载体膜包括带式自动接合膜。
23.如权利要求16所述的方法,其特征在于,构建所述组件包括组装多个导电构件与所述组件,以使各导电构件电耦合到至少一个半导体管芯的导电区和引线。
24.如权利要求16所述的方法,其特征在于,构建所述组件包括在所述载体膜上形成多个导电构件,且然后将引线和所述至少一个半导体管芯组装到所述导电构件和所述载体膜上,以使至少一个导电构件具有电耦合到所述半导体管芯的导电区的第一端和电耦合到引线的第二端。
25.如权利要求16所述的方法,其特征在于,构建所述组件包括在所述载体膜上整体地形成多条引线和多个导电构件,以使各导电构件具有第一端和第二端,其中第一端电耦合到至少一条引线;以及
然后将所述至少一个半导体管芯组装到多个所述半导体构件上,以使至少一个导电构件具有电耦合到所述半导体管芯的导电区的第二端。
CN200980134103.4A 2008-08-28 2009-08-04 模制超薄半导体管芯封装和使用该封装的系统及其制造方法 Expired - Fee Related CN102132403B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/200,819 US7855439B2 (en) 2008-08-28 2008-08-28 Molded ultra thin semiconductor die packages, systems using the same, and methods of making the same
US12/200,819 2008-08-28
PCT/US2009/052707 WO2010025012A2 (en) 2008-08-28 2009-08-04 Molded ultra thin semiconductor die packages, systems using the same, and methods of making the same

Publications (2)

Publication Number Publication Date
CN102132403A CN102132403A (zh) 2011-07-20
CN102132403B true CN102132403B (zh) 2014-03-12

Family

ID=41722207

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980134103.4A Expired - Fee Related CN102132403B (zh) 2008-08-28 2009-08-04 模制超薄半导体管芯封装和使用该封装的系统及其制造方法

Country Status (5)

Country Link
US (2) US7855439B2 (zh)
KR (1) KR101629259B1 (zh)
CN (1) CN102132403B (zh)
TW (1) TWI483356B (zh)
WO (1) WO2010025012A2 (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7855439B2 (en) * 2008-08-28 2010-12-21 Fairchild Semiconductor Corporation Molded ultra thin semiconductor die packages, systems using the same, and methods of making the same
US8368187B2 (en) 2010-02-03 2013-02-05 Stats Chippac, Ltd. Semiconductor device and method of forming air gap adjacent to stress sensitive region of the die
FR2963478B1 (fr) 2010-07-27 2013-06-28 St Microelectronics Grenoble 2 Dispositif semi-conducteur comprenant un composant passif de condensateurs et procede pour sa fabrication.
JP5822468B2 (ja) 2011-01-11 2015-11-24 ローム株式会社 半導体装置
WO2012144595A1 (ja) 2011-04-20 2012-10-26 株式会社日本触媒 ポリアクリル酸(塩)系吸水性樹脂の製造方法および製造装置
US8247269B1 (en) 2011-06-29 2012-08-21 Fairchild Semiconductor Corporation Wafer level embedded and stacked die power system-in-package packages
EP2613349B1 (en) * 2012-01-05 2019-11-20 Nxp B.V. Semiconductor package with improved thermal properties
US8956918B2 (en) * 2012-12-20 2015-02-17 Infineon Technologies Ag Method of manufacturing a chip arrangement comprising disposing a metal structure over a carrier
CN103151317B (zh) * 2013-02-21 2015-12-23 日月光半导体制造股份有限公司 半导体封装结构及其制造方法
CN109698181B (zh) * 2015-05-15 2023-08-18 无锡超钰微电子有限公司 芯片封装结构
DE102018118251B4 (de) 2018-07-27 2020-02-06 Infineon Technologies Ag Chipanordnung und Verfahren zur Herstellung derselben
JP7306294B2 (ja) * 2020-02-19 2023-07-11 株式会社デンソー 半導体モジュール
CN111883442A (zh) * 2020-08-31 2020-11-03 矽磐微电子(重庆)有限公司 半导体封装方法及半导体封装结构

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101252108A (zh) * 2007-02-21 2008-08-27 育霈科技股份有限公司 具有晶粒容纳通孔与连接通孔的半导体元件封装与其方法

Family Cites Families (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4736236A (en) * 1984-03-08 1988-04-05 Olin Corporation Tape bonding material and structure for electronic circuit fabrication
US5198888A (en) * 1987-12-28 1993-03-30 Hitachi, Ltd. Semiconductor stacked device
US5309322A (en) * 1992-10-13 1994-05-03 Motorola, Inc. Leadframe strip for semiconductor packages and method
US5468999A (en) * 1994-05-26 1995-11-21 Motorola, Inc. Liquid encapsulated ball grid array semiconductor device with fine pitch wire bonding
US5696666A (en) * 1995-10-11 1997-12-09 Motorola, Inc. Low profile exposed die chip carrier package
US5729049A (en) * 1996-03-19 1998-03-17 Micron Technology, Inc. Tape under frame for conventional-type IC package assembly
US6423623B1 (en) * 1998-06-09 2002-07-23 Fairchild Semiconductor Corporation Low Resistance package for semiconductor devices
US6133634A (en) * 1998-08-05 2000-10-17 Fairchild Semiconductor Corporation High performance flip chip package
US6982478B2 (en) * 1999-03-26 2006-01-03 Oki Electric Industry Co., Ltd. Semiconductor device and method of fabricating the same
KR100344927B1 (ko) * 1999-09-27 2002-07-19 삼성전자 주식회사 적층 패키지 및 그의 제조 방법
JP2001118947A (ja) * 1999-10-19 2001-04-27 Nec Corp 半導体装置用パッケージの製造方法及び半導体装置
JP2001339011A (ja) * 2000-03-24 2001-12-07 Shinko Electric Ind Co Ltd 半導体装置およびその製造方法
JP2001332580A (ja) * 2000-05-23 2001-11-30 Nec Corp 半導体装置及びその製造方法
JP3916854B2 (ja) * 2000-06-28 2007-05-23 シャープ株式会社 配線基板、半導体装置およびパッケージスタック半導体装置
US6576494B1 (en) * 2000-06-28 2003-06-10 Micron Technology, Inc. Recessed encapsulated microelectronic devices and methods for formation
US6661082B1 (en) * 2000-07-19 2003-12-09 Fairchild Semiconductor Corporation Flip chip substrate design
US6734534B1 (en) * 2000-08-16 2004-05-11 Intel Corporation Microelectronic substrate with integrated devices
US6459148B1 (en) * 2000-11-13 2002-10-01 Walsin Advanced Electronics Ltd QFN semiconductor package
US6645791B2 (en) * 2001-04-23 2003-11-11 Fairchild Semiconductor Semiconductor die package including carrier with mask
US6893901B2 (en) * 2001-05-14 2005-05-17 Fairchild Semiconductor Corporation Carrier with metal bumps for semiconductor die packages
JP2002343899A (ja) * 2001-05-17 2002-11-29 Sharp Corp 半導体パッケージ用基板、半導体パッケージ
US6486545B1 (en) * 2001-07-26 2002-11-26 Amkor Technology, Inc. Pre-drilled ball grid array package
SG111919A1 (en) * 2001-08-29 2005-06-29 Micron Technology Inc Packaged microelectronic devices and methods of forming same
US20030143776A1 (en) * 2002-01-31 2003-07-31 Serafin Pedron Method of manufacturing an encapsulated integrated circuit package
US6744254B2 (en) * 2002-03-08 2004-06-01 Eaton Corporation Breaker failure annunciator system
US7122884B2 (en) * 2002-04-16 2006-10-17 Fairchild Semiconductor Corporation Robust leaded molded packages and methods for forming the same
US7061077B2 (en) * 2002-08-30 2006-06-13 Fairchild Semiconductor Corporation Substrate based unmolded package including lead frame structure and semiconductor die
US6777800B2 (en) * 2002-09-30 2004-08-17 Fairchild Semiconductor Corporation Semiconductor die package including drain clip
US6723585B1 (en) * 2002-10-31 2004-04-20 National Semiconductor Corporation Leadless package
US20040124508A1 (en) * 2002-11-27 2004-07-01 United Test And Assembly Test Center Ltd. High performance chip scale leadframe package and method of manufacturing the package
US6781242B1 (en) * 2002-12-02 2004-08-24 Asat, Ltd. Thin ball grid array package
US7217594B2 (en) * 2003-02-11 2007-05-15 Fairchild Semiconductor Corporation Alternative flip chip in leaded molded package design and method for manufacture
US8574961B2 (en) * 2003-04-29 2013-11-05 Semiconductor Components Industries, Llc Method of marking a low profile packaged semiconductor device
DE10320646A1 (de) * 2003-05-07 2004-09-16 Infineon Technologies Ag Elektronisches Bauteil, sowie Systemträger und Nutzen zur Herstellung desselben
KR100585100B1 (ko) * 2003-08-23 2006-05-30 삼성전자주식회사 적층 가능한 리드 프레임을 갖는 얇은 반도체 패키지 및그 제조방법
US6977431B1 (en) * 2003-11-05 2005-12-20 Amkor Technology, Inc. Stackable semiconductor package and manufacturing method thereof
US7315077B2 (en) * 2003-11-13 2008-01-01 Fairchild Korea Semiconductor, Ltd. Molded leadless package having a partially exposed lead frame pad
US7411289B1 (en) * 2004-06-14 2008-08-12 Asat Ltd. Integrated circuit package with partially exposed contact pads and process for fabricating the same
TWI241007B (en) * 2004-09-09 2005-10-01 Phoenix Prec Technology Corp Semiconductor device embedded structure and method for fabricating the same
US7402462B2 (en) * 2005-07-12 2008-07-22 Fairchild Semiconductor Corporation Folded frame carrier for MOSFET BGA
JP5113346B2 (ja) * 2006-05-22 2013-01-09 日立電線株式会社 電子装置用基板およびその製造方法、ならびに電子装置およびその製造方法
KR100827667B1 (ko) * 2007-01-16 2008-05-07 삼성전자주식회사 기판 내에 반도체 칩을 갖는 반도체 패키지 및 이를제조하는 방법
SG149725A1 (en) * 2007-07-24 2009-02-27 Micron Technology Inc Thin semiconductor die packages and associated systems and methods
KR100885924B1 (ko) * 2007-08-10 2009-02-26 삼성전자주식회사 묻혀진 도전성 포스트를 포함하는 반도체 패키지 및 그제조방법
TW200910541A (en) * 2007-08-21 2009-03-01 Advanced Semiconductor Eng Package structure and manufacturing method thereof
US7790576B2 (en) * 2007-11-29 2010-09-07 Stats Chippac, Ltd. Semiconductor device and method of forming through hole vias in die extension region around periphery of die
KR101472900B1 (ko) * 2007-12-06 2014-12-15 페어차일드코리아반도체 주식회사 몰디드 리드리스 패키지 및 그 제조방법
US9059074B2 (en) * 2008-03-26 2015-06-16 Stats Chippac Ltd. Integrated circuit package system with planar interconnect
SG142321A1 (en) * 2008-04-24 2009-11-26 Micron Technology Inc Pre-encapsulated cavity interposer
US7855439B2 (en) * 2008-08-28 2010-12-21 Fairchild Semiconductor Corporation Molded ultra thin semiconductor die packages, systems using the same, and methods of making the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101252108A (zh) * 2007-02-21 2008-08-27 育霈科技股份有限公司 具有晶粒容纳通孔与连接通孔的半导体元件封装与其方法

Also Published As

Publication number Publication date
TWI483356B (zh) 2015-05-01
KR101629259B1 (ko) 2016-06-21
US7855439B2 (en) 2010-12-21
TW201013869A (en) 2010-04-01
KR20110045079A (ko) 2011-05-03
US8168473B2 (en) 2012-05-01
CN102132403A (zh) 2011-07-20
WO2010025012A3 (en) 2010-05-20
US20100052119A1 (en) 2010-03-04
US20110059582A1 (en) 2011-03-10
WO2010025012A2 (en) 2010-03-04

Similar Documents

Publication Publication Date Title
CN102132403B (zh) 模制超薄半导体管芯封装和使用该封装的系统及其制造方法
CN103109367B (zh) 可堆叠的模塑微电子封装
US10490478B2 (en) Chip packaging and composite system board
US7767497B2 (en) Microelectronic package element and method of fabricating thereof
CN101416311B (zh) 无夹片和无引线半导体管芯封装及其制造方法
CN103715166A (zh) 用于部件封装件的装置和方法
CN104576421A (zh) 半导体器件和用于制造半导体器件的方法
TW201041106A (en) Substrate having single patterned metal foil, and package applied with the same, and methods of manufacturing the substrate and package
CN103946976A (zh) 具有翻转式球接合表面的双层级引线框架及装置封装
CN104425470A (zh) 半导体模块及其通过扩展嵌入技术的制造方法
CN101432868A (zh) 用于使用牺牲金属基础的封装类型的三维封装方案
US8421204B2 (en) Embedded semiconductor power modules and packages
CN114388375A (zh) 形成芯片封装体的方法和芯片封装体
CN110034078A (zh) 用于半导体器件的封装内嵌结构和制造方法
CN211125635U (zh) 半导体设备和电子设备
KR100831481B1 (ko) 반도체 장치와 그것을 이용한 반도체 패키지 및 회로 장치
CN108172561B (zh) 承载基板与其封装结构,及半导体封装元件的制作方法
US10528104B2 (en) System and methods for substrates
TW201036113A (en) Substrateless chip package and fabricating method
CN212695146U (zh) 芯片封装基板和芯片封装结构
TW201426958A (zh) 堆疊式封裝件與其製造方法
CN108305836B (zh) 封装基板及其制法
CN114975235A (zh) 半导体封装结构及导电tiv通孔的制备方法
CN101740424B (zh) 芯片封装结构的制程
CN115332215A (zh) 一种用于芯片封装的中介层及制作方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20140312

Termination date: 20210804