CN103163105A - Mass cleanliness detection method - Google Patents
Mass cleanliness detection method Download PDFInfo
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- CN103163105A CN103163105A CN2013100394140A CN201310039414A CN103163105A CN 103163105 A CN103163105 A CN 103163105A CN 2013100394140 A CN2013100394140 A CN 2013100394140A CN 201310039414 A CN201310039414 A CN 201310039414A CN 103163105 A CN103163105 A CN 103163105A
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- white light
- plain piece
- cleanliness
- testing sample
- mass
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Abstract
The invention relates to a mass cleanliness detection method. Simple water vapor is used and surface cleanliness detection of a single-cast sapphire plain piece substrate can be carried out. According to the method, a plain piece is placed on certain height, and a white light source is placed above the plain piece. A device capable of generating deion water vapor is placed in front of the plain piece. Water vapor given out from the device is cooled on the surface of the plain piece and forms a layer of thin water mist, at the moment, with the help of the light source in front of the plain piece, the surface or a colorful grain, or a virtual image of the white light source can be seen on the side face of the plain piece, and the two conditions can explain the cleanliness condition of the surface of the plain piece. The mass cleanliness detection method is low in cost, convenient to operate, and suitable for detection of the cleanliness of a mass sapphire plain piece.
Description
Technical field
The present invention relates to a kind of field of semiconductor-related technology that belongs to, relate to a kind of single detection method of throwing sapphire plain film substrate surface cleanliness factor.
Background technology
Now, along with new forms of energy implementations such as the development of LED technology and energy-saving and emission-reduction, whole LED industrial chain has obtained the growth of advancing by leaps and bounds.LED extension factory installation amount is riseing always in recent years, and as the epitaxially grown important substrate sapphire of LED chip at present, its demand is also in steady increase.Sapphire manufacturer in global range has all in succession carried out some and has expanded production, especially the domestic enterprise that many Sapphire Substrate processing occurred, out need afterwards to clean up and package just to sell the client yet sapphire is processed, also cleaning this section operation exactly, cleaning the whether clean detection of back substrate and could not find the way of simple economy all the time.Sapphire Substrate is essential material in the LED industrial chain, and the effect of the patterned sapphire substrate technology that especially adopts now aspect LED raising brightness also impels the Sapphire Substrate surface cleanliness to be detected as in order to produce the necessary operation on line further.Patterned sapphire substrate is take the plain film sapphire as the basis, by photoetching, be etched in the pattern that its surface forms one deck rule, in order to enhance productivity, reduce production costs, must guarantee every sapphire plain film surface cleanliness, therefore can carry out the mass cleanliness factor to the sapphire plain film before processing and detect, guaranteeing to detect accurately, simply, efficiently becomes the necessary links that reduces costs in present patterned sapphire substrate processing.
Summary of the invention
The technical problem to be solved in the present invention is: propose a kind of mass cleanliness factor detection method, the method cost is low, and is easy to operate, is fit to the check of mass sapphire plain film cleanliness factor.
The technical solution adopted in the present invention is: a kind of mass cleanliness factor detects the method, for detection of the Sapphire Substrate surface cleanliness, it is characterized in that comprising the following steps:
1) testing sample is placed in certain altitude, oblique upper is placed a white light, and the generating means that can produce deionized water steam is placed in the place ahead;
2) energising treats that the deionized water steam raising plant is heated to boiling and can sees that obvious water vapour emerges, and the sample of required test is placed in film magazine as requested, opens white light;
3) shower nozzle of hand-held deionized water steam raising plant moves to the testing sample front with it, steam is sprayed onto the testing sample surface, meet the cold moisture film that can form thin layer when water vapour touches sapphire plain film surface, can clearly see by the white light irradiation reflected image that testing sample occurs;
4) if the testing sample surface state unanimously can form uniform water film, can unifiedly form reflected light after irradiation is come; If there is grease in opposite surface, perhaps other does not clean up spot, and the plain film surface can locally form moisture film, and dirty part can resolve into seven-colour-light with white light under white light thus, sees seven lathe work roads; Or the fluorescent tube virtual image.
The invention has the beneficial effects as follows: utilize simple light to go out sapphire plain film surface cleanliness testing scheme in Propagation performance and film formation Mechanism Design in method; The phenomenon that obtains in method is obvious, and is easy to distinguish, and easy to understand can be applied in many association areas.
Embodiment
The present invention is further detailed explanation in conjunction with the embodiments now.
Embodiment 1
In this example, the water vapour generation device is that the device of outsourcing pressing converts, and white light source is common white light desk lamp.At first the water vapour device is contained certain deionized water according to capacity requirement, connect power supply and heat, treat that the device shower nozzle can see obviously that water vapour is emerged and can carry out dependence test; Then sample to be tested is taken out with plastic tweezer, mobile single sapphire smooth surface of throwing emits outgoing direction near water vapour slightly, removes at random sample and observes to white light, and operation, test sample to be tested one by one under water vapour successively.Can see at last two kinds of surface conditions: a kind of lines that occurs seven coloured silks at sample surfaces, the another kind of virtual image that occurs desk lamp tube at sample surfaces is carried out the relative photo carving technology with sample, finds that degumming phenomenon appears in sample; Therefore can judge that the sample surfaces cleanliness factor on seven lathe work roads appears in the surface not good enough, be not suitable for follow-up the demanding production line of cleanliness factor being used.
Embodiment 2
The flow process of this example will be carried out according to example 1, and test process is identical with example 1, and difference is will adopt in this example the method for introducing in the present invention to carry out batch testing.Before carry out this example, still needing needs water vapour device energising heating the sample of all tests is positioned in the open type film magazine in addition, and the sample shiny surface outwardly; After water vapour begins to come up from device, shower nozzle is moved on to testing sample top, carry out large tracts of land water spray steam operation, just can clearly see the surface state of in film magazine all samples by the white light source that is placed on oblique upper this moment, and record result and get final product.Method with introduction of the present invention in example is applied to can save detection time in actual batch production, in time judges the surface appearance of this batch sample.
Just the specific embodiment of the present invention of describing in above instructions, various not illustrating is construed as limiting flesh and blood of the present invention, the person of an ordinary skill in the technical field after having read instructions can to before described embodiment make an amendment or be out of shape, and do not deviate from essence of an invention and scope.
Claims (1)
1. a mass cleanliness factor detects the method, for detection of the Sapphire Substrate surface cleanliness, it is characterized in that comprising the following steps:
1) testing sample is placed in certain altitude, oblique upper is placed a white light, and the generating means that can produce deionized water steam is placed in the place ahead;
2) energising treats that the deionized water steam raising plant is heated to boiling and can sees that obvious water vapour emerges, and the sample of required test is placed in film magazine as requested, opens white light;
3) shower nozzle of hand-held deionized water steam raising plant moves to the testing sample front with it, steam is sprayed onto the testing sample surface, meet the cold moisture film that can form thin layer when water vapour touches sapphire plain film surface, can clearly see by the white light irradiation reflected image that testing sample occurs;
4) if the testing sample surface state unanimously can form uniform water film, can unifiedly form reflected light after irradiation is come; If there is grease in opposite surface, perhaps other does not clean up spot, and the plain film surface can locally form moisture film, and dirty part can resolve into seven-colour-light with white light under white light thus, sees seven lathe work roads; Or the fluorescent tube virtual image.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201310039414.0A CN103163105B (en) | 2013-01-31 | 2013-01-31 | Mass cleanliness detection method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201310039414.0A CN103163105B (en) | 2013-01-31 | 2013-01-31 | Mass cleanliness detection method |
Publications (2)
Publication Number | Publication Date |
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CN103163105A true CN103163105A (en) | 2013-06-19 |
CN103163105B CN103163105B (en) | 2015-07-01 |
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Family Applications (1)
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CN201310039414.0A Expired - Fee Related CN103163105B (en) | 2013-01-31 | 2013-01-31 | Mass cleanliness detection method |
Country Status (1)
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5386121A (en) * | 1993-12-23 | 1995-01-31 | International Business Machines Corporation | In situ, non-destructive CVD surface monitor |
CN101548174A (en) * | 2007-02-28 | 2009-09-30 | 丰田自动车株式会社 | Device and method for evaluating cleanliness of a surface |
-
2013
- 2013-01-31 CN CN201310039414.0A patent/CN103163105B/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5386121A (en) * | 1993-12-23 | 1995-01-31 | International Business Machines Corporation | In situ, non-destructive CVD surface monitor |
CN101548174A (en) * | 2007-02-28 | 2009-09-30 | 丰田自动车株式会社 | Device and method for evaluating cleanliness of a surface |
Non-Patent Citations (6)
Title |
---|
史伟 等: "图像处理在物体表面洁净度检测中的应用", 《实用测试技术》 * |
周海 等: "蓝宝石晶片质量检测体系研究", 《应用科技》 * |
周海: "蓝宝石晶片表面净化技术研究", 《电子机械工程》 * |
李伟 等: "接触角法在测定固体表面洁净度方面的应用", 《日用化学工业》 * |
王吉翠 等: "蓝宝石晶片加工表面质量检测方法综述", 《超硬材料工程》 * |
王承遇 等: "《玻璃表面处理技术》", 31 July 2004, 化学工业出版社 * |
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CN103163105B (en) | 2015-07-01 |
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