CN103846788A - Polishing machine with improved polished piece adsorption mode - Google Patents
Polishing machine with improved polished piece adsorption mode Download PDFInfo
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- CN103846788A CN103846788A CN201410080721.8A CN201410080721A CN103846788A CN 103846788 A CN103846788 A CN 103846788A CN 201410080721 A CN201410080721 A CN 201410080721A CN 103846788 A CN103846788 A CN 103846788A
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- absorption
- gas circuit
- polishing machine
- central shaft
- adsorption tank
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/28—Work carriers for double side lapping of plane surfaces
Abstract
The invention discloses a polishing machine with an improved polished piece adsorption mode. The polishing machine comprises a machine frame, an adsorption upper disk, an adsorption lower disk, an upper disk drive system, a lower disk drive system and a vacuumizing system, wherein the upper/lower disk drive system comprises a central shaft; the bottom of the central shaft is connected with the adsorption upper/lower disk; a closed connecting air channel is formed in the central shaft; a rotary air channel connector is arranged at the position, close to the bottom, of the central shaft; the rotary air channel connector is communicated to the closed connecting air channel; air channel connecting openings are formed in the outer end of the rotary air channel connector; air channel through holes are formed in the adsorption upper/lower disk; the air channel connecting openings are communicated with the air channel through holes formed in the adsorption upper/lower disk through connecting air pipes; a cushion pad which is closely adhered to the lower surface of the adsorption upper/lower disk is arranged below/above the adsorption upper/lower disk; a through-type adsorption groove is formed in the surface of each cushion pad; the lower/upper end of each air channel through hole is flush with the corresponding adsorption groove. The polishing machine with the improved polished piece adsorption mode is simple in structure, low in cost, low in investment and convenient to operate, and facilities later-period automatic polishing.
Description
Technical field
The present invention relates to a kind of polishing machine, relate in particular to a kind of polishing machine that improves polished part suction type.
Background technology
The glass that at present polishing machine is processed is to be all attached to the upper dish of polishing machine or the plane of lower wall is processed, and is adsorbed in the plane of upper and lower dish carries out grinding and polishing by the absorption layer of polyester synthetic material.The upper and lower dish of existing polishing machine mostly is plane non-porous structure, and do not there is Incision Machine's, these polishing machines are mainly that the laminating that relies on the absorption layer of special substance to complete polished glass is fixed, the absorption layer back side is bonding with upper and lower dish by glue, binding agent etc., absorption layer front is made up of many fluted body apertures that are of close texture, and after pressing, Bas Discharged in aperture is had to Incision Machine's.After use after a while, polishing powder can be penetrated in the aperture in absorption layer front gradually, makes original aperture not have Incision Machine's and can not use, and must frequently change.Work every day and to calculate for eight hours by polishing machine, the absorption layer of polyester synthetic material must be changed once every several days, caused thus the absorption layer of polyester synthetic material always high as the cost of a kind of polishing consumptive material.
In addition, polishing machine often processes a sheet glass and need to peel off to remove and be adsorbed on absorption layer on glass, can only lean on artificial little by little blow or method of infiltration removes according to existing technique, quite wastes time and energy, and affects the automaticity of whole polishing machine.In prior art, also have to disclose the upper dish of polishing machine is carried out to the mode that vacuum suction is connected with a ceramic displacement disc, but the setting of ceramic displacement disc has not only increased equipment cost, and the quality of ceramic displacement disc is heavier, the required power consumption of polishing increases greatly, polished wafer is placed on ceramic displacement disc not only wastes time and energy, and this rigid contact easily causes wafer damage in the time of polishing, quality of finish also cannot guarantee; In prior art, also there is the situation of the vacuum cup absorption workpiece of direct employing perforate, but this vacuum suction mode often air-tightness is not good, cause the required adsorptive pressure of vacuum suction excessive, this not only easily causes the distortion of workpiece and affects polishing precision, and equally easily cause the damage of workpiece, and if the impurity such as polishing powder enter into the pore of offering on vacuum cup, not only cleaning difficulty, when serious, need to change whole vacuum cup, cost increases greatly.
Summary of the invention
The technical problem to be solved in the present invention is to overcome the deficiencies in the prior art, provide a kind of simple in structure, cost is low, it is little to invest, easy to operate, the polishing machine that is conducive to the improvement polished part suction type of realizing later stage automation polishing.
For solving the problems of the technologies described above, the technical scheme that the present invention proposes is a kind of polishing machine (updraft type) that improves polished part suction type, comprise frame, dish in absorption, absorption lower wall, upper disc driving system, lower disc driving system and pumped vacuum systems, upper disc driving system comprises a central shaft, the bottom of central shaft is connected with the upper dish of absorption, in described central shaft, offer closed connection gas circuit, central shaft is provided with a rotary pneumatic pipeline connector near bottom position, the inner of rotary pneumatic pipeline connector is connected with described pumped vacuum systems by closed connection gas circuit, the outer end of rotary pneumatic pipeline connector is provided with multiple air-path interfaces, in described absorption, dish offers multiple gas circuit through holes, each air-path interface is communicated with the upper end of coiling the gas circuit through hole of offering in absorption by connecting tracheae, in described absorption, dish below is provided with the cushion pad of being close to its lower surface, and the surface of described cushion pad offers pass-through type adsorption tank (this adsorption tank comprises hole shape, bar shaped, the various pass-through type structures such as L shaped), and described adsorption tank aligns in the lower end of described gas circuit through hole.
In above-mentioned polishing machine, preferred, described multiple air-path interfaces are along the distribution that is centrosymmetric of the central rotating shaft of described rotary pneumatic pipeline connector.Such air-path interface is provided with to be beneficial to and coordinates the preferred arrangement of follow-up adsorption tank, makes the cushion pad can uniform stressed, adsorbs better polished part and reaches polishing effect.Preferred, in described absorption, multiple gas circuit through holes of offering of dish are along the distribution that is centrosymmetric of the central rotating shaft of the upper dish of absorption.Such gas circuit via arrangement is conducive to increase on-off valve with the docking of rotary pneumatic pipeline connector with in the middle of being connected gas circuit, and is conducive to equally coordinate the preferred arrangement of follow-up adsorption tank.Preferred, respectively connect and on tracheae, be also provided with on-off valve, this model glass that polishing machine of the present invention had adapt to vary in size carries out the compatibility of polishing operation; If run into ting model glass, only need to close the vacuum air-channel outside glass institute coverage, but also be conducive to the sheet of getting of glass, in the time getting sheet, only need to close negative pressure, access malleation is blown and just can be removed vacuum, take off smoothly polished glass workpiece, need not manually blow or seep water removes.
In above-mentioned polishing machine, preferred, described cushion pad is by adhesive bond mode or is close to by vacuum suction mode on the lower surface of the upper dish of absorption; Adhesive bond mode is more reliable and more stable; But vacuum suction mode, by making cleaning and the replacing of cushion pad more quick and convenient, is conducive to realize the full-automation of whole polishing machine, also can make full use of the pumped vacuum systems of the supporting setting of polishing machine.In the time adopting vacuum suction mode, in described absorption, coil the adsorption hole that has additional adsorption tank described in part misalignment, this adsorption hole is communicated with the air-path interface that described rotary pneumatic pipeline connector outer end arranges by connecting tracheae, cushion pad absorption can be fitted in to the lower surface of the upper dish of absorption by this adsorption hole.
As a total technical conceive, the present invention also provides the another kind of polishing machine (downdraft) that improves polished part suction type, comprise frame, dish in absorption, absorption lower wall, upper disc driving system, lower disc driving system and pumped vacuum systems, lower disc driving system comprises a central shaft, the top of central shaft is connected with absorption lower wall, in described central shaft, offer closed connection gas circuit, central shaft is provided with a rotary pneumatic pipeline connector near bottom position, the upper end of rotary pneumatic pipeline connector is connected with the described closed bottom that is connected gas circuit, the lower end of rotary pneumatic pipeline connector is connected with described pumped vacuum systems, described closed connection gas circuit top is communicated to the air-path interface that central shaft outside is offered, described absorption lower wall offers gas circuit through hole, air-path interface is communicated with the bottom of the gas circuit through hole of offering on absorption lower wall by connecting tracheae, described absorption lower wall top is provided with the cushion pad of being close to its upper surface, and the surface of described cushion pad offers pass-through type adsorption tank, and described adsorption tank aligns in the upper end of described gas circuit through hole.
In above-mentioned downdraft polishing machine, preferably, the bottom of described gas circuit through hole is provided with vacuum chamber (absorption lower wall and sealed bottom are connected to form vacuum chamber), this vacuum chamber is between support and absorption lower wall, and described connection tracheae is to be communicated with the gas circuit through hole of offering on described absorption lower wall by this vacuum chamber.By the vacuum chamber of an inside is set in downdraft polishing machine, can makes the pressure of vacuum suction more stable, even, and be convenient to simplify follow-up air-path interface and the setting that is connected tracheae.Therefore, in above-mentioned downdraft polishing machine, preferred, an air-path interface is only offered in described central shaft outside, and this air-path interface connects tracheae by one and is communicated with described vacuum chamber.
In above-mentioned downdraft polishing machine, preferred, the gas circuit through hole that described absorption lower wall is offered is communicated with the central rotating shaft of absorption lower wall; Described vacuum chamber is separated into the sub-chamber of multiple vacuum, and this multiple vacuum Zi Qiangcheng center diffusion way layout to the periphery, and each vacuum is interconnected between sub-chamber.
Similar with above-mentioned updraft type polishing machine, preferred, described cushion pad can be by adhesive bond mode or be close to by vacuum suction mode on the upper surface of absorption lower wall; In the time adopting vacuum suction mode, in described absorption, coil the adsorption hole that has additional adsorption tank described in part misalignment, this adsorption hole can be communicated with the air-path interface of described rotary pneumatic pipeline connector arranged outside or also can directly be communicated to above-mentioned vacuum chamber by connecting tracheae equally, cushion pad absorption can be fitted in to the upper surface of absorption lower wall by this adsorption hole.
In above-mentioned updraft type or downdraft polishing machine, preferred, described adsorption tank is provided with many, and this adsorption tank of many is center diffusion way layout to the periphery on cushion pad surface.This preferred adsorption tank set-up mode is conducive to guarantee that workpiece glass can firmly be adsorbed on the upper dish of absorption or absorption lower wall equably, preferred, described adsorption tank is similar " returning " font and arranges, and a loop of composition after the adsorption tank of every two U-shapeds docking mutually cuts off between the adsorption tank of two U-shapeds of the same circuit.
In above-mentioned updraft type or downdraft polishing machine, preferably, when the lower surface of being close to the upper dish of absorption when described cushion pad arranges, the lower surface coiling in described absorption offers the non-pass-through type groove aliging with described adsorption tank, and the lower end of described gas circuit through hole is communicated to this non-pass-through type groove;
In the time that described cushion pad is close to the upper surface that adsorbs lower wall and is arranged, the upper surface of described absorption lower wall offers the non-pass-through type groove aliging with described adsorption tank, and the upper end of described gas circuit through hole is communicated to this non-pass-through type groove.
In above-mentioned updraft type or downdraft polishing machine, preferred, the special construction based on adopting in the present invention or particular form, described cushion pad preferably adopts rubber blanket material to make.The situation that does not almost adopt rubber blanket to make in existing cushion pad.
Compared with prior art, the invention has the advantages that:
1. compare existing polishing machine suction type, the suction type after the present invention improves is not only simple in structure, and improvement cost is very low;
2. the polishing machine after the present invention's improvement adopts the mode of vacuum suction and air blowing, is convenient to very much the load of processed glass and gets sheet, and being convenient to being close to and peeling off of cushion pad, can greatly simplify artificial; Because the polishing machine after improving adopts the mode of vacuum suction and air blowing, absorption and the stripping process of polished and cushion pad are simplified greatly, and a difficult problem that has solved current polishing machine and manually get sheet, is conducive to realize from now on the production automation of polishing machine polishing;
3. the structural design that the present invention is special is not limited to cushion pad of the present invention and adopts the polyester synthetic material that is exclusively used in the upper dish of bonding absorption or lower wall in prior art, can adopt the material that other prices are cheaper to make (as rubber blanket) cushion pad, to meet adsorption function, and do not need frequent replacing, greatly reduce the use cost of cushion pad consumptive material in polishing machine;
4. the structural design that the present invention is special pays somebody's debt and expect repayment later buffering of the present invention can to bear other more functional location, for example, can be used as cushion pad and use, greatly improve the processing quality of polished part polishing.
Accompanying drawing explanation
Fig. 1 is the structural representation of updraft type polishing machine superstructure in the embodiment of the present invention 1.
Fig. 2 be in the embodiment of the present invention 1 updraft type polishing machine superstructure along the cutaway view of central shaft.
Fig. 3 is the overall structure schematic diagram of updraft type polishing machine in the embodiment of the present invention 1.
Fig. 4 is the structural representation of downdraft polishing machine infrastructure in the embodiment of the present invention 2.
Fig. 5 be in the embodiment of the present invention 2 downdraft polishing machine infrastructure along the cutaway view of central shaft.
Fig. 6 is the plan structure schematic diagram of cushion pad in the embodiment of the present invention.
Fig. 7 is the overall structure schematic diagram of downdraft polishing machine in the embodiment of the present invention 2.
Marginal data:
1, frame; 2, dish in absorption; 3, absorption lower wall; 4, upper disc driving system; 5, lower disc driving system; 6, central shaft; 61, closed connection gas circuit; 62, rotary pneumatic pipeline connector; 63, air-path interface; 64, gas circuit through hole; 65, connect tracheae; 66, on-off valve; 7, cushion pad; 71, adsorption tank; 8, vacuum chamber; 81, the sub-chamber of vacuum; 9, support; 10, polished part.
The specific embodiment
For the ease of understanding the present invention, below in connection with Figure of description and preferred embodiment, the present invention is done more comprehensively, described meticulously, but protection scope of the present invention is not limited to following specific embodiment.
It should be noted that, in the time that a certain element is described on " be fixed on or be connected in " another element, it can be directly to fix or be connected on another element, can be also indirectly fixed or be connected on another element by other intermediate connectors.
Unless otherwise defined, all technical terms of hereinafter using are identical with the implication that those skilled in the art understand conventionally.Technical term used herein, just in order to describe the object of specific embodiment, is not to be intended to limit the scope of the invention.
Embodiment 1:
A kind of updraft type polishing machine of improvement polished part suction type of the present invention as shown in FIG. 1 to 3, comprise frame 1, dish 2 in absorption, absorption lower wall 3, upper disc driving system 4, lower disc driving system 5, recovery system and pumped vacuum systems, upper disc driving system 4 comprises a central shaft 6, the bottom of central shaft 6 is connected with the upper dish 2 of absorption, in central shaft 6, offer closed connection gas circuit 61, central shaft 6 is provided with a rotary pneumatic pipeline connector 62 near bottom position, the inner of rotary pneumatic pipeline connector 62 is connected and (adopts conventional pumped vacuum systems with outside pumped vacuum systems by closed connection gas circuit 61, not shown), the outer end of rotary pneumatic pipeline connector 62 is provided with multiple air-path interfaces 63, in absorption, dish 2 offers multiple gas circuit through holes 64, each air-path interface 63 is communicated with by the upper end that connects the gas circuit through hole 64 of offering on the upper dish 2 of tracheae 65 and absorption, in absorption, dish 2 belows are provided with the cushion pad 7 of being close to its lower surface by binding agent bonding method, and the surface of cushion pad 7 offers pass-through type adsorption tank 71, the lower end alignment adsorption tank 71 of gas circuit through hole 64.The below of cushion pad 7 arranges polished part 10.
In the updraft type polishing machine of the present embodiment, multiple air-path interfaces 63 are along the distribution that is centrosymmetric of the central rotating shaft of rotary pneumatic pipeline connector 62.In addition, in absorption dish 2 multiple gas circuit through holes of offering 64 along the distribution that is centrosymmetric of the central rotating shaft of the upper dish 2 of absorption.As shown in Figure 2, on each connection tracheae 65, be also provided with on-off valve 66.
As shown in Figure 6, in the updraft type polishing machine of the present embodiment, adsorption tank 71 is provided with many, and this adsorption tank of many 71 is center diffusion way layout to the periphery on cushion pad 7 surfaces.Concrete, adsorption tank 71 is similar " returning " font to be arranged, and a loop of composition after adsorption tank 71 docking of every two U-shapeds, partition mutually between the adsorption tank of two U-shapeds of the same circuit.In the present embodiment, cushion pad adopts rubber blanket material to make.
The upper disc driving system 4 of whole polishing machine also includes the conventional components such as lifting cylinder, transmission mechanism, lower disc driving system 5 comprises the parts such as corresponding motor, transmission mechanism, upper disc driving system 4 and lower disc driving system 5 are all installed in frame 1, and all can be by guidance panel control.
In the updraft type polishing machine of above-mentioned the present embodiment, a dish load of 2 in absorption, get sheet operating process and comprise: first make to adsorb upper dish 2 by disc driving system 4 in guidance panel control and tilt, then open pumped vacuum systems, the pass-through type adsorption tank 71 that polished workpiece glass alignment cushion pad 7 surfaces are offered, and make its laminating, then workpiece glass is carried out to polishing operation, just after polishing completes, make to adsorb dish 2 times; In control, disc driving system 4 makes to adsorb dish 2 and again tilts, lift by hand or manipulator fixing polishing after workpiece glass, close negative pressure, access malleation, can make workpiece glass depart from by blowing.
Embodiment 2:
A kind of downdraft polishing machine of improvement polished part suction type of the present invention as shown in Figure 4 to 7, comprise frame 1, dish 2 in absorption, absorption lower wall 3, upper disc driving system 4, lower disc driving system 5, recovery system and pumped vacuum systems (referring to Fig. 7), lower disc driving system 5 comprises a central shaft 6, the top of central shaft 6 is connected with absorption lower wall 3, in central shaft 6, offer closed connection gas circuit 61, central shaft 6 is provided with a rotary pneumatic pipeline connector 62 near bottom position, the upper end of rotary pneumatic pipeline connector 62 is connected with the closed bottom that is connected gas circuit 61, the lower end of rotary pneumatic pipeline connector 62 is connected with pumped vacuum systems, closed connection gas circuit 61 tops are communicated to the air-path interface 63 that central shaft 6 outsides are offered, absorption lower wall 3 offers multiple gas circuit through holes 64, air-path interface 63 is communicated with the bottom of the gas circuit through hole 64 of offering on absorption lower wall 3 by connecting tracheae 65.Absorption lower wall 3 tops are provided with the cushion pad 7 of being close to its upper surface by binding agent bonding method.The surface of cushion pad 7 offers pass-through type adsorption tank 71, the upper end alignment adsorption tank 71 of gas circuit through hole 64.In the present embodiment, volume cushion pad 7 can also be close on the upper surface of absorption lower wall 3 by vacuum suction mode; While adopting vacuum suction mode, adsorb on lower wall 3 except arranging aforesaid multiple gas circuit through hole 64, also have additional the adsorption hole of part misalignment adsorption tank 71, these adsorption holes and gas circuit through hole 64 are structurally without essential distinction, be passage, and these adsorption holes are communicated with the air-path interface 63 that rotary pneumatic pipeline connector 62 outer ends arrange by connecting tracheae 65 equally.In such cases, gas circuit through hole 64 and adsorption hole are all communicated to pumped vacuum systems, and gas circuit through hole 64 directly sees through the upper polishing workpiece of adsorption tank 71 absorption arranging on cushion pad 7, and adsorption hole directly adsorbs cushion pad 7.
In the downdraft polishing machine of the present embodiment, the bottom of gas circuit through hole 64 is provided with vacuum chamber 8, and this vacuum chamber 8 is between support 9 and absorption lower wall 3, and connecting tracheae 65 is to be communicated with the gas circuit through hole 64 of offering on absorption lower wall 3 by this vacuum chamber 8.In the present embodiment, an air-path interface 63 is only offered in central shaft 6 outsides, and this air-path interface 63 is communicated with vacuum chamber 8 by a connection tracheae 65.Multiple gas circuit through holes 64 that absorption lower wall 3 is offered are along the distribution that is centrosymmetric of the central rotating shaft of absorption lower walls 3; 8 of vacuum chambers are separated into the sub-chamber 81 of multiple vacuum, and the sub-Qiang81Cheng of these multiple vacuum center diffusion way layout to the periphery, and the sub-chamber 81 of each vacuum is interconnected.The corresponding gas circuit through hole 64 belows vacuum chamber 8 that is docked and connected.
As shown in Figure 6, in the updraft type polishing machine of the present embodiment, the top of cushion pad 7 arranges polished part.Adsorption tank 71 is provided with many, and this adsorption tank of many 71 is center diffusion way layout to the periphery on cushion pad 7 surfaces.Concrete, adsorption tank 71 is similar " returning " font to be arranged, and the same loop of composition after adsorption tank 71 docking of every two U-shapeds, partition mutually between the adsorption tank of two U-shapeds of the same circuit.The corresponding gas circuit through hole 64 tops the same circuit that is docked and connected.In the present embodiment, cushion pad adopts rubber blanket material to make.
The upper disc driving system of whole polishing machine also includes the conventional components such as lifting cylinder, transmission mechanism, lower disc driving system 5 comprises the parts such as corresponding motor, transmission mechanism, upper disc driving system and lower disc driving system 5 are all installed in frame 1, and all can be by guidance panel control.
The load of the downdraft polishing machine of above-mentioned the present embodiment, to get updraft type polishing machine in sheet operating process and embodiment 1 basic identical.
Claims (10)
1. one kind is improved the polishing machine of polished part suction type, comprise frame, dish in absorption, absorption lower wall, upper disc driving system, lower disc driving system and pumped vacuum systems, upper disc driving system comprises a central shaft, the bottom of central shaft is connected with the upper dish of absorption, it is characterized in that: in described central shaft, offer closed connection gas circuit, central shaft is provided with a rotary pneumatic pipeline connector near bottom position, the inner of rotary pneumatic pipeline connector is connected with described pumped vacuum systems by closed connection gas circuit, the outer end of rotary pneumatic pipeline connector is provided with multiple air-path interfaces, in described absorption, dish offers multiple gas circuit through holes, each air-path interface is communicated with the upper end of coiling the gas circuit through hole of offering in absorption by connecting tracheae, in described absorption, dish below is provided with the cushion pad of being close to its lower surface, and the surface of described cushion pad offers pass-through type adsorption tank, and described adsorption tank aligns in the lower end of described gas circuit through hole.
2. polishing machine according to claim 1, is characterized in that: described multiple air-path interfaces are along the distribution that is centrosymmetric of the central rotating shaft of described rotary pneumatic pipeline connector; In described absorption, multiple gas circuit through holes of offering of dish are along the distribution that is centrosymmetric of the central rotating shaft of the upper dish of absorption; Each tracheae that connects is provided with on-off valve.
3. polishing machine according to claim 1 and 2, is characterized in that: described cushion pad is by adhesive bond mode or is close to by vacuum suction mode on the lower surface of the upper dish of absorption;
In the time adopting vacuum suction mode, in described absorption, coil the adsorption hole that has additional adsorption tank described in part misalignment, described adsorption hole is communicated with the air-path interface of described rotary pneumatic pipeline connector outer end setting by connecting tracheae.
4. one kind is improved the polishing machine of polished part suction type, comprise frame, dish in absorption, absorption lower wall, upper disc driving system, lower disc driving system and pumped vacuum systems, lower disc driving system comprises a central shaft, the top of central shaft is connected with absorption lower wall, it is characterized in that: in described central shaft, offer closed connection gas circuit, central shaft is provided with a rotary pneumatic pipeline connector near bottom position, the upper end of rotary pneumatic pipeline connector is connected with the described closed bottom that is connected gas circuit, the lower end of rotary pneumatic pipeline connector is connected with described pumped vacuum systems, described closed connection gas circuit top is communicated to the air-path interface that central shaft outside is offered, this air-path interface is communicated with the bottom of the gas circuit through hole of offering on absorption lower wall by connecting tracheae, described absorption lower wall top is provided with the cushion pad of being close to its upper surface, and the surface of described cushion pad offers pass-through type adsorption tank, and described adsorption tank aligns in the upper end of described gas circuit through hole.
5. polishing machine according to claim 4, it is characterized in that: the bottom of described gas circuit through hole is provided with vacuum chamber, this vacuum chamber is between support and absorption lower wall, and described connection tracheae is to be communicated with the gas circuit through hole of offering on described absorption lower wall by this vacuum chamber.
6. polishing machine according to claim 5, is characterized in that: an air-path interface is only offered in described central shaft outside, and this air-path interface connects tracheae by one and is communicated with described vacuum chamber.
7. according to the polishing machine described in claim 5 or 6, it is characterized in that: described vacuum chamber is separated into the sub-chamber of multiple vacuum, and this multiple vacuum Zi Qiangcheng center diffusion way layout to the periphery, each vacuum is interconnected between sub-chamber.
8. according to the polishing machine described in any one in claim 1～7, it is characterized in that: described adsorption tank is provided with many, this adsorption tank of many is center diffusion way layout to the periphery on cushion pad surface;
When the lower surface of being close to the upper dish of absorption when described cushion pad arranges, the lower surface coiling in described absorption offers the non-pass-through type groove aliging with described adsorption tank, and the lower end of described gas circuit through hole is communicated to this non-pass-through type groove;
In the time that described cushion pad is close to the upper surface that adsorbs lower wall and is arranged, the upper surface of described absorption lower wall offers the non-pass-through type groove aliging with described adsorption tank, and the upper end of described gas circuit through hole is communicated to this non-pass-through type groove.
9. polishing machine according to claim 8, is characterized in that: described adsorption tank is similar " returning " font to be arranged, and a loop of composition after the adsorption tank of every two U-shapeds docking, between the adsorption tank of two U-shapeds of the same circuit, mutually cuts off.
10. according to the polishing machine described in any one in claim 1～7, it is characterized in that: described cushion pad adopts rubber blanket material to make.
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| CN201410080721.8A CN103846788B (en) | 2014-03-07 | 2014-03-07 | Improve the buffing machine of polished part suction type |
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| CN201410080721.8A CN103846788B (en) | 2014-03-07 | 2014-03-07 | Improve the buffing machine of polished part suction type |
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| CN107097151A (en) * | 2017-07-04 | 2017-08-29 | 大连桑姆泰克工业部件有限公司 | Polishing fluid pipe-line system and upper lower burrs grinding mechanism |
| CN107097151B (en) * | 2017-07-04 | 2023-09-22 | 大连桑姆泰克工业部件有限公司 | Polishing solution pipeline system and upper disc and lower disc grinding mechanism |
| CN110170912A (en) * | 2019-05-30 | 2019-08-27 | 湖南永创机电设备有限公司 | A kind of vacuum suction and air blowing blanking device for glass substrate polishing |
| CN110170912B (en) * | 2019-05-30 | 2024-03-15 | 湖南永创机电设备有限公司 | Vacuum adsorption and blowing discharging device for polishing glass substrate |
| CN113427393A (en) * | 2021-07-23 | 2021-09-24 | 长江存储科技有限责任公司 | Sucker device and chemical mechanical polishing equipment |
| CN113427393B (en) * | 2021-07-23 | 2022-06-03 | 长江存储科技有限责任公司 | Sucker device and chemical mechanical polishing equipment |
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| CN103846788B (en) | 2016-06-29 |
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