CN1266543C - 用于改进相移掩模成像性能的装置和系统及其方法 - Google Patents
用于改进相移掩模成像性能的装置和系统及其方法 Download PDFInfo
- Publication number
- CN1266543C CN1266543C CNB031226124A CN03122612A CN1266543C CN 1266543 C CN1266543 C CN 1266543C CN B031226124 A CNB031226124 A CN B031226124A CN 03122612 A CN03122612 A CN 03122612A CN 1266543 C CN1266543 C CN 1266543C
- Authority
- CN
- China
- Prior art keywords
- light
- pupil plane
- phase
- aperture
- etching system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
Abstract
Description
Claims (15)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US36135102P | 2002-03-05 | 2002-03-05 | |
US60/361,351 | 2002-03-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1453635A CN1453635A (zh) | 2003-11-05 |
CN1266543C true CN1266543C (zh) | 2006-07-26 |
Family
ID=27757780
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB031226124A Expired - Fee Related CN1266543C (zh) | 2002-03-05 | 2003-03-05 | 用于改进相移掩模成像性能的装置和系统及其方法 |
Country Status (7)
Country | Link |
---|---|
US (2) | US6967712B2 (zh) |
EP (1) | EP1343050A3 (zh) |
JP (2) | JP4297703B2 (zh) |
KR (1) | KR100808620B1 (zh) |
CN (1) | CN1266543C (zh) |
SG (1) | SG99416A1 (zh) |
TW (1) | TWI274232B (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6842223B2 (en) | 2003-04-11 | 2005-01-11 | Nikon Precision Inc. | Enhanced illuminator for use in photolithographic systems |
US7438997B2 (en) | 2004-05-14 | 2008-10-21 | Intel Corporation | Imaging and devices in lithography |
US20070121090A1 (en) * | 2005-11-30 | 2007-05-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
NL2004323A (en) * | 2009-04-16 | 2010-10-18 | Asml Netherlands Bv | Device manufacturing method and lithographic apparatus. |
NL2009004A (en) * | 2011-07-20 | 2013-01-22 | Asml Netherlands Bv | Inspection method and apparatus, and lithographic apparatus. |
KR101982693B1 (ko) * | 2014-08-25 | 2019-05-27 | 에이에스엠엘 홀딩 엔.브이. | 측정 방법, 측정 장치, 리소그래피 장치 및 디바이스 제조 방법 |
JP7193304B2 (ja) * | 2018-03-19 | 2022-12-20 | ソニーセミコンダクタソリューションズ株式会社 | 光源システム、光学回折素子製造方法、および測距システム、ならびに光学回折素子 |
CN115202146A (zh) * | 2021-04-14 | 2022-10-18 | 上海传芯半导体有限公司 | 移相掩膜版及其制作方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5062705A (en) * | 1989-09-13 | 1991-11-05 | Matsushita Electric Industrial Co., Ltd. | Apparatus for evaluating a lens |
JP3200894B2 (ja) | 1991-03-05 | 2001-08-20 | 株式会社日立製作所 | 露光方法及びその装置 |
US5348837A (en) * | 1991-09-24 | 1994-09-20 | Hitachi, Ltd. | Projection exposure apparatus and pattern forming method for use therewith |
JPH05259025A (ja) * | 1992-03-16 | 1993-10-08 | Matsushita Electric Ind Co Ltd | 露光装置 |
DE69224514T2 (de) | 1992-03-23 | 1998-06-18 | Erland Torbjoern Sandstroem | Verfahren und Vorrichtung zur Erzeugung eines Bildes |
JPH05315226A (ja) * | 1992-05-11 | 1993-11-26 | Sony Corp | 投影露光装置 |
JPH07283130A (ja) * | 1994-04-14 | 1995-10-27 | Canon Inc | 投影露光方法及びそれを用いた投影露光装置 |
KR0172790B1 (ko) * | 1995-09-18 | 1999-03-20 | 김영환 | 위상반전 마스크 및 그 제조방법 |
JPH10115932A (ja) | 1996-10-09 | 1998-05-06 | Mitsubishi Electric Corp | 位相シフトマスクを用いた露光方法 |
TW388004B (en) * | 1998-04-03 | 2000-04-21 | United Microelectronics Corp | Alternating phase shift mask |
JP3123542B2 (ja) * | 1998-05-02 | 2001-01-15 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
US6377337B1 (en) * | 1998-05-02 | 2002-04-23 | Canon Kabushiki Kaisha | Projection exposure apparatus |
EP1143492A4 (en) | 1998-09-03 | 2004-06-02 | Nikon Corp | EXPOSURE APPARATUS AND METHOD, DEVICE AND METHOD FOR PRODUCING SAID APPARATUS |
US6320648B1 (en) * | 1998-10-12 | 2001-11-20 | Steven R. J. Brueck | Method and apparatus for improving pattern fidelity in diffraction-limited imaging |
US6207328B1 (en) * | 1999-08-23 | 2001-03-27 | United Microelectronics Corp. | Method of forming a phase shift mask |
DE10027984B4 (de) * | 2000-06-06 | 2008-10-23 | Promos Technologies, Inc. | Fotolithografiesystem mit einer Frequenzbereichsfiltermaske |
-
2003
- 2003-03-04 TW TW092104583A patent/TWI274232B/zh not_active IP Right Cessation
- 2003-03-04 SG SG200301100A patent/SG99416A1/en unknown
- 2003-03-05 EP EP03004859A patent/EP1343050A3/en not_active Ceased
- 2003-03-05 KR KR1020030013591A patent/KR100808620B1/ko not_active IP Right Cessation
- 2003-03-05 JP JP2003059065A patent/JP4297703B2/ja not_active Expired - Fee Related
- 2003-03-05 CN CNB031226124A patent/CN1266543C/zh not_active Expired - Fee Related
- 2003-03-05 US US10/378,672 patent/US6967712B2/en not_active Expired - Fee Related
-
2005
- 2005-05-05 US US11/121,917 patent/US7098995B2/en not_active Expired - Fee Related
-
2006
- 2006-05-25 JP JP2006145953A patent/JP4476243B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2003257853A (ja) | 2003-09-12 |
JP4297703B2 (ja) | 2009-07-15 |
US20030219096A1 (en) | 2003-11-27 |
KR20040002452A (ko) | 2004-01-07 |
JP4476243B2 (ja) | 2010-06-09 |
JP2006261696A (ja) | 2006-09-28 |
CN1453635A (zh) | 2003-11-05 |
EP1343050A3 (en) | 2004-05-19 |
US6967712B2 (en) | 2005-11-22 |
TW200304053A (en) | 2003-09-16 |
US7098995B2 (en) | 2006-08-29 |
SG99416A1 (en) | 2003-10-27 |
TWI274232B (en) | 2007-02-21 |
KR100808620B1 (ko) | 2008-02-29 |
EP1343050A2 (en) | 2003-09-10 |
US20050190355A1 (en) | 2005-09-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: ASML HOLDING CO., LTD. Free format text: FORMER OWNER: ASML NETHERLAND B.V. Effective date: 20050304 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20050304 Address after: Holland HOFEN feld Applicant after: ASML Holding B.V. Address before: Holland HOFEN feld Applicant before: ASML Holland Co., Ltd. |
|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060726 Termination date: 20160305 |