CN1713380A - 集成电路封装的静电放电(esd)防护 - Google Patents

集成电路封装的静电放电(esd)防护 Download PDF

Info

Publication number
CN1713380A
CN1713380A CNA2005100810245A CN200510081024A CN1713380A CN 1713380 A CN1713380 A CN 1713380A CN A2005100810245 A CNA2005100810245 A CN A2005100810245A CN 200510081024 A CN200510081024 A CN 200510081024A CN 1713380 A CN1713380 A CN 1713380A
Authority
CN
China
Prior art keywords
joint sheet
integrated circuit
semiconductor chip
pin
accessory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CNA2005100810245A
Other languages
English (en)
Other versions
CN100356564C (zh
Inventor
游善谦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiwan Semiconductor Manufacturing Co TSMC Ltd
Original Assignee
Taiwan Semiconductor Manufacturing Co TSMC Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Manufacturing Co TSMC Ltd filed Critical Taiwan Semiconductor Manufacturing Co TSMC Ltd
Publication of CN1713380A publication Critical patent/CN1713380A/zh
Application granted granted Critical
Publication of CN100356564C publication Critical patent/CN100356564C/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/60Protection against electrostatic charges or discharges, e.g. Faraday shields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/0401Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05553Shape in top view being rectangular
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49171Fan-out arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49541Geometry of the lead-frame
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01014Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01023Vanadium [V]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/014Solder alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

Abstract

本发明提供一种集成电路封装的静电放电防护方法。该集成电路封装包括封装衬底,其具有多个引脚,连接到半导体芯片上的多个接合垫,其中一些与形成于半导体芯片上的集成电路的IC接合垫相连接,其它则与集成电路绝缘的浮动接合垫相连接。所述多个引脚包括连接到主动接合垫的主动引脚,以及连接到浮动接合垫的虚拟(非连接)引脚。这些由连接材料所形成的浮动接合垫同样可用来形成集成电路。可使用球格阵列(BGA)或倒装芯片的IC封装,以及一种提供形成IC封装的方法。由于此封装的邻接的非连接引脚易受静电放电所影响,故设计浮动接合垫以防止静电放电破坏主动组件。本发明通过将非连接型引脚与浮动接合垫相连接而提供ESD防护。

Description

集成电路封装的静电放电(ESD)防护
技术领域
本发明涉及一种集成电路(integrated circuit,IC)封装中的静电放电(electrostatic discharg,ESD)保护,且特别涉及一种将非连接型引脚与浮动接合垫连接以提供ESD防护的方法。
背景技术
静电放电(electrostatic discharg,ESD)是由一非传导表面瞬间所放的静态电流,其将造成集成电路中半导体元件及其它电子元件的破坏。举例来说,一个人在地毯上行走,在高湿度的情况下所带的静电电荷为几千伏特的电压;在低湿度的情况下所带的静电电荷则超过一万伏特的电压。当集成电路或集成电路(integrated circuit,IC)封装被一静电电荷源接触时,IC封装中的集成电路将产生ESD现象,其可能发生在元件在场中的组装或组装之后的期间。当“被电流摧毁”,即受到静电放电的影响时,瞬间的ESD电源等级将对集成电路造成严重的破坏。
一个典型的IC封装包括一连接于半导体芯片的金属导线架或其它封装衬底。此半导体芯片包括一具有多个主动接合垫与外部元件连接的集成电路。金属导线架或其它封装衬底包括多个引脚或其它接点,此其它接点与形成于半导体芯片上的集成电路的个别接合垫相连接。举例来说,此连接方式可利用焊线连接到金属导线架来完成,或借由倒装芯片(flip-chip)封装技术来完成,此倒装芯片封装技术包括利用焊料凸块(solder bumps)直接将封装衬底的接触区域与相对应的半导体芯片的接合垫相互连接。在典型的IC封装中,金属导线架包括至少一没有连接至其相对应接合垫的引脚,这种引脚称为无金属线型或非连接型引脚。
在图1所示的背景技术配置中,IC封装115包括将半导体芯片101连接到导线架103。此导线架103包括多个引脚,此多个引脚包含连接型引脚105及非连接型引脚107。利用焊线111将连接型引脚105连接到对应的接合垫113,并且在半导体芯片101上形成一部分的集成电路。相反的,在传统设计中,金属导线架103的非连接型引脚107则没有与半导体芯片101相连接。
在场中的处理、安装、测试及使用期间中,连接式引脚及非连接式引脚都同样有可能受到静电放电所影响,即被电流摧毁。当非连接型的其中一引脚受到ESD影响时,将导致其邻接且未被电流摧毁的引脚造成ESD故障。更特别的是,当无金属线型的引脚受到ESD影响时,因耦合效应,此静电放电穿过邻接的连接型引脚到接合垫及其集成电路上,而破坏了集成电路的主动电路元件。
在一篇标题为“由于非连接型引脚受到ESD应力所造成的新故障机制”的报告中,详细讨论到ESD的破坏是由于一邻接引脚被电流摧毁所导致的。此报告为1994年,日本的一位松本先生于EOS/ESD 90-95专题论集的著作。此报告公开了一件事实,当人体模型(human body model,HBM)的ESD脉冲重复地施加于一IC封装上的非连接型引脚时,假如以金属线连接到内部电路,则任两个相邻的引脚将难防ESD的破坏。这是因为静电电荷将累积于树脂当中并且环绕着非连接型引脚,导致非连接型引脚与其邻接引脚之间产生大的电位差,而严重地降低邻接引脚的ESD抵抗能力。
据此,存在一种需求,即降低因非连接型引脚受到静电放电影响而透过一连接型引脚造成元件破坏的可能性。
发明内容
为达到上述和其它目的及其用途,本发明提供一种配件,至少包含一具有多个引脚连接到一半导芯片上的封装衬底,每一所述引脚连接至下列元件其中之一:IC接合垫,形成于该半导体芯片上并且连接到该半导体芯片的集成电路;以及浮动接合垫,形成于该半导体芯片上并且与该半导体芯片的集成电路绝缘。
如上所述的配件,其中该浮动接合垫包括用于该集成电路中的至少一金属层的一部分。
如上所述的配件,其中该部分与该相关金属层的其它部分绝缘。
如上所述的配件,其中由多个金属层及该浮动接合垫所形成的该集成电路包括每一所述金属层的非连续部分,每一非连续部分与相对应的金属层绝缘,且所述相对应的非连续部分彼此对准和接触。
如上所述的配件,其中该半导体芯片包括硅衬底。
如上所述的配件,其中该封装衬底为金属导线架,并且所述多个引脚实质上围绕着该半导体芯片。
如上所述的配件,其中该封装衬底为球格阵列衬底,并且每一所述引脚利用焊线连接至一IC接合垫及一浮动接合垫的其中之一。
如上所述的配件,当人体模型的ESD加压至4千伏并且施加于所述多个引脚的任一引脚时,其中该配件可抵抗由静电放电所造成的破坏。
本发明还提供一种配件,至少包含一具有多个接点连接到半导体芯片上的封装衬底,并且每一所述接点连接至下列元件其中之一:IC接合垫,形成于该半导体芯片上并且连接到该半导体芯片的集成电路;以及浮动接合垫,形成于该半导体芯片上并且与该半导体芯片的集成电路绝缘。
如上所述的配件,其中每一所述接点利用倒装芯片装配技术以连接到IC接合垫及浮动接合垫的其中之一,并且还包含焊锡,形成于每一所述接点和该IC接合垫的其中之一和浮动接合垫间。
本发明又提供一配件,至少包含封装衬底,其具有多个接点,并且所述接点连接到包括集成电路的半导体芯片上,所述接点包括多个主动接点,其每一接点与连接到该集成电路的IC接合垫相连接,并且至少一虚拟接点与一形成于该半导体芯片上且与该集成电路绝缘的浮动接合垫相连接。
如上所述的配件,其中该封装衬底为BGA衬底,并且每一所述主动接点为可用焊线连接到该IC接合垫的引脚,以及每一该至少一虚拟接点为可用焊线来连接到该浮动接合垫的虚拟引脚。
如上所述的配件,其中该封装衬底为倒装芯片,并且每一该主动接点为倒装芯片,以焊接方式连接到该IC接合垫的其中之一,且每一该至少一虚拟接点为倒装芯片,以焊接方式连接到该浮动接合垫。
本发明提供一种抑制集成电路封装中的静电放电破坏的方法,至少包含:提供具有多个引脚的封装衬底,所述多个引脚包括至少一非主动引脚;提供具有集成电路形成于其中的半导体芯片,该集成电路包括多个IC接合垫;在该半导体芯片上形成至少一浮动接合垫,每一浮动接合垫与该集成电路绝缘;以及连接该至少一非主动引脚的每一非主动引脚到该至少一浮动接合垫的一浮动接合垫。
如上所述的方法,还包含进一步连接所述多个引脚的每一其它引脚到所述多个IC接合垫的一IC接合垫。
如上所述的方法,其中每一该连接方式及该进一步的连接方式包含倒装芯片装配方式。
如上所述的方法,其中该连接方式包含焊线方式。
如上所述的方法,其中该连接方式包含焊接方式。
如上所述的方法,其中该形成至少一浮动接合垫发生于该半导体芯片上的该集成电路的形成期间中。
如上所述的方法,还包含利用人体模型的ESD加压至4千伏并且施加于该至少一非连接引脚的至少一引脚上来作测试,并且其中该测试不会破坏到该集成电路。
本发明用以抑制集成电路封装中的静电放电破坏的设备及方法,是借由焊线(wire bonding)或倒装芯片(flip-chip)的接合技术来实现的。
附图说明
为让本发明的上述和其它目的、特征、和优点能更明显易懂,下文特举一较佳实施例,并配合所附图式,作详细说明如下:
图1是根据背景技术的集成电路封装平面图;
图2是根据本发明的示范IC封装平面图;
图3是本发明的示范浮动接合垫的横向剖面图;
图4是一示范浮动接合垫的平面图,此浮动接合垫有关于本发明的半导体芯片的其它特征;以及
图5是本发明的另一示范浮动接合垫的横向剖面图。
图中标号说明:
3:接合垫                5:接触表面
7:传导层                 9:传导层
11:传导层                7A:非连续部分
9A:非连续部分            11A:非连续部分
7B:其它部分              9B:其它部分
11B:其它部分             21:半导体芯片
23:接合垫                25:接合垫
31:封装衬底              33:主动引脚
35:虚拟引脚              37:焊线
41:集成电路封装          43:集成电路
101:半导体芯片           103:导线架
105:连接型引脚           107:非连接型引脚
111:焊线                 113:接合垫
115:集成电路封装
具体实施方式
本发明直接在一包括集成电路的半导体芯片上提供浮动接合垫。这些浮动接合垫可由形成集成电路元件的相同材料所构成,并且在制造过程期间,用以形成半导体芯片上的集成电路,但此浮动接合垫将与集成电路电性上绝缘。这些集成电路典型地形成在许多的传导材料层上。所述每一浮动接合垫可由一或多个传导层的非连续部分来形成,用以形成集成电路。此非连续部分由相同的传导材料层所形成,同样可用以形成主动集成电路的传导特性,以及利用相同的图案化操作(如光刻)和蚀刻操作予以完成。可使用表面或大马士革的图案化制造过程。本发明也提供形成一集成电路(integrated circuit,IC)封装,使每一IC封装引脚不是与集成电路的主动接合垫相连接,就是与一浮动接合垫相连接。
图2是本发明的一示范设备的示范配置的平面图。此示范IC封装41包括一连接到半导体芯片21的封装衬底31。此半导体芯片21包括一形成于其上方的集成电路43。封装衬底31可为一导线架,像是金属导线架、球格阵列(ball grid array,BGA)封装、或用以连接半导体芯片21至外侧的其它衬底。封装衬底的每一引脚33及35都连接到对应的半导体芯片21的接合垫23及25。在图2的示范配置中,半导体芯片21被围绕着并且贴在封装衬底31上。其它结构及配置可用于其它示范实施例中。在一示范实施例中,封装衬底31可为一由金属所形成的导线架,以及在另一示范实施例中,仅有封装衬底31的33及35引脚可由金属形成,而封装衬底31的主体可由其它材料像是陶瓷或塑料所形成。本发明在半导体芯片的接合垫中也采用倒装芯片(flip-chip)IC封装,借由直接利用焊料凸块(solder bumps)将接合垫连接到封装衬底的对应引脚上。因此,此IC封装41的连接配置方式仅为一示范例。各种封装衬底可用以形成IC封装并且连接IC到外侧。
仍然参照图2,封装衬底31包括多个引脚。所述多个引脚为多个主动引脚33及多个虚拟或无动作引脚35。每一主动引脚33及虚拟引脚35利用焊线连接到一形成于半导体芯片21上的对应的接合垫。特别的是,每一主动引脚33连接到对应的主动接合垫23,以及每一虚拟引脚35连接到对应的浮动接合垫25。在图2的实施例中,每个连接方式可借由焊线37及传统技术来连接。在另一示范实施例中,可使用倒装芯片(flip-chip)焊料连结方式并且利用传统技术来完成。在封装衬底31的多个33及35引脚中的位置仅为一示范例。在其它示范实施例中,将可能有较多或较少的虚拟引脚并且可能形成于各种位置当中。此外,封装衬底31上的引脚33及35的配置方式,在其它示范实施例中可以不同。每一浮动接合垫25与一形成于半导体芯片21上的集成电路43电性绝缘。相对的,每一主动接合垫25因被连接而在半导体芯片21上形成部分的集成电路43,因此这些主动接合垫25也可称为IC接合垫。可利用传统方法(未详细示出)使集成电路43形成于半导体芯片21上,集成电路43可以内连接方式(未示于图2中)连接到主动接合垫23。浮动垫25由相同材料所形成,并且在相同的制造过程操作期间,用以形成集成电路43的元件。此将示于图3至图5中。
图3是一示范浮动接合垫的横向剖面图。此浮动接合垫包括接触表面5,并且由三个传导层7、9、11的非连续部分7A、9A、11A的对准堆所形成(传导层9示于图4中)。在一示范实施例中,每一传导层可为一金属像是铝、铜或其合金。每一非连续部分7A、9A、11A可利用传统表面或大马士革的图案化技术加以形成。利用图案化技术来形成一非连续隔离部分,像是非连续部分7A,由同样被图案化而形成其它部分7B的传导层7来形成部分的集成电路,如示于图2中的集成电路43。同样地,其它部分11B由相同的传导层11所形成,此传导层11也包含所形成的接合垫3的非连续部分11A。每一非连续部分7A、9A、11A及其它部分7B、11B都形成于半导体芯片21上,并且浮动接合垫3与示于图2中的集成电路43的主动元件电性绝缘。图3的配置仅为一示范例,并且在其它示范实施例中,少于三个传导层同样可用以形成浮动接合垫3。在包括多于三个传导层的其它示范实施例中,浮动接合垫3可由一或多个传导层的非连续部分来形成。虽然未示出,这些相同的传导层同样可用以形成集成电路的IC接合垫。
图4是浮动接合垫3与其它部分7B、9B、11B电性绝缘的透视图。其它部分7B、9B、11B分别由相同的传导层7、9、11所形成,图案化这些传导层来形成7A、9A、11A并且结合形成浮动接合垫3。每一浮动接合垫3及每一形成于其它部分7B、9B、11B的传导元件形成于半导体芯片21上,且每一形成于其它部分7B、9B、11B的传导元件则在半导体芯片21上形成部分的集成电路,如图2中的集成电路43。
图5是一示范实施例的横向剖面图,其为一具有上表面5并且由个别的传导薄膜的非连续部分7A、9A、11A所形成的示范浮动接合垫3。在图5的示范实施例中,非连续部分7A、9A、11A其相互间并非能绝对的对准,但仍有物理上及电性上的接触。图案化传导层7不但形成非连续部分7A,而且也形成与非连续部分7A电性绝缘的其它部分7B。同样地,图案化传导层11不但形成非连续部分11A,而且也形成与非连续部分11A电性绝缘的其它部分11B。
其它示范浮动接合垫可用于其它示范实施例中。各种安装及对准浮动接合垫可形成包含一或多个多路传导层的非连续部分,并用以形成集成电路元件。
请再参考到图2,IC封装41可抵抗ESD的破坏。更特别的是,当这些虚拟引脚35其中的一引脚,经由人体或场中的其它ESD来源或在装配、测试的期间受到ESD影响时,IC封装41的集成电路43可抵抗ESD的破坏。可以发现,当这些虚拟引脚35的任一引脚因受ESD影响而被电流摧毁,可借由将ESD转移到邻接引脚的方法或其它方法,则集成电路43的元件将不会被破坏。当人体模型(human body model,HBM)的ESD电压像4000V(伏)那么高并且施加于一虚拟引脚35时,IC封装则可抵抗来自ESD的破坏。
尽管到此为止的说明都是设备的关联性,本发明也同样针对一种抑制集成电路中的静电放电的方法加以详细说明。本方法包括提供一封装衬底,如前述的导线架及一包含集成电路的半导体芯片。本方法更提供借由形成传导层中的至少一非连续部分,来形成浮动接合垫,此传导层可用来形成集成电路元件的主动传导元件。这些非连续部分较佳地可在半导体元件的形成期间中来形成。本方法也提供利用焊线或倒装芯片来连接封装衬底的非主动引脚与半导体芯片的浮动接合垫,此倒装芯片式需利用焊接直接将引脚或导线架的传导部分连接到半导体芯片上对应的接合垫上。封装衬底的主动引脚可连接到集成电路的主动或IC接合垫。
前述仅说明本发明的原理。尽管未明白的说明或在此示出,在不脱离本发明的精神和范围下,仍可借由那些技术中的技巧来设计出各种配置方式来将本发明的原理予以具体化。举例来说,虽然在图2中说明一种封装衬底的结合,根据本发明的观点也可采用相似的其它封装衬底,用以形成一IC封装并且连接IC至外侧。此外,所有列举于此的例子及条件语言主要是想达到教学目的,以及有助于读者能了解本发明的原理和发明人更深一层技术所提供的观点,并且这种特别说明的例子及条件可推断为不受限制。此外,所有的说明在此不但陈述了本发明的原理、观点以及实施例,而且还包括其特定范例,想要用以包含结构上及功能上与其均等的事物。同时,此均等物旨在用以包括现在已知的均等物及未来所发展出来的均等物,即所开发的任何元件,即不管结构如何而执行相同的功能。
此示范实施例的说明旨在使人理解所附图示的关联性,可视为完整说明书的一部分。在说明书中,关系措辞不但有低、高、水平、垂直、上面、下面、上、下、上方以及底部,而且还包括其衍生用语(即水平地、向下地等等),可参照图中所描述或展示的方位来加以理解。这些关系措辞为了说明上的方便,并不要求将设备建构在特有的定位中。有关“连接”的一些措辞,如连结以及相互连接可为一种结构上、不是直接就是通过一中间结构间接的彼此黏接或贴附,以及包括可移动或坚固的附着或是除了特别说明以外的关系。
虽然本发明已以一些较佳实施例公开如上,然而其并非用以限定本发明,任何熟习此技术的人,在不脱离本发明的精神和范围内,可以作各种的更动与润饰,因此本发明的保护范围应视后附权利要求所界定的范围为准。

Claims (20)

1.一种配件,至少包含一具有多个引脚连接到一半导芯片上的封装衬底,每一所述引脚连接至下列元件其中之一:
IC接合垫,形成于该半导体芯片上并且连接到该半导体芯片的集成电路;以及
浮动接合垫,形成于该半导体芯片上并且与该半导体芯片的集成电路绝缘。
2.如权利要求1所述的配件,其中该浮动接合垫包括用于该集成电路中的至少一金属层的一部分。
3.如权利要求2所述的配件,其中该部分与该相关金属层的其它部分绝缘。
4.如权利要求1所述的配件,其中由多个金属层及该浮动接合垫所形成的该集成电路包括每一所述金属层的非连续部分,每一非连续部分与相对应的金属层绝缘,且所述相对应的非连续部分彼此对准和接触。
5.如权利要求1所述的配件,其中该半导体芯片包括硅衬底。
6.如权利要求1所述的配件,其中该封装衬底为金属导线架,并且所述多个引脚实质上围绕着该半导体芯片。
7.如权利要求1所述的配件,其中该封装衬底为球格阵列衬底,并且每一所述引脚利用焊线连接至一IC接合垫及一浮动接合垫的其中之一。
8.如权利要求1所述的配件,当人体模型的ESD加压至4千伏并且施加于所述多个引脚的任一引脚时,其中该配件可抵抗由静电放电所造成的破坏。
9.一配件,至少包含一具有多个接点连接到半导体芯片上的封装衬底,并且每一所述接点连接至下列元件其中之一:
IC接合垫,形成于该半导体芯片上并且连接到该半导体芯片的集成电路;以及
浮动接合垫,形成于该半导体芯片上并且与该半导体芯片的集成电路绝缘。
10.如权利要求9所述的配件,其中每一所述接点利用倒装芯片装配技术以连接到IC接合垫及浮动接合垫的其中之一,并且还包含焊锡,形成于每一所述接点和该IC接合垫的其中之一和浮动接合垫间。
11.一配件,至少包含封装衬底,其具有多个接点,并且所述接点连接到包括集成电路的半导体芯片上,所述接点包括多个主动接点,其每一接点与连接到该集成电路的IC接合垫相连接,并且至少一虚拟接点与一形成于该半导体芯片上且与该集成电路绝缘的浮动接合垫相连接。
12.如权利要求11所述的配件,其中该封装衬底为BGA衬底,并且每一所述主动接点为可用焊线连接到该IC接合垫的引脚,以及每一该至少一虚拟接点为可用焊线来连接到该浮动接合垫的虚拟引脚。
13.如权利要求11所述的配件,其中该封装衬底为倒装芯片,并且每一该主动接点为倒装芯片,以焊接方式连接到该IC接合垫的其中之一,且每一该至少一虚拟接点为倒装芯片,以焊接方式连接到该浮动接合垫。
14.一种抑制集成电路封装中的静电放电破坏的方法,至少包含:
提供具有多个引脚的封装衬底,所述多个引脚包括至少一非主动引脚;
提供具有集成电路形成于其中的半导体芯片,该集成电路包括多个IC接合垫;
在该半导体芯片上形成至少一浮动接合垫,每一浮动接合垫与该集成电路绝缘;以及
连接该至少一非主动引脚的每一非主动引脚到该至少一浮动接合垫的一浮动接合垫。
15.如权利要求14所述的方法,还包含进一步连接所述多个引脚的每一其它引脚到所述多个IC接合垫的一IC接合垫。
16.如权利要求15所述的方法,其中每一该连接方式及该进一步的连接方式包含倒装芯片装配方式。
17.如权利要求14所述的方法,其中该连接方式包含焊线方式。
18.如权利要求14所述的方法,其中该连接方式包含焊接方式。
19.如权利要求14所述的方法,其中该形成至少一浮动接合垫发生于该半导体芯片上的该集成电路的形成期间中。
20.如权利要求14所述的方法,还包含利用人体模型的ESD加压至4千伏并且施加于该至少一非连接引脚的至少一引脚上来作测试,并且其中该测试不会破坏到该集成电路。
CNB2005100810245A 2004-06-25 2005-06-27 集成电路封装的静电放电(esd)防护方法及其配件 Active CN100356564C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/876,980 2004-06-25
US10/876,980 US7301229B2 (en) 2004-06-25 2004-06-25 Electrostatic discharge (ESD) protection for integrated circuit packages

Publications (2)

Publication Number Publication Date
CN1713380A true CN1713380A (zh) 2005-12-28
CN100356564C CN100356564C (zh) 2007-12-19

Family

ID=35504786

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2005100810245A Active CN100356564C (zh) 2004-06-25 2005-06-27 集成电路封装的静电放电(esd)防护方法及其配件

Country Status (3)

Country Link
US (1) US7301229B2 (zh)
CN (1) CN100356564C (zh)
TW (1) TWI286374B (zh)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101752348B (zh) * 2008-11-03 2011-09-07 盛群半导体股份有限公司 静电放电防护装置及其防护方法
CN102593106A (zh) * 2012-02-28 2012-07-18 上海华力微电子有限公司 一种用于防止封装样品被静电损伤的保护装置
CN106549006A (zh) * 2016-10-26 2017-03-29 上海华力微电子有限公司 用于封装级可靠性测试的静电防护电路和测试安装方法
CN107946288A (zh) * 2016-10-12 2018-04-20 旭景科技股份有限公司 具有静电放电防护的感测芯片封装及其制造方法
CN104502646B (zh) * 2014-12-22 2019-07-05 上海斐讯数据通信技术有限公司 一种移动终端测试夹具保护装置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7643259B2 (en) * 2006-08-31 2010-01-05 Texas Instruments Incorporated Substrate, with ESD magnetically induced wires, bound to passives/product ICS
TWI332255B (en) * 2007-03-20 2010-10-21 Orient Semiconductor Elect Ltd Heat block
US7940500B2 (en) * 2008-05-23 2011-05-10 Sae Magnetics (H.K.) Ltd. Multi-chip module package including external and internal electrostatic discharge protection circuits, and/or method of making the same
TWI362902B (en) 2008-09-02 2012-04-21 E Ink Holdings Inc Bistable display device
JP5264585B2 (ja) * 2009-03-24 2013-08-14 パナソニック株式会社 電子部品接合方法および電子部品
US8212350B2 (en) * 2009-04-06 2012-07-03 Intel Corporation Space and cost efficient incorporation of specialized input-output pins on integrated circuit substrates
KR101161820B1 (ko) * 2010-11-23 2012-07-03 크루셜텍 (주) 포인팅 디바이스의 정전기 방지 장치
FR2974665A1 (fr) * 2011-04-27 2012-11-02 St Microelectronics Crolles 2 Puce microelectronique, composant incluant une telle puce et procede de fabrication
US8796855B2 (en) 2012-01-13 2014-08-05 Freescale Semiconductor, Inc. Semiconductor devices with nonconductive vias
CN102832189B (zh) * 2012-09-11 2014-07-16 矽力杰半导体技术(杭州)有限公司 一种多芯片封装结构及其封装方法
US10491787B2 (en) 2014-09-23 2019-11-26 Flir Systems, Inc. Electrostatic discharge mitigation systems and methods for imaging devices
KR20190133964A (ko) 2018-05-24 2019-12-04 삼성전자주식회사 반도체 장치 및 이를 포함하는 반도체 패키지
US11329013B2 (en) 2020-05-28 2022-05-10 Nxp Usa, Inc. Interconnected substrate arrays containing electrostatic discharge protection grids and associated microelectronic packages

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4928162A (en) * 1988-02-22 1990-05-22 Motorola, Inc. Die corner design having topological configurations
US5114880A (en) * 1990-06-15 1992-05-19 Motorola, Inc. Method for fabricating multiple electronic devices within a single carrier structure
JPH08274261A (ja) * 1995-03-30 1996-10-18 Kawasaki Steel Corp 静電破壊保護回路
US6078502A (en) * 1996-04-01 2000-06-20 Lsi Logic Corporation System having heat dissipating leadframes
TW359023B (en) 1996-04-20 1999-05-21 Winbond Electronics Corp Device for improvement of static discharge protection in ICs
US5715127A (en) 1996-05-06 1998-02-03 Winbond Electronics Corp. Method for preventing electrostatic discharge failure in an integrated circuit package
US5712753A (en) 1996-05-06 1998-01-27 Winbond Electronics Corp. Method for preventing electrostatic discharge failure in an integrated circuit package
US5818086A (en) 1996-06-11 1998-10-06 Winbond Electronics Corporation Reinforced ESD protection for NC-pin adjacent input pin
US6008532A (en) * 1997-10-23 1999-12-28 Lsi Logic Corporation Integrated circuit package having bond fingers with alternate bonding areas
TW399274B (en) * 1998-02-09 2000-07-21 Winbond Electronics Corp IC package with enhanced ESD protection capability
US6016000A (en) * 1998-04-22 2000-01-18 Cvc, Inc. Ultra high-speed chip semiconductor integrated circuit interconnect structure and fabrication method using free-space dielectrics
US6211565B1 (en) 1999-04-29 2001-04-03 Winbond Electronics Corporation Apparatus for preventing electrostatic discharge in an integrated circuit
US6433411B1 (en) * 2000-05-22 2002-08-13 Agere Systems Guardian Corp. Packaging micromechanical devices
US6476472B1 (en) * 2000-08-18 2002-11-05 Agere Systems Inc. Integrated circuit package with improved ESD protection for no-connect pins
US6638789B1 (en) * 2000-09-26 2003-10-28 Amkor Technology, Inc. Micromachine stacked wirebonded package fabrication method
CN1179413C (zh) * 2001-03-28 2004-12-08 华邦电子股份有限公司 避免静电放电破坏的导架及其方法
US6800930B2 (en) * 2002-07-31 2004-10-05 Micron Technology, Inc. Semiconductor dice having back side redistribution layer accessed using through-silicon vias, and assemblies

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101752348B (zh) * 2008-11-03 2011-09-07 盛群半导体股份有限公司 静电放电防护装置及其防护方法
CN102593106A (zh) * 2012-02-28 2012-07-18 上海华力微电子有限公司 一种用于防止封装样品被静电损伤的保护装置
CN104502646B (zh) * 2014-12-22 2019-07-05 上海斐讯数据通信技术有限公司 一种移动终端测试夹具保护装置
CN107946288A (zh) * 2016-10-12 2018-04-20 旭景科技股份有限公司 具有静电放电防护的感测芯片封装及其制造方法
CN106549006A (zh) * 2016-10-26 2017-03-29 上海华力微电子有限公司 用于封装级可靠性测试的静电防护电路和测试安装方法

Also Published As

Publication number Publication date
CN100356564C (zh) 2007-12-19
TWI286374B (en) 2007-09-01
TW200601530A (en) 2006-01-01
US20050285280A1 (en) 2005-12-29
US7301229B2 (en) 2007-11-27

Similar Documents

Publication Publication Date Title
CN1713380A (zh) 集成电路封装的静电放电(esd)防护
US9559043B2 (en) Multi-level leadframe with interconnect areas for soldering conductive bumps, multi-level package assembly and method for manufacturing the same
US7119427B2 (en) Stacked BGA packages
US7872343B1 (en) Dual laminate package structure with embedded elements
US7569939B2 (en) Self alignment features for an electronic assembly
CN1169216C (zh) 半导体集成电路器件
KR101153693B1 (ko) 반도체 장치
CN1742372A (zh) 集成电路组合件
US20080029884A1 (en) Multichip device and method for producing a multichip device
CN1326225A (zh) 芯片倒装型半导体器件及其制造方法
CN1638108A (zh) 一种制造半导体器件的方法
CN1848417A (zh) 接合垫结构及其形成方法
CN1835229A (zh) 半导体器件和制造半导体器件的方法
CN1665027A (zh) 半导体器件
CN1254185A (zh) 小型半导体封装装置
US6849479B2 (en) Substrate based ESD network protection method for flip chip design
JP2001332653A (ja) 半導体装置
KR101943460B1 (ko) 반도체 패키지
CN1536673A (zh) 半导体集成电路器件
CN1295785C (zh) 接合垫区的结构
US6943103B2 (en) Methods for reducing flip chip stress
CN1808711A (zh) 封装体及封装体模块
JP2008277457A (ja) 積層型半導体装置および実装体
CN2696127Y (zh) 接合垫区的结构
KR20150090504A (ko) 패키지 기판

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant