CN1926461A - 修改微机电元件的时间响应 - Google Patents

修改微机电元件的时间响应 Download PDF

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CN1926461A
CN1926461A CNA2005800065043A CN200580006504A CN1926461A CN 1926461 A CN1926461 A CN 1926461A CN A2005800065043 A CNA2005800065043 A CN A2005800065043A CN 200580006504 A CN200580006504 A CN 200580006504A CN 1926461 A CN1926461 A CN 1926461A
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CN100485444C (zh
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马尼什·科塔里
威廉·J·卡明斯
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Qualcomm MEMS Technologies Inc
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IDC LLC
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/904—Micromirror

Abstract

在一衬底上布置一可移动元件阵列。每一元件均具有一空腔及一移动穿过所述空腔的可移动部件。所述元件的压力阻力发生变化，从而允许以致动信号的不同电平来操纵致动信号来从而以不同的压力阻力来激励元件。

Description

修改微机电元件的时间响应
技术领域
本发明大体而言涉及微机电元件，且更具体而言涉及修改微机电元件的时间响应。
背景技术
微机电(MEMS)系统通常由各个以微米尺度制造的单独移动元件构成。例如可调开关、电容器、用于显示及印刷应用的反射器等元件即为MEMS的实例。出于本说明之目的，一MEMS装置具有至少一个可移动元件、一使该元件移进或移出的空腔、及促成元件移动的某种致动信号。
在一些应用中，元件的致动定时(其中致动为元件自一位置向下一位置的移动)是装置运行的一关键部分。例如，在MEMS开关中，可级联各开关元件且一第一开关的响应时间可决定下一开关的响应时间，等等。在MEMS显示器中，元件的移动通常对光进行调制，且调制的定时决定观众所看到的图像内容。
通过这些元件的响应时间来对这些元件实施更精密的控制可提供更好的运行，例如更高的图像质量。例如，通过显示元件的响应时间控制显示元件可为显示应用提供一更高的位深度。
发明内容
无
附图说明
参照图式阅读本揭示内容可最好地了解本发明，在图式中：
图1显示一微机电元件的一实施例。
图2a及2b显示与压力相关的运行时间曲线图。
图3显示一显示元件阵列的一实施例。
图4a及4b显示一显示元件的各替代实施例的剖面图。
图5显示一显示元件的一实施例的一致动/释放响应曲线。
图6显示一显示元件阵列的一替代实施例。
图7显示一显示元件的一替代实施例的一致动/释放响应曲线。
图8显示一由若干个具有不同压力阻力水平的显示元件构成的像素的实施例。
图9显示一由若干个具有不同压力阻力水平的显示元件构成的像素的一替代实施例。
图10显示一具有支撑轨道的像素的一替代实施例。
具体实施方式
图1显示一微机电元件10的一般化结构的图式。此可移动元件10具有一毗邻一空腔18的可移动部件14。与可移动部件14相对的为一某一种类的致动器16，例如一地址晶体管或其它能够将可移动元件朝衬底12致动至空腔18中的组件。通常，所述元件将悬置于衬底上方，但也可跨空腔水平定向，或所述致动器可为可移动元件10的悬置部分。同样地，穿过所述空腔的移动可为部件14往空腔18中的运动，如假若一部件从一类似于部件14a的位置行进至一平行于部件14b的位置的位置时所将发生的一样。或者，所述移动可朝相反方向：始于位置14b并终止于一平行于部件14a的位置的位置。
当所述部件朝衬底方向移动时，陷获在空腔18内的气体必定会排出。根据为此种排出所采取的措施，元件的响应时间可受到影响。响应(或致动)时间为可移动部件到达其致动位置所需的时间周期。如果几乎不存在让气体排出的空间，则气体的机械阻力可对元件的可移动部件的运动起到阻尼作用。因机械阻力而引起的此种阻尼在此处将称作压力阻力。所述压力阻力可用于实现对元件响应的更精密控制。
带有压力的空气或其它气体可起到尤如其为液体一般的作用，且由气体所引起的阻力类似于粘性液体阻尼的阻力。当气体驻留于一极小的间隙中时，其不再起液体的作用，而是通过气体本身的压力来阻抗移动。在小的间隙情况下，将通过压力*容积＝常数这一公式来计算所述压力。在可移动元件的情况下，可移动元件与衬底或其它固定结构之间的气体的压力阻力最初可为粘性液体阻尼，并随间隙的闭合而变成上面所表征的压力。
可通过改变各元件中的压力阻力来操纵该压力阻力，其中不同元件具有不同压力阻力且因此具有不同响应时间。一种其中通过气孔来改变可移动元件的响应时间的不同方法阐述于2001年9月28日提出申请且名称为“Interferometric Modulation ofRadiation”的第09/966,843号美国专利申请案中。在该方法中，期望使响应时间加速，且所有元件因均具有相同的孔图案而均具有相同的压力阻力。当可移动元件偏转时，其均具有一致的压力阻力。
图2a中显示一响应时间相对于压力的关系曲线图。如从3个不同曲线中可看到，气体压力为影响装置响应的主要因素。图2b显示两个不同元件的响应时间。顶部曲线为一调谐成具有一较慢响应的元件的响应时间。底部曲线为一调谐成具有一较快响应的元件的响应时间。可利用各装置之间的此种压力阻力变化。
所述压力阻力变化可应用于不同的可移动元件。这些可移动元件包括开关、不同类型的显示元件、可调电容器、等等。对于显示元件而言，提供能使气体排出的额外空间即可加快响应时间。在显示器应用中，MEMS元件通常在一衬底上布置成一x-y格栅。根据元件的尺寸而定，MEMS元件可进一步被分组成子阵列，其中每一子阵列均形成观众所看到的合成图像中的一像素(或pixel)。此一阵列的一部分显示于图3中。
在图3中，显示一可移动元件阵列的一部分。所述可移动元件被分组成对应于像素的子阵列，例如子阵列20。所述阵列中的每一元件均包括一表面，所述表面的中心处具有一孔以在所述元件的可移动部件受到致动并移动时允许气体排出。虽然此特定结构是基于干涉式调制器，但这些孔也可用于诸多不同类型的结构。为了改变元件的压力阻力，可改变孔的尺寸，从而为元件提供不同的响应时间。
干涉式调制器(例如iMoDTM)依赖于干涉效应，所述干涉效应对空腔内的光起作用以根据图像数据来调制光。此一调制器的一剖面图显示于图4a中。在此实施例中，视图表面将是图像的‘底部’。所述调制器阵列形成于一透明衬底30上。一光学堆叠36形成一第一旋光表面，其可受第二旋光表面-机械或反射镜层33的影响。一介电层38通常保护所述光学堆叠层。机械层32由柱(例如32)支撑，其中柱的位置形成所述阵列中的各个元素。
当衬底上的电路(未显示)在机械层下面的一特定区域(例如层34的悬置于空腔40上方的部分)中受到激励时，所述机械层就会朝光学堆叠36方向偏移。当其偏移时，所述机械层使观看者所看到的光学堆叠部分显现黑色。因此，通过对具有图像数据的机械层进行寻址，观看者会看到一图像。一干涉式调制器的此特定实施例在此处可称作一单片干涉式调制器。
在图4b中所示的一干涉式调制器的一替代实施例中，使在偏移时会使像素显现黑色的反射镜44与支撑层42分离。此在此处可称作一可分离式调制器。在这两种情况下，可使用对驻留于阵列封装内部的气体的陷获来改变可移动元件的响应时间。下文将参照单片式实施例来论述其大体原理，并在后面论述对于可分离式调制器所作的修改。
在所述调制器的一实施例中，观看者可看到图4a所示的层34。然而，所述孔是如此之小以致通常不会因在致动部分的中心处形成孔而产生讨厌的假象。在图4b中，所述孔将制作于反射镜44中、支撑层42中、或二者中。观看者将不会看到支撑层42中所制作的孔，因为这些孔将被反射镜44屏蔽。通过在表面上添加孔，将会改变响应时间。此类元件的响应时间显示于图5中。由图可见，这些元件具有一大约200微秒的响应时间。
与此相反，一无孔的元件阵列的一部分显示于图6中。像素50-其由若干个子像素构成且在此处称作一巨像素-将具有在其表面中无孔的各个元件(例如52)，且边缘51为一由虚线表示的自由边缘。此类调制器的响应时间显示于图7中。由图可见，响应时间接近3毫秒。在为收集此数据所实施的实验中，这两个调制器均由同一晶圆制成，因此对于二者而言，其它可影响响应时间的因素(例如电介质充电)将是相似的。响应时间延长只是因为调制器元件下面的气体的陷获。
此特性可用来提供对可移动元件的更精密控制。例如，在例如图8中所示的单片式调制器中，边缘元件70a-j可制造成其机械阻力低于像素72a与b中间部位的元件。当以一第一电平(例如一斜波信号的开始部分)施加一致动信号时，所述边缘元件将首先移动，使对朝衬底方向拉动可移动部件的吸引力的机械阻力减小。当边缘元件移动时，其使气体陷获在像素(在此实例中为72a及72b)中间的元件下面。一种用以制作具有不同机械刚度的调制器的方法可见于2003年6月3日颁予且名称为“Microelectromechanical System Device and Method for Fabricating Same”的第6,574,033号美国专利中。
所陷获气体提供了另一对像素的最后两个元件的响应时间进行控制的机会。当致动信号达到一第二电平时，所述中间元件将随后移动。通过此种方式，控制所述电压即会使系统设计者能够提供具有不同时间或电压的脉冲以确定一像素中有多少个元件移动并影响观看者所看到的合成像素。
此种无孔方法存在其它变化形式。例如，一位于像素的一自由边缘上的第一组元件(例如70a、70d、70f及70h)可设计成首先偏移。然后，一位于一第二自由边缘上的第二组元件(例如70c、70e、70g及70j)可在第一组后移动而不是如上所述同时移动。如上所述的机械阻力可控制移动定时。第一边缘及第二边缘在一些应用中可能需要同时移动，或在其它应用中可能需要分别移动。
一种改变机械阻力的方法的一实例可包括改变调制器柱的柱间隔。图8所示调制器在边缘像素70a-70j的柱之间的间隙宽于对中间的元件所用的柱。通过将图6所示元件52与图8所示元件70c相比较，可更清楚地看到这一点。也可具有其它类型的机械阻力变化形式。
在一替代实施例中，可在可移动元件的背面中形成孔，如图9中所示。中心元件82a及82b具有中心孔以使任何陷获的空气能够排出。此可允许得到另一水平的响应时间。对致动信号具有较低机械阻力的边缘元件可首先作出响应，然后是具有孔的中间元件82a，接着是无孔的元件82b。同样，此可在不同程度上控制致动信号以使不同数量之元件用于形成合成像素。
因而，在上述各实施例中，提供一可移动元件阵列。每一元件均具有一可移动部件及一使所述部件穿过其移动的空腔。改变所述元件的压力阻力以使至少一个元件具有一不同于子阵列或像素中其它元件的压力阻力水平。该差异可能是由于因邻近元件塌缩而压迫元件下面的空气所致，或由于存在或不存在图案化至元件表面中的孔所致。
重新参见图4b，这些大体原理也可应用于不具有例如上文所述的单片式反射镜或机械层的优点的元件。可移动元件44也可在其中形成有孔，以允许所陷获的空气排出。或者，支撑层42可制造成大于此处所示的层，以便在反射镜移动时移动并覆盖反射镜的边缘，从而将气体陷获在反射镜下面。另外，可制造通道来限制或释放各反射镜之间的空气。
在另一替代实施例中，反射镜44可由两部分或两层形成。第一层将厚于或薄于第二层。第二层将沉积在第一层上，但具有较小的表面面积，从而形成一具有一刚性中心部分及一挠性外侧部分的反射镜。当反射镜移动时，所述挠性部分将首先塌缩并将空气陷获在反射镜的边缘下面。
在另一实施例中，可在所有四个边上支撑反射镜或可移动元件，使反射镜依靠在‘轨道’上。此显示于图10中，其中没有任何柱，每一子元件及每一巨像素均在各个边上受到支撑。陷获在巨像素90下面的任何气体均将与陷获在巨像素96下面的任何气体隔离。一实施例将把这两个巨像素之间的轨道98制造成不允许任何气体移动。除各个子像素中的孔外，也可通过在子像素周围的轨道中(例如92a与92b之间)形成或选择不形成孔来控制响应时间。如果在轨道中形成孔，则将使气体在承受压力时能够更快地自一移动元件中排出，并将改变响应时间。
在再一实施例中，所述衬底可图案化有诸如凸块或槽等结构以利于气体移动。此附加方面将适用于任何先前所述的实施例。可移动元件本身上面也可具有凸块以利于气体移动。所述凸块及槽的图案可在一巨像素的不同元件中有所变化以提供所期望的可变压力阻力。
除使用替代类型的元件外，这两种干涉式调制器仅作为本发明可应用于的装置的实例，也可对所述循环的释放部分而不是致动部分利用所述气体陷获特性。此已在上文中参照图1进行了说明。然而，在给定反射镜背侧上的空间大小及所涉及的封装复杂性的情况下，在所述致动循环上陷获气体可能更为可行。然而，不打算将本发明的应用仅限于所述致动循环。
到现在为止所作的说明已提及所述物质作为一气体陷获在所述元件下面。此气体更有可能是空气，当然也可使用不同的气体。使用一其密度小于空气的气体可更进一步增加响应时间，因为元件将具有更低的压力阻力。气体所提供的阻尼力取决于其性质，例如分压、密度及粘度。装置的几何形状以及气体分子的几何形状也可能具有影响。
在干涉式调制器的该具体实例中，这些元件在真空下运行时均具有一处于纳秒范围内的响应时间。当封装有空气时，这些元件的响应时间处于微秒范围内。因此，看起来在真空下具有一更快响应时间的元件可以采用一不同于空气的气体来将其响应时间调整至该类型元件的最佳运行范围内。
因此，虽然到现在为止是阐述一种用于改变MEMS元件的响应时间的方法及设备的一具体实施例，但并非旨在将这些特定说明视为对本发明范围的限定，除非在随附权利要求书如此提及。

Claims (24)

1、一种位于一衬底上的可移动元件阵列，每一元件均包括：
一空腔；及
一移动穿过所述空腔的可移动部件；
其中所述元件的一压力阻力会发生变化。
2、如权利要求1所述的阵列，所述可移动部件进一步在所述部件中包含孔以允许气体在所述元件移动时排出。
3、如权利要求2所述的阵列，其中所述阵列中的不同元件具有不同的孔图案。
4、如权利要求1所述的阵列，所述可移动部件进一步包括一挠性部分及一刚性部分以便在所述可移动部件移动穿过所述空腔时，所述挠性部分塌缩以将气体陷获在所述刚性部分与所述衬底之间。
5、如权利要求1所述的阵列，所述可移动部件进一步包括一由一支撑层形成的可移动反射镜。
6、如权利要求1所述的阵列，所述可移动部件进一步包括一由至少一个支撑柱悬置于所述空腔上方的可移动反射镜。
7、如权利要求6所述的阵列，所述支撑柱进一步包括支撑轨道。
8、如权利要求7所述的阵列，所述支撑轨道具有孔以允许气体排出。
9、如权利要求1所述的阵列，所述支撑层阻挡所述可移动反射镜的边缘从而将气体陷获在所述反射镜与所述衬底之间。
10、如权利要求1所述的阵列，所述压力阻力因所述可移动部件的一机械硬度而发生变化。
11、如权利要求1所述的阵列，所述阵列进一步包括一由调制器元件形成的x-y格栅，所述x-y格栅形成一像素，其中位于所述像素的外边缘处的调制器元件设置成首先致动，从而增加位于所述像素中间处的元件的所述压力阻力。
12、如权利要求11所述的阵列，其中位于所述像素的所述外边缘处的所述元件具有更低的机械刚性，从而使气体陷获在所述像素中间处的所述元件下面。
13、如权利要求1所述的阵列，其中所述阵列进一步包括一由如下构成的群组中的一者所形成的阵列：显示元件、开关、可调电容器、及干涉式调制器元件。
14、如权利要求1所述的阵列，所述阵列进一步包括自所述可移动元件跨越所述空腔的结构以利于气体流动。
15、如权利要求1所述的阵列，所述可移动元件上形成有利于气体流动的结构。
16、一种用以制造一可移动元件阵列的方法，所述方法包括：
在一空腔上方形成可移离一衬底的可移动部件，以使所述可移动部件中的至少一个的一压力阻力不同于所述可移动部件中其它可移动部件的一压力阻力。
17、如权利要求16所述的方法，其中形成可移动部件进一步包括形成具有图案化于所述部件的一表面中的孔的可移动部件。
18、如权利要求17所述的方法，其中所述孔在所述可移动部件中的至少一个上形成一第一图案，且所述孔在所述可移动部件中的其它可移动部件上形成一第二图案。
19、如权利要求16所述的方法，其中通过下述方式来改变所述压力阻力：将所述可移动部件中的一些制造成具有一较低的机械阻力，从而使其以一种将气体迫入其它可移动部件的空腔中的方式致动。
20、一种用以操作一衬底上作为像素布置成子阵列的一光调制器元件阵列的方法，所述方法包括：
以一第一电平提供一致动信号，从而使所述像素中的一第一组元件致动从而将气体陷获在所述像素中的其它元件与所述衬底之间；及
以一第二电平提供一致动信号，使所述像素中的一第二组元件根据一取决于所述压力阻力的响应时间致动。
21、如权利要求20所述的方法，使一第一组元件致动进一步包括使所述像素的一第一边缘上的元件致动。
22、如权利要求22所述的方法，使一第一组元件致动进一步包括使沿一第二边缘的元件与沿一第一边缘的所述元件同时致动。
23、如权利要求20所述的方法，使一第一组元件致动进一步包括使沿一第二边缘的元件在沿所述第一边缘的所述元件之后致动。
24、如权利要求20所述的方法，使一第二组元件根据其响应时间致动进一步包括使在其表面中图案化有孔的一第二组元件致动，所述孔用于改变所述元件的所述压力阳力。
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US20050195467A1 (en) 2005-09-08
AU2005218462A1 (en) 2005-09-15
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