DE10190427T1 - Energieüberwachungsvorrichtung für einen Fluormolekül-Laser - Google Patents

Energieüberwachungsvorrichtung für einen Fluormolekül-Laser

Info

Publication number
DE10190427T1
DE10190427T1 DE10190427T DE10190427T DE10190427T1 DE 10190427 T1 DE10190427 T1 DE 10190427T1 DE 10190427 T DE10190427 T DE 10190427T DE 10190427 T DE10190427 T DE 10190427T DE 10190427 T1 DE10190427 T1 DE 10190427T1
Authority
DE
Germany
Prior art keywords
fluoromolecular
laser
monitoring device
energy monitoring
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10190427T
Other languages
English (en)
Inventor
Klaus Wolfgang Vogler
Frank Voss
Elko Wolfgang Bergmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lambda Physik AG
Original Assignee
Lambda Physik AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lambda Physik AG filed Critical Lambda Physik AG
Publication of DE10190427T1 publication Critical patent/DE10190427T1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J2001/0276—Protection
    • G01J2001/0285—Protection against laser damage
DE10190427T 2000-01-25 2001-01-25 Energieüberwachungsvorrichtung für einen Fluormolekül-Laser Withdrawn DE10190427T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17780900P 2000-01-25 2000-01-25
PCT/IB2001/000788 WO2001055684A2 (en) 2000-01-25 2001-01-25 Energy monitor for molecular fluorine laser

Publications (1)

Publication Number Publication Date
DE10190427T1 true DE10190427T1 (de) 2002-06-06

Family

ID=22650056

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10190427T Withdrawn DE10190427T1 (de) 2000-01-25 2001-01-25 Energieüberwachungsvorrichtung für einen Fluormolekül-Laser

Country Status (5)

Country Link
US (1) US6907058B2 (de)
JP (1) JP2003521683A (de)
KR (1) KR20020030736A (de)
DE (1) DE10190427T1 (de)
WO (1) WO2001055684A2 (de)

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US7230964B2 (en) * 2001-04-09 2007-06-12 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
FR2885412B1 (fr) * 2005-05-03 2008-12-05 Commissariat Energie Atomique Dispositif et procede de prelevement et de transport
US7663747B2 (en) * 2006-04-27 2010-02-16 Metrosol, Inc. Contamination monitoring and control techniques for use with an optical metrology instrument
US7622310B2 (en) * 2006-04-27 2009-11-24 Metrosol, Inc. Contamination monitoring and control techniques for use with an optical metrology instrument
US7342235B1 (en) * 2006-04-27 2008-03-11 Metrosol, Inc. Contamination monitoring and control techniques for use with an optical metrology instrument
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DE102012205308B4 (de) * 2012-03-30 2018-05-30 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Vorrichtung zur Verstärkung eines Laserstrahls
WO2014208111A1 (ja) 2013-06-27 2014-12-31 ギガフォトン株式会社 光ビーム計測装置、レーザ装置及び光ビーム分離装置
US10228322B2 (en) * 2017-07-13 2019-03-12 Cymer LLC Apparatus for and method of sensing fluorine concentration
KR20220024662A (ko) * 2019-06-22 2022-03-03 오피어-스피리콘, 엘엘씨 레이저 빔 프로파일링과 사용하기 위한 나노-텍스처 감쇠기 및 레이저 빔 특성화 시스템 및 사용 방법
WO2021084544A1 (en) * 2019-10-31 2021-05-06 Wi-Charge Ltd Optical power meter for safe operation of optical wireless power systems

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Also Published As

Publication number Publication date
WO2001055684A2 (en) 2001-08-02
JP2003521683A (ja) 2003-07-15
US6907058B2 (en) 2005-06-14
KR20020030736A (ko) 2002-04-25
WO2001055684A3 (en) 2002-01-10
US20010028664A1 (en) 2001-10-11

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