DE10297191T5 - Phase-Change-Material-Speicherbauteil - Google Patents

Phase-Change-Material-Speicherbauteil Download PDF

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Publication number
DE10297191T5
DE10297191T5 DE10297191T DE10297191T DE10297191T5 DE 10297191 T5 DE10297191 T5 DE 10297191T5 DE 10297191 T DE10297191 T DE 10297191T DE 10297191 T DE10297191 T DE 10297191T DE 10297191 T5 DE10297191 T5 DE 10297191T5
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Germany
Prior art keywords
memory device
phase change
change material
material memory
phase
Prior art date
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Granted
Application number
DE10297191T
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English (en)
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DE10297191B4 (de
Inventor
Tyler A Lowrey
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Intel Corp
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Intel Corp
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Publication of DE10297191T5 publication Critical patent/DE10297191T5/de
Application granted granted Critical
Publication of DE10297191B4 publication Critical patent/DE10297191B4/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20Multistable switching devices, e.g. memristors
    • H10N70/231Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/80Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011Manufacture or treatment of multistable switching devices
    • H10N70/061Patterning of the switching material
    • H10N70/068Patterning of the switching material by processes specially adapted for achieving sub-lithographic dimensions, e.g. using spacers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/821Device geometry
    • H10N70/826Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • H10N70/8265Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices on sidewalls of dielectric structures, e.g. mesa or cup type devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/861Thermal details
    • H10N70/8616Thermal insulation means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/881Switching materials
    • H10N70/882Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • H10N70/8828Tellurides, e.g. GeSbTe
DE10297191T 2001-09-07 2002-08-20 Phasenwechselmaterial-Speicherbauteil und Verfahren zur Herstellung Expired - Fee Related DE10297191B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/948,830 2001-09-07
US09/948,830 US6586761B2 (en) 2001-09-07 2001-09-07 Phase change material memory device
PCT/US2002/026376 WO2003023875A2 (en) 2001-09-07 2002-08-20 Phase change material memory device

Publications (2)

Publication Number Publication Date
DE10297191T5 true DE10297191T5 (de) 2004-10-07
DE10297191B4 DE10297191B4 (de) 2009-07-23

Family

ID=25488290

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10297191T Expired - Fee Related DE10297191B4 (de) 2001-09-07 2002-08-20 Phasenwechselmaterial-Speicherbauteil und Verfahren zur Herstellung

Country Status (6)

Country Link
US (2) US6586761B2 (de)
KR (1) KR100595450B1 (de)
CN (1) CN100379046C (de)
DE (1) DE10297191B4 (de)
TW (1) TW559915B (de)
WO (1) WO2003023875A2 (de)

Families Citing this family (312)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6638820B2 (en) 2001-02-08 2003-10-28 Micron Technology, Inc. Method of forming chalcogenide comprising devices, method of precluding diffusion of a metal into adjacent chalcogenide material, and chalcogenide comprising devices
US6734455B2 (en) * 2001-03-15 2004-05-11 Micron Technology, Inc. Agglomeration elimination for metal sputter deposition of chalcogenides
US7102150B2 (en) * 2001-05-11 2006-09-05 Harshfield Steven T PCRAM memory cell and method of making same
US6955940B2 (en) * 2001-08-29 2005-10-18 Micron Technology, Inc. Method of forming chalcogenide comprising devices
US20030047765A1 (en) * 2001-08-30 2003-03-13 Campbell Kristy A. Stoichiometry for chalcogenide glasses useful for memory devices and method of formation
US7319057B2 (en) * 2001-10-30 2008-01-15 Ovonyx, Inc. Phase change material memory device
US6815818B2 (en) * 2001-11-19 2004-11-09 Micron Technology, Inc. Electrode structure for use in an integrated circuit
US6791859B2 (en) 2001-11-20 2004-09-14 Micron Technology, Inc. Complementary bit PCRAM sense amplifier and method of operation
EP1318552A1 (de) * 2001-12-05 2003-06-11 STMicroelectronics S.r.l. Kleinflächige Kontaktzone, hocheffizientes Phasenwechsel-Speicherelement und dessen Verfahren zur Herstellung
EP1469532B1 (de) * 2003-04-16 2009-08-26 STMicroelectronics S.r.l. Selbstausrichtendes Verfahren zur Herstellung einer Phasenwechsel-Speicherzelle und dadurch hergestellte Phasenwechsel-Speicherzelle
US6909656B2 (en) * 2002-01-04 2005-06-21 Micron Technology, Inc. PCRAM rewrite prevention
US20030143782A1 (en) 2002-01-31 2003-07-31 Gilton Terry L. Methods of forming germanium selenide comprising devices and methods of forming silver selenide comprising structures
US6867064B2 (en) * 2002-02-15 2005-03-15 Micron Technology, Inc. Method to alter chalcogenide glass for improved switching characteristics
US6791885B2 (en) 2002-02-19 2004-09-14 Micron Technology, Inc. Programmable conductor random access memory and method for sensing same
US6809362B2 (en) 2002-02-20 2004-10-26 Micron Technology, Inc. Multiple data state memory cell
US6930913B2 (en) * 2002-02-20 2005-08-16 Stmicroelectronics S.R.L. Contact structure, phase change memory cell, and manufacturing method thereof with elimination of double contacts
US6891747B2 (en) 2002-02-20 2005-05-10 Stmicroelectronics S.R.L. Phase change memory cell and manufacturing method thereof using minitrenches
US6972430B2 (en) * 2002-02-20 2005-12-06 Stmicroelectronics S.R.L. Sublithographic contact structure, phase change memory cell with optimized heater shape, and manufacturing method thereof
US7151273B2 (en) 2002-02-20 2006-12-19 Micron Technology, Inc. Silver-selenide/chalcogenide glass stack for resistance variable memory
US6858482B2 (en) * 2002-04-10 2005-02-22 Micron Technology, Inc. Method of manufacture of programmable switching circuits and memory cells employing a glass layer
KR20050044865A (ko) 2002-05-08 2005-05-13 포세온 테크날러지 인코퍼레이티드 고효율 고체상태 광원과 이용 및 제조 방법
US6890790B2 (en) 2002-06-06 2005-05-10 Micron Technology, Inc. Co-sputter deposition of metal-doped chalcogenides
JP4027282B2 (ja) * 2002-07-10 2007-12-26 キヤノン株式会社 インクジェット記録ヘッド
US7015494B2 (en) * 2002-07-10 2006-03-21 Micron Technology, Inc. Assemblies displaying differential negative resistance
US6872963B2 (en) * 2002-08-08 2005-03-29 Ovonyx, Inc. Programmable resistance memory element with layered memory material
US6864503B2 (en) * 2002-08-09 2005-03-08 Macronix International Co., Ltd. Spacer chalcogenide memory method and device
US7364644B2 (en) 2002-08-29 2008-04-29 Micron Technology, Inc. Silver selenide film stoichiometry and morphology control in sputter deposition
US7163837B2 (en) * 2002-08-29 2007-01-16 Micron Technology, Inc. Method of forming a resistance variable memory element
US6856002B2 (en) * 2002-08-29 2005-02-15 Micron Technology, Inc. Graded GexSe100-x concentration in PCRAM
US7010644B2 (en) * 2002-08-29 2006-03-07 Micron Technology, Inc. Software refreshed memory device and method
US6864521B2 (en) * 2002-08-29 2005-03-08 Micron Technology, Inc. Method to control silver concentration in a resistance variable memory element
US7049623B2 (en) * 2002-12-13 2006-05-23 Ovonyx, Inc. Vertical elevated pore phase change memory
EP1439583B1 (de) * 2003-01-15 2013-04-10 STMicroelectronics Srl Sub-lithographische Kontaktstruktur, insbesondere für ein Phasenwechsel-Speicherelement, und deren Herstellungsverfahren
US7425735B2 (en) 2003-02-24 2008-09-16 Samsung Electronics Co., Ltd. Multi-layer phase-changeable memory devices
US7402851B2 (en) * 2003-02-24 2008-07-22 Samsung Electronics Co., Ltd. Phase changeable memory devices including nitrogen and/or silicon and methods for fabricating the same
US7115927B2 (en) 2003-02-24 2006-10-03 Samsung Electronics Co., Ltd. Phase changeable memory devices
US6813178B2 (en) 2003-03-12 2004-11-02 Micron Technology, Inc. Chalcogenide glass constant current device, and its method of fabrication and operation
KR100560659B1 (ko) * 2003-03-21 2006-03-16 삼성전자주식회사 상변화 기억 소자 및 그 제조 방법
US7050327B2 (en) 2003-04-10 2006-05-23 Micron Technology, Inc. Differential negative resistance memory
US7220656B2 (en) 2003-04-29 2007-05-22 Micron Technology, Inc. Strained semiconductor by wafer bonding with misorientation
US6930909B2 (en) * 2003-06-25 2005-08-16 Micron Technology, Inc. Memory device and methods of controlling resistance variation and resistance profile drift
US6961277B2 (en) 2003-07-08 2005-11-01 Micron Technology, Inc. Method of refreshing a PCRAM memory device
US20050029504A1 (en) * 2003-08-04 2005-02-10 Karpov Ilya V. Reducing parasitic conductive paths in phase change memories
US7211819B2 (en) * 2003-08-04 2007-05-01 Intel Corporation Damascene phase change memory
US7381611B2 (en) 2003-08-04 2008-06-03 Intel Corporation Multilayered phase change memory
EP1678442B8 (de) 2003-10-31 2013-06-26 Phoseon Technology, Inc. LED-Lichtmodul und Herstellungsverfahren
US7928420B2 (en) * 2003-12-10 2011-04-19 International Business Machines Corporation Phase change tip storage cell
US7943919B2 (en) * 2003-12-10 2011-05-17 International Business Machines Corporation Integrated circuit with upstanding stylus
US7057923B2 (en) * 2003-12-10 2006-06-06 International Buisness Machines Corp. Field emission phase change diode memory
KR100583118B1 (ko) * 2003-12-19 2006-05-23 주식회사 하이닉스반도체 반도체 소자의 캐패시터 형성방법
KR100568511B1 (ko) * 2003-12-30 2006-04-07 삼성전자주식회사 상전이막 패턴을 갖는 반도체 장치들 및 그 제조방법들
CN100508235C (zh) * 2004-01-09 2009-07-01 中国科学院上海微系统与信息技术研究所 相变存储器单元器件的制备方法
US7153721B2 (en) * 2004-01-28 2006-12-26 Micron Technology, Inc. Resistance variable memory elements based on polarized silver-selenide network growth
KR100564608B1 (ko) * 2004-01-29 2006-03-28 삼성전자주식회사 상변화 메모리 소자
US7105864B2 (en) * 2004-01-29 2006-09-12 Micron Technology, Inc. Non-volatile zero field splitting resonance memory
US7583551B2 (en) 2004-03-10 2009-09-01 Micron Technology, Inc. Power management control and controlling memory refresh operations
WO2005091392A1 (en) 2004-03-18 2005-09-29 Phoseon Technology, Inc. Micro-reflectors on a substrate for high-density led array
US7005665B2 (en) * 2004-03-18 2006-02-28 International Business Machines Corporation Phase change memory cell on silicon-on insulator substrate
KR100546406B1 (ko) * 2004-04-10 2006-01-26 삼성전자주식회사 상변화 메모리 소자 제조 방법
KR100639206B1 (ko) * 2004-06-30 2006-10-30 주식회사 하이닉스반도체 상변환 기억 소자 및 그 제조방법
US7354793B2 (en) 2004-08-12 2008-04-08 Micron Technology, Inc. Method of forming a PCRAM device incorporating a resistance-variable chalocogenide element
US7326950B2 (en) 2004-07-19 2008-02-05 Micron Technology, Inc. Memory device with switching glass layer
KR100612906B1 (ko) * 2004-08-02 2006-08-14 삼성전자주식회사 상변화 기억 소자의 형성 방법
CN100397561C (zh) * 2004-08-06 2008-06-25 中国科学院上海微系统与信息技术研究所 一种纳米相变存储器器件单元的制备方法
US7365411B2 (en) 2004-08-12 2008-04-29 Micron Technology, Inc. Resistance variable memory with temperature tolerant materials
KR100566699B1 (ko) * 2004-08-17 2006-04-03 삼성전자주식회사 상변화 메모리 장치 및 그 제조 방법
KR100663348B1 (ko) * 2004-09-02 2007-01-02 삼성전자주식회사 몰딩막 및 형성막 패턴 사이에 개재된 상전이막 패턴을갖는 피이. 램들 및 그 형성방법들.
US20060108667A1 (en) * 2004-11-22 2006-05-25 Macronix International Co., Ltd. Method for manufacturing a small pin on integrated circuits or other devices
US7220983B2 (en) * 2004-12-09 2007-05-22 Macronix International Co., Ltd. Self-aligned small contact phase-change memory method and device
US7374174B2 (en) 2004-12-22 2008-05-20 Micron Technology, Inc. Small electrode for resistance variable devices
EP1677371A1 (de) * 2004-12-30 2006-07-05 STMicroelectronics S.r.l. Zweiteiliger Widerstandsheizer für Phasenwechselspeicher und Herstellungsmethode
KR101288758B1 (ko) 2004-12-30 2013-07-23 포세온 테크날러지 인코퍼레이티드 산업 공정에서 광원을 사용하는 시스템 및 방법
US7709334B2 (en) 2005-12-09 2010-05-04 Macronix International Co., Ltd. Stacked non-volatile memory device and methods for fabricating the same
KR100707182B1 (ko) * 2005-02-18 2007-04-13 삼성전자주식회사 상전이 메모리 소자 및 제조방법
US7317200B2 (en) 2005-02-23 2008-01-08 Micron Technology, Inc. SnSe-based limited reprogrammable cell
US8022382B2 (en) * 2005-03-11 2011-09-20 Taiwan Semiconductor Manufacturing Company, Ltd. Phase change memory devices with reduced programming current
US7709289B2 (en) 2005-04-22 2010-05-04 Micron Technology, Inc. Memory elements having patterned electrodes and method of forming the same
US7427770B2 (en) 2005-04-22 2008-09-23 Micron Technology, Inc. Memory array for increased bit density
US7696503B2 (en) * 2005-06-17 2010-04-13 Macronix International Co., Ltd. Multi-level memory cell having phase change element and asymmetrical thermal boundary
US8237140B2 (en) * 2005-06-17 2012-08-07 Macronix International Co., Ltd. Self-aligned, embedded phase change RAM
US7321130B2 (en) 2005-06-17 2008-01-22 Macronix International Co., Ltd. Thin film fuse phase change RAM and manufacturing method
US7238994B2 (en) 2005-06-17 2007-07-03 Macronix International Co., Ltd. Thin film plate phase change ram circuit and manufacturing method
US7534647B2 (en) 2005-06-17 2009-05-19 Macronix International Co., Ltd. Damascene phase change RAM and manufacturing method
US7598512B2 (en) * 2005-06-17 2009-10-06 Macronix International Co., Ltd. Thin film fuse phase change cell with thermal isolation layer and manufacturing method
US7514367B2 (en) * 2005-06-17 2009-04-07 Macronix International Co., Ltd. Method for manufacturing a narrow structure on an integrated circuit
US7514288B2 (en) * 2005-06-17 2009-04-07 Macronix International Co., Ltd. Manufacturing methods for thin film fuse phase change ram
US7274034B2 (en) 2005-08-01 2007-09-25 Micron Technology, Inc. Resistance variable memory device with sputtered metal-chalcogenide region and method of fabrication
US7332735B2 (en) 2005-08-02 2008-02-19 Micron Technology, Inc. Phase change memory cell and method of formation
US7579615B2 (en) 2005-08-09 2009-08-25 Micron Technology, Inc. Access transistor for memory device
US7251154B2 (en) 2005-08-15 2007-07-31 Micron Technology, Inc. Method and apparatus providing a cross-point memory array using a variable resistance memory cell and capacitance
KR100637235B1 (ko) * 2005-08-26 2006-10-20 삼성에스디아이 주식회사 플라즈마 디스플레이 패널
KR100655440B1 (ko) 2005-08-30 2006-12-08 삼성전자주식회사 상변화 기억 소자 및 그 형성 방법
US7601995B2 (en) * 2005-10-27 2009-10-13 Infineon Technologies Ag Integrated circuit having resistive memory cells
US7417245B2 (en) * 2005-11-02 2008-08-26 Infineon Technologies Ag Phase change memory having multilayer thermal insulation
US7397060B2 (en) 2005-11-14 2008-07-08 Macronix International Co., Ltd. Pipe shaped phase change memory
US20070111429A1 (en) * 2005-11-14 2007-05-17 Macronix International Co., Ltd. Method of manufacturing a pipe shaped phase change memory
US7786460B2 (en) * 2005-11-15 2010-08-31 Macronix International Co., Ltd. Phase change memory device and manufacturing method
US7635855B2 (en) 2005-11-15 2009-12-22 Macronix International Co., Ltd. I-shaped phase change memory cell
US7450411B2 (en) 2005-11-15 2008-11-11 Macronix International Co., Ltd. Phase change memory device and manufacturing method
US7394088B2 (en) * 2005-11-15 2008-07-01 Macronix International Co., Ltd. Thermally contained/insulated phase change memory device and method (combined)
US7414258B2 (en) 2005-11-16 2008-08-19 Macronix International Co., Ltd. Spacer electrode small pin phase change memory RAM and manufacturing method
US7829876B2 (en) * 2005-11-21 2010-11-09 Macronix International Co., Ltd. Vacuum cell thermal isolation for a phase change memory device
US7507986B2 (en) 2005-11-21 2009-03-24 Macronix International Co., Ltd. Thermal isolation for an active-sidewall phase change memory cell
CN100524878C (zh) * 2005-11-21 2009-08-05 旺宏电子股份有限公司 具有空气绝热单元的可编程电阻材料存储阵列
US7479649B2 (en) * 2005-11-21 2009-01-20 Macronix International Co., Ltd. Vacuum jacketed electrode for phase change memory element
US7449710B2 (en) * 2005-11-21 2008-11-11 Macronix International Co., Ltd. Vacuum jacket for phase change memory element
US7599217B2 (en) 2005-11-22 2009-10-06 Macronix International Co., Ltd. Memory cell device and manufacturing method
US7459717B2 (en) 2005-11-28 2008-12-02 Macronix International Co., Ltd. Phase change memory cell and manufacturing method
US7688619B2 (en) 2005-11-28 2010-03-30 Macronix International Co., Ltd. Phase change memory cell and manufacturing method
US7521364B2 (en) 2005-12-02 2009-04-21 Macronix Internation Co., Ltd. Surface topology improvement method for plug surface areas
US7605079B2 (en) * 2005-12-05 2009-10-20 Macronix International Co., Ltd. Manufacturing method for phase change RAM with electrode layer process
US7642539B2 (en) * 2005-12-13 2010-01-05 Macronix International Co., Ltd. Thin film fuse phase change cell with thermal isolation pad and manufacturing method
JP2007165710A (ja) * 2005-12-15 2007-06-28 Elpida Memory Inc 不揮発性メモリ素子の製造方法
KR100655082B1 (ko) * 2005-12-23 2006-12-08 삼성전자주식회사 상변화 메모리 소자 및 그 제조방법
US7531825B2 (en) * 2005-12-27 2009-05-12 Macronix International Co., Ltd. Method for forming self-aligned thermal isolation cell for a variable resistance memory array
US8062833B2 (en) * 2005-12-30 2011-11-22 Macronix International Co., Ltd. Chalcogenide layer etching method
US7595218B2 (en) * 2006-01-09 2009-09-29 Macronix International Co., Ltd. Programmable resistive RAM and manufacturing method
US7741636B2 (en) * 2006-01-09 2010-06-22 Macronix International Co., Ltd. Programmable resistive RAM and manufacturing method
US7560337B2 (en) * 2006-01-09 2009-07-14 Macronix International Co., Ltd. Programmable resistive RAM and manufacturing method
US20070158632A1 (en) * 2006-01-09 2007-07-12 Macronix International Co., Ltd. Method for Fabricating a Pillar-Shaped Phase Change Memory Element
US7825396B2 (en) 2006-01-11 2010-11-02 Macronix International Co., Ltd. Self-align planerized bottom electrode phase change memory and manufacturing method
US7692272B2 (en) 2006-01-19 2010-04-06 Elpida Memory, Inc. Electrically rewritable non-volatile memory element and method of manufacturing the same
US7432206B2 (en) * 2006-01-24 2008-10-07 Macronix International Co., Ltd. Self-aligned manufacturing method, and manufacturing method for thin film fuse phase change ram
US7456421B2 (en) * 2006-01-30 2008-11-25 Macronix International Co., Ltd. Vertical side wall active pin structures in a phase change memory and manufacturing methods
US7956358B2 (en) * 2006-02-07 2011-06-07 Macronix International Co., Ltd. I-shaped phase change memory cell with thermal isolation
US7714315B2 (en) * 2006-02-07 2010-05-11 Qimonda North America Corp. Thermal isolation of phase change memory cells
US7910907B2 (en) * 2006-03-15 2011-03-22 Macronix International Co., Ltd. Manufacturing method for pipe-shaped electrode phase change memory
US7388236B2 (en) * 2006-03-29 2008-06-17 Cree, Inc. High efficiency and/or high power density wide bandgap transistors
US9178141B2 (en) 2006-04-04 2015-11-03 Micron Technology, Inc. Memory elements using self-aligned phase change material layers and methods of manufacturing same
US7812334B2 (en) * 2006-04-04 2010-10-12 Micron Technology, Inc. Phase change memory elements using self-aligned phase change material layers and methods of making and using same
KR100868321B1 (ko) * 2006-04-14 2008-11-11 재단법인서울대학교산학협력재단 다중 비트 상변화 메모리 소자의 단위 셀
US7554144B2 (en) 2006-04-17 2009-06-30 Macronix International Co., Ltd. Memory device and manufacturing method
US7928421B2 (en) 2006-04-21 2011-04-19 Macronix International Co., Ltd. Phase change memory cell with vacuum spacer
US8129706B2 (en) * 2006-05-05 2012-03-06 Macronix International Co., Ltd. Structures and methods of a bistable resistive random access memory
US7608848B2 (en) * 2006-05-09 2009-10-27 Macronix International Co., Ltd. Bridge resistance random access memory device with a singular contact structure
KR100782482B1 (ko) * 2006-05-19 2007-12-05 삼성전자주식회사 GeBiTe막을 상변화 물질막으로 채택하는 상변화 기억 셀, 이를 구비하는 상변화 기억소자, 이를 구비하는 전자 장치 및 그 제조방법
US7423300B2 (en) 2006-05-24 2008-09-09 Macronix International Co., Ltd. Single-mask phase change memory element
KR100748557B1 (ko) * 2006-05-26 2007-08-10 삼성전자주식회사 상변화 메모리 장치
US7820997B2 (en) * 2006-05-30 2010-10-26 Macronix International Co., Ltd. Resistor random access memory cell with reduced active area and reduced contact areas
US7732800B2 (en) * 2006-05-30 2010-06-08 Macronix International Co., Ltd. Resistor random access memory cell with L-shaped electrode
JP4437297B2 (ja) * 2006-06-22 2010-03-24 エルピーダメモリ株式会社 半導体記憶装置及び半導体記憶装置の製造方法
US7696506B2 (en) 2006-06-27 2010-04-13 Macronix International Co., Ltd. Memory cell with memory material insulation and manufacturing method
US7785920B2 (en) * 2006-07-12 2010-08-31 Macronix International Co., Ltd. Method for making a pillar-type phase change memory element
US7442603B2 (en) * 2006-08-16 2008-10-28 Macronix International Co., Ltd. Self-aligned structure and method for confining a melting point in a resistor random access memory
JP4257352B2 (ja) * 2006-08-22 2009-04-22 エルピーダメモリ株式会社 半導体記憶装置及び半導体記憶装置の製造方法
US7560723B2 (en) 2006-08-29 2009-07-14 Micron Technology, Inc. Enhanced memory density resistance variable memory cells, arrays, devices and systems including the same, and methods of fabrication
US7772581B2 (en) 2006-09-11 2010-08-10 Macronix International Co., Ltd. Memory device having wide area phase change element and small electrode contact area
KR100810615B1 (ko) * 2006-09-20 2008-03-06 삼성전자주식회사 고온 상전이 패턴을 구비한 상전이 메모리소자 및 그제조방법
US7504653B2 (en) 2006-10-04 2009-03-17 Macronix International Co., Ltd. Memory cell device with circumferentially-extending memory element
US7510929B2 (en) * 2006-10-18 2009-03-31 Macronix International Co., Ltd. Method for making memory cell device
US7388771B2 (en) 2006-10-24 2008-06-17 Macronix International Co., Ltd. Methods of operating a bistable resistance random access memory with multiple memory layers and multilevel memory states
US20080094885A1 (en) * 2006-10-24 2008-04-24 Macronix International Co., Ltd. Bistable Resistance Random Access Memory Structures with Multiple Memory Layers and Multilevel Memory States
US7863655B2 (en) 2006-10-24 2011-01-04 Macronix International Co., Ltd. Phase change memory cells with dual access devices
US7527985B2 (en) * 2006-10-24 2009-05-05 Macronix International Co., Ltd. Method for manufacturing a resistor random access memory with reduced active area and reduced contact areas
US8067762B2 (en) 2006-11-16 2011-11-29 Macronix International Co., Ltd. Resistance random access memory structure for enhanced retention
US20080128675A1 (en) * 2006-11-30 2008-06-05 Michele Magistretti Phase change memory cell having a tapered microtrench
US7476587B2 (en) * 2006-12-06 2009-01-13 Macronix International Co., Ltd. Method for making a self-converged memory material element for memory cell
US7682868B2 (en) 2006-12-06 2010-03-23 Macronix International Co., Ltd. Method for making a keyhole opening during the manufacture of a memory cell
US20080137400A1 (en) * 2006-12-06 2008-06-12 Macronix International Co., Ltd. Phase Change Memory Cell with Thermal Barrier and Method for Fabricating the Same
US7473576B2 (en) * 2006-12-06 2009-01-06 Macronix International Co., Ltd. Method for making a self-converged void and bottom electrode for memory cell
US7697316B2 (en) * 2006-12-07 2010-04-13 Macronix International Co., Ltd. Multi-level cell resistance random access memory with metal oxides
US7903447B2 (en) * 2006-12-13 2011-03-08 Macronix International Co., Ltd. Method, apparatus and computer program product for read before programming process on programmable resistive memory cell
US8344347B2 (en) * 2006-12-15 2013-01-01 Macronix International Co., Ltd. Multi-layer electrode structure
KR20080057094A (ko) * 2006-12-19 2008-06-24 삼성전자주식회사 상변화 메모리 소자와 그 제조 및 동작 방법
US7718989B2 (en) * 2006-12-28 2010-05-18 Macronix International Co., Ltd. Resistor random access memory cell device
US7515461B2 (en) * 2007-01-05 2009-04-07 Macronix International Co., Ltd. Current compliant sensing architecture for multilevel phase change memory
US7440315B2 (en) 2007-01-09 2008-10-21 Macronix International Co., Ltd. Method, apparatus and computer program product for stepped reset programming process on programmable resistive memory cell
US7433226B2 (en) 2007-01-09 2008-10-07 Macronix International Co., Ltd. Method, apparatus and computer program product for read before programming process on multiple programmable resistive memory cell
US7535756B2 (en) 2007-01-31 2009-05-19 Macronix International Co., Ltd. Method to tighten set distribution for PCRAM
US7663135B2 (en) 2007-01-31 2010-02-16 Macronix International Co., Ltd. Memory cell having a side electrode contact
US7619311B2 (en) 2007-02-02 2009-11-17 Macronix International Co., Ltd. Memory cell device with coplanar electrode surface and method
US7701759B2 (en) * 2007-02-05 2010-04-20 Macronix International Co., Ltd. Memory cell device and programming methods
US7483292B2 (en) * 2007-02-07 2009-01-27 Macronix International Co., Ltd. Memory cell with separate read and program paths
US7463512B2 (en) * 2007-02-08 2008-12-09 Macronix International Co., Ltd. Memory element with reduced-current phase change element
US8115213B2 (en) 2007-02-08 2012-02-14 Phoseon Technology, Inc. Semiconductor light sources, systems, and methods
US8138028B2 (en) * 2007-02-12 2012-03-20 Macronix International Co., Ltd Method for manufacturing a phase change memory device with pillar bottom electrode
US7884343B2 (en) * 2007-02-14 2011-02-08 Macronix International Co., Ltd. Phase change memory cell with filled sidewall memory element and method for fabricating the same
US7619237B2 (en) * 2007-02-21 2009-11-17 Macronix International Co., Ltd. Programmable resistive memory cell with self-forming gap
US8008643B2 (en) * 2007-02-21 2011-08-30 Macronix International Co., Ltd. Phase change memory cell with heater and method for fabricating the same
US7956344B2 (en) * 2007-02-27 2011-06-07 Macronix International Co., Ltd. Memory cell with memory element contacting ring-shaped upper end of bottom electrode
US7786461B2 (en) 2007-04-03 2010-08-31 Macronix International Co., Ltd. Memory structure with reduced-size memory element between memory material portions
US8610098B2 (en) 2007-04-06 2013-12-17 Macronix International Co., Ltd. Phase change memory bridge cell with diode isolation device
US7755076B2 (en) * 2007-04-17 2010-07-13 Macronix International Co., Ltd. 4F2 self align side wall active phase change memory
US7569844B2 (en) * 2007-04-17 2009-08-04 Macronix International Co., Ltd. Memory cell sidewall contacting side electrode
US7483316B2 (en) * 2007-04-24 2009-01-27 Macronix International Co., Ltd. Method and apparatus for refreshing programmable resistive memory
KR100922392B1 (ko) * 2007-05-04 2009-10-19 삼성전자주식회사 상변화 메모리 소자 및 그 형성 방법
US7888719B2 (en) * 2007-05-23 2011-02-15 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor memory structures
WO2008149605A1 (ja) * 2007-06-04 2008-12-11 Nec Corporation 抵抗変化素子およびこれを備えた半導体装置
US8410607B2 (en) * 2007-06-15 2013-04-02 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor memory structures
US8237149B2 (en) * 2007-06-18 2012-08-07 Samsung Electronics Co., Ltd. Non-volatile memory device having bottom electrode
KR100911473B1 (ko) * 2007-06-18 2009-08-11 삼성전자주식회사 상변화 메모리 유닛, 이의 제조 방법, 이를 포함하는상변화 메모리 장치 및 그 제조 방법
US8513637B2 (en) 2007-07-13 2013-08-20 Macronix International Co., Ltd. 4F2 self align fin bottom electrodes FET drive phase change memory
TWI402980B (zh) 2007-07-20 2013-07-21 Macronix Int Co Ltd 具有緩衝層之電阻式記憶結構
US7884342B2 (en) * 2007-07-31 2011-02-08 Macronix International Co., Ltd. Phase change memory bridge cell
US7729161B2 (en) * 2007-08-02 2010-06-01 Macronix International Co., Ltd. Phase change memory with dual word lines and source lines and method of operating same
US9018615B2 (en) 2007-08-03 2015-04-28 Macronix International Co., Ltd. Resistor random access memory structure having a defined small area of electrical contact
US7678606B2 (en) * 2007-09-04 2010-03-16 Industrial Technology Research Institute Phase change memory device and fabrication method thereof
US7642125B2 (en) 2007-09-14 2010-01-05 Macronix International Co., Ltd. Phase change memory cell in via array with self-aligned, self-converged bottom electrode and method for manufacturing
US8178386B2 (en) 2007-09-14 2012-05-15 Macronix International Co., Ltd. Phase change memory cell array with self-converged bottom electrode and method for manufacturing
KR101162760B1 (ko) * 2007-10-08 2012-07-05 삼성전자주식회사 상변화 메모리 소자 및 그의 제조방법
US7551473B2 (en) * 2007-10-12 2009-06-23 Macronix International Co., Ltd. Programmable resistive memory with diode structure
US7919766B2 (en) 2007-10-22 2011-04-05 Macronix International Co., Ltd. Method for making self aligning pillar memory cell device
US7804083B2 (en) * 2007-11-14 2010-09-28 Macronix International Co., Ltd. Phase change memory cell including a thermal protect bottom electrode and manufacturing methods
US7646631B2 (en) 2007-12-07 2010-01-12 Macronix International Co., Ltd. Phase change memory cell having interface structures with essentially equal thermal impedances and manufacturing methods
US7639527B2 (en) 2008-01-07 2009-12-29 Macronix International Co., Ltd. Phase change memory dynamic resistance test and manufacturing methods
US7879643B2 (en) 2008-01-18 2011-02-01 Macronix International Co., Ltd. Memory cell with memory element contacting an inverted T-shaped bottom electrode
US7879645B2 (en) 2008-01-28 2011-02-01 Macronix International Co., Ltd. Fill-in etching free pore device
US8189372B2 (en) * 2008-02-05 2012-05-29 International Business Machines Corporation Integrated circuit including electrode having recessed portion
US8158965B2 (en) 2008-02-05 2012-04-17 Macronix International Co., Ltd. Heating center PCRAM structure and methods for making
US7855435B2 (en) * 2008-03-12 2010-12-21 Qimonda Ag Integrated circuit, method of manufacturing an integrated circuit, and memory module
US7852658B2 (en) * 2008-03-14 2010-12-14 Micron Technology, Inc. Phase change memory cell with constriction structure
US20090239334A1 (en) * 2008-03-20 2009-09-24 International Business Machines Corporation Electrode formed in aperture defined by a copolymer mask
US8084842B2 (en) 2008-03-25 2011-12-27 Macronix International Co., Ltd. Thermally stabilized electrode structure
US7579210B1 (en) * 2008-03-25 2009-08-25 Ovonyx, Inc. Planar segmented contact
US8030634B2 (en) 2008-03-31 2011-10-04 Macronix International Co., Ltd. Memory array with diode driver and method for fabricating the same
US7825398B2 (en) 2008-04-07 2010-11-02 Macronix International Co., Ltd. Memory cell having improved mechanical stability
US7791057B2 (en) 2008-04-22 2010-09-07 Macronix International Co., Ltd. Memory cell having a buried phase change region and method for fabricating the same
US8077505B2 (en) 2008-05-07 2011-12-13 Macronix International Co., Ltd. Bipolar switching of phase change device
US7701750B2 (en) 2008-05-08 2010-04-20 Macronix International Co., Ltd. Phase change device having two or more substantial amorphous regions in high resistance state
TWI426604B (zh) * 2008-06-03 2014-02-11 Higgs Opl Capital Llc 相變化記憶裝置及其製造方法
WO2009152108A2 (en) * 2008-06-10 2009-12-17 Advanced Technology Materials, Inc. GeSbTe MATERIAL INCLUDING SUPERFLOW LAYER(S), AND USE OF Ge TO PREVENT INTERACTION OF Te FROM SbXTeY AND GeXTeY RESULTING IN HIGH Te CONTENT AND FILM CRISTALLINITY
US8415651B2 (en) 2008-06-12 2013-04-09 Macronix International Co., Ltd. Phase change memory cell having top and bottom sidewall contacts
US8134857B2 (en) 2008-06-27 2012-03-13 Macronix International Co., Ltd. Methods for high speed reading operation of phase change memory and device employing same
US7932506B2 (en) 2008-07-22 2011-04-26 Macronix International Co., Ltd. Fully self-aligned pore-type memory cell having diode access device
US8467236B2 (en) 2008-08-01 2013-06-18 Boise State University Continuously variable resistor
US7903457B2 (en) 2008-08-19 2011-03-08 Macronix International Co., Ltd. Multiple phase change materials in an integrated circuit for system on a chip application
US7772583B2 (en) * 2008-08-21 2010-08-10 Micron Technology, Inc. Memory devices and methods of forming the same
US20100051896A1 (en) * 2008-09-02 2010-03-04 Samsung Electronics Co., Ltd. Variable resistance memory device using a channel-shaped variable resistance pattern
US7719913B2 (en) 2008-09-12 2010-05-18 Macronix International Co., Ltd. Sensing circuit for PCRAM applications
IT1391864B1 (it) * 2008-09-30 2012-01-27 St Microelectronics Rousset Cella di memoria resistiva e metodo per la fabbricazione di una cella di memoria resistiva
US8324605B2 (en) 2008-10-02 2012-12-04 Macronix International Co., Ltd. Dielectric mesh isolated phase change structure for phase change memory
US8586962B2 (en) * 2008-10-06 2013-11-19 Samsung Electronics Co., Ltd. Cross point memory arrays, methods of manufacturing the same, masters for imprint processes, and methods of manufacturing masters
US7897954B2 (en) 2008-10-10 2011-03-01 Macronix International Co., Ltd. Dielectric-sandwiched pillar memory device
CN101728482B (zh) * 2008-10-24 2011-12-07 中芯国际集成电路制造(上海)有限公司 相变半导体器件的制造方法及相变半导体器件
US8097870B2 (en) * 2008-11-05 2012-01-17 Seagate Technology Llc Memory cell with alignment structure
US8036014B2 (en) * 2008-11-06 2011-10-11 Macronix International Co., Ltd. Phase change memory program method without over-reset
US8907316B2 (en) 2008-11-07 2014-12-09 Macronix International Co., Ltd. Memory cell access device having a pn-junction with polycrystalline and single crystal semiconductor regions
US8664689B2 (en) 2008-11-07 2014-03-04 Macronix International Co., Ltd. Memory cell access device having a pn-junction with polycrystalline plug and single-crystal semiconductor regions
US7869270B2 (en) * 2008-12-29 2011-01-11 Macronix International Co., Ltd. Set algorithm for phase change memory cell
US8089137B2 (en) 2009-01-07 2012-01-03 Macronix International Co., Ltd. Integrated circuit memory with single crystal silicon on silicide driver and manufacturing method
US8093661B2 (en) * 2009-01-07 2012-01-10 Macronix International Co., Ltd. Integrated circuit device with single crystal silicon on silicide and manufacturing method
KR20100082604A (ko) * 2009-01-09 2010-07-19 삼성전자주식회사 가변저항 메모리 장치 및 그의 형성 방법
US8107283B2 (en) 2009-01-12 2012-01-31 Macronix International Co., Ltd. Method for setting PCRAM devices
US8030635B2 (en) 2009-01-13 2011-10-04 Macronix International Co., Ltd. Polysilicon plug bipolar transistor for phase change memory
US8064247B2 (en) 2009-01-14 2011-11-22 Macronix International Co., Ltd. Rewritable memory device based on segregation/re-absorption
US8933536B2 (en) 2009-01-22 2015-01-13 Macronix International Co., Ltd. Polysilicon pillar bipolar transistor with self-aligned memory element
US8653737B2 (en) 2009-04-14 2014-02-18 Phoseon Technology, Inc. Controller for semiconductor lighting device
US8678612B2 (en) 2009-04-14 2014-03-25 Phoseon Technology, Inc. Modular light source
US8084760B2 (en) 2009-04-20 2011-12-27 Macronix International Co., Ltd. Ring-shaped electrode and manufacturing method for same
US8173987B2 (en) 2009-04-27 2012-05-08 Macronix International Co., Ltd. Integrated circuit 3D phase change memory array and manufacturing method
US8097871B2 (en) 2009-04-30 2012-01-17 Macronix International Co., Ltd. Low operational current phase change memory structures
US7933139B2 (en) 2009-05-15 2011-04-26 Macronix International Co., Ltd. One-transistor, one-resistor, one-capacitor phase change memory
US8350316B2 (en) 2009-05-22 2013-01-08 Macronix International Co., Ltd. Phase change memory cells having vertical channel access transistor and memory plane
US7968876B2 (en) 2009-05-22 2011-06-28 Macronix International Co., Ltd. Phase change memory cell having vertical channel access transistor
US8809829B2 (en) 2009-06-15 2014-08-19 Macronix International Co., Ltd. Phase change memory having stabilized microstructure and manufacturing method
US8406033B2 (en) 2009-06-22 2013-03-26 Macronix International Co., Ltd. Memory device and method for sensing and fixing margin cells
US8238149B2 (en) 2009-06-25 2012-08-07 Macronix International Co., Ltd. Methods and apparatus for reducing defect bits in phase change memory
US8363463B2 (en) 2009-06-25 2013-01-29 Macronix International Co., Ltd. Phase change memory having one or more non-constant doping profiles
US8138056B2 (en) 2009-07-03 2012-03-20 International Business Machines Corporation Thermally insulated phase change material memory cells with pillar structure
US8198619B2 (en) 2009-07-15 2012-06-12 Macronix International Co., Ltd. Phase change memory cell structure
US8110822B2 (en) 2009-07-15 2012-02-07 Macronix International Co., Ltd. Thermal protect PCRAM structure and methods for making
US7894254B2 (en) 2009-07-15 2011-02-22 Macronix International Co., Ltd. Refresh circuitry for phase change memory
CN101964394B (zh) * 2009-07-24 2012-10-17 中芯国际集成电路制造(上海)有限公司 一种制作相变存储单元相变单元的方法
US8064248B2 (en) 2009-09-17 2011-11-22 Macronix International Co., Ltd. 2T2R-1T1R mix mode phase change memory array
US8178387B2 (en) 2009-10-23 2012-05-15 Macronix International Co., Ltd. Methods for reducing recrystallization time for a phase change material
US8465172B2 (en) 2009-12-17 2013-06-18 Phoseon Technology, Inc. Lighting module with diffractive optical element
KR101617381B1 (ko) * 2009-12-21 2016-05-02 삼성전자주식회사 가변 저항 메모리 장치 및 그 형성 방법
KR20110076394A (ko) * 2009-12-29 2011-07-06 삼성전자주식회사 상변화 메모리 장치
KR20110090583A (ko) * 2010-02-04 2011-08-10 삼성전자주식회사 상변화 메모리 장치 및 그 형성 방법
US8669697B2 (en) 2010-03-11 2014-03-11 Phoseon Technology, Inc. Cooling large arrays with high heat flux densities
KR101709323B1 (ko) 2010-04-23 2017-02-22 삼성전자주식회사 가변 저항 메모리 소자 및 그 제조 방법
US8729521B2 (en) 2010-05-12 2014-05-20 Macronix International Co., Ltd. Self aligned fin-type programmable memory cell
US8591078B2 (en) 2010-06-03 2013-11-26 Phoseon Technology, Inc. Microchannel cooler for light emitting diode light fixtures
US8310864B2 (en) 2010-06-15 2012-11-13 Macronix International Co., Ltd. Self-aligned bit line under word line memory array
US9082954B2 (en) 2010-09-24 2015-07-14 Macronix International Co., Ltd. PCRAM with current flowing laterally relative to axis defined by electrodes
US8395935B2 (en) 2010-10-06 2013-03-12 Macronix International Co., Ltd. Cross-point self-aligned reduced cell size phase change memory
US8497705B2 (en) 2010-11-09 2013-07-30 Macronix International Co., Ltd. Phase change device for interconnection of programmable logic device
US8467238B2 (en) 2010-11-15 2013-06-18 Macronix International Co., Ltd. Dynamic pulse operation for phase change memory
US9357592B2 (en) 2010-11-18 2016-05-31 Phoseon Technology, Inc. Light source temperature monitor and control
US8273598B2 (en) * 2011-02-03 2012-09-25 International Business Machines Corporation Method for forming a self-aligned bit line for PCRAM and self-aligned etch back process
US8524599B2 (en) * 2011-03-17 2013-09-03 Micron Technology, Inc. Methods of forming at least one conductive element and methods of forming a semiconductor structure
US8518811B2 (en) 2011-04-08 2013-08-27 Infineon Technologies Ag Schottky diodes having metal gate electrodes and methods of formation thereof
US9293197B2 (en) 2011-08-15 2016-03-22 Lockheed Martin Corporation Reconfigurable phase change material masks for electro-optical compressive sensing
US8932900B2 (en) 2011-08-24 2015-01-13 Taiwan Semiconductor Manufacturing Company, Ltd. Phase change memory and method of fabricating same
US8872137B2 (en) 2011-09-15 2014-10-28 Phoseon Technology, Inc. Dual elliptical reflector with a co-located foci for curing optical fibers
US9126432B2 (en) 2011-09-20 2015-09-08 Phoseon Technology, Inc. Differential Ultraviolet curing using external optical elements
EP3552719B1 (de) 2011-10-12 2020-07-01 Phoseon Technology, Inc. Mehrere lichtsammlungs- und linsenkombinationen mit benachbarten foki zur härtung von optischen fasern
US8823279B2 (en) 2011-10-27 2014-09-02 Phoseon Technology, Inc. Smart FET circuit
US8932901B2 (en) 2011-10-31 2015-01-13 Macronix International Co., Ltd. Stressed phase change materials
US8931928B2 (en) 2011-11-01 2015-01-13 Phoseon Technology, Inc. Removable window frame for lighting module
US8987700B2 (en) 2011-12-02 2015-03-24 Macronix International Co., Ltd. Thermally confined electrode for programmable resistance memory
US8851715B2 (en) 2012-01-13 2014-10-07 Phoseon Technology, Inc. Lamp ventilation system
US8888336B2 (en) 2012-02-29 2014-11-18 Phoseon Technology, Inc. Air deflectors for heat management in a lighting module
US8678622B2 (en) 2012-04-27 2014-03-25 Phoseon Technology, Inc. Wrap-around window for lighting module
KR102117124B1 (ko) 2012-04-30 2020-05-29 엔테그리스, 아이엔씨. 유전체 물질로 중심-충전된 상 변화 합금을 포함하는 상 변화 메모리 구조체
CN102810637A (zh) * 2012-09-13 2012-12-05 中国科学院上海微系统与信息技术研究所 用于替代dram及flash的相变存储单元及其制作方法
US9640757B2 (en) 2012-10-30 2017-05-02 Entegris, Inc. Double self-aligned phase change memory device structure
CN103839919B (zh) * 2012-11-23 2018-09-14 中芯国际集成电路制造(上海)有限公司 电极的制造方法、熔丝装置及其制造方法
US9340446B1 (en) 2013-02-04 2016-05-17 Lockheed Martin Corporation Optical apparatus and method of forming a gradient index device
US9548449B2 (en) * 2013-06-25 2017-01-17 Intel Corporation Conductive oxide random access memory (CORAM) cell and method of fabricating same
CN103346258B (zh) * 2013-07-19 2015-08-26 中国科学院上海微系统与信息技术研究所 相变存储单元及其制备方法
US8872149B1 (en) * 2013-07-30 2014-10-28 Taiwan Semiconductor Manufacturing Company, Ltd. RRAM structure and process using composite spacer
US9336879B2 (en) 2014-01-24 2016-05-10 Macronix International Co., Ltd. Multiple phase change materials in an integrated circuit for system on a chip application
US9559113B2 (en) 2014-05-01 2017-01-31 Macronix International Co., Ltd. SSL/GSL gate oxide in 3D vertical channel NAND
US9159412B1 (en) 2014-07-15 2015-10-13 Macronix International Co., Ltd. Staggered write and verify for phase change memory
US10437083B1 (en) 2014-10-20 2019-10-08 Lockheed Martin Corporation Individually addressable infrared mask array
US9672906B2 (en) 2015-06-19 2017-06-06 Macronix International Co., Ltd. Phase change memory with inter-granular switching
CN105098071B (zh) * 2015-07-08 2018-01-05 江苏时代全芯存储科技有限公司 制造相变化记忆体的方法
US9969647B2 (en) 2016-05-17 2018-05-15 Lockheed Martin Energy, Llc Glass composites having a gradient index of refraction and methods for production thereof
US9908808B1 (en) 2016-08-18 2018-03-06 Lockheed Martin Corporation Ternary glass materials with low refractive index variability
US10483201B1 (en) * 2018-10-26 2019-11-19 Nanya Technology Corporation Semiconductor structure and method for manufacturing the same
US10950784B2 (en) * 2019-06-07 2021-03-16 Taiwan Semiconductor Manufacturing Co., Ltd. RRAM with a barrier layer

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4845533A (en) * 1986-08-22 1989-07-04 Energy Conversion Devices, Inc. Thin film electrical devices with amorphous carbon electrodes and method of making same
JPH07114260B2 (ja) * 1989-11-23 1995-12-06 財団法人韓国電子通信研究所 コップ状のポリシリコン貯蔵電極を有するスタック構造のdramセル,およびその製造方法
US5534712A (en) * 1991-01-18 1996-07-09 Energy Conversion Devices, Inc. Electrically erasable memory elements characterized by reduced current and improved thermal stability
US5536947A (en) * 1991-01-18 1996-07-16 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory element and arrays fabricated therefrom
US5534711A (en) * 1991-01-18 1996-07-09 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
KR940001426B1 (ko) * 1991-03-27 1994-02-23 삼성전자 주식회사 고집적 반도체 메모리장치 및 그 제조방법
US5391511A (en) * 1992-02-19 1995-02-21 Micron Technology, Inc. Semiconductor processing method of producing an isolated polysilicon lined cavity and a method of forming a capacitor
JP3566743B2 (ja) * 1993-12-13 2004-09-15 Tdk株式会社 光記録媒体
KR0151196B1 (ko) * 1994-01-12 1998-10-01 문정환 반도체 메모리장치의 제조방법
US5789758A (en) * 1995-06-07 1998-08-04 Micron Technology, Inc. Chalcogenide memory cell with a plurality of chalcogenide electrodes
US6420725B1 (en) * 1995-06-07 2002-07-16 Micron Technology, Inc. Method and apparatus for forming an integrated circuit electrode having a reduced contact area
US5555537A (en) * 1995-06-30 1996-09-10 International Business Machines Corporation Optical data storage system with multiple write-once phase-change recording layers
US5686337A (en) * 1996-01-11 1997-11-11 Vanguard International Semiconductor Corporation Method for fabricating stacked capacitors in a DRAM cell
KR100668180B1 (ko) * 1996-03-11 2007-01-11 마츠시타 덴끼 산교 가부시키가이샤 광학적 정보 기록매체와 그 제조방법 및 기록 재생 소거방법
US5789277A (en) * 1996-07-22 1998-08-04 Micron Technology, Inc. Method of making chalogenide memory device
US5998244A (en) * 1996-08-22 1999-12-07 Micron Technology, Inc. Memory cell incorporating a chalcogenide element and method of making same
US6031287A (en) * 1997-06-18 2000-02-29 Micron Technology, Inc. Contact structure and memory element incorporating the same
US5933365A (en) * 1997-06-19 1999-08-03 Energy Conversion Devices, Inc. Memory element with energy control mechanism
US7173317B1 (en) * 1998-11-09 2007-02-06 Micron Technology, Inc. Electrical and thermal contact for use in semiconductor devices
US6507061B1 (en) * 2001-08-31 2003-01-14 Intel Corporation Multiple layer phase-change memory

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US20030047762A1 (en) 2003-03-13
WO2003023875A2 (en) 2003-03-20
US6586761B2 (en) 2003-07-01
US6908812B2 (en) 2005-06-21
US20030201469A1 (en) 2003-10-30
CN100379046C (zh) 2008-04-02
CN1554125A (zh) 2004-12-08
DE10297191B4 (de) 2009-07-23
TW559915B (en) 2003-11-01
WO2003023875A3 (en) 2004-03-18
KR20040033017A (ko) 2004-04-17

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