DE19581936T1 - Plasmaverstärkte chemische Gasphasenabscheidung von Titannitrid unter der Verwendung von Ammoniak - Google Patents

Plasmaverstärkte chemische Gasphasenabscheidung von Titannitrid unter der Verwendung von Ammoniak

Info

Publication number
DE19581936T1
DE19581936T1 DE19581936T DE19581936T DE19581936T1 DE 19581936 T1 DE19581936 T1 DE 19581936T1 DE 19581936 T DE19581936 T DE 19581936T DE 19581936 T DE19581936 T DE 19581936T DE 19581936 T1 DE19581936 T1 DE 19581936T1
Authority
DE
Germany
Prior art keywords
ammonia
vapor deposition
chemical vapor
titanium nitride
plasma enhanced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE19581936T
Other languages
English (en)
Inventor
Robert F Foster
Rikhit Arora
Joseph T Hillman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Materials Research Corp
Original Assignee
Materials Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Materials Research Corp filed Critical Materials Research Corp
Publication of DE19581936T1 publication Critical patent/DE19581936T1/de
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76841—Barrier, adhesion or liner layers
    • H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45557—Pulsed pressure or control pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
DE19581936T 1995-03-10 1995-11-27 Plasmaverstärkte chemische Gasphasenabscheidung von Titannitrid unter der Verwendung von Ammoniak Ceased DE19581936T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/401,859 US5610106A (en) 1995-03-10 1995-03-10 Plasma enhanced chemical vapor deposition of titanium nitride using ammonia
PCT/US1995/015427 WO1996028586A1 (en) 1995-03-10 1995-11-27 Plasma enhanced chemical vapor deposition of titanium nitride using ammonia

Publications (1)

Publication Number Publication Date
DE19581936T1 true DE19581936T1 (de) 1998-04-16

Family

ID=23589517

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19581936T Ceased DE19581936T1 (de) 1995-03-10 1995-11-27 Plasmaverstärkte chemische Gasphasenabscheidung von Titannitrid unter der Verwendung von Ammoniak

Country Status (9)

Country Link
US (1) US5610106A (de)
JP (1) JPH11501987A (de)
KR (1) KR100356264B1 (de)
AU (1) AU4463596A (de)
CH (1) CH689640A5 (de)
DE (1) DE19581936T1 (de)
LU (1) LU90134B1 (de)
TW (1) TW369675B (de)
WO (1) WO1996028586A1 (de)

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US5665640A (en) 1994-06-03 1997-09-09 Sony Corporation Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
US6699530B2 (en) * 1995-07-06 2004-03-02 Applied Materials, Inc. Method for constructing a film on a semiconductor wafer
JP3469420B2 (ja) * 1996-12-20 2003-11-25 東京エレクトロン株式会社 Ｃｖｄ成膜方法
US6093645A (en) * 1997-02-10 2000-07-25 Tokyo Electron Limited Elimination of titanium nitride film deposition in tungsten plug technology using PE-CVD-TI and in-situ plasma nitridation
US6037252A (en) * 1997-11-05 2000-03-14 Tokyo Electron Limited Method of titanium nitride contact plug formation
US5997649A (en) * 1998-04-09 1999-12-07 Tokyo Electron Limited Stacked showerhead assembly for delivering gases and RF power to a reaction chamber
US6635569B1 (en) * 1998-04-20 2003-10-21 Tokyo Electron Limited Method of passivating and stabilizing a Ti-PECVD process chamber and combined Ti-PECVD/TiN-CVD processing method and apparatus
US6022800A (en) * 1998-04-29 2000-02-08 Worldwide Semiconductor Manufacturing Corporation Method of forming barrier layer for tungsten plugs in interlayer dielectrics
US6289842B1 (en) 1998-06-22 2001-09-18 Structured Materials Industries Inc. Plasma enhanced chemical vapor deposition system
US6302057B1 (en) 1998-09-15 2001-10-16 Tokyo Electron Limited Apparatus and method for electrically isolating an electrode in a PECVD process chamber
US6364954B2 (en) 1998-12-14 2002-04-02 Applied Materials, Inc. High temperature chemical vapor deposition chamber
US6221174B1 (en) 1999-02-11 2001-04-24 Applied Materials, Inc. Method of performing titanium/titanium nitride integration
GB2347686B (en) * 1999-03-08 2003-06-11 Trikon Holdings Ltd Gas delivery system
US6548402B2 (en) 1999-06-11 2003-04-15 Applied Materials, Inc. Method of depositing a thick titanium nitride film
US6555183B2 (en) 1999-06-11 2003-04-29 Applied Materials, Inc. Plasma treatment of a titanium nitride film formed by chemical vapor deposition
US6328871B1 (en) * 1999-08-16 2001-12-11 Applied Materials, Inc. Barrier layer for electroplating processes
US6436819B1 (en) 2000-02-01 2002-08-20 Applied Materials, Inc. Nitrogen treatment of a metal nitride/metal stack
US6436820B1 (en) 2000-02-03 2002-08-20 Applied Materials, Inc Method for the CVD deposition of a low residual halogen content multi-layered titanium nitride film having a combined thickness greater than 1000 Å
US6399490B1 (en) 2000-06-29 2002-06-04 International Business Machines Corporation Highly conformal titanium nitride deposition process for high aspect ratio structures
US6403478B1 (en) 2000-08-31 2002-06-11 Chartered Semiconductor Manufacturing Company Low pre-heat pressure CVD TiN process
US6508919B1 (en) * 2000-11-28 2003-01-21 Tokyo Electron Limited Optimized liners for dual damascene metal wiring
US7563715B2 (en) 2005-12-05 2009-07-21 Asm International N.V. Method of producing thin films
US9139906B2 (en) * 2001-03-06 2015-09-22 Asm America, Inc. Doping with ALD technology
US20030091739A1 (en) * 2001-11-14 2003-05-15 Hitoshi Sakamoto Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
US6750146B2 (en) * 2002-04-03 2004-06-15 United Microelectronics Corp. Method for forming barrier layer
US6858524B2 (en) * 2002-12-03 2005-02-22 Asm International, Nv Method of depositing barrier layer for metal gates
KR100490049B1 (ko) * 2003-04-14 2005-05-17 삼성전자주식회사 일체형 디퓨저 프레임을 가지는 ｃｖｄ 장치
KR100568256B1 (ko) * 2003-12-11 2006-04-07 삼성전자주식회사 반도체 소자 제조 장비의 세정 방법
KR100615602B1 (ko) 2004-09-15 2006-08-25 삼성전자주식회사 매끄러운 표면을 갖는 타이타늄 나이트라이드 막의 형성방법들 및 이를 이용한 반도체 장치의 형성방법들
US8257790B2 (en) * 2006-02-24 2012-09-04 Tokyo Electron Limited Ti-containing film formation method and storage medium
KR101427142B1 (ko) * 2006-10-05 2014-08-07 에이에스엠 아메리카, 인코포레이티드 금속 규산염 막의 원자층 증착
FR2968831B1 (fr) 2010-12-08 2012-12-21 Soitec Silicon On Insulator Procedes de formation de materiaux massifs de nitrure iii sur des couches matricielles de croissance de nitrure de metal et structures formees par ces procedes
US9023721B2 (en) 2010-11-23 2015-05-05 Soitec Methods of forming bulk III-nitride materials on metal-nitride growth template layers, and structures formed by such methods
US8824200B1 (en) 2013-12-17 2014-09-02 The United States Of America As Represented By The Secretary Of The Army Nonvolative memory cells programable by phase change
US10266947B2 (en) * 2016-08-23 2019-04-23 Lam Research Corporation Rotary friction welded blank for PECVD heated showerhead

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US4798165A (en) * 1985-10-07 1989-01-17 Epsilon Apparatus for chemical vapor deposition using an axially symmetric gas flow
US4792378A (en) * 1987-12-15 1988-12-20 Texas Instruments Incorporated Gas dispersion disk for use in plasma enhanced chemical vapor deposition reactor
JP2776826B2 (ja) * 1988-04-15 1998-07-16 株式会社日立製作所 半導体装置およびその製造方法
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US5052339A (en) * 1990-10-16 1991-10-01 Air Products And Chemicals, Inc. Radio frequency plasma enhanced chemical vapor deposition process and reactor
KR100228259B1 (ko) * 1990-10-24 1999-11-01 고지마 마따오 박막의 형성방법 및 반도체장치
US5268034A (en) * 1991-06-25 1993-12-07 Lsi Logic Corporation Fluid dispersion head for CVD appratus
US5308655A (en) * 1991-08-16 1994-05-03 Materials Research Corporation Processing for forming low resistivity titanium nitride films
JP2989063B2 (ja) * 1991-12-12 1999-12-13 キヤノン株式会社 薄膜形成装置および薄膜形成方法
US5370739A (en) * 1992-06-15 1994-12-06 Materials Research Corporation Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD
US5342652A (en) * 1992-06-15 1994-08-30 Materials Research Corporation Method of nucleating tungsten on titanium nitride by CVD without silane
US5356476A (en) * 1992-06-15 1994-10-18 Materials Research Corporation Semiconductor wafer processing method and apparatus with heat and gas flow control
US5434110A (en) * 1992-06-15 1995-07-18 Materials Research Corporation Methods of chemical vapor deposition (CVD) of tungsten films on patterned wafer substrates
US5416045A (en) * 1993-02-18 1995-05-16 Micron Technology, Inc. Method for chemical vapor depositing a titanium nitride layer on a semiconductor wafer and method of annealing tin films
US5246881A (en) * 1993-04-14 1993-09-21 Micron Semiconductor, Inc. Low-pressure chemical vapor deposition process for depositing high-density, highly-conformal, titanium nitride films of low bulk resistivity
US5443647A (en) * 1993-04-28 1995-08-22 The United States Of America As Represented By The Secretary Of The Army Method and apparatus for depositing a refractory thin film by chemical vapor deposition
US5378501A (en) * 1993-10-05 1995-01-03 Foster; Robert F. Method for chemical vapor deposition of titanium nitride films at low temperatures
WO1995033866A1 (en) * 1994-06-03 1995-12-14 Materials Research Corporation Method and apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor

Also Published As

Publication number Publication date
JPH11501987A (ja) 1999-02-16
LU90134B1 (fr) 1997-11-27
KR100356264B1 (ko) 2002-11-18
AU4463596A (en) 1996-10-02
WO1996028586A1 (en) 1996-09-19
CH689640A5 (de) 1999-07-30
US5610106A (en) 1997-03-11
KR19980702877A (ko) 1998-08-05
TW369675B (en) 1999-09-11

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8607 Notification of search results after publication
8127 New person/name/address of the applicant

Owner name: MATERIALS RESEARCH CORP., ORANGEBURG, N.Y., US TOK

8128 New person/name/address of the agent

Representative=s name: EISENFUEHR, SPEISER & PARTNER, 28195 BREMEN

8607 Notification of search results after publication
8131 Rejection