DE19781974T1 - Sputtersystem mit zylindrischem Wagen - Google Patents

Sputtersystem mit zylindrischem Wagen

Info

Publication number
DE19781974T1
DE19781974T1 DE19781974T DE19781974T DE19781974T1 DE 19781974 T1 DE19781974 T1 DE 19781974T1 DE 19781974 T DE19781974 T DE 19781974T DE 19781974 T DE19781974 T DE 19781974T DE 19781974 T1 DE19781974 T1 DE 19781974T1
Authority
DE
Germany
Prior art keywords
sputtering system
cylindrical carriage
carriage
cylindrical
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19781974T
Other languages
English (en)
Other versions
DE19781974C2 (de
Inventor
Dennis R Hollars
Robert B Zubeck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Velocidata Inc
Original Assignee
Velocidata Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Velocidata Inc filed Critical Velocidata Inc
Publication of DE19781974T1 publication Critical patent/DE19781974T1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
DE19781974T 1996-08-26 1997-08-26 Sputtersystem mit zylindrischem Wagen Pending DE19781974T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/703,011 US5753092A (en) 1996-08-26 1996-08-26 Cylindrical carriage sputtering system
PCT/US1997/015062 WO1998008997A2 (en) 1996-08-26 1997-08-26 A cylindrical carriage sputtering system

Publications (1)

Publication Number Publication Date
DE19781974T1 true DE19781974T1 (de) 1999-10-14

Family

ID=24823580

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19781974T Pending DE19781974T1 (de) 1996-08-26 1997-08-26 Sputtersystem mit zylindrischem Wagen
DE19781974A Expired - Fee Related DE19781974C2 (de) 1996-08-26 1997-08-26 Sputtersystem mit zylindrischem Wagen

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE19781974A Expired - Fee Related DE19781974C2 (de) 1996-08-26 1997-08-26 Sputtersystem mit zylindrischem Wagen

Country Status (6)

Country Link
US (1) US5753092A (de)
JP (1) JP2000517378A (de)
AU (1) AU4164497A (de)
DE (2) DE19781974T1 (de)
TW (1) TW495827B (de)
WO (1) WO1998008997A2 (de)

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US6178608B1 (en) * 1999-03-26 2001-01-30 Bourn & Koch Machine Tool Co. Rotary transfer machine
US6402903B1 (en) 2000-02-04 2002-06-11 Steag Hamatech Ag Magnetic array for sputtering system
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US20020044391A1 (en) 2000-11-15 2002-04-18 Masayoshi Hiramoto Magneto-resistive element magnetic head, and magnetic recording and reproduction apparatus
US20030003767A1 (en) * 2001-06-29 2003-01-02 Plasmion Corporation High throughput hybrid deposition system and method using the same
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DE10307454B4 (de) * 2003-02-21 2010-10-28 Vistec Semiconductor Systems Gmbh Verfahren zur optischen Inspektion eines Halbleitersubstrats
US20040262148A1 (en) * 2003-06-23 2004-12-30 Cheng Yuanda Randy Sputter cathode assembly for uniform film deposition
DE10351330A1 (de) * 2003-10-31 2005-05-25 Sig Technology Ltd. Verfahren und Vorrichtung zur Versorgung mindestens einer Bearbeitungsstation für ein Werkstück
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US7645492B2 (en) * 2004-07-30 2010-01-12 Exatec Llc Plasma coating system for accommodating substrates of different shapes
DE112005002056B4 (de) 2004-08-30 2021-09-23 Ulvac, Inc. Filmformungsvorrichtung
ATE415503T1 (de) * 2005-08-10 2008-12-15 Applied Materials Gmbh & Co Kg Vakuumbeschichtungsanlage mit motorisch angetriebener drehkathode
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US8236152B2 (en) * 2006-11-24 2012-08-07 Ascentool International Ltd. Deposition system
WO2009029944A2 (en) * 2007-08-31 2009-03-05 Geoffrey Green Improved sputtering assembly
JP2010001565A (ja) * 2008-05-20 2010-01-07 Canon Anelva Corp スパッタリング装置、それを用いた太陽電池及び画像表示装置の製造方法
WO2010021613A1 (en) * 2008-08-20 2010-02-25 Ascentool, Inc. Deposition system
KR101028406B1 (ko) * 2009-08-12 2011-04-13 (주)화백엔지니어링 아크 검출장치 및 방법
JP5497572B2 (ja) * 2009-08-18 2014-05-21 キヤノンアネルバ株式会社 スパッタリング装置及び真空処理装置
KR101282959B1 (ko) * 2009-11-03 2013-07-08 한국과학기술연구원 무기 박막 형성 방법 및 그를 위한 스퍼터링 시스템
CN102127740B (zh) * 2010-01-19 2013-12-11 鸿富锦精密工业（深圳）有限公司 溅镀装置
CN102294642B (zh) * 2010-06-25 2014-03-26 鸿富锦精密工业（深圳）有限公司 抛光装置
JP5220147B2 (ja) * 2010-06-29 2013-06-26 キヤノンアネルバ株式会社 冷却装置および加熱装置
JP5527894B2 (ja) * 2010-09-01 2014-06-25 株式会社アルバック スパッタ装置
DE102010056157A1 (de) * 2010-12-28 2012-06-28 Oerlikon Trading Ag, Trübbach Halterung für Bohrkopfbeschichtung
EP2718959B1 (de) * 2011-06-07 2018-10-31 Vision Ease LP Verbesserungen bei der auftragung von beschichtungsmaterialien
DE102012104475A1 (de) * 2012-05-24 2013-11-28 Aixtron Se Carousel-Reactor
DE102014112723A1 (de) 2014-09-04 2016-03-10 Eaton Industries Austria Gmbh Verfahren zur Unterscheidung eines Lichtbogens von einem leuchtenden Gas enthaltend zumindest Metalldampf
CN111221147B (zh) 2015-04-15 2022-04-12 视觉缓解公司 具有分等级的显微镜头的眼镜镜片
DE102015220162A1 (de) * 2015-10-16 2017-04-20 Robert Bosch Gmbh Steuergerät für ein Fahrzeug mit einem Lichtbogensensor
US10268050B2 (en) 2015-11-06 2019-04-23 Hoya Lens Thailand Ltd. Spectacle lens
JP6588418B2 (ja) * 2016-12-07 2019-10-09 株式会社神戸製鋼所 成膜装置およびそれを用いた成膜物の製造方法、ならびに冷却パネル
US10422038B2 (en) * 2017-03-14 2019-09-24 Eastman Kodak Company Dual gas bearing substrate positioning system
US10400332B2 (en) * 2017-03-14 2019-09-03 Eastman Kodak Company Deposition system with interlocking deposition heads
US11397038B1 (en) 2017-07-18 2022-07-26 Seagate Technology Llc Coaxially pumped cooling station
JP7000083B2 (ja) * 2017-09-07 2022-01-19 芝浦メカトロニクス株式会社 成膜装置
JP6511212B1 (ja) * 2017-11-10 2019-05-15 株式会社アルバック 真空装置、吸着装置、導電性薄膜製造方法
CN108193189A (zh) * 2017-12-27 2018-06-22 深圳市华星光电技术有限公司 一种真空溅射设备及其真空大气交换装置
US11378818B2 (en) 2018-03-01 2022-07-05 Essilor International Lens element
US11852904B2 (en) 2018-03-01 2023-12-26 Essilor International Lens element
TWI738401B (zh) * 2020-07-03 2021-09-01 力鼎精密股份有限公司 將載板送入超高真空加熱腔室以及超低溫磁控離子反應式蝕刻腔體中加工之方法
CN111972376B (zh) * 2020-09-07 2022-07-08 杨庄 一种具备蚊香液的灭蚊灯
KR20220126847A (ko) * 2021-03-09 2022-09-19 삼성디스플레이 주식회사 마그넷 조립체 및 이를 포함하는 증착 장치
TW202337683A (zh) * 2021-12-07 2023-10-01 美商因特瓦克公司 硬質耐刮擦低反射率光學塗層

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Also Published As

Publication number Publication date
JP2000517378A (ja) 2000-12-26
WO1998008997A2 (en) 1998-03-05
DE19781974C2 (de) 2002-01-10
WO1998008997A3 (en) 1998-06-04
AU4164497A (en) 1998-03-19
TW495827B (en) 2002-07-21
US5753092A (en) 1998-05-19

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