DE3062187D1 - Cleaning composition, process for its production and its use - Google Patents

Cleaning composition, process for its production and its use

Info

Publication number
DE3062187D1
DE3062187D1 DE8080103088T DE3062187T DE3062187D1 DE 3062187 D1 DE3062187 D1 DE 3062187D1 DE 8080103088 T DE8080103088 T DE 8080103088T DE 3062187 T DE3062187 T DE 3062187T DE 3062187 D1 DE3062187 D1 DE 3062187D1
Authority
DE
Germany
Prior art keywords
production
cleaning composition
cleaning
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080103088T
Other languages
English (en)
Inventor
Peter Bakos
Gerald Andrei Bendz
Russell Elwood Darrow
Dennis Louis Rivenburgh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3062187D1 publication Critical patent/DE3062187D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00—Chemical paint or ink removers
    • C09D9/005—Chemical paint or ink removers containing organic solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
DE8080103088T 1979-06-26 1980-06-03 Cleaning composition, process for its production and its use Expired DE3062187D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/052,160 US4276186A (en) 1979-06-26 1979-06-26 Cleaning composition and use thereof

Publications (1)

Publication Number Publication Date
DE3062187D1 true DE3062187D1 (en) 1983-04-07

Family

ID=21975853

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080103088T Expired DE3062187D1 (en) 1979-06-26 1980-06-03 Cleaning composition, process for its production and its use

Country Status (6)

Country Link
US (1) US4276186A (de)
EP (1) EP0021149B1 (de)
JP (1) JPS5821000B2 (de)
CA (1) CA1124610A (de)
DE (1) DE3062187D1 (de)
IT (1) IT1151031B (de)

Families Citing this family (95)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376069A (en) * 1979-10-15 1983-03-08 Life Industries Corporation Hydrotropic cleaner and deoxidizer
DE3032891A1 (de) * 1980-09-01 1982-04-15 Henkel KGaA, 4000 Düsseldorf Verfahren zur reduzierung der konzentration von loesungsmitteldampf
US4428871A (en) 1981-09-23 1984-01-31 J. T. Baker Chemical Company Stripping compositions and methods of stripping resists
US4395479A (en) * 1981-09-23 1983-07-26 J. T. Baker Chemical Company Stripping compositions and methods of stripping resists
US4664721A (en) * 1981-12-07 1987-05-12 Intercontinental Chemical Corporation Printing screen cleaning and reclaiming compositions
US4453984A (en) * 1982-06-30 1984-06-12 International Business Machines Corporation Method for removing electrically conductive paste from a screening mask
US4401747A (en) * 1982-09-02 1983-08-30 J. T. Baker Chemical Company Stripping compositions and methods of stripping resists
US4401748A (en) * 1982-09-07 1983-08-30 J. T. Baker Chemical Company Stripping compositions and methods of stripping resists
US4514232A (en) * 1982-12-15 1985-04-30 International Business Machines Corporation Process for stripping silicon oil base thermal grease
US4737195A (en) * 1983-11-18 1988-04-12 Amchem Products Activator-accelerator mixtures for alkaline paint stripper compositions
US4791043A (en) * 1983-12-20 1988-12-13 Hmc Patents Holding Co., Inc. Positive photoresist stripping composition
US4541489A (en) * 1984-03-19 1985-09-17 Phillips Petroleum Company Method of removing flow-restricting materials from wells
GB8409054D0 (en) * 1984-04-07 1984-05-16 Procter & Gamble Stabilized oil-in-water cleaning microemulsions
DK600484D0 (da) * 1984-12-14 1984-12-14 Cps Kemi Aps Vaeske til fortynding og/eller fjernelse af trykkeri- og serigrafifarver
DE3501675A1 (de) * 1985-01-19 1986-07-24 Merck Patent Gmbh, 6100 Darmstadt Mittel und verfahren zur entfernung von fotoresist- und stripperresten von halbleitersubstraten
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
US4640719A (en) * 1985-07-01 1987-02-03 Petroleum Fermentations N.V. Method for printed circuit board and/or printed wiring board cleaning
DE3544339C1 (de) * 1985-12-14 1987-01-29 Degussa Poliergoldpraeparat
US4666626A (en) * 1986-03-21 1987-05-19 C.L.M., Inc. Paint stripper compositions
US4749510A (en) * 1986-04-14 1988-06-07 Grow Group, Inc. Paint stripping composition and method of making and using the same
US4744834A (en) * 1986-04-30 1988-05-17 Noor Haq Photoresist stripper comprising a pyrrolidinone, a diethylene glycol ether, a polyglycol and a quaternary ammonium hydroxide
JPH0721638B2 (ja) * 1986-07-18 1995-03-08 東京応化工業株式会社 基板の処理方法
US4770713A (en) * 1986-12-10 1988-09-13 Advanced Chemical Technologies, Inc. Stripping compositions containing an alkylamide and an alkanolamine and use thereof
US4729797A (en) * 1986-12-31 1988-03-08 International Business Machines Corporation Process for removal of cured epoxy
US4732695A (en) * 1987-02-02 1988-03-22 Texo Corporation Paint stripper compositions having reduced toxicity
EP0279089A1 (de) * 1987-02-16 1988-08-24 W.R. Grace & Co.-Conn. Reinigung von Sieben und Filzen in der Papierindustrie
US4764222A (en) * 1987-04-13 1988-08-16 Merck & Co. Inc. N-methyl-2-pyrrolidone compositions
WO1988008445A1 (en) * 1987-04-29 1988-11-03 Coroman Industries, Inc. Graffiti removal composition and method
SE462975B (sv) * 1987-06-05 1990-09-24 Chemie Consult Scandinavia Ab Saett och rengoeringsmedel vid rengoering av foeremaal eller ytor med anvaendning av ett laettflytande, vaetskeformigt rengoeringsmedel innehaallande n-metyl-2-pyrrolidon genom neddoppning i ett bad innehaallande medlet
WO1990000579A1 (en) * 1988-07-15 1990-01-25 Advanced Chemical Systems International Corporation Stripping composition using n-cyclohexyl-2-pyrrolidone
US4983224A (en) * 1988-10-28 1991-01-08 Rd Chemical Company Cleaning compositions and methods for removing soldering flux
US4848470A (en) * 1988-11-21 1989-07-18 Acme Resin Corporation Process for removing flow-restricting materials from wells
US4964919A (en) * 1988-12-27 1990-10-23 Nalco Chemical Company Cleaning of silicon wafers with an aqueous solution of KOH and a nitrogen-containing compound
US5310696A (en) * 1989-06-16 1994-05-10 Massachusetts Institute Of Technology Chemical method for the modification of a substrate surface to accomplish heteroepitaxial crystal growth
US5167853A (en) * 1989-06-30 1992-12-01 Stevens Sciences, Corp. Paint stripper and varnish remover compositions containing organoclay rheological additives, methods for making these compositions and methods for removing paint and other polymeric coatings from flexible and inflexible surfaces
US5098591A (en) * 1989-06-30 1992-03-24 Stevens Sciences Corp. Paint stripper and varnish remover compositions containing organoclay rheological additives, methods for making these compositions and methods for removing paint and other polymeric coatings from flexible and inflexible surfaces
US5124062A (en) * 1989-06-30 1992-06-23 Stevens Sciences Corp. Paint stripper and varnish remover compositions, methods for making these compositions and methods for removing paint and other polymeric coatings from flexible and inflexible surfaces
US5130046A (en) * 1989-07-28 1992-07-14 Ppg Industries, Inc. Paint stripping composition containing silica microparticles and polar co-thickening agent
US5334255A (en) * 1989-12-04 1994-08-02 Basf Corporation Method for removing and reclaiming excess paint from a paint spray booth
US5395548A (en) * 1990-01-24 1995-03-07 Motorola, Inc. Non-azeotropic solvent composition for cleaning and defluxing electrical assemblies
US5015410A (en) * 1990-02-20 1991-05-14 Arco Chemical Technology, Inc. Paint stripper compositions containing N-methyl-2-pyrrolidone, aliphatic hydrocarbons, and aromatic hydrocarbons
US5183534A (en) * 1990-03-09 1993-02-02 Amoco Corporation Wet-etch process and composition
US5011621A (en) * 1990-06-04 1991-04-30 Arco Chemical Technology, Inc. Paint stripper compositions containing N-methyl-2-pyrrolidone and renewable resources
US5073287A (en) * 1990-07-16 1991-12-17 Fremont Industries, Inc. Coating remover and paint stripper containing N-methyl-2-pyrrolidone, methanol, and sodium methoxide
US6242400B1 (en) 1990-11-05 2001-06-05 Ekc Technology, Inc. Method of stripping resists from substrates using hydroxylamine and alkanolamine
US6000411A (en) * 1990-11-05 1999-12-14 Ekc Technology, Inc. Cleaning compositions for removing etching residue and method of using
US20040018949A1 (en) * 1990-11-05 2004-01-29 Wai Mun Lee Semiconductor process residue removal composition and process
US6110881A (en) * 1990-11-05 2000-08-29 Ekc Technology, Inc. Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
US5279771A (en) * 1990-11-05 1994-01-18 Ekc Technology, Inc. Stripping compositions comprising hydroxylamine and alkanolamine
US6121217A (en) 1990-11-05 2000-09-19 Ekc Technology, Inc. Alkanolamine semiconductor process residue removal composition and process
US7205265B2 (en) * 1990-11-05 2007-04-17 Ekc Technology, Inc. Cleaning compositions and methods of use thereof
JP3160344B2 (ja) * 1991-01-25 2001-04-25 アシュランド インコーポレーテッド 有機ストリッピング組成物
JP2614980B2 (ja) * 1991-06-14 1997-05-28 ペトロファーム インコーポレイテッド ロジンハンダ付用フラックスをテルペン及び炭化水素で除去するための組成物及び方法
DE4124246A1 (de) * 1991-07-22 1993-01-28 Henkel Kgaa Reinigungsmittel fuer elektronische und elektrische baugruppen
GB9116004D0 (en) * 1991-07-24 1991-09-11 Brent Chemicals Int Method for removing coatings from metal substrates prone to corrosion or deterioration
GB2259096A (en) * 1991-08-28 1993-03-03 Unilever Plc Liquid cleaning products
US5667594A (en) * 1991-10-31 1997-09-16 Daikin Industries Ltd. Cleaning method with solvent
DK169079B1 (da) * 1991-11-12 1994-08-08 Ebbe Damgaard Larsen I det væsentlige vandfrit middel til aflakering af emner af let korroderbare materialer, hvilket middel indeholder N-methyl-pyrrolidon, kaliumhydroxyd og en alkohol med 2-3 karbonatomer samt fremgangsmåde til dets fremstilling og anvendelse af dette
US5259993A (en) * 1992-01-21 1993-11-09 Cook Composites And Polymers Co. Aqueous cleaner
DE4208753C2 (de) * 1992-03-19 1999-10-21 Georg Scheidel Jun Gmbh Verwendung einer wäßrigen Zubereitung in flüssiger oder pastöser Form zum Entfernen von Farben und Klebern
JP3048207B2 (ja) * 1992-07-09 2000-06-05 イー．ケー．シー．テクノロジー．インコーポレイテッド 還元及び酸化電位を有する求核アミン化合物を含む洗浄剤組成物およびこれを使用した基板の洗浄方法
US5425893A (en) * 1993-04-14 1995-06-20 Stevens; Edwin Photoreactive paint stripping compositions and methods
CA2123193A1 (en) * 1993-05-18 1994-11-19 Shinji Konishi Cleaning solution for apparatuses used for production of photosensitizer, apparatuses used for preparation of positive resist solutions and spin coater line pipings, and cleaning method using the cleaning solution
US7144849B2 (en) * 1993-06-21 2006-12-05 Ekc Technology, Inc. Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
US5320758A (en) * 1993-06-29 1994-06-14 Church & Dwight Co., Inc. Method of recycling amine saponifiers used in cleaning electronic circuit boards
JPH07109495A (ja) * 1993-10-15 1995-04-25 Mitsubishi Chem Corp エポキシ樹脂封止素子の洗浄方法
US5419779A (en) * 1993-12-02 1995-05-30 Ashland Inc. Stripping with aqueous composition containing hydroxylamine and an alkanolamine
US6187729B1 (en) * 1993-12-14 2001-02-13 Petroferm Inc. Cleaning composition comprising solvating agent and rinsing agent
US5391397A (en) * 1994-04-05 1995-02-21 Motorola, Inc. Method of adhesion to a polyimide surface by formation of covalent bonds
US5691289A (en) * 1994-11-17 1997-11-25 Kay Chemical Company Cleaning compositions and methods of using the same
US5728668A (en) * 1994-12-14 1998-03-17 Colgate Palmolive Company Cleaning composition
JPH08231989A (ja) * 1995-02-23 1996-09-10 Kurita Water Ind Ltd 洗浄剤組成物及び洗浄方法
WO1998037156A1 (de) * 1997-02-18 1998-08-27 Kristian Oeffner Polyurethanschaumentferner für verschiedene untergründe
US5938856A (en) * 1997-06-13 1999-08-17 International Business Machines Corporation Process of removing flux residue from microelectronic components
US5935869A (en) * 1997-07-10 1999-08-10 International Business Machines Corporation Method of planarizing semiconductor wafers
FR2768152B1 (fr) * 1997-09-11 2001-07-06 Appryl Snc Composition pour le decapage des peintures sur polymere
US5922606A (en) * 1997-09-16 1999-07-13 Nalco Chemical Company Fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips
JP3953600B2 (ja) * 1997-10-28 2007-08-08 シャープ株式会社 レジスト膜剥離剤及びそれを用いた薄膜回路素子の製造方法
US6319884B2 (en) 1998-06-16 2001-11-20 International Business Machines Corporation Method for removal of cured polyimide and other polymers
JP2000057685A (ja) 1998-08-11 2000-02-25 Nec Yamagata Ltd ディスクドライブ装置
GB2349984A (en) 1999-03-04 2000-11-15 Ibm Decontamination of electronic cards from copper salts
US6248704B1 (en) 1999-05-03 2001-06-19 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductors devices
CN1185286C (zh) * 1999-10-07 2005-01-19 日立化成工业株式会社 处理环氧树脂固化产物的方法
TWI229123B (en) 2000-03-03 2005-03-11 Nec Electronics Corp Anticorrosive treating concentrate
US6597444B1 (en) 2000-06-28 2003-07-22 Advanced Micro Devices, Inc. Determination of flux coverage
US6258612B1 (en) 2000-06-28 2001-07-10 Advanced Micro Devices, Inc. Determination of flux prior to package assembly
US6367679B1 (en) 2000-06-28 2002-04-09 Advanced Micro Devices, Inc. Detection of flux residue
JP3592285B2 (ja) 2001-06-28 2004-11-24 住友電気工業株式会社 ポリイミド層を含む積層体のエッチング方法
US6800141B2 (en) * 2001-12-21 2004-10-05 International Business Machines Corporation Semi-aqueous solvent based method of cleaning rosin flux residue
KR100651366B1 (ko) * 2003-09-05 2006-11-28 삼성전기주식회사 세정력과 폴리이미드면 접착력을 지닌 브라운 옥사이드전처리제 조성물 및 브라운 옥사이드 공정을 통한폴리이미드면 접착력 향상 방법
US20050066995A1 (en) * 2003-09-30 2005-03-31 International Business Machines Corporation Non-hermetic encapsulant removal for module rework
JP3833650B2 (ja) * 2003-12-04 2006-10-18 関東化学株式会社 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法
TWI338026B (en) * 2007-01-05 2011-03-01 Basf Electronic Materials Taiwan Ltd Composition and method for stripping organic coatings
JP6041624B2 (ja) * 2012-10-31 2016-12-14 株式会社ネオス シリカスケール除去剤組成物
CN104099193A (zh) * 2013-04-03 2014-10-15 东莞市剑鑫电子材料有限公司 水基型玻璃清洗剂、制备方法及其在手机镜片清洗中的应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3551204A (en) * 1967-08-08 1970-12-29 Amicon Corp Process and composition for recovering electronic devices from encapsulation in potting compounds
US3576751A (en) * 1968-05-10 1971-04-27 Beatrice Foods Co Drain cleaner
US3813309A (en) * 1969-12-23 1974-05-28 Ibm Method for stripping resists from substrates
US3706691A (en) * 1970-09-04 1972-12-19 Us Navy Depotting solvent
US3673099A (en) * 1970-10-19 1972-06-27 Bell Telephone Labor Inc Process and composition for stripping cured resins from substrates
FR2213972A1 (en) * 1973-01-17 1974-08-09 Parker Ste Continentale Alkaline stripping solns. contg. amine accelerators - for stripping protective and/or decorative organic coatings from surfaces
US3876461A (en) * 1973-09-04 1975-04-08 Motorola Inc Semiconductor process
US3871930A (en) * 1973-12-19 1975-03-18 Texas Instruments Inc Method of etching films made of polyimide based polymers
GB1507472A (en) * 1974-05-02 1978-04-12 Bunker Ramo Foamable coating remover composition
DE2532024A1 (de) * 1975-07-17 1977-02-03 Siemens Ag Verfahren zum abloesen von schichtstoffen bei mit einer schutzschicht beschichteten elektrischen bauteilen
US4078102A (en) * 1976-10-29 1978-03-07 International Business Machines Corporation Process for stripping resist layers from substrates

Also Published As

Publication number Publication date
JPS5821000B2 (ja) 1983-04-26
IT1151031B (it) 1986-12-17
EP0021149A1 (de) 1981-01-07
JPS565899A (en) 1981-01-21
EP0021149B1 (de) 1983-03-02
IT8021994A1 (it) 1981-11-13
US4276186A (en) 1981-06-30
CA1124610A (en) 1982-06-01
IT8021994A0 (it) 1980-05-13

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8339 Ceased/non-payment of the annual fee