DE3465849D1 - Semiconductor devise for generating electromagnetic radiation - Google Patents
Semiconductor devise for generating electromagnetic radiationInfo
- Publication number
- DE3465849D1 DE3465849D1 DE8484200473T DE3465849T DE3465849D1 DE 3465849 D1 DE3465849 D1 DE 3465849D1 DE 8484200473 T DE8484200473 T DE 8484200473T DE 3465849 T DE3465849 T DE 3465849T DE 3465849 D1 DE3465849 D1 DE 3465849D1
- Authority
- DE
- Germany
- Prior art keywords
- electromagnetic radiation
- generating electromagnetic
- semiconductor devise
- devise
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005670 electromagnetic radiation Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/15—Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
- H01L29/151—Compositional structures
- H01L29/152—Compositional structures with quantum effects only in vertical direction, i.e. layered structures with quantum effects solely resulting from vertical potential variation
- H01L29/155—Comprising only semiconductor materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8301215A NL8301215A (nl) | 1983-04-07 | 1983-04-07 | Halfgeleiderinrichting voor het opwekken van electromagnetische straling. |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3465849D1 true DE3465849D1 (en) | 1987-10-08 |
Family
ID=19841666
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8484200473T Expired DE3465849D1 (en) | 1983-04-07 | 1984-04-04 | Semiconductor devise for generating electromagnetic radiation |
Country Status (5)
Country | Link |
---|---|
US (1) | US4644378A (de) |
EP (1) | EP0124924B1 (de) |
JP (1) | JPS59197187A (de) |
DE (1) | DE3465849D1 (de) |
NL (1) | NL8301215A (de) |
Families Citing this family (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6140082A (ja) * | 1984-07-31 | 1986-02-26 | Sharp Corp | 半導体装置 |
US5060234A (en) * | 1984-11-19 | 1991-10-22 | Max-Planck Gesellschaft Zur Forderung Der Wissenschaften | Injection laser with at least one pair of monoatomic layers of doping atoms |
JPH0669109B2 (ja) * | 1984-12-07 | 1994-08-31 | シャ−プ株式会社 | 光半導体装置 |
JPS61137383A (ja) * | 1984-12-07 | 1986-06-25 | Sharp Corp | 光半導体装置 |
JPS61210679A (ja) * | 1985-03-15 | 1986-09-18 | Sony Corp | 半導体装置 |
JPS61220492A (ja) * | 1985-03-27 | 1986-09-30 | Nec Corp | 量子井戸レ−ザ |
JPH0750795B2 (ja) * | 1985-03-28 | 1995-05-31 | キヤノン株式会社 | 発光素子 |
JPS61244086A (ja) * | 1985-04-22 | 1986-10-30 | Sharp Corp | 半導体レ−ザ素子 |
JPS6218082A (ja) * | 1985-07-16 | 1987-01-27 | Sharp Corp | 半導体レ−ザ素子 |
FR2589630B1 (fr) * | 1985-07-23 | 1988-06-17 | Deveaud Benoit | Absorbant saturable a tres faibles temps de commutation |
CA1279394C (en) * | 1985-07-26 | 1991-01-22 | Naoki Chinone | Multiple quantum well type semiconductor laser |
US4881235A (en) * | 1985-07-26 | 1989-11-14 | Hitachi, Ltd. | Semiconductor laser having a multiple quantum well structure doped with impurities |
JPS62165385A (ja) * | 1986-01-14 | 1987-07-21 | Nec Corp | 半導体発光装置 |
JPS62188295A (ja) * | 1986-02-13 | 1987-08-17 | Sharp Corp | 半導体レ−ザ素子 |
JPS63153887A (ja) * | 1986-08-08 | 1988-06-27 | Sharp Corp | 半導体レ−ザ素子 |
JPS63207186A (ja) * | 1987-02-24 | 1988-08-26 | Nippon Telegr & Teleph Corp <Ntt> | 可視光領域光素子用材料 |
JP2544378B2 (ja) * | 1987-03-25 | 1996-10-16 | 株式会社日立製作所 | 光半導体装置 |
EP0393135B1 (de) * | 1987-12-23 | 1994-11-23 | BRITISH TELECOMMUNICATIONS public limited company | Halbleiterheterostruktur |
CA1299719C (en) * | 1989-01-13 | 1992-04-28 | Hui Chun Liu | Semiconductor superlattice infrared source |
JPH0327577A (ja) * | 1989-06-23 | 1991-02-05 | イーストマン・コダックジャパン株式会社 | 発光ダイオ―ドアレイ |
DE69132934T2 (de) * | 1990-05-23 | 2002-08-29 | Uniphase Opto Holdings Inc | Strahlungsemittierende Halbleiteranordnung und Verfahren zum Herstellen derselben |
US5244749A (en) * | 1992-08-03 | 1993-09-14 | At&T Bell Laboratories | Article comprising an epitaxial multilayer mirror |
US5362977A (en) * | 1992-12-28 | 1994-11-08 | At&T Bell Laboratories | Single mirror light-emitting diodes with enhanced intensity |
US6603784B1 (en) | 1998-12-21 | 2003-08-05 | Honeywell International Inc. | Mechanical stabilization of lattice mismatched quantum wells |
US7049761B2 (en) | 2000-02-11 | 2006-05-23 | Altair Engineering, Inc. | Light tube and power supply circuit |
US7860137B2 (en) * | 2004-10-01 | 2010-12-28 | Finisar Corporation | Vertical cavity surface emitting laser with undoped top mirror |
CA2581614A1 (en) * | 2004-10-01 | 2006-04-13 | Finisar Corporation | Vertical cavity surface emitting laser having multiple top-side contacts |
US8118447B2 (en) | 2007-12-20 | 2012-02-21 | Altair Engineering, Inc. | LED lighting apparatus with swivel connection |
US7712918B2 (en) | 2007-12-21 | 2010-05-11 | Altair Engineering , Inc. | Light distribution using a light emitting diode assembly |
US8360599B2 (en) | 2008-05-23 | 2013-01-29 | Ilumisys, Inc. | Electric shock resistant L.E.D. based light |
US7976196B2 (en) | 2008-07-09 | 2011-07-12 | Altair Engineering, Inc. | Method of forming LED-based light and resulting LED-based light |
US7946729B2 (en) | 2008-07-31 | 2011-05-24 | Altair Engineering, Inc. | Fluorescent tube replacement having longitudinally oriented LEDs |
US8674626B2 (en) | 2008-09-02 | 2014-03-18 | Ilumisys, Inc. | LED lamp failure alerting system |
US8256924B2 (en) | 2008-09-15 | 2012-09-04 | Ilumisys, Inc. | LED-based light having rapidly oscillating LEDs |
US8324817B2 (en) | 2008-10-24 | 2012-12-04 | Ilumisys, Inc. | Light and light sensor |
US7938562B2 (en) | 2008-10-24 | 2011-05-10 | Altair Engineering, Inc. | Lighting including integral communication apparatus |
US8653984B2 (en) | 2008-10-24 | 2014-02-18 | Ilumisys, Inc. | Integration of LED lighting control with emergency notification systems |
US8214084B2 (en) | 2008-10-24 | 2012-07-03 | Ilumisys, Inc. | Integration of LED lighting with building controls |
US8444292B2 (en) | 2008-10-24 | 2013-05-21 | Ilumisys, Inc. | End cap substitute for LED-based tube replacement light |
US8901823B2 (en) | 2008-10-24 | 2014-12-02 | Ilumisys, Inc. | Light and light sensor |
US8556452B2 (en) | 2009-01-15 | 2013-10-15 | Ilumisys, Inc. | LED lens |
US8362710B2 (en) | 2009-01-21 | 2013-01-29 | Ilumisys, Inc. | Direct AC-to-DC converter for passive component minimization and universal operation of LED arrays |
US8664880B2 (en) | 2009-01-21 | 2014-03-04 | Ilumisys, Inc. | Ballast/line detection circuit for fluorescent replacement lamps |
US8330381B2 (en) | 2009-05-14 | 2012-12-11 | Ilumisys, Inc. | Electronic circuit for DC conversion of fluorescent lighting ballast |
US8299695B2 (en) | 2009-06-02 | 2012-10-30 | Ilumisys, Inc. | Screw-in LED bulb comprising a base having outwardly projecting nodes |
US20100309649A1 (en) * | 2009-06-09 | 2010-12-09 | Epistar Corporation | Photoelectronic device having a variable resistor structure |
EP2446715A4 (de) | 2009-06-23 | 2013-09-11 | Ilumisys Inc | Beleuchtungsvorrichtung mit leds und schaltstromsteuerungssystem |
WO2011119958A1 (en) | 2010-03-26 | 2011-09-29 | Altair Engineering, Inc. | Inside-out led bulb |
EP2553320A4 (de) | 2010-03-26 | 2014-06-18 | Ilumisys Inc | Led-licht mit thermoelektrischem generator |
WO2011119907A2 (en) | 2010-03-26 | 2011-09-29 | Altair Engineering, Inc. | Led light tube with dual sided light distribution |
US8454193B2 (en) | 2010-07-08 | 2013-06-04 | Ilumisys, Inc. | Independent modules for LED fluorescent light tube replacement |
US8596813B2 (en) | 2010-07-12 | 2013-12-03 | Ilumisys, Inc. | Circuit board mount for LED light tube |
EP2633227B1 (de) | 2010-10-29 | 2018-08-29 | iLumisys, Inc. | Mechanismen zur minimierung des risikos von elektroschocks während der installation einer lichtröhre |
US8870415B2 (en) | 2010-12-09 | 2014-10-28 | Ilumisys, Inc. | LED fluorescent tube replacement light with reduced shock hazard |
US9072171B2 (en) | 2011-08-24 | 2015-06-30 | Ilumisys, Inc. | Circuit board mount for LED light |
US9184518B2 (en) | 2012-03-02 | 2015-11-10 | Ilumisys, Inc. | Electrical connector header for an LED-based light |
WO2014008463A1 (en) | 2012-07-06 | 2014-01-09 | Ilumisys, Inc. | Power supply assembly for led-based light tube |
US9271367B2 (en) | 2012-07-09 | 2016-02-23 | Ilumisys, Inc. | System and method for controlling operation of an LED-based light |
US9285084B2 (en) | 2013-03-14 | 2016-03-15 | Ilumisys, Inc. | Diffusers for LED-based lights |
US9267650B2 (en) | 2013-10-09 | 2016-02-23 | Ilumisys, Inc. | Lens for an LED-based light |
US9574717B2 (en) | 2014-01-22 | 2017-02-21 | Ilumisys, Inc. | LED-based light with addressed LEDs |
US9510400B2 (en) | 2014-05-13 | 2016-11-29 | Ilumisys, Inc. | User input systems for an LED-based light |
US10161568B2 (en) | 2015-06-01 | 2018-12-25 | Ilumisys, Inc. | LED-based light with canted outer walls |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3982207A (en) * | 1975-03-07 | 1976-09-21 | Bell Telephone Laboratories, Incorporated | Quantum effects in heterostructure lasers |
US4205329A (en) * | 1976-03-29 | 1980-05-27 | Bell Telephone Laboratories, Incorporated | Periodic monolayer semiconductor structures grown by molecular beam epitaxy |
US4261771A (en) * | 1979-10-31 | 1981-04-14 | Bell Telephone Laboratories, Incorporated | Method of fabricating periodic monolayer semiconductor structures by molecular beam epitaxy |
US4439782A (en) * | 1980-11-21 | 1984-03-27 | University Of Illinois Foundation | Semiconductor device with heterojunction of Alx Ga1-x As--AlAs--Ga |
DE3276979D1 (en) * | 1981-05-06 | 1987-09-17 | Univ Illinois | Method of forming wide bandgap region within multilayer semiconductors |
JPS57187986A (en) * | 1981-05-15 | 1982-11-18 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor light emitting element |
-
1983
- 1983-04-07 NL NL8301215A patent/NL8301215A/nl not_active Application Discontinuation
-
1984
- 1984-04-04 EP EP84200473A patent/EP0124924B1/de not_active Expired
- 1984-04-04 DE DE8484200473T patent/DE3465849D1/de not_active Expired
- 1984-04-06 JP JP59067779A patent/JPS59197187A/ja active Granted
-
1985
- 1985-12-31 US US06/816,972 patent/US4644378A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS59197187A (ja) | 1984-11-08 |
EP0124924B1 (de) | 1987-09-02 |
US4644378A (en) | 1987-02-17 |
NL8301215A (nl) | 1984-11-01 |
JPH048956B2 (de) | 1992-02-18 |
EP0124924A1 (de) | 1984-11-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL |
|
8339 | Ceased/non-payment of the annual fee |