DE3468768D1 - Method of making a nonvolatile semiconductor memory device - Google Patents

Method of making a nonvolatile semiconductor memory device

Info

Publication number
DE3468768D1
DE3468768D1 DE8484901915T DE3468768T DE3468768D1 DE 3468768 D1 DE3468768 D1 DE 3468768D1 DE 8484901915 T DE8484901915 T DE 8484901915T DE 3468768 T DE3468768 T DE 3468768T DE 3468768 D1 DE3468768 D1 DE 3468768D1
Authority
DE
Germany
Prior art keywords
making
memory device
semiconductor memory
nonvolatile semiconductor
nonvolatile
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484901915T
Other languages
English (en)
Inventor
John Janning
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NCR International Inc
Original Assignee
NCR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NCR Corp filed Critical NCR Corp
Application granted granted Critical
Publication of DE3468768D1 publication Critical patent/DE3468768D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/792—Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/201—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys
    • H01L29/205—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys in different semiconductor regions, e.g. heterojunctions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/4908—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78651—Silicon transistors
    • H01L29/78654—Monocrystalline silicon transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)
DE8484901915T 1983-05-02 1984-04-26 Method of making a nonvolatile semiconductor memory device Expired DE3468768D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/490,743 US4876582A (en) 1983-05-02 1983-05-02 Crystallized silicon-on-insulator nonvolatile memory device
PCT/US1984/000638 WO1984004418A1 (en) 1983-05-02 1984-04-26 Nonvolatile semiconductor memory device

Publications (1)

Publication Number Publication Date
DE3468768D1 true DE3468768D1 (en) 1988-02-18

Family

ID=23949270

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484901915T Expired DE3468768D1 (en) 1983-05-02 1984-04-26 Method of making a nonvolatile semiconductor memory device

Country Status (6)

Country Link
US (1) US4876582A (de)
EP (1) EP0140965B1 (de)
JP (1) JPS60501284A (de)
CA (1) CA1211562A (de)
DE (1) DE3468768D1 (de)
WO (1) WO1984004418A1 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
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JPS61263279A (ja) * 1985-05-17 1986-11-21 Matsushita Electronics Corp 不揮発性メモリの製造方法
JP2649511B2 (ja) * 1986-02-05 1997-09-03 松下電子工業株式会社 半導体記憶装置
US5514885A (en) * 1986-10-09 1996-05-07 Myrick; James J. SOI methods and apparatus
US5343064A (en) * 1988-03-18 1994-08-30 Spangler Leland J Fully integrated single-crystal silicon-on-insulator process, sensors and circuits
EP0408653A4 (en) * 1988-03-31 1991-10-16 Solarex Corporation Gate dielectric for a thin film field effect transistor
US5245452A (en) * 1988-06-24 1993-09-14 Matsushita Electronics Corporation Active matric drive liquid crystal display device using polycrystalline silicon pixel electrodes
EP0366146B1 (de) * 1988-10-28 1994-01-05 Casio Computer Company Limited Dünnfilm-Transistor mit einer Speicherfunktion und Verfahren zur Verwendung eines Dünnfilmtransistors als Speicherelement
US5196912A (en) * 1988-10-28 1993-03-23 Casio Computer Co., Ltd. Thin film transistor having memory function and method for using thin film transistor as memory element
JPH0644625B2 (ja) * 1988-12-31 1994-06-08 三星電子株式会社 アクティブマトリックス液晶表示素子用薄膜トランジスタ
US5079606A (en) * 1989-01-26 1992-01-07 Casio Computer Co., Ltd. Thin-film memory element
US5057885A (en) * 1989-07-28 1991-10-15 Casio Computer Co., Ltd. Memory cell system with first and second gates
US5038184A (en) * 1989-11-30 1991-08-06 Xerox Corporation Thin film varactors
JPH04212426A (ja) * 1990-06-21 1992-08-04 Mitsubishi Electric Corp 半導体装置およびその製造方法
US6849872B1 (en) * 1991-08-26 2005-02-01 Semiconductor Energy Laboratory Co., Ltd. Thin film transistor
US5235189A (en) * 1991-11-19 1993-08-10 Motorola, Inc. Thin film transistor having a self-aligned gate underlying a channel region
JPH06132303A (ja) * 1991-11-29 1994-05-13 Semiconductor Energy Lab Co Ltd 薄膜トランジスタおよびその作製方法
US6964890B1 (en) 1992-03-17 2005-11-15 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for forming the same
KR970010652B1 (ko) * 1992-07-06 1997-06-30 가부시키가이샤 한도오따이 에네루기 겐큐쇼 박막형 반도체 장치 및 그 제작방법
US5643801A (en) * 1992-11-06 1997-07-01 Semiconductor Energy Laboratory Co., Ltd. Laser processing method and alignment
JPH06296023A (ja) * 1993-02-10 1994-10-21 Semiconductor Energy Lab Co Ltd 薄膜状半導体装置およびその作製方法
US5973382A (en) * 1993-07-12 1999-10-26 Peregrine Semiconductor Corporation Capacitor on ultrathin semiconductor on insulator
US5863823A (en) * 1993-07-12 1999-01-26 Peregrine Semiconductor Corporation Self-aligned edge control in silicon on insulator
US5930638A (en) * 1993-07-12 1999-07-27 Peregrine Semiconductor Corp. Method of making a low parasitic resistor on ultrathin silicon on insulator
US5864162A (en) * 1993-07-12 1999-01-26 Peregrine Seimconductor Corporation Apparatus and method of making a self-aligned integrated resistor load on ultrathin silicon on sapphire
US5719065A (en) 1993-10-01 1998-02-17 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device with removable spacers
JPH07109573A (ja) * 1993-10-12 1995-04-25 Semiconductor Energy Lab Co Ltd ガラス基板および加熱処理方法
US5738731A (en) * 1993-11-19 1998-04-14 Mega Chips Corporation Photovoltaic device
US5488579A (en) * 1994-04-29 1996-01-30 Motorola Inc. Three-dimensionally integrated nonvolatile SRAM cell and process
US5455791A (en) * 1994-06-01 1995-10-03 Zaleski; Andrzei Method for erasing data in EEPROM devices on SOI substrates and device therefor
JP3548237B2 (ja) * 1994-08-29 2004-07-28 シャープ株式会社 薄膜トランジスタ
JPH08203884A (ja) * 1995-01-31 1996-08-09 Mitsubishi Electric Corp オキシナイトライド膜およびその形成方法ならびにそのオキシナイトライド膜を用いた素子分離酸化膜の形成方法
JP3444053B2 (ja) * 1995-10-13 2003-09-08 ソニー株式会社 薄膜半導体装置
US5997634A (en) * 1996-11-14 1999-12-07 Micron Technology, Inc. Method of forming a crystalline phase material
US6087271A (en) * 1997-12-18 2000-07-11 Advanced Micro Devices, Inc. Methods for removal of an anti-reflective coating following a resist protect etching process
DE69925078T2 (de) * 1998-08-29 2006-03-09 International Business Machines Corp. SOI-Transistor mit einem Substrat-Kontakt und Verfahren zu dessen Herstellung
US7692223B2 (en) * 2006-04-28 2010-04-06 Semiconductor Energy Laboratory Co., Ltd Semiconductor device and method for manufacturing the same
US8324661B2 (en) * 2009-12-23 2012-12-04 Intel Corporation Quantum well transistors with remote counter doping
KR20130136063A (ko) * 2012-06-04 2013-12-12 삼성디스플레이 주식회사 박막 트랜지스터, 이를 포함하는 박막 트랜지스터 표시판 및 그 제조 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4151537A (en) * 1976-03-10 1979-04-24 Gte Laboratories Incorporated Gate electrode for MNOS semiconductor memory device
US4096509A (en) * 1976-07-22 1978-06-20 The United States Of America As Represented By The Secretary Of The Air Force MNOS memory transistor having a redeposited silicon nitride gate dielectric
EP0072603B1 (de) * 1978-06-14 1986-10-01 Fujitsu Limited Verfahren zur Herstellung einer Halbleiteranordnung mit einer Isolierschicht aus Siliziumdioxid, die mit einer Schicht aus Siliziumoxynitrid bedeckt ist
US4250206A (en) * 1978-12-11 1981-02-10 Texas Instruments Incorporated Method of making non-volatile semiconductor memory elements
US4272880A (en) * 1979-04-20 1981-06-16 Intel Corporation MOS/SOS Process
GB2064866A (en) * 1979-11-30 1981-06-17 Gen Electric Co Ltd Field effect semiconductor device
JPS5688354A (en) * 1979-12-20 1981-07-17 Toshiba Corp Semiconductor integrated circuit device
JPS56150864A (en) * 1980-04-24 1981-11-21 Toshiba Corp Semiconductor device
US4519849A (en) * 1980-10-14 1985-05-28 Intel Corporation Method of making EPROM cell with reduced programming voltage
JPS57132365A (en) * 1981-02-10 1982-08-16 Toshiba Corp Nonvolatile semiconductor memory storage
US4490900A (en) * 1982-01-29 1985-01-01 Seeq Technology, Inc. Method of fabricating an MOS memory array having electrically-programmable and electrically-erasable storage devices incorporated therein
US4619034A (en) * 1983-05-02 1986-10-28 Ncr Corporation Method of making laser recrystallized silicon-on-insulator nonvolatile memory device

Also Published As

Publication number Publication date
JPS60501284A (ja) 1985-08-08
EP0140965A1 (de) 1985-05-15
WO1984004418A1 (en) 1984-11-08
EP0140965B1 (de) 1988-01-13
US4876582A (en) 1989-10-24
CA1211562A (en) 1986-09-16
JPH0451071B2 (de) 1992-08-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: NCR INTERNATIONAL INC., DAYTON, OHIO, US

8328 Change in the person/name/address of the agent

Free format text: KAHLER, K., DIPL.-ING., 8948 MINDELHEIM KAECK, J., DIPL.-ING. DIPL.-WIRTSCH.-ING., 8910 LANDSBERG FIENER, J., PAT.-ANWAELTE, 8948 MINDELHEIM

8327 Change in the person/name/address of the patent owner

Owner name: AT&T GLOBAL INFORMATION SOLUTIONS INTERNATIONAL IN

8327 Change in the person/name/address of the patent owner

Owner name: AT&T GLOBAL INFORMATION SOLUTIONS INTERNATIONAL IN

8327 Change in the person/name/address of the patent owner

Owner name: NCR INTERNATIONAL, INC. (N.D.GES.D.STAATES DELAWAR

8327 Change in the person/name/address of the patent owner

Owner name: NCR INTERNATIONAL, INC. (N.D.GES.D.STAATES DELAWAR

8328 Change in the person/name/address of the agent

Free format text: V. BEZOLD & SOZIEN, 80799 MUENCHEN