DE3469111D1 - Thermo-mechanical overlay signature tuning for photolithographic mask aligner - Google Patents

Thermo-mechanical overlay signature tuning for photolithographic mask aligner

Info

Publication number
DE3469111D1
DE3469111D1 DE8484112873T DE3469111T DE3469111D1 DE 3469111 D1 DE3469111 D1 DE 3469111D1 DE 8484112873 T DE8484112873 T DE 8484112873T DE 3469111 T DE3469111 T DE 3469111T DE 3469111 D1 DE3469111 D1 DE 3469111D1
Authority
DE
Germany
Prior art keywords
thermo
tuning
photolithographic mask
mask aligner
overlay signature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484112873T
Other languages
English (en)
Inventor
David Wai Tai Yau
Robert Adam Modavis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3469111D1 publication Critical patent/DE3469111D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
DE8484112873T 1983-12-01 1984-10-26 Thermo-mechanical overlay signature tuning for photolithographic mask aligner Expired DE3469111D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/557,018 US4540251A (en) 1983-12-01 1983-12-01 Thermo-mechanical overlay signature tuning for Perkin-Elmer mask aligner

Publications (1)

Publication Number Publication Date
DE3469111D1 true DE3469111D1 (en) 1988-03-03

Family

ID=24223733

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484112873T Expired DE3469111D1 (en) 1983-12-01 1984-10-26 Thermo-mechanical overlay signature tuning for photolithographic mask aligner

Country Status (4)

Country Link
US (1) US4540251A (de)
EP (1) EP0145902B1 (de)
JP (1) JPS60120522A (de)
DE (1) DE3469111D1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61160934A (ja) * 1985-01-10 1986-07-21 Canon Inc 投影光学装置
US4763991A (en) * 1987-08-10 1988-08-16 Litton Systems, Inc. Adjustable six degree of freedom mount for optical components
US4989031A (en) * 1990-01-29 1991-01-29 Nikon Corporation Projection exposure apparatus
US5142132A (en) * 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
US5136413A (en) * 1990-11-05 1992-08-04 Litel Instruments Imaging and illumination system with aspherization and aberration correction by phase steps
US5227839A (en) * 1991-06-24 1993-07-13 Etec Systems, Inc. Small field scanner
JP2548968Y2 (ja) * 1991-07-22 1997-09-24 株式会社 神崎高級工機製作所 車軸駆動装置
US5715509A (en) * 1996-06-10 1998-02-03 Eastman Kodak Company Method and apparatus for transferring toner
US5812906A (en) * 1996-06-10 1998-09-22 Eastman Kodak Company Fuser having thermoelectric temperature control
FR2761486B1 (fr) * 1997-03-28 1999-05-21 Centre Nat Etd Spatiales Dispositif de positionnement micrometrique d'un support d'element optique spatial selon six degres de liberte
DE19825716A1 (de) 1998-06-09 1999-12-16 Zeiss Carl Fa Baugruppe aus optischem Element und Fassung
DE19859634A1 (de) * 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie
EP1312965B1 (de) * 2000-08-18 2007-01-17 Nikon Corporation Haltevorrichtung für optisches Element
JP2003234269A (ja) * 2002-02-07 2003-08-22 Nikon Corp 反射ミラーの保持方法、反射ミラーの保持部材及び露光装置
US6994444B2 (en) * 2002-06-14 2006-02-07 Asml Holding N.V. Method and apparatus for managing actinic intensity transients in a lithography mirror
JP4237755B2 (ja) * 2003-10-02 2009-03-11 カール・ツァイス・エスエムティー・アーゲー 半導体リソグラフィにおける光学的半組立品及び投射対物レンズ
US7374301B1 (en) * 2005-02-20 2008-05-20 Douglas Evan Simmers Stretched membrane device
ATE554427T1 (de) 2007-01-22 2012-05-15 Zeiss Carl Smt Gmbh Verfahren zur verbesserung von bildgebungseigenschaften eines optischen systems und optisches system

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1232209A (fr) * 1958-08-11 1960-10-06 Optische Ind De Oude Delft Nv Dispositif de montage pour éléments optiques
NL6701520A (de) * 1967-02-01 1968-08-02
US4175835A (en) * 1978-07-20 1979-11-27 The United States Of America As Represented By The Secretary Of The Air Force Floating head laser mirror assembly
JPS6032555B2 (ja) * 1979-09-28 1985-07-29 株式会社日立製作所 レ−ザビ−ム溶接回転ヘツド
US4422725A (en) * 1981-03-16 1983-12-27 United Technologies Corporation Method of optimally operating a graphite fiber reinforced glass matrix composite optical article
US4408874A (en) * 1981-05-07 1983-10-11 Computervision Corporation Projection aligner with specific means for bending mirror
JPS5825637A (ja) * 1981-08-08 1983-02-15 Canon Inc 投影焼付装置

Also Published As

Publication number Publication date
JPH0332909B2 (de) 1991-05-15
EP0145902B1 (de) 1988-01-27
US4540251A (en) 1985-09-10
JPS60120522A (ja) 1985-06-28
EP0145902A1 (de) 1985-06-26

Similar Documents

Publication Publication Date Title
DE3469111D1 (en) Thermo-mechanical overlay signature tuning for photolithographic mask aligner
US4621041B1 (en) Lithographic printing plate
AU564369B2 (en) Phase shifting mask for photolithography
AU9197482A (en) Lithographic mask
DE3377815D1 (en) Alignment and focusing system for a scanning mask aligner
AU551316B2 (en) Single exposure process for preparing printed circuits
FI830995L (fi) Laongnyppress foer pappersmaskin.
GB2129822B (en) Photosensitive plate for lithographic printing plate
EP0110417A3 (en) Presensitized lithographic plate
EP0198082A4 (de) Polarisierender film.
JPS5627930A (en) Xxray lithographic system
DE3470965D1 (en) Resist structure and processes for making and patterning it
GB8312582D0 (en) Lithographic apparatus
GB2146133B (en) Projection printing
EP0129901A3 (en) Light-sensitive water-developable registration material for producing printing or relief forms, and resists
DE3573864D1 (en) Alignment method for reduction projection type aligner
IT8419811A0 (it) Allineamento elettronico per sintonizzatori.
GB8416345D0 (en) Optical lithographic processes
EP0134789A4 (de) Zweischichten-uv-empfindliches schutzsystem für strukturierung von hochreflektiven trägern.
EP0164598A3 (en) Photosensitive resin composition and process for forming photo-resist pattern using the same
GB8719915D0 (en) Apparatus for exposure
DE3573326D1 (en) A projection aligner of a lithographic system
GB8315180D0 (en) Hold down arrangement for copy sheet pick-off system
DE3463189D1 (en) Developing liquid for photoresist
GB2148515B (en) Capacitive mask aligner

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee