DE3586668D1 - Laserverfahren zur photomaskenreparatur. - Google Patents

Laserverfahren zur photomaskenreparatur.

Info

Publication number
DE3586668D1
DE3586668D1 DE8585303091T DE3586668T DE3586668D1 DE 3586668 D1 DE3586668 D1 DE 3586668D1 DE 8585303091 T DE8585303091 T DE 8585303091T DE 3586668 T DE3586668 T DE 3586668T DE 3586668 D1 DE3586668 D1 DE 3586668D1
Authority
DE
Germany
Prior art keywords
photomask
laser
defect
laser process
repair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585303091T
Other languages
English (en)
Other versions
DE3586668T2 (de
Inventor
Peter L Young
Modest M Oprysko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gould Electronics Inc
Original Assignee
Gould Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gould Inc filed Critical Gould Inc
Application granted granted Critical
Publication of DE3586668D1 publication Critical patent/DE3586668D1/de
Publication of DE3586668T2 publication Critical patent/DE3586668T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
DE8585303091T 1984-06-20 1985-05-01 Laserverfahren zur photomaskenreparatur. Expired - Fee Related DE3586668T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US62236884A 1984-06-20 1984-06-20

Publications (2)

Publication Number Publication Date
DE3586668D1 true DE3586668D1 (de) 1992-10-29
DE3586668T2 DE3586668T2 (de) 1993-04-01

Family

ID=24493929

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585303091T Expired - Fee Related DE3586668T2 (de) 1984-06-20 1985-05-01 Laserverfahren zur photomaskenreparatur.

Country Status (5)

Country Link
US (1) US4727234A (de)
EP (1) EP0165685B1 (de)
JP (1) JPS6114640A (de)
AT (1) ATE80955T1 (de)
DE (1) DE3586668T2 (de)

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US6074571A (en) * 1997-09-30 2000-06-13 International Business Machines Corporation Cut and blast defect to avoid chrome roll over annealing
JP3193678B2 (ja) * 1997-10-20 2001-07-30 株式会社アドバンテスト 半導体ウエハリペア装置及び方法
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KR101115291B1 (ko) 2003-04-25 2012-03-05 가부시키가이샤 한도오따이 에네루기 켄큐쇼 액적 토출 장치, 패턴의 형성 방법, 및 반도체 장치의 제조 방법
US20050196710A1 (en) * 2004-03-04 2005-09-08 Semiconductor Energy Laboratory Co., Ltd. Method for forming pattern, thin film transistor, display device and method for manufacturing the same, and television apparatus
US8158517B2 (en) * 2004-06-28 2012-04-17 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing wiring substrate, thin film transistor, display device and television device
EP1870388B1 (de) * 2005-04-15 2010-09-08 Asahi Glass Company Ltd. Verfahren zur verringerung des durchmessers einer blase in einer glasplatte
US8290239B2 (en) * 2005-10-21 2012-10-16 Orbotech Ltd. Automatic repair of electric circuits
US7676061B2 (en) * 2006-05-02 2010-03-09 Telesis Technologies, Inc. Laser safety system
US20070106416A1 (en) 2006-06-05 2007-05-10 Griffiths Joseph J Method and system for adaptively controlling a laser-based material processing process and method and system for qualifying same
DE102006043874B4 (de) * 2006-09-15 2020-07-09 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Reparatur von Photolithographiemasken
CA2742985A1 (en) * 2008-11-06 2010-05-14 Uico, Inc. Capacitive touch screen and strategic geometry isolation patterning method for making touch screens
JP2011114844A (ja) * 2009-11-30 2011-06-09 Seiko Instruments Inc 圧電振動片の製造方法及び圧電振動片、圧電振動子、発振器、電子機器並びに電波時計
JP5860228B2 (ja) * 2011-06-13 2016-02-16 株式会社ディスコ レーザー加工装置
JP5744640B2 (ja) * 2011-06-21 2015-07-08 三菱電機株式会社 液晶パネルの輝点欠陥黒化方法
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KR20220038214A (ko) * 2020-09-18 2022-03-28 삼성디스플레이 주식회사 마스크 수리 장치 및 그것을 이용한 마스크 수리 방법
CN113671790B (zh) * 2021-08-13 2022-06-14 深圳市龙图光电有限公司 掩模版缺陷无痕去除方法、装置、设备及其存储介质

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Also Published As

Publication number Publication date
EP0165685A3 (en) 1988-01-27
ATE80955T1 (de) 1992-10-15
EP0165685B1 (de) 1992-09-23
EP0165685A2 (de) 1985-12-27
DE3586668T2 (de) 1993-04-01
US4727234A (en) 1988-02-23
JPS6114640A (ja) 1986-01-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: GOULD ELECTRONICS INC., EASTLAKE, OHIO, US

8328 Change in the person/name/address of the agent

Free format text: DERZEIT KEIN VERTRETER BESTELLT

8339 Ceased/non-payment of the annual fee