DE3679085D1 - Lichtempfindliches gemisch und lichtempfindliches, positiv arbeitendes kopiermaterial. - Google Patents

Lichtempfindliches gemisch und lichtempfindliches, positiv arbeitendes kopiermaterial.

Info

Publication number: DE3679085D1
Authority: DE; Germany
Prior art keywords: light; sensitive; copy material; working copy; mixture
Prior art date: 1985-02-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE8686102431T

Other languages

English (en)

Inventor

Michael G Kelly

Donald Mammato

Dane Durham

Sangya Jain

Lawrence Crane

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Clariant Finance BVI Ltd

Original Assignee

Hoechst Celanese Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-02-28

Filing date

1986-02-25

Publication date

1991-06-13

1986-02-25 Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp

1991-06-13 Application granted granted Critical

1991-06-13 Publication of DE3679085D1 publication Critical patent/DE3679085D1/de

2006-02-26 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides

DE8686102431T 1985-02-28 1986-02-25 Lichtempfindliches gemisch und lichtempfindliches, positiv arbeitendes kopiermaterial. Expired - Fee Related DE3679085D1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US06/706,817 US4588670A (en)	1985-02-28	1985-02-28	Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist

Publications (1)

Publication Number	Publication Date
DE3679085D1 true DE3679085D1 (de)	1991-06-13

Family

ID=24839175

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE8686102431T Expired - Fee Related DE3679085D1 (de)	1985-02-28	1986-02-25	Lichtempfindliches gemisch und lichtempfindliches, positiv arbeitendes kopiermaterial.

Country Status (5)

Country	Link
US (1)	US4588670A (de)
EP (1)	EP0193166B1 (de)
JP (1)	JPS61209439A (de)
CA (1)	CA1267559A (de)
DE (1)	DE3679085D1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4735885A (en) *	1985-12-06	1988-04-05	Allied Corporation	Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids
JPS63305348A (ja) *	1987-06-05	1988-12-13	Fuji Photo Film Co Ltd	ポジ型フオトレジスト組成物
DE3729034A1 (de) *	1987-08-31	1989-03-09	Hoechst Ag	Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial
JP2715480B2 (ja) *	1988-10-13	1998-02-18	住友化学工業株式会社	ポジ型レジスト用組成物
DE3837500A1 (de) *	1988-11-04	1990-05-23	Hoechst Ag	Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
JPH0627655A (ja) *	1990-11-28	1994-02-04	Hoechst Celanese Corp	ポジ型フォトレジスト組成物
US5876897A (en) *	1997-03-07	1999-03-02	Clariant Finance (Bvi) Limited	Positive photoresists containing novel photoactive compounds
US5726296A (en) *	1997-03-07	1998-03-10	Hoechst Celanese Corp.	Process for preparing photoactive coumarin derivatives
US5866295A (en) *	1997-03-07	1999-02-02	Clariant Finance (Bvi) Limited	Photosensitive quinolone compounds and a process of preparation
US5726295A (en) *	1997-03-07	1998-03-10	Hoechst Celanese Corp.	Photoactive coumarin derivatives
US5739295A (en) *	1997-03-07	1998-04-14	Hoechst Celanese Corporation	Photoactive coumarin sulfonate compounds
US5773591A (en) *	1997-03-07	1998-06-30	Hoechst Celanese Corp.	Process for preparing coumarin sulfonates
US5936071A (en) *	1998-02-02	1999-08-10	Clariant Finance (Bvi) Limited	Process for making a photoactive compound and photoresist therefrom
KR101632965B1 (ko) *	2008-12-29	2016-06-24	삼성디스플레이 주식회사	포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법
KR20140014217A (ko)	2011-03-10	2014-02-05	쓰리엠 이노베이티브 프로퍼티즈 컴파니	여과 매체
US8703385B2 (en)	2012-02-10	2014-04-22	3M Innovative Properties Company	Photoresist composition
US8715904B2 (en)	2012-04-27	2014-05-06	3M Innovative Properties Company	Photocurable composition
US8883402B2 (en)	2012-08-09	2014-11-11	3M Innovative Properties Company	Photocurable compositions
JP6469006B2 (ja)	2012-08-09	2019-02-13	スリーエムイノベイティブプロパティズカンパニー	光硬化性組成物

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE938233C (de) *	1953-03-11	1956-01-26	Kalle & Co Ag	Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
NL130926C (de) *	1959-09-04
US3666473A (en) *	1970-10-06	1972-05-30	Ibm	Positive photoresists for projection exposure
US4174222A (en) *	1975-05-24	1979-11-13	Tokyo Ohka Kogyo Kabushiki Kaisha	Positive-type O-quinone diazide containing photoresist compositions
JPS5280022A (en) *	1975-12-26	1977-07-05	Fuji Photo Film Co Ltd	Light solubilizable composition
DE3040157A1 (de) *	1980-10-24	1982-06-03	Hoechst Ag, 6000 Frankfurt	Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3040156A1 (de) *	1980-10-24	1982-06-03	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3043967A1 (de) *	1980-11-21	1982-06-24	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4439516A (en) *	1982-03-15	1984-03-27	Shipley Company Inc.	High temperature positive diazo photoresist processing using polyvinyl phenol
US4499171A (en) *	1982-04-20	1985-02-12	Japan Synthetic Rubber Co., Ltd.	Positive type photosensitive resin composition with at least two o-quinone diazides

1985
- 1985-02-28 US US06/706,817 patent/US4588670A/en not_active Expired - Lifetime
1986
- 1986-02-25 DE DE8686102431T patent/DE3679085D1/de not_active Expired - Fee Related
- 1986-02-25 EP EP86102431A patent/EP0193166B1/de not_active Expired - Lifetime
- 1986-02-27 CA CA000502903A patent/CA1267559A/en not_active Expired
- 1986-02-28 JP JP61042042A patent/JPS61209439A/ja active Pending

Also Published As

Publication number	Publication date
EP0193166B1 (de)	1991-05-08
US4588670A (en)	1986-05-13
JPS61209439A (ja)	1986-09-17
EP0193166A3 (en)	1987-12-23
CA1267559A (en)	1990-04-10
EP0193166A2 (de)	1986-09-03

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Legal Events

Date	Code	Title	Description
1992-06-04	8364	No opposition during term of opposition
1999-03-11	8327	Change in the person/name/address of the patent owner	Owner name: CLARIANT FINANCE (BVI) LTD., ROAD TOWN, TORTOLA, V
1999-03-11	8328	Change in the person/name/address of the agent	Free format text: SPOTT WEINMILLER & PARTNER, 80336 MUENCHEN
2005-12-15	8339	Ceased/non-payment of the annual fee