DE3764032D1 - Strukturiertes bild und herstellungsverfahren desselben. - Google Patents

Strukturiertes bild und herstellungsverfahren desselben.

Info

Publication number
DE3764032D1
DE3764032D1 DE8787107477T DE3764032T DE3764032D1 DE 3764032 D1 DE3764032 D1 DE 3764032D1 DE 8787107477 T DE8787107477 T DE 8787107477T DE 3764032 T DE3764032 T DE 3764032T DE 3764032 D1 DE3764032 D1 DE 3764032D1
Authority
DE
Germany
Prior art keywords
manufacturing
structured image
structured
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787107477T
Other languages
English (en)
Inventor
Burn Jeng Lin
Bea-Jane Lin Yang
Jer-Ming Yang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3764032D1 publication Critical patent/DE3764032D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/38Treatment before imagewise removal, e.g. prebaking
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking
    • G03F7/405Treatment with inorganic or organometallic reagents after imagewise removal
DE8787107477T 1986-06-10 1987-05-22 Strukturiertes bild und herstellungsverfahren desselben. Expired - Fee Related DE3764032D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/872,584 US4737425A (en) 1986-06-10 1986-06-10 Patterned resist and process

Publications (1)

Publication Number Publication Date
DE3764032D1 true DE3764032D1 (de) 1990-09-06

Family

ID=25359899

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787107477T Expired - Fee Related DE3764032D1 (de) 1986-06-10 1987-05-22 Strukturiertes bild und herstellungsverfahren desselben.

Country Status (4)

Country Link
US (1) US4737425A (de)
EP (1) EP0249769B1 (de)
JP (1) JPS62297837A (de)
DE (1) DE3764032D1 (de)

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JP2641452B2 (ja) * 1987-07-27 1997-08-13 株式会社日立製作所 パターン形成方法
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JP2666985B2 (ja) * 1988-10-27 1997-10-22 株式会社シャンソン化粧品本舗 化粧料充填用容器
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US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US6929762B2 (en) * 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
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US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
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KR100618851B1 (ko) * 2004-04-08 2006-09-01 삼성전자주식회사 반도체 소자 제조용 마스크 패턴 및 그 형성 방법과 미세패턴 형성용 코팅 조성물 제조 방법 및 반도체 소자의제조 방법
US7314691B2 (en) * 2004-04-08 2008-01-01 Samsung Electronics Co., Ltd. Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
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US7105452B2 (en) * 2004-08-13 2006-09-12 Molecular Imprints, Inc. Method of planarizing a semiconductor substrate with an etching chemistry
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KR101324549B1 (ko) * 2005-12-08 2013-11-01 몰레큘러 임프린츠 인코퍼레이티드 기판의 양면 패턴화를 위한 방법 및 시스템
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JP5306989B2 (ja) * 2006-04-03 2013-10-02 モレキュラー・インプリンツ・インコーポレーテッド 複数のフィールド及びアライメント・マークを有する基板を同時にパターニングする方法
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Also Published As

Publication number Publication date
JPS62297837A (ja) 1987-12-25
EP0249769A2 (de) 1987-12-23
EP0249769B1 (de) 1990-08-01
US4737425A (en) 1988-04-12
EP0249769A3 (en) 1988-09-28
JPH0456977B2 (de) 1992-09-10

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