DE3785636T2 - Beleuchtungsapparat für Belichtung. - Google Patents

Beleuchtungsapparat für Belichtung.

Info

Publication number
DE3785636T2
DE3785636T2 DE87115792T DE3785636T DE3785636T2 DE 3785636 T2 DE3785636 T2 DE 3785636T2 DE 87115792 T DE87115792 T DE 87115792T DE 3785636 T DE3785636 T DE 3785636T DE 3785636 T2 DE3785636 T2 DE 3785636T2
Authority
DE
Germany
Prior art keywords
exposure
lighting apparatus
lighting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE87115792T
Other languages
English (en)
Other versions
DE3785636D1 (de
Inventor
Yasuhiro Yoshitake
Yoshitada Oshida
Masataka Shiba
Naoto Nakashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE3785636D1 publication Critical patent/DE3785636D1/de
Publication of DE3785636T2 publication Critical patent/DE3785636T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
DE87115792T 1986-10-29 1987-10-27 Beleuchtungsapparat für Belichtung. Expired - Fee Related DE3785636T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61255624A JPS63110722A (ja) 1986-10-29 1986-10-29 露光照明装置

Publications (2)

Publication Number Publication Date
DE3785636D1 DE3785636D1 (de) 1993-06-03
DE3785636T2 true DE3785636T2 (de) 1993-10-14

Family

ID=17281337

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87115792T Expired - Fee Related DE3785636T2 (de) 1986-10-29 1987-10-27 Beleuchtungsapparat für Belichtung.

Country Status (4)

Country Link
US (1) US4819033A (de)
EP (1) EP0265917B1 (de)
JP (1) JPS63110722A (de)
DE (1) DE3785636T2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937619A (en) * 1986-08-08 1990-06-26 Hitachi, Ltd. Projection aligner and exposure method
US5307207A (en) * 1988-03-16 1994-04-26 Nikon Corporation Illuminating optical apparatus
JP3200894B2 (ja) * 1991-03-05 2001-08-20 株式会社日立製作所 露光方法及びその装置
JP3235078B2 (ja) * 1993-02-24 2001-12-04 株式会社ニコン 走査露光方法、露光制御装置、走査型露光装置、及びデバイス製造方法
JP3296448B2 (ja) * 1993-03-15 2002-07-02 株式会社ニコン 露光制御方法、走査露光方法、露光制御装置、及びデバイス製造方法
JP3316704B2 (ja) * 1993-06-10 2002-08-19 株式会社ニコン 投影露光装置、走査露光方法、及び素子製造方法
JP3363532B2 (ja) * 1993-07-26 2003-01-08 キヤノン株式会社 走査型露光装置
US5442184A (en) * 1993-12-10 1995-08-15 Texas Instruments Incorporated System and method for semiconductor processing using polarized radiant energy
US5621529A (en) * 1995-04-05 1997-04-15 Intelligent Automation Systems, Inc. Apparatus and method for projecting laser pattern with reduced speckle noise
US5680588A (en) * 1995-06-06 1997-10-21 International Business Machines Corporation Method and system for optimizing illumination in an optical photolithography projection imaging system
JPH1070064A (ja) 1996-08-27 1998-03-10 Nikon Corp 投影露光装置
US6037967A (en) * 1996-12-18 2000-03-14 Etec Systems, Inc. Short wavelength pulsed laser scanner
WO2000011766A1 (en) 1998-08-20 2000-03-02 Orbotech Ltd. Laser repetition rate multiplier
IL133889A (en) 2000-01-05 2007-03-08 Orbotech Ltd Pulse light pattern writer
SE519397C2 (sv) 1998-12-16 2003-02-25 Micronic Laser Systems Ab System och metod för mikrolitografiskt ritande av högprecisionsmönster
US6369888B1 (en) 1999-11-17 2002-04-09 Applied Materials, Inc. Method and apparatus for article inspection including speckle reduction
JP2001358056A (ja) * 2000-06-15 2001-12-26 Canon Inc 露光装置
US7588795B2 (en) * 2000-08-24 2009-09-15 Samsung Mobile Display Co., Ltd. Manufacturing method of OLED display and apparatus for manufacturing the OLED display
KR100342653B1 (ko) * 2000-08-24 2002-07-03 김순택 유기 전계발광소자의 제조 방법
US7453486B2 (en) * 2000-12-13 2008-11-18 Orbotech Ltd Pulse light pattern writer
US6819490B2 (en) 2001-09-10 2004-11-16 Micronic Laser Systems Ab Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece
US6903859B2 (en) 2001-12-07 2005-06-07 Micronic Laser Systems Ab Homogenizer
JP4987708B2 (ja) * 2005-06-20 2012-07-25 パナソニック株式会社 ２次元画像表示装置、照明光源及び露光照明装置
DE102006038643B4 (de) * 2006-08-17 2009-06-10 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102008009601A1 (de) * 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
WO2013103992A2 (en) * 2012-01-06 2013-07-11 Calmar Optcom, Inc., dba Calmar Laser Generating ultrashort laser pulses based on two-stage pulse processing

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198631A (en) * 1981-05-29 1982-12-06 Ibm Exposing method and device
US4450358A (en) * 1982-09-22 1984-05-22 Honeywell Inc. Optical lithographic system
US4624551A (en) * 1983-09-17 1986-11-25 Nippon Kogaku K.K. Light irradiation control method for projection exposure apparatus
US4619508A (en) * 1984-04-28 1986-10-28 Nippon Kogaku K. K. Illumination optical arrangement
JPS60247643A (ja) * 1984-05-24 1985-12-07 Canon Inc 光学装置

Also Published As

Publication number Publication date
JPS63110722A (ja) 1988-05-16
US4819033A (en) 1989-04-04
EP0265917A3 (en) 1989-03-22
JPH0556015B2 (de) 1993-08-18
EP0265917A2 (de) 1988-05-04
DE3785636D1 (de) 1993-06-03
EP0265917B1 (de) 1993-04-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee