DE3787955D1 - Photomaske mit Transmissionsfaktor-Modulation, ihr Herstellungsverfahren und Herstellungsverfahren für ein Beugungsgitter. - Google Patents

Photomaske mit Transmissionsfaktor-Modulation, ihr Herstellungsverfahren und Herstellungsverfahren für ein Beugungsgitter.

Info

Publication number
DE3787955D1
DE3787955D1 DE87117890T DE3787955T DE3787955D1 DE 3787955 D1 DE3787955 D1 DE 3787955D1 DE 87117890 T DE87117890 T DE 87117890T DE 3787955 T DE3787955 T DE 3787955T DE 3787955 D1 DE3787955 D1 DE 3787955D1
Authority
DE
Germany
Prior art keywords
manufacturing process
photomask
diffraction grating
transmission factor
factor modulation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE87117890T
Other languages
English (en)
Other versions
DE3787955T2 (de
Inventor
Nobuhiro Kawatsuki
Katsuya Fujisawa
Ichiro Matsuzaki
Masao Uetsuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Application granted granted Critical
Publication of DE3787955D1 publication Critical patent/DE3787955D1/de
Publication of DE3787955T2 publication Critical patent/DE3787955T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE3787955T 1986-12-06 1987-12-03 Photomaske mit Transmissionsfaktor-Modulation, ihr Herstellungsverfahren und Herstellungsverfahren für ein Beugungsgitter. Expired - Fee Related DE3787955T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29099286 1986-12-06

Publications (2)

Publication Number Publication Date
DE3787955D1 true DE3787955D1 (de) 1993-12-02
DE3787955T2 DE3787955T2 (de) 1994-05-19

Family

ID=17763056

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3787955T Expired - Fee Related DE3787955T2 (de) 1986-12-06 1987-12-03 Photomaske mit Transmissionsfaktor-Modulation, ihr Herstellungsverfahren und Herstellungsverfahren für ein Beugungsgitter.

Country Status (4)

Country Link
US (1) US4842969A (de)
EP (1) EP0271002B1 (de)
KR (1) KR910005879B1 (de)
DE (1) DE3787955T2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5070488A (en) * 1988-06-29 1991-12-03 Atsuko Fukushima Optical integrated circuit and optical apparatus
US4909818A (en) * 1988-11-16 1990-03-20 Jones William F System and process for making diffractive contact
US5279924A (en) * 1989-04-04 1994-01-18 Sharp Kabushiki Kaisha Manufacturing method of optical diffraction grating element with serrated gratings having uniformly etched grooves
US5286584A (en) * 1989-12-20 1994-02-15 U.S. Philips Corporation Method of manufacturing a device and group of masks for this method
JPH04211202A (ja) * 1990-03-19 1992-08-03 Canon Inc 反射型回折格子および該回折格子を用いた装置
JPH0416910A (ja) * 1990-05-11 1992-01-21 Omron Corp 光学レンズ
US5367588A (en) * 1992-10-29 1994-11-22 Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same
US5104209A (en) * 1991-02-19 1992-04-14 Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications Method of creating an index grating in an optical fiber and a mode converter using the index grating
US5604081A (en) * 1992-08-14 1997-02-18 Siemens Aktiengesellschaft Method for producing a surface structure with reliefs
US5418095A (en) * 1993-01-21 1995-05-23 Sematech, Inc. Method of fabricating phase shifters with absorbing/attenuating sidewalls using an additive process
US5411824A (en) * 1993-01-21 1995-05-02 Sematech, Inc. Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging
AU5681194A (en) * 1993-01-21 1994-08-15 Sematech, Inc. Phase shifting mask structure with multilayer optical coating for improved transmission
GB9509932D0 (en) * 1995-05-17 1995-07-12 Northern Telecom Ltd Bragg gratings in waveguides
US5792180A (en) * 1996-01-23 1998-08-11 United States Surgical Corporation High bend strength surgical needles and surgical incision members and methods of producing same by double sided photoetching
US5762811A (en) * 1996-01-24 1998-06-09 United States Surgical Corporation One-sided photoetching process for needle fabrication
US5693454A (en) * 1996-01-24 1997-12-02 United States Surgical Corporation Two-sided photoetching process for needle fabrication
CA2271815C (en) * 1996-11-15 2010-01-19 Diffraction Ltd. In-line holographic mask for micromachining
US6613498B1 (en) 1998-09-17 2003-09-02 Mems Optical Llc Modulated exposure mask and method of using a modulated exposure mask
US6307662B1 (en) * 1999-01-21 2001-10-23 Ncr Corporation Blazed diffraction scanner
GB2349237A (en) 1999-04-24 2000-10-25 Sharp Kk An optical element, method of manufacture thereof and a display device incorporating said element.
GB2360971A (en) * 2000-04-03 2001-10-10 Suisse Electronique Microtech Technique for microstructuring replication moulds
US20060216478A1 (en) * 2000-07-26 2006-09-28 Shimadzu Corporation Grating, negative and replica gratings of the grating, and method of manufacturing the same
JP4344224B2 (ja) * 2003-11-21 2009-10-14 浜松ホトニクス株式会社 光学マスクおよびｍｏｐａレーザ装置
JP5841797B2 (ja) 2011-10-07 2016-01-13 株式会社日立ハイテクノロジーズ 回折格子の製造方法
CN103630953B (zh) 2012-08-22 2016-08-03 北京京东方光电科技有限公司 一种棱镜膜及其制备方法及装置
WO2014183039A2 (en) * 2013-05-10 2014-11-13 Optometrics Corporation Combination optical filter and diffraction grating and associated systems and methods
US11795253B2 (en) * 2018-12-26 2023-10-24 Kuraray Co., Ltd. Composition having excellent coating properties
WO2021016028A1 (en) * 2019-07-19 2021-01-28 Magic Leap, Inc. Method of fabricating diffraction gratings

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT284506B (de) * 1968-01-20 1970-09-25 Heidenhain Gmbh Dr Johannes Verfahren zur Herstellung von optischen Beugungsgittern
US3777633A (en) * 1972-02-25 1973-12-11 Ibm Structure for making phase filters
JPS54110857A (en) * 1978-02-17 1979-08-30 Nec Corp Optical production of sawtooth photo-sensitive resin flim
US4414317A (en) * 1982-04-21 1983-11-08 Armstrong World Industries, Inc. Transparency, a method for forming it and a photographic mask whose optical densities are correlated with the contour of a surface
JPS59172723A (ja) * 1983-03-22 1984-09-29 Nec Corp パタ−ン形成方法

Also Published As

Publication number Publication date
DE3787955T2 (de) 1994-05-19
EP0271002A3 (en) 1988-09-14
EP0271002B1 (de) 1993-10-27
US4842969A (en) 1989-06-27
KR880008058A (ko) 1988-08-30
KR910005879B1 (ko) 1991-08-06
EP0271002A2 (de) 1988-06-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee