DE3873550D1 - Photopolymerisierbare zusammensetzungen. - Google Patents

Photopolymerisierbare zusammensetzungen.

Info

Publication number
DE3873550D1
DE3873550D1 DE8888100938T DE3873550T DE3873550D1 DE 3873550 D1 DE3873550 D1 DE 3873550D1 DE 8888100938 T DE8888100938 T DE 8888100938T DE 3873550 T DE3873550 T DE 3873550T DE 3873550 D1 DE3873550 D1 DE 3873550D1
Authority
DE
Germany
Prior art keywords
photopolymerizable compositions
photopolymerizable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888100938T
Other languages
English (en)
Other versions
DE3873550T2 (de
Inventor
Masami Kawabata
Masahiko Harada
Yasuyuki Takimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62014458A external-priority patent/JP2539810B2/ja
Priority claimed from JP11389487A external-priority patent/JPH07116248B2/ja
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Application granted granted Critical
Publication of DE3873550D1 publication Critical patent/DE3873550D1/de
Publication of DE3873550T2 publication Critical patent/DE3873550T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/103—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing a diaryl- or triarylmethane dye
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/105—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing a methine or polymethine dye
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/109—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing other specific dyes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
DE8888100938T 1987-01-22 1988-01-22 Photopolymerisierbare zusammensetzungen. Expired - Fee Related DE3873550T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62014458A JP2539810B2 (ja) 1987-01-22 1987-01-22 高感度光重合性組成物
JP11389487A JPH07116248B2 (ja) 1987-05-11 1987-05-11 光重合性組成物

Publications (2)

Publication Number Publication Date
DE3873550D1 true DE3873550D1 (de) 1992-09-17
DE3873550T2 DE3873550T2 (de) 1993-01-28

Family

ID=26350407

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888100938T Expired - Fee Related DE3873550T2 (de) 1987-01-22 1988-01-22 Photopolymerisierbare zusammensetzungen.

Country Status (5)

Country Link
US (2) US4868092A (de)
EP (1) EP0276016B1 (de)
AU (1) AU600334B2 (de)
CA (1) CA1308852C (de)
DE (1) DE3873550T2 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2538992B2 (ja) * 1987-07-21 1996-10-02 三菱化学株式会社 光重合性組成物
JPH01126302A (ja) * 1987-11-10 1989-05-18 Nippon Paint Co Ltd 光重合性組成物
DE3918105A1 (de) * 1988-06-02 1989-12-14 Toyo Boseki Photopolymerisierbare zusammensetzung
US4971892A (en) * 1988-11-23 1990-11-20 Minnesota Mining And Manufacturing Company High sensitivity photopolymerizable composition
US4921827A (en) * 1988-11-23 1990-05-01 Minnesota Mining And Manufacturing Company Sensitized photoinitiator system for addition polymerization
US5164278A (en) * 1990-03-01 1992-11-17 International Business Machines Corporation Speed enhancers for acid sensitized resists
JP2677457B2 (ja) * 1991-01-22 1997-11-17 日本ペイント株式会社 光重合性組成物
US5639802A (en) * 1991-05-20 1997-06-17 Spectra Group Limited, Inc. Cationic polymerization
JP2758737B2 (ja) * 1991-07-11 1998-05-28 日本ペイント株式会社 光重合性組成物及び感光性平版印刷版
US5422204A (en) * 1991-07-19 1995-06-06 Canon Kabushiki Kaisha Photo-crosslinkable resin composition and hologram recording medium
US5415976A (en) * 1991-10-25 1995-05-16 Minnesota Mining And Manufacturing Company Aminoketone sensitizers for photopolymer compositions
US5451612A (en) * 1993-08-17 1995-09-19 Cenegy; Louis F. Integral skin polyurethane
GB9319961D0 (en) * 1993-09-28 1993-11-17 Horsell Plc Photopolymerisable composition
US5629354A (en) * 1995-02-28 1997-05-13 Eastman Kodak Company Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator
US5821030A (en) * 1995-07-20 1998-10-13 Kodak Polychrome Graphics Lithographic printing plates having a photopolymerizable imaging layer overcoated with an oxygen barrier layer
JP3470253B2 (ja) * 1996-07-24 2003-11-25 コニカミノルタホールディングス株式会社 光開始剤、光重合組成物、ラジカル発生方法、平版印刷版作成用感光材料及び平版印刷版の作成方法
FR2762001B1 (fr) * 1997-04-11 1999-07-02 Rhodia Chimie Sa Amorceurs non toxiques, resines a groupements organofonctionnels reticulables comprenant les amorceurs, et leur utilisation pour la preparation de polymeres stables et non toxiques
AT412427B (de) * 1999-12-21 2005-02-25 Ciba Sc Holding Ag Strahlungsempfindliche zusammensetzung
JP2002308922A (ja) * 2001-04-12 2002-10-23 Fuji Photo Film Co Ltd 光重合性組成物並びにそれを用いた記録材料
US6664025B2 (en) 2002-02-12 2003-12-16 Kodak Polychrome Graphics Llc Visible radiation sensitive composition
US20080103222A1 (en) * 2002-04-26 2008-05-01 Albemarle Corporation New Class of Amine Coinitiators in Photoinitiated Polymerizations
DE10255663B4 (de) * 2002-11-28 2006-05-04 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Elemente
US20040198859A1 (en) * 2003-04-03 2004-10-07 Nguyen Chau K. Photopolymerization systems and their use
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
US8287923B2 (en) * 2005-06-10 2012-10-16 Medical College Of Georgia Research Institute, Inc. Compositions and methods for treating immune disorders
WO2010003026A1 (en) * 2008-07-01 2010-01-07 The Regents Of The University Of Colorado Methods for extensive dark curing based on visible-light initiated, controlled radical polymerization
US9298088B2 (en) * 2013-07-24 2016-03-29 Orthogonal, Inc. Fluorinated photopolymer with fluorinated sensitizer
KR20160118340A (ko) 2014-02-07 2016-10-11 올싸거널 인코포레이티드 교차-결합 가능한 플루오르화된 포토폴리머
EP3470469A1 (de) 2017-10-13 2019-04-17 LANXESS Deutschland GmbH Methinfarbstoffe

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3759807A (en) * 1969-01-28 1973-09-18 Union Carbide Corp Photopolymerization process using combination of organic carbonyls and amines
US3729313A (en) * 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3808006A (en) * 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
BE794482A (fr) * 1972-01-25 1973-07-24 Du Pont Compositions photopolymerisables contenant des composes cis- alpha -dicarbonyliques cycliques et des sensibilisateurs choisis
US4147552A (en) * 1976-05-21 1979-04-03 Eastman Kodak Company Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
US4278751A (en) * 1979-11-16 1981-07-14 Eastman Kodak Company Photopolymerization co-initiator compositions comprising amine-substituted ketocoumarins and certain acetic acid derivative activators
DE3069349D1 (en) * 1979-06-18 1984-11-08 Eastman Kodak Co Co-initiator compositions for photopolymerization containing 3-acyl-substituted coumarins, photopolymerizable composition and photographic element
US4366228A (en) * 1980-09-05 1982-12-28 Eastman Kodak Company Photopolymerizable compositions featuring novel co-initiators
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
CA1270089A (en) * 1985-08-01 1990-06-05 Masami Kawabata Photopolymerizable composition
US4710445A (en) * 1986-04-22 1987-12-01 Minnesota Mining And Manufacturing Company Resist imageable photopolymerizable compositions
US4792506A (en) * 1986-09-19 1988-12-20 Minnesota Mining And Manufacturing Company Polymerizable compositions containing iodonium photoinitiators and photosensitizers therefor
US4735632A (en) * 1987-04-02 1988-04-05 Minnesota Mining And Manufacturing Company Coated abrasive binder containing ternary photoinitiator system

Also Published As

Publication number Publication date
EP0276016A2 (de) 1988-07-27
US4965171A (en) 1990-10-23
EP0276016A3 (en) 1989-07-05
CA1308852C (en) 1992-10-13
AU1072288A (en) 1988-07-28
DE3873550T2 (de) 1993-01-28
AU600334B2 (en) 1990-08-09
US4868092A (en) 1989-09-19
EP0276016B1 (de) 1992-08-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee