DE388800T1 - Plasma-reaktionsgeraet und substrat-behandlungsverfahren. - Google Patents

Plasma-reaktionsgeraet und substrat-behandlungsverfahren.

Info

Publication number
DE388800T1
DE388800T1 DE199090104938T DE90104938T DE388800T1 DE 388800 T1 DE388800 T1 DE 388800T1 DE 199090104938 T DE199090104938 T DE 199090104938T DE 90104938 T DE90104938 T DE 90104938T DE 388800 T1 DE388800 T1 DE 388800T1
Authority
DE
Germany
Prior art keywords
treatment method
plasma reaction
substrate treatment
reaction machine
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE199090104938T
Other languages
English (en)
Inventor
Jes Okemos Mi 48864 Us Asmussen
Donnie K. East Lansing Mi 48823 Us Reinhard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Michigan State University MSU
Original Assignee
Michigan State University MSU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Michigan State University MSU filed Critical Michigan State University MSU
Publication of DE388800T1 publication Critical patent/DE388800T1/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
DE199090104938T 1989-03-23 1990-03-15 Plasma-reaktionsgeraet und substrat-behandlungsverfahren. Pending DE388800T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/328,017 US4943345A (en) 1989-03-23 1989-03-23 Plasma reactor apparatus and method for treating a substrate

Publications (1)

Publication Number Publication Date
DE388800T1 true DE388800T1 (de) 1991-02-07

Family

ID=23279149

Family Applications (2)

Application Number Title Priority Date Filing Date
DE199090104938T Pending DE388800T1 (de) 1989-03-23 1990-03-15 Plasma-reaktionsgeraet und substrat-behandlungsverfahren.
DE69029480T Expired - Fee Related DE69029480T2 (de) 1989-03-23 1990-03-15 Plasma-Reaktionsgerät und Substrat-Behandlungsverfahren

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69029480T Expired - Fee Related DE69029480T2 (de) 1989-03-23 1990-03-15 Plasma-Reaktionsgerät und Substrat-Behandlungsverfahren

Country Status (9)

Country Link
US (1) US4943345A (de)
EP (1) EP0388800B1 (de)
JP (1) JP2553947B2 (de)
AT (1) ATE146899T1 (de)
CA (1) CA2008926C (de)
DE (2) DE388800T1 (de)
DK (1) DK0388800T3 (de)
ES (1) ES2018129T3 (de)
GR (1) GR900300199T1 (de)

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Also Published As

Publication number Publication date
DE69029480T2 (de) 1997-04-10
US4943345A (en) 1990-07-24
EP0388800A2 (de) 1990-09-26
GR900300199T1 (en) 1991-10-10
ES2018129T3 (es) 1997-05-01
ES2018129A4 (es) 1991-04-01
CA2008926C (en) 1994-03-29
JPH02282482A (ja) 1990-11-20
EP0388800A3 (de) 1991-07-03
ATE146899T1 (de) 1997-01-15
DE69029480D1 (de) 1997-02-06
JP2553947B2 (ja) 1996-11-13
CA2008926A1 (en) 1990-09-23
EP0388800B1 (de) 1996-12-27
DK0388800T3 (da) 1997-06-09

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