DE50114723D1 - Sechsachsiges Positioniersystem mit magnetfeldfreiem Raum - Google Patents
Sechsachsiges Positioniersystem mit magnetfeldfreiem RaumInfo
- Publication number
- DE50114723D1 DE50114723D1 DE50114723T DE50114723T DE50114723D1 DE 50114723 D1 DE50114723 D1 DE 50114723D1 DE 50114723 T DE50114723 T DE 50114723T DE 50114723 T DE50114723 T DE 50114723T DE 50114723 D1 DE50114723 D1 DE 50114723D1
- Authority
- DE
- Germany
- Prior art keywords
- magnetic
- field
- positioning system
- free space
- axis positioning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10046144 | 2000-09-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE50114723D1 true DE50114723D1 (de) | 2009-04-09 |
Family
ID=7656655
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE50114723T Expired - Lifetime DE50114723D1 (de) | 2000-09-15 | 2001-08-30 | Sechsachsiges Positioniersystem mit magnetfeldfreiem Raum |
DE10142489A Ceased DE10142489A1 (de) | 2000-09-15 | 2001-08-30 | Sechsachsiges Positioniersystem mit magnetfeldfreiem Raum |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE10142489A Ceased DE10142489A1 (de) | 2000-09-15 | 2001-08-30 | Sechsachsiges Positioniersystem mit magnetfeldfreiem Raum |
Country Status (4)
Country | Link |
---|---|
US (1) | US6639225B2 (de) |
EP (1) | EP1189018B1 (de) |
JP (1) | JP2002184838A (de) |
DE (2) | DE50114723D1 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7509270B1 (en) | 1992-12-09 | 2009-03-24 | Discovery Communications, Inc. | Electronic Book having electronic commerce features |
US7861166B1 (en) | 1993-12-02 | 2010-12-28 | Discovery Patent Holding, Llc | Resizing document pages to fit available hardware screens |
US7865567B1 (en) | 1993-12-02 | 2011-01-04 | Discovery Patent Holdings, Llc | Virtual on-demand electronic book |
JP4745556B2 (ja) * | 2001-08-20 | 2011-08-10 | キヤノン株式会社 | 位置決め装置、露光装置、及びデバイス製造方法 |
US6638226B2 (en) * | 2001-09-28 | 2003-10-28 | Teratech Corporation | Ultrasound imaging system |
JP2004146492A (ja) * | 2002-10-23 | 2004-05-20 | Canon Inc | Euv露光装置 |
JP2003244927A (ja) * | 2002-02-18 | 2003-08-29 | Yaskawa Electric Corp | リニアモータ及びそれを有するステージ装置 |
KR100565104B1 (ko) * | 2002-06-12 | 2006-03-30 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 디바이스 제조방법 |
US6888289B2 (en) * | 2002-07-16 | 2005-05-03 | Baldor Electric Company | Multi-axes, sub-micron positioner |
US20040145751A1 (en) * | 2003-01-28 | 2004-07-29 | Binnard Michael B. | Square wafer chuck with mirror |
JP2005005393A (ja) * | 2003-06-10 | 2005-01-06 | Canon Inc | ステージ装置、露光装置、およびデバイス製造方法 |
JP2005253179A (ja) * | 2004-03-03 | 2005-09-15 | Canon Inc | 位置決め装置、露光装置およびデバイス製造方法 |
JP4447949B2 (ja) * | 2004-03-25 | 2010-04-07 | キヤノン株式会社 | 位置決め装置の初期化方法、露光装置およびデバイス製造方法 |
FR2881351B1 (fr) * | 2005-02-01 | 2009-01-16 | Linac Technologies Sas Soc Par | Installation et procede pour la sterilisation d'objets par bombardement d'electrons a faible energie |
TWI359344B (en) * | 2008-03-25 | 2012-03-01 | Univ Nat Taiwan | A six degree of freedom precise positioning system |
NL2003776A (en) | 2008-12-31 | 2010-07-01 | Asml Holding Nv | Linear motor magnetic shield apparatus. |
CN102175133B (zh) * | 2011-02-25 | 2012-07-18 | 清华大学 | 全局金属膜厚度测量装置 |
DE102011100153A1 (de) * | 2011-04-29 | 2012-10-31 | Physik Instrumente GmbH & Co. KG | Anordnung eines planaren 6D-Positionierers |
US9500468B2 (en) | 2014-08-25 | 2016-11-22 | Board Of Trustees Of Michigan State University | Scanning interferometry technique for through-thickness evaluation in multi-layered transparent structures |
DE102014224221A1 (de) | 2014-11-27 | 2016-06-02 | Carl Zeiss Smt Gmbh | Positions-Messeinrichtung und Verfahren zur Ermittlung von Positionen eines Messobjekts |
JP6506153B2 (ja) * | 2015-10-27 | 2019-04-24 | 株式会社Screenホールディングス | 変位検出装置および変位検出方法ならびに基板処理装置 |
CN105655494B (zh) * | 2016-03-18 | 2018-08-24 | 深圳市华星光电技术有限公司 | 有机发光二极管的基底及其制作方法、有机发光二极管 |
JP7016969B2 (ja) | 2018-05-02 | 2022-02-07 | エーエスエムエル ネザーランズ ビー.ブイ. | 電子ビーム装置 |
CN115355813B (zh) * | 2022-10-21 | 2023-03-24 | 北京科技大学 | 一种高精度三轴无磁测试转台系统 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5139383A (en) * | 1991-07-23 | 1992-08-18 | Huntington Mechanical Laboratories, Inc. | Device for positioning objects within a sealed chamber |
US5528118A (en) * | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
JPH10112433A (ja) * | 1996-10-04 | 1998-04-28 | Nikon Corp | 除振装置及び露光装置 |
JP3963410B2 (ja) * | 1997-04-22 | 2007-08-22 | キヤノン株式会社 | 位置決め装置およびこれを用いた露光装置 |
JP2000243693A (ja) * | 1999-02-23 | 2000-09-08 | Nikon Corp | ステージ装置及び露光装置 |
DE60032568T2 (de) * | 1999-12-01 | 2007-10-04 | Asml Netherlands B.V. | Positionierungsapparat und damit versehener lithographischer Apparat |
TW546551B (en) * | 1999-12-21 | 2003-08-11 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
-
2001
- 2001-08-30 DE DE50114723T patent/DE50114723D1/de not_active Expired - Lifetime
- 2001-08-30 DE DE10142489A patent/DE10142489A1/de not_active Ceased
- 2001-08-30 EP EP01120844A patent/EP1189018B1/de not_active Expired - Lifetime
- 2001-09-13 JP JP2001277353A patent/JP2002184838A/ja active Pending
- 2001-09-14 US US09/951,762 patent/US6639225B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1189018B1 (de) | 2009-02-25 |
DE10142489A1 (de) | 2002-04-04 |
US6639225B2 (en) | 2003-10-28 |
JP2002184838A (ja) | 2002-06-28 |
EP1189018A3 (de) | 2003-04-02 |
EP1189018A2 (de) | 2002-03-20 |
US20020079461A1 (en) | 2002-06-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |