DE502005007746D1 - Verfahren und Vorrichtung zur Maskenpositionierung - Google Patents

Verfahren und Vorrichtung zur Maskenpositionierung

Info

Publication number
DE502005007746D1
DE502005007746D1 DE502005007746T DE502005007746T DE502005007746D1 DE 502005007746 D1 DE502005007746 D1 DE 502005007746D1 DE 502005007746 T DE502005007746 T DE 502005007746T DE 502005007746 T DE502005007746 T DE 502005007746T DE 502005007746 D1 DE502005007746 D1 DE 502005007746D1
Authority
DE
Germany
Prior art keywords
substrate
mask
actuator
movement
magnets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE502005007746T
Other languages
English (en)
Inventor
Dieter Manz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials GmbH and Co KG
Original Assignee
Applied Materials GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials GmbH and Co KG filed Critical Applied Materials GmbH and Co KG
Publication of DE502005007746D1 publication Critical patent/DE502005007746D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
DE502005007746T 2005-04-20 2005-04-20 Verfahren und Vorrichtung zur Maskenpositionierung Active DE502005007746D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05008663A EP1715076B1 (de) 2005-04-20 2005-04-20 Verfahren und Vorrichtung zur Maskenpositionierung

Publications (1)

Publication Number Publication Date
DE502005007746D1 true DE502005007746D1 (de) 2009-09-03

Family

ID=34935470

Family Applications (1)

Application Number Title Priority Date Filing Date
DE502005007746T Active DE502005007746D1 (de) 2005-04-20 2005-04-20 Verfahren und Vorrichtung zur Maskenpositionierung

Country Status (8)

Country Link
US (1) US20070009671A1 (de)
EP (1) EP1715076B1 (de)
JP (1) JP5063925B2 (de)
KR (1) KR100800237B1 (de)
CN (1) CN1854909A (de)
AT (1) ATE437248T1 (de)
DE (1) DE502005007746D1 (de)
TW (1) TWI311158B (de)

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EP1715075B1 (de) * 2005-04-20 2008-04-16 Applied Materials GmbH & Co. KG Magnetische Maskenhalterung
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JP2007128845A (ja) * 2005-11-04 2007-05-24 Samsung Sdi Co Ltd レーザ熱転写装置及びレーザ熱転写方法
JP2007128844A (ja) * 2005-11-04 2007-05-24 Samsung Sdi Co Ltd レーザ熱転写装置及びレーザ熱転写方法そしてこれを利用した有機発光表示素子
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KR101569796B1 (ko) * 2009-06-23 2015-11-20 주성엔지니어링(주) 기판 정렬 장치, 이를 포함하는 기판 처리 장치 및 기판 정렬 방법
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CN102110787B (zh) * 2010-11-05 2012-07-25 四川虹视显示技术有限公司 Oled掩膜板对位方法
CN103205703B (zh) * 2012-01-16 2016-04-27 昆山允升吉光电科技有限公司 提高掩模板开口位置精度的方法及其装置
US10679883B2 (en) * 2012-04-19 2020-06-09 Intevac, Inc. Wafer plate and mask arrangement for substrate fabrication
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US10062600B2 (en) 2012-04-26 2018-08-28 Intevac, Inc. System and method for bi-facial processing of substrates
MY170824A (en) 2012-04-26 2019-09-04 Intevac Inc System architecture for vacuum processing
CN103676488B (zh) * 2012-09-10 2016-02-03 上海微电子装备有限公司 掩模交接机构及具有该掩模交接机构的掩模台
US20140166203A1 (en) * 2012-12-14 2014-06-19 Shenzhen China Star Optoelectronics Technology Co., Ltd Blocking device, sealant curing device, and sealant curing method
KR102081254B1 (ko) * 2013-07-09 2020-04-16 삼성디스플레이 주식회사 금속 마스크 고정 장치
JP6607923B2 (ja) 2014-08-05 2019-11-20 インテヴァック インコーポレイテッド 注入マスク及びアライメント
WO2016109975A1 (en) * 2015-01-09 2016-07-14 Applied Materials,Inc. Method for coating thin metal substrates using pulsed or combustion coating processes
EP3245311A1 (de) * 2015-01-12 2017-11-22 Applied Materials, Inc. Halteanordnung zum tragen eines substratträgers und eines maskenträgers während einer lagenabscheidung in einer verarbeitungskammer, vorrichtung zur abscheidung einer lage auf einem substrat und verfahren zum ausrichten eines substratträgers zum tragen eines substrats und eines maskenträgers
CN107532289B (zh) * 2015-04-20 2020-06-23 夏普株式会社 成膜方法
CN105428552B (zh) * 2015-12-31 2017-06-09 昆山国显光电有限公司 Oled器件发光层形成方法
US20190368024A1 (en) * 2017-02-24 2019-12-05 Applied Materials, Inc. Positioning arrangement for a substrate carrier and a mask carrier, transportation system for a substrate carrier and a mask carrier, and methods therefor
DE102017105374A1 (de) * 2017-03-14 2018-09-20 Aixtron Se Vorrichtung zum Abscheiden einer strukturierten Schicht auf einem Substrat sowie Verfahren zum Einrichten der Vorrichtung
DE102017105379A1 (de) * 2017-03-14 2018-09-20 Aixtron Se Substrathalteranordnung mit Maskenträger
CN108198958B (zh) * 2018-01-30 2020-06-30 京东方科技集团股份有限公司 显示基板及其制作方法、制作设备、显示装置
KR102591646B1 (ko) * 2018-06-29 2023-10-20 삼성디스플레이 주식회사 증착 장치 및 증착 장치의 마그넷 플레이트 얼라인 방법
WO2020242611A1 (en) 2019-05-24 2020-12-03 Applied Materials, Inc. System and method for aligning a mask with a substrate
US11189516B2 (en) 2019-05-24 2021-11-30 Applied Materials, Inc. Method for mask and substrate alignment
US10916464B1 (en) 2019-07-26 2021-02-09 Applied Materials, Inc. Method of pre aligning carrier, wafer and carrier-wafer combination for throughput efficiency
US11756816B2 (en) 2019-07-26 2023-09-12 Applied Materials, Inc. Carrier FOUP and a method of placing a carrier
US11196360B2 (en) 2019-07-26 2021-12-07 Applied Materials, Inc. System and method for electrostatically chucking a substrate to a carrier
US10950441B1 (en) * 2019-09-03 2021-03-16 Kyoka Utsumi Mimura Low energy e-beam contact printing lithography
JP7266555B2 (ja) * 2020-06-16 2023-04-28 キヤノン株式会社 アライメント方法および蒸着方法

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KR100422487B1 (ko) * 2001-12-10 2004-03-11 에이엔 에스 주식회사 전자석을 이용한 유기전계발광소자 제작용 증착장치 및그를 이용한 증착방법
US8808457B2 (en) * 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
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JP3592690B2 (ja) * 2002-07-10 2004-11-24 エイエヌエス インコーポレイテッド 有機電界発光表示装置用製造設備のシャドーマスク着脱装置
US20040026634A1 (en) * 2002-08-08 2004-02-12 Takao Utsumi Electron beam proximity exposure apparatus
JP4257497B2 (ja) * 2003-02-26 2009-04-22 株式会社日立ハイテクノロジーズ 真空蒸着方法及び真空蒸着装置、並びにこの真空蒸着方法により製造したｅｌパネル
EP1715075B1 (de) * 2005-04-20 2008-04-16 Applied Materials GmbH & Co. KG Magnetische Maskenhalterung

Also Published As

Publication number Publication date
TW200706663A (en) 2007-02-16
JP5063925B2 (ja) 2012-10-31
CN1854909A (zh) 2006-11-01
TWI311158B (en) 2009-06-21
ATE437248T1 (de) 2009-08-15
KR20060110804A (ko) 2006-10-25
EP1715076A1 (de) 2006-10-25
US20070009671A1 (en) 2007-01-11
EP1715076B1 (de) 2009-07-22
JP2006302896A (ja) 2006-11-02
KR100800237B1 (ko) 2008-02-01

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