DE59403284D1 - Photopolymerisierbare Zusammensetzungen - Google Patents

Photopolymerisierbare Zusammensetzungen

Info

Publication number
DE59403284D1
DE59403284D1 DE59403284T DE59403284T DE59403284D1 DE 59403284 D1 DE59403284 D1 DE 59403284D1 DE 59403284 T DE59403284 T DE 59403284T DE 59403284 T DE59403284 T DE 59403284T DE 59403284 D1 DE59403284 D1 DE 59403284D1
Authority
DE
Germany
Prior art keywords
compositions
photopolymerizable compositions
photoresistor
tacky
molecular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE59403284T
Other languages
English (en)
Inventor
Roger Pierre-Elie Dr Salvin
Martin Dr Roth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of DE59403284D1 publication Critical patent/DE59403284D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
DE59403284T 1993-07-02 1994-06-24 Photopolymerisierbare Zusammensetzungen Expired - Lifetime DE59403284D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH200593 1993-07-02

Publications (1)

Publication Number Publication Date
DE59403284D1 true DE59403284D1 (de) 1997-08-14

Family

ID=4223681

Family Applications (1)

Application Number Title Priority Date Filing Date
DE59403284T Expired - Lifetime DE59403284D1 (de) 1993-07-02 1994-06-24 Photopolymerisierbare Zusammensetzungen

Country Status (9)

Country Link
US (2) US5942371A (de)
EP (1) EP0633503B1 (de)
JP (1) JP3511146B2 (de)
KR (1) KR100299264B1 (de)
CN (1) CN1070211C (de)
AT (1) ATE155260T1 (de)
CA (1) CA2127238C (de)
DE (1) DE59403284D1 (de)
TW (1) TW268031B (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW268031B (de) * 1993-07-02 1996-01-11 Ciba Geigy
TW268011B (de) * 1993-07-02 1996-01-11 Ciba Geigy
US5853957A (en) * 1995-05-08 1998-12-29 Tamura Kaken Co., Ltd Photosensitive resin compositions, cured films thereof, and circuit boards
US6207346B1 (en) * 1997-04-09 2001-03-27 Advanced Coatings International Waterborne photoresists made from urethane acrylates
JP3711198B2 (ja) * 1998-04-23 2005-10-26 東京応化工業株式会社 レジストパターンの形成方法
WO2000002091A1 (fr) * 1998-07-07 2000-01-13 Kansai Paint Co., Ltd. Composition de resist de soudage a base d'eau
JP2001222103A (ja) 1999-08-05 2001-08-17 Nippon Paint Co Ltd 水性フォトソルダーレジスト組成物
GB0117155D0 (en) * 2001-07-13 2001-09-05 Coates Electrographics Ltd Improvement in or relating to photocurable resist inks
EP1451640A1 (de) * 2001-12-03 2004-09-01 Showa Denko K.K. Lichtempfindliche zusammensetzung, und verfahren zur herstellung eines fotoempfindlichen films und einer leiterplatte
CA2479942A1 (en) * 2002-04-26 2003-11-06 Albemarle Corporation A new class of amine coinitiators in photoinitiated polymerizations
CN1298796C (zh) * 2003-10-17 2007-02-07 财团法人工业技术研究院 光学涂布层合物及其制造方法
EP1682161A4 (de) * 2003-10-29 2011-12-07 Gentis Inc Polymerisierbare emulsionen für die gewebeherstellung
EP1696719A4 (de) * 2003-11-14 2008-10-29 Bridgestone Corp Elektromagnetisch abschirmendes lichtdurchlässiges fenstermaterial und herstellungsverfahren dafür
US7635552B2 (en) * 2006-07-25 2009-12-22 Endicott Interconnect Technologies, Inc. Photoresist composition with antibacterial agent
KR101048329B1 (ko) 2008-10-06 2011-07-14 주식회사 엘지화학 우레탄계 다관능성 모노머, 그의 제조방법 및 이를 포함하는 감광성 수지 조성물
CN102585556A (zh) * 2011-12-31 2012-07-18 上海东升新材料有限公司 光引发聚合制备抗盐性分散剂的方法
CN103969947B (zh) * 2013-01-31 2016-05-04 太阳油墨（苏州）有限公司 碱显影型感光性树脂组合物、其干膜及其固化物以及使用其而形成的印刷电路板
WO2017126536A1 (ja) * 2016-01-20 2017-07-27 三菱瓦斯化学株式会社 樹脂組成物、支持体付き樹脂シート、多層プリント配線板及び半導体装置
US11274501B2 (en) 2020-07-08 2022-03-15 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications
US11314266B2 (en) 2020-07-08 2022-04-26 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications
US11131158B1 (en) 2020-07-08 2021-09-28 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications
US11802645B2 (en) 2020-07-08 2023-10-31 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications
US11256273B2 (en) 2020-07-08 2022-02-22 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications
US11294401B2 (en) 2020-07-08 2022-04-05 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1618729A1 (de) * 1966-03-10 1972-03-30 North American Aviation Inc Verfahren zur Herstellung eines photopolymerisierbaren Epoxydharzes
EP0270945B1 (de) * 1986-12-02 1993-04-21 E.I. Du Pont De Nemours And Company Photosensible Zusammensetzung mit verbesserter Haftung, Gegenstände und Verfahren
DE3850533T2 (de) * 1987-08-05 1994-10-27 Ciba Geigy Ag Bilderzeugungsverfahren.
JPS6462375A (en) * 1987-09-02 1989-03-08 Arakawa Chem Ind Liquid photosolder resist ink composition of alkali development type
JPH0823694B2 (ja) * 1988-08-04 1996-03-06 富士写真フイルム株式会社 液状感光性樹脂組成物
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
EP0402894B1 (de) * 1989-06-16 1995-07-26 Ciba-Geigy Ag Photoresist
EP0493317B2 (de) * 1990-12-18 2001-01-10 Ciba SC Holding AG Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungsmittel
JPH04294352A (ja) * 1991-03-22 1992-10-19 Tamura Kaken Kk 感光性水性樹脂組成物
JP2877659B2 (ja) * 1993-05-10 1999-03-31 日本化薬株式会社 レジストインキ組成物及びその硬化物
TW268031B (de) * 1993-07-02 1996-01-11 Ciba Geigy

Also Published As

Publication number Publication date
US5942371A (en) 1999-08-24
CN1070211C (zh) 2001-08-29
TW268031B (de) 1996-01-11
KR100299264B1 (ko) 2001-11-30
US6045972A (en) 2000-04-04
CN1103077A (zh) 1995-05-31
CA2127238C (en) 2006-03-21
JPH0756337A (ja) 1995-03-03
JP3511146B2 (ja) 2004-03-29
ATE155260T1 (de) 1997-07-15
KR950003920A (ko) 1995-02-17
EP0633503A1 (de) 1995-01-11
EP0633503B1 (de) 1997-07-09
CA2127238A1 (en) 1995-01-03

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Legal Events

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8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: VANTICO AG, BASEL, CH