DE60003109D1 - Strahlmittel und Strahlverfahren - Google Patents

Strahlmittel und Strahlverfahren

Info

Publication number
DE60003109D1
DE60003109D1 DE60003109T DE60003109T DE60003109D1 DE 60003109 D1 DE60003109 D1 DE 60003109D1 DE 60003109 T DE60003109 T DE 60003109T DE 60003109 T DE60003109 T DE 60003109T DE 60003109 D1 DE60003109 D1 DE 60003109D1
Authority
DE
Germany
Prior art keywords
abrasives
blasting processes
blasting
processes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60003109T
Other languages
English (en)
Other versions
DE60003109T2 (de
Inventor
Masaharu Tanaka
Hachiro Hirano
Makoto Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of DE60003109D1 publication Critical patent/DE60003109D1/de
Publication of DE60003109T2 publication Critical patent/DE60003109T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C11/00Selection of abrasive materials or additives for abrasive blasts
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0055After-treatment, e.g. cleaning or desmearing of holes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/025Abrading, e.g. grinding or sand blasting
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0035Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
DE60003109T 1999-03-29 2000-03-28 Strahlmittel und Strahlverfahren Expired - Lifetime DE60003109T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8634399 1999-03-29

Publications (2)

Publication Number Publication Date
DE60003109D1 true DE60003109D1 (de) 2003-07-10
DE60003109T2 DE60003109T2 (de) 2004-01-29

Family

ID=13884226

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60003109T Expired - Lifetime DE60003109T2 (de) 1999-03-29 2000-03-28 Strahlmittel und Strahlverfahren

Country Status (4)

Country Link
US (1) US6478878B1 (de)
EP (1) EP1040892B1 (de)
JP (2) JP2000343435A (de)
DE (1) DE60003109T2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000343435A (ja) * 1999-03-29 2000-12-12 Asahi Glass Co Ltd ブラストメディア及びブラスト方法
JP3840632B2 (ja) 2000-05-08 2006-11-01 三井造船株式会社 ナトリウム系脱塩剤および廃棄物処理装置
US6817927B2 (en) * 2001-10-19 2004-11-16 Eastman Kodak Company Method of removing material from an external surface using core/shell particles
JP3941573B2 (ja) * 2002-04-24 2007-07-04 宇部興産株式会社 フレキシブル両面基板の製造方法
JP2004148414A (ja) * 2002-10-28 2004-05-27 Seiko Epson Corp 研削材及び研削材の製造方法並びに製造装置
JP4367623B2 (ja) 2004-01-14 2009-11-18 住友電気工業株式会社 多孔質延伸ポリテトラフルオロエチレンシート製または多孔質延伸ポリテトラフルオロエチレンフィルム製の電気回路部品の製造方法、及び電気回路部品
DE102004003420B4 (de) * 2004-01-23 2006-10-26 Dr.Ing.H.C. F. Porsche Ag Verfahren zur Behandlung von Aluminiumgussteilen
JP4947510B2 (ja) * 2004-12-24 2012-06-06 Nltテクノロジー株式会社 アクティブマトリクス型表示装置及びその製造方法
US20070111642A1 (en) * 2005-11-14 2007-05-17 Davis Ian M Apparatus and methods for slurry cleaning of etch chambers
US20080017734A1 (en) * 2006-07-10 2008-01-24 Micheli Paul R System and method of uniform spray coating
DE102006035260A1 (de) 2006-07-26 2008-01-31 Martin GmbH für Umwelt- und Energietechnik Verfahren und Vorrichtung zum Trennen von Reststoffen
KR101111930B1 (ko) 2008-09-30 2012-02-14 이비덴 가부시키가이샤 다층 프린트 배선판, 및 다층 프린트 배선판의 제조 방법
DE102009017231B4 (de) * 2009-04-09 2016-12-01 Epcos Ag Horde
JP2012069854A (ja) * 2010-09-27 2012-04-05 Cmk Corp 多層プリント配線板とその製造方法
US10294019B2 (en) * 2016-08-17 2019-05-21 Raritan Pharmaceuticals Inc. System for preparing medicinal beverages using cartridge-type beverage brewers
CN111050478B (zh) * 2019-12-25 2021-03-02 浙江振有电子股份有限公司 一种环氧基板微米级细孔去渣方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL93572A (en) * 1989-03-14 1993-06-10 Church & Dwight Co Inc Process for removing coatings from sensitive substrates and blasting media useful therein
KR0149479B1 (ko) 1992-03-20 1998-10-15 마이클 제이 케니 연마성 피막 제거제 및 그를 사용하는 방법
US5308404A (en) * 1993-01-21 1994-05-03 Church & Dwight Co., Inc. Less aggressive blast media formed from compacted particles
US6010546A (en) 1997-07-24 2000-01-04 Asahi Glass Company, Ltd. Blasting medium and blasting method employing such medium
US5827114A (en) * 1996-09-25 1998-10-27 Church & Dwight Co., Inc. Slurry blasting process
JPH11246217A (ja) * 1998-03-04 1999-09-14 Asahi Glass Co Ltd ナトリウム塩の製造方法
JP2000343435A (ja) * 1999-03-29 2000-12-12 Asahi Glass Co Ltd ブラストメディア及びブラスト方法

Also Published As

Publication number Publication date
JP2000343435A (ja) 2000-12-12
US6478878B1 (en) 2002-11-12
JP2010158770A (ja) 2010-07-22
DE60003109T2 (de) 2004-01-29
EP1040892A1 (de) 2000-10-04
EP1040892B1 (de) 2003-06-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition