US20040137734A1
(en)
*
|
1995-11-15 |
2004-07-15 |
Princeton University |
Compositions and processes for nanoimprinting
|
US8128856B2
(en)
*
|
1995-11-15 |
2012-03-06 |
Regents Of The University Of Minnesota |
Release surfaces, particularly for use in nanoimprint lithography
|
US6334960B1
(en)
|
1999-03-11 |
2002-01-01 |
Board Of Regents, The University Of Texas System |
Step and flash imprint lithography
|
US6780001B2
(en)
*
|
1999-07-30 |
2004-08-24 |
Formfactor, Inc. |
Forming tool for forming a contoured microelectronic spring mold
|
US6939474B2
(en)
*
|
1999-07-30 |
2005-09-06 |
Formfactor, Inc. |
Method for forming microelectronic spring structures on a substrate
|
US6873087B1
(en)
*
|
1999-10-29 |
2005-03-29 |
Board Of Regents, The University Of Texas System |
High precision orientation alignment and gap control stages for imprint lithography processes
|
US7432634B2
(en)
|
2000-10-27 |
2008-10-07 |
Board Of Regents, University Of Texas System |
Remote center compliant flexure device
|
SE516194C2
(sv)
*
|
2000-04-18 |
2001-12-03 |
Obducat Ab |
Substrat för samt process vid tillverkning av strukturer
|
CN100504598C
(zh)
*
|
2000-07-16 |
2009-06-24 |
得克萨斯州大学系统董事会 |
用于平版印刷工艺中的高分辨率重叠对齐方法和系统
|
US20050160011A1
(en)
*
|
2004-01-20 |
2005-07-21 |
Molecular Imprints, Inc. |
Method for concurrently employing differing materials to form a layer on a substrate
|
AU2001277907A1
(en)
*
|
2000-07-17 |
2002-01-30 |
Board Of Regents, The University Of Texas System |
Method and system of automatic fluid dispensing for imprint lithography processes
|
KR20030040378A
(ko)
*
|
2000-08-01 |
2003-05-22 |
보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 |
임프린트 리소그래피를 위한 투명한 템플릿과 기판사이의고정확성 갭 및 방향설정 감지 방법
|
WO2002017383A2
(en)
*
|
2000-08-21 |
2002-02-28 |
Board Of Regents, The University Of Texas System |
Flexure based translation stage
|
EP2306242A3
(de)
*
|
2000-10-12 |
2011-11-02 |
Board of Regents, The University of Texas System |
Verfahren zur Erzeugung eines Motifs auf einem Substrat
|
US20050274219A1
(en)
*
|
2004-06-01 |
2005-12-15 |
Molecular Imprints, Inc. |
Method and system to control movement of a body for nano-scale manufacturing
|
US20060005657A1
(en)
*
|
2004-06-01 |
2006-01-12 |
Molecular Imprints, Inc. |
Method and system to control movement of a body for nano-scale manufacturing
|
US6964793B2
(en)
*
|
2002-05-16 |
2005-11-15 |
Board Of Regents, The University Of Texas System |
Method for fabricating nanoscale patterns in light curable compositions using an electric field
|
SE519573C2
(sv)
|
2001-07-05 |
2003-03-11 |
Obducat Ab |
Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp
|
SG187992A1
(en)
*
|
2001-07-25 |
2013-03-28 |
Univ Princeton |
Nanochannel arrays and their preparation and use for high throughput macromolecular analysis
|
US9678038B2
(en)
|
2001-07-25 |
2017-06-13 |
The Trustees Of Princeton University |
Nanochannel arrays and their preparation and use for high throughput macromolecular analysis
|
JP2003109915A
(ja)
*
|
2001-09-28 |
2003-04-11 |
National Institute Of Advanced Industrial & Technology |
剥離性雰囲気でのインプリントリソグラフィー方法及び装置
|
EP1441868A4
(de)
*
|
2001-10-11 |
2006-08-30 |
Brewer Science Inc |
Reproduktion von gemusterter struktur unter verwendung von nichthaftender form
|
US20030071016A1
(en)
|
2001-10-11 |
2003-04-17 |
Wu-Sheng Shih |
Patterned structure reproduction using nonsticking mold
|
KR20030057067A
(ko)
*
|
2001-12-28 |
2003-07-04 |
엘지.필립스 엘시디 주식회사 |
인쇄방식을 이용한 패턴형성방법
|
WO2003106693A2
(en)
|
2002-01-01 |
2003-12-24 |
Princeton University |
Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof
|
JP2003218658A
(ja)
*
|
2002-01-17 |
2003-07-31 |
Nec Corp |
弾性表面波素子及び半導体装置の製造方法
|
US20030186405A1
(en)
*
|
2002-04-01 |
2003-10-02 |
The Ohio State University Research Foundation |
Micro/nano-embossing process and useful applications thereof
|
US7652574B2
(en)
*
|
2002-04-08 |
2010-01-26 |
Sayegh Adel O |
Article surveillance tag having a vial
|
US6730617B2
(en)
|
2002-04-24 |
2004-05-04 |
Ibm |
Method of fabricating one or more tiers of an integrated circuit
|
US7037639B2
(en)
*
|
2002-05-01 |
2006-05-02 |
Molecular Imprints, Inc. |
Methods of manufacturing a lithography template
|
US20030235787A1
(en)
*
|
2002-06-24 |
2003-12-25 |
Watts Michael P.C. |
Low viscosity high resolution patterning material
|
US7179079B2
(en)
*
|
2002-07-08 |
2007-02-20 |
Molecular Imprints, Inc. |
Conforming template for patterning liquids disposed on substrates
|
US20080160129A1
(en)
|
2006-05-11 |
2008-07-03 |
Molecular Imprints, Inc. |
Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
|
US6926929B2
(en)
*
|
2002-07-09 |
2005-08-09 |
Molecular Imprints, Inc. |
System and method for dispensing liquids
|
US6932934B2
(en)
*
|
2002-07-11 |
2005-08-23 |
Molecular Imprints, Inc. |
Formation of discontinuous films during an imprint lithography process
|
US7442336B2
(en)
*
|
2003-08-21 |
2008-10-28 |
Molecular Imprints, Inc. |
Capillary imprinting technique
|
US7077992B2
(en)
|
2002-07-11 |
2006-07-18 |
Molecular Imprints, Inc. |
Step and repeat imprint lithography processes
|
US6908861B2
(en)
*
|
2002-07-11 |
2005-06-21 |
Molecular Imprints, Inc. |
Method for imprint lithography using an electric field
|
MY164487A
(en)
|
2002-07-11 |
2017-12-29 |
Molecular Imprints Inc |
Step and repeat imprint lithography processes
|
US6900881B2
(en)
*
|
2002-07-11 |
2005-05-31 |
Molecular Imprints, Inc. |
Step and repeat imprint lithography systems
|
US7019819B2
(en)
*
|
2002-11-13 |
2006-03-28 |
Molecular Imprints, Inc. |
Chucking system for modulating shapes of substrates
|
US7027156B2
(en)
*
|
2002-08-01 |
2006-04-11 |
Molecular Imprints, Inc. |
Scatterometry alignment for imprint lithography
|
US7070405B2
(en)
*
|
2002-08-01 |
2006-07-04 |
Molecular Imprints, Inc. |
Alignment systems for imprint lithography
|
US7071088B2
(en)
*
|
2002-08-23 |
2006-07-04 |
Molecular Imprints, Inc. |
Method for fabricating bulbous-shaped vias
|
US6936194B2
(en)
*
|
2002-09-05 |
2005-08-30 |
Molecular Imprints, Inc. |
Functional patterning material for imprint lithography processes
|
US20040065252A1
(en)
*
|
2002-10-04 |
2004-04-08 |
Sreenivasan Sidlgata V. |
Method of forming a layer on a substrate to facilitate fabrication of metrology standards
|
US8349241B2
(en)
*
|
2002-10-04 |
2013-01-08 |
Molecular Imprints, Inc. |
Method to arrange features on a substrate to replicate features having minimal dimensional variability
|
DE60333715D1
(de)
*
|
2002-10-30 |
2010-09-23 |
Hitachi Ltd |
Verfahren zur Herstellung funktioneller Substrate, die kolumnare Mikrosäulen aufweisen
|
WO2004044654A2
(en)
*
|
2002-11-12 |
2004-05-27 |
Princeton University |
Compositions and processes for nanoimprinting
|
US6929762B2
(en)
*
|
2002-11-13 |
2005-08-16 |
Molecular Imprints, Inc. |
Method of reducing pattern distortions during imprint lithography processes
|
US6980282B2
(en)
*
|
2002-12-11 |
2005-12-27 |
Molecular Imprints, Inc. |
Method for modulating shapes of substrates
|
ATE549743T1
(de)
|
2002-11-13 |
2012-03-15 |
Molecular Imprints Inc |
Ein lithographiesystem mit einem halterungssystem
|
US7641840B2
(en)
*
|
2002-11-13 |
2010-01-05 |
Molecular Imprints, Inc. |
Method for expelling gas positioned between a substrate and a mold
|
US6900126B2
(en)
|
2002-11-20 |
2005-05-31 |
International Business Machines Corporation |
Method of forming metallized pattern
|
US7365103B2
(en)
*
|
2002-12-12 |
2008-04-29 |
Board Of Regents, The University Of Texas System |
Compositions for dark-field polymerization and method of using the same for imprint lithography processes
|
US20040112862A1
(en)
*
|
2002-12-12 |
2004-06-17 |
Molecular Imprints, Inc. |
Planarization composition and method of patterning a substrate using the same
|
US6871558B2
(en)
|
2002-12-12 |
2005-03-29 |
Molecular Imprints, Inc. |
Method for determining characteristics of substrate employing fluid geometries
|
AU2003300865A1
(en)
*
|
2002-12-13 |
2004-07-09 |
Molecular Imprints, Inc. |
Magnification corrections employing out-of-plane distortions on a substrate
|
JP2004241397A
(ja)
*
|
2003-01-23 |
2004-08-26 |
Dainippon Printing Co Ltd |
薄膜トランジスタおよびその製造方法
|
US20040168613A1
(en)
*
|
2003-02-27 |
2004-09-02 |
Molecular Imprints, Inc. |
Composition and method to form a release layer
|
US7452574B2
(en)
*
|
2003-02-27 |
2008-11-18 |
Molecular Imprints, Inc. |
Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
|
JP4317375B2
(ja)
*
|
2003-03-20 |
2009-08-19 |
株式会社日立製作所 |
ナノプリント装置、及び微細構造転写方法
|
US7122079B2
(en)
*
|
2004-02-27 |
2006-10-17 |
Molecular Imprints, Inc. |
Composition for an etching mask comprising a silicon-containing material
|
US7179396B2
(en)
*
|
2003-03-25 |
2007-02-20 |
Molecular Imprints, Inc. |
Positive tone bi-layer imprint lithography method
|
US7186656B2
(en)
*
|
2004-05-21 |
2007-03-06 |
Molecular Imprints, Inc. |
Method of forming a recessed structure employing a reverse tone process
|
US7323417B2
(en)
*
|
2004-09-21 |
2008-01-29 |
Molecular Imprints, Inc. |
Method of forming a recessed structure employing a reverse tone process
|
US20040202865A1
(en)
*
|
2003-04-08 |
2004-10-14 |
Andrew Homola |
Release coating for stamper
|
US7410904B2
(en)
*
|
2003-04-24 |
2008-08-12 |
Hewlett-Packard Development Company, L.P. |
Sensor produced using imprint lithography
|
US7396475B2
(en)
*
|
2003-04-25 |
2008-07-08 |
Molecular Imprints, Inc. |
Method of forming stepped structures employing imprint lithography
|
US6805054B1
(en)
|
2003-05-14 |
2004-10-19 |
Molecular Imprints, Inc. |
Method, system and holder for transferring templates during imprint lithography processes
|
JP4937750B2
(ja)
*
|
2003-05-14 |
2012-05-23 |
モレキュラー・インプリンツ・インコーポレーテッド |
インプリント・リソグラフィ・プロセス中にテンプレートを移動させるための方法、システム、ホルダ、アセンブリ
|
US6951173B1
(en)
*
|
2003-05-14 |
2005-10-04 |
Molecular Imprints, Inc. |
Assembly and method for transferring imprint lithography templates
|
US20050160934A1
(en)
*
|
2004-01-23 |
2005-07-28 |
Molecular Imprints, Inc. |
Materials and methods for imprint lithography
|
US7157036B2
(en)
*
|
2003-06-17 |
2007-01-02 |
Molecular Imprints, Inc |
Method to reduce adhesion between a conformable region and a pattern of a mold
|
US20060108710A1
(en)
*
|
2004-11-24 |
2006-05-25 |
Molecular Imprints, Inc. |
Method to reduce adhesion between a conformable region and a mold
|
US7307118B2
(en)
*
|
2004-11-24 |
2007-12-11 |
Molecular Imprints, Inc. |
Composition to reduce adhesion between a conformable region and a mold
|
US7150622B2
(en)
*
|
2003-07-09 |
2006-12-19 |
Molecular Imprints, Inc. |
Systems for magnification and distortion correction for imprint lithography processes
|
KR100606532B1
(ko)
*
|
2003-08-02 |
2006-07-31 |
동부일렉트로닉스 주식회사 |
반도체 소자의 제조 방법
|
DE10340608A1
(de)
|
2003-08-29 |
2005-03-24 |
Infineon Technologies Ag |
Polymerformulierung und Verfahren zur Herstellung einer Dielektrikumsschicht
|
CN1997691B
(zh)
*
|
2003-09-23 |
2011-07-20 |
北卡罗来纳大学查珀尔希尔分校 |
光固化的全氟聚醚用作微流体器件中的新材料
|
US7136150B2
(en)
*
|
2003-09-25 |
2006-11-14 |
Molecular Imprints, Inc. |
Imprint lithography template having opaque alignment marks
|
US8211214B2
(en)
*
|
2003-10-02 |
2012-07-03 |
Molecular Imprints, Inc. |
Single phase fluid imprint lithography method
|
US7090716B2
(en)
*
|
2003-10-02 |
2006-08-15 |
Molecular Imprints, Inc. |
Single phase fluid imprint lithography method
|
US20050084804A1
(en)
*
|
2003-10-16 |
2005-04-21 |
Molecular Imprints, Inc. |
Low surface energy templates
|
US7261830B2
(en)
*
|
2003-10-16 |
2007-08-28 |
Molecular Imprints, Inc. |
Applying imprinting material to substrates employing electromagnetic fields
|
US7122482B2
(en)
*
|
2003-10-27 |
2006-10-17 |
Molecular Imprints, Inc. |
Methods for fabricating patterned features utilizing imprint lithography
|
US20050106321A1
(en)
*
|
2003-11-14 |
2005-05-19 |
Molecular Imprints, Inc. |
Dispense geometery to achieve high-speed filling and throughput
|
US20050098534A1
(en)
*
|
2003-11-12 |
2005-05-12 |
Molecular Imprints, Inc. |
Formation of conductive templates employing indium tin oxide
|
EP1538482B1
(de)
*
|
2003-12-05 |
2016-02-17 |
Obducat AB |
Gerät und Methode für grossflÀ¤chige Lithographie
|
US9040090B2
(en)
|
2003-12-19 |
2015-05-26 |
The University Of North Carolina At Chapel Hill |
Isolated and fixed micro and nano structures and methods thereof
|
DK1704585T3
(en)
*
|
2003-12-19 |
2017-05-22 |
Univ North Carolina Chapel Hill |
Methods for preparing isolated micro- and nanostructures using soft lithography or printing lithography
|
KR101010431B1
(ko)
*
|
2003-12-27 |
2011-01-21 |
엘지디스플레이 주식회사 |
평판표시소자의 제조방법 및 장치
|
US20050158419A1
(en)
*
|
2004-01-15 |
2005-07-21 |
Watts Michael P. |
Thermal processing system for imprint lithography
|
US20050156353A1
(en)
*
|
2004-01-15 |
2005-07-21 |
Watts Michael P. |
Method to improve the flow rate of imprinting material
|
US7462292B2
(en)
*
|
2004-01-27 |
2008-12-09 |
Hewlett-Packard Development Company, L.P. |
Silicon carbide imprint stamp
|
US7060625B2
(en)
*
|
2004-01-27 |
2006-06-13 |
Hewlett-Packard Development Company, L.P. |
Imprint stamp
|
CN101189271A
(zh)
*
|
2004-02-13 |
2008-05-28 |
北卡罗来纳大学查珀尔希尔分校 |
制造微流体设备的功能材料和新型方法
|
US7019835B2
(en)
*
|
2004-02-19 |
2006-03-28 |
Molecular Imprints, Inc. |
Method and system to measure characteristics of a film disposed on a substrate
|
US8076386B2
(en)
|
2004-02-23 |
2011-12-13 |
Molecular Imprints, Inc. |
Materials for imprint lithography
|
US7906180B2
(en)
*
|
2004-02-27 |
2011-03-15 |
Molecular Imprints, Inc. |
Composition for an etching mask comprising a silicon-containing material
|
US20050189676A1
(en)
*
|
2004-02-27 |
2005-09-01 |
Molecular Imprints, Inc. |
Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
|
US7730834B2
(en)
*
|
2004-03-04 |
2010-06-08 |
Asml Netherlands B.V. |
Printing apparatus and device manufacturing method
|
JP4393244B2
(ja)
*
|
2004-03-29 |
2010-01-06 |
キヤノン株式会社 |
インプリント装置
|
JP4481698B2
(ja)
*
|
2004-03-29 |
2010-06-16 |
キヤノン株式会社 |
加工装置
|
DE102004028851B4
(de)
*
|
2004-03-31 |
2006-04-13 |
Infineon Technologies Ag |
Verfahren und Vorrichtung zum Vermessen eines Oberflächenprofils einer Probe
|
US20050230882A1
(en)
*
|
2004-04-19 |
2005-10-20 |
Molecular Imprints, Inc. |
Method of forming a deep-featured template employed in imprint lithography
|
US8235302B2
(en)
*
|
2004-04-20 |
2012-08-07 |
Nanolnk, Inc. |
Identification features
|
US7195733B2
(en)
*
|
2004-04-27 |
2007-03-27 |
The Board Of Trustees Of The University Of Illinois |
Composite patterning devices for soft lithography
|
US20080055581A1
(en)
*
|
2004-04-27 |
2008-03-06 |
Rogers John A |
Devices and methods for pattern generation by ink lithography
|
US7140861B2
(en)
*
|
2004-04-27 |
2006-11-28 |
Molecular Imprints, Inc. |
Compliant hard template for UV imprinting
|
EP1594001B1
(de)
|
2004-05-07 |
2015-12-30 |
Obducat AB |
Gerät und Verfahren für die Imprint-Lithographie
|
US20050253307A1
(en)
*
|
2004-05-11 |
2005-11-17 |
Molecualr Imprints, Inc. |
Method of patterning a conductive layer on a substrate
|
US7307697B2
(en)
*
|
2004-05-28 |
2007-12-11 |
Board Of Regents, The University Of Texas System |
Adaptive shape substrate support system
|
US20050276919A1
(en)
*
|
2004-06-01 |
2005-12-15 |
Molecular Imprints, Inc. |
Method for dispensing a fluid on a substrate
|
US20050275311A1
(en)
*
|
2004-06-01 |
2005-12-15 |
Molecular Imprints, Inc. |
Compliant device for nano-scale manufacturing
|
DE602005022874D1
(de)
*
|
2004-06-03 |
2010-09-23 |
Molecular Imprints Inc |
Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
|
US20050270516A1
(en)
*
|
2004-06-03 |
2005-12-08 |
Molecular Imprints, Inc. |
System for magnification and distortion correction during nano-scale manufacturing
|
US20050272599A1
(en)
*
|
2004-06-04 |
2005-12-08 |
Kenneth Kramer |
Mold release layer
|
US7799699B2
(en)
|
2004-06-04 |
2010-09-21 |
The Board Of Trustees Of The University Of Illinois |
Printable semiconductor structures and related methods of making and assembling
|
US7521292B2
(en)
|
2004-06-04 |
2009-04-21 |
The Board Of Trustees Of The University Of Illinois |
Stretchable form of single crystal silicon for high performance electronics on rubber substrates
|
US7557367B2
(en)
|
2004-06-04 |
2009-07-07 |
The Board Of Trustees Of The University Of Illinois |
Stretchable semiconductor elements and stretchable electrical circuits
|
US7943491B2
(en)
*
|
2004-06-04 |
2011-05-17 |
The Board Of Trustees Of The University Of Illinois |
Pattern transfer printing by kinetic control of adhesion to an elastomeric stamp
|
US20050277066A1
(en)
*
|
2004-06-10 |
2005-12-15 |
Le Ngoc V |
Selective etch process for step and flash imprint lithography
|
US20070228593A1
(en)
*
|
2006-04-03 |
2007-10-04 |
Molecular Imprints, Inc. |
Residual Layer Thickness Measurement and Correction
|
JP2006013400A
(ja)
*
|
2004-06-29 |
2006-01-12 |
Canon Inc |
2つの対象物間の相対的位置ずれ検出方法及び装置
|
US7785526B2
(en)
*
|
2004-07-20 |
2010-08-31 |
Molecular Imprints, Inc. |
Imprint alignment method, system, and template
|
US20060017876A1
(en)
*
|
2004-07-23 |
2006-01-26 |
Molecular Imprints, Inc. |
Displays and method for fabricating displays
|
US8088293B2
(en)
*
|
2004-07-29 |
2012-01-03 |
Micron Technology, Inc. |
Methods of forming reticles configured for imprint lithography
|
US7309225B2
(en)
*
|
2004-08-13 |
2007-12-18 |
Molecular Imprints, Inc. |
Moat system for an imprint lithography template
|
US7105452B2
(en)
*
|
2004-08-13 |
2006-09-12 |
Molecular Imprints, Inc. |
Method of planarizing a semiconductor substrate with an etching chemistry
|
US7939131B2
(en)
*
|
2004-08-16 |
2011-05-10 |
Molecular Imprints, Inc. |
Method to provide a layer with uniform etch characteristics
|
US7282550B2
(en)
*
|
2004-08-16 |
2007-10-16 |
Molecular Imprints, Inc. |
Composition to provide a layer with uniform etch characteristics
|
US7641468B2
(en)
*
|
2004-09-01 |
2010-01-05 |
Hewlett-Packard Development Company, L.P. |
Imprint lithography apparatus and method employing an effective pressure
|
US20070164476A1
(en)
*
|
2004-09-01 |
2007-07-19 |
Wei Wu |
Contact lithography apparatus and method employing substrate deformation
|
WO2006033872A2
(en)
*
|
2004-09-21 |
2006-03-30 |
Molecular Imprints, Inc. |
Method of forming an in-situ recessed structure
|
US7205244B2
(en)
*
|
2004-09-21 |
2007-04-17 |
Molecular Imprints |
Patterning substrates employing multi-film layers defining etch-differential interfaces
|
US7547504B2
(en)
*
|
2004-09-21 |
2009-06-16 |
Molecular Imprints, Inc. |
Pattern reversal employing thick residual layers
|
US7241395B2
(en)
*
|
2004-09-21 |
2007-07-10 |
Molecular Imprints, Inc. |
Reverse tone patterning on surfaces having planarity perturbations
|
US7041604B2
(en)
*
|
2004-09-21 |
2006-05-09 |
Molecular Imprints, Inc. |
Method of patterning surfaces while providing greater control of recess anisotropy
|
US7252777B2
(en)
*
|
2004-09-21 |
2007-08-07 |
Molecular Imprints, Inc. |
Method of forming an in-situ recessed structure
|
US20060062922A1
(en)
*
|
2004-09-23 |
2006-03-23 |
Molecular Imprints, Inc. |
Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
|
US7244386B2
(en)
*
|
2004-09-27 |
2007-07-17 |
Molecular Imprints, Inc. |
Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
|
JP4704434B2
(ja)
*
|
2004-10-08 |
2011-06-15 |
ダウ・コーニング・コーポレイション |
相変化組成物を使用するリトグラフィープロセス及びパターン
|
US20060081557A1
(en)
|
2004-10-18 |
2006-04-20 |
Molecular Imprints, Inc. |
Low-k dielectric functional imprinting materials
|
US7163888B2
(en)
*
|
2004-11-22 |
2007-01-16 |
Motorola, Inc. |
Direct imprinting of etch barriers using step and flash imprint lithography
|
US7292326B2
(en)
*
|
2004-11-30 |
2007-11-06 |
Molecular Imprints, Inc. |
Interferometric analysis for the manufacture of nano-scale devices
|
JP4655043B2
(ja)
|
2004-11-30 |
2011-03-23 |
旭硝子株式会社 |
モールド、および転写微細パターンを有する基材の製造方法
|
US20070231421A1
(en)
*
|
2006-04-03 |
2007-10-04 |
Molecular Imprints, Inc. |
Enhanced Multi Channel Alignment
|
US7630067B2
(en)
*
|
2004-11-30 |
2009-12-08 |
Molecular Imprints, Inc. |
Interferometric analysis method for the manufacture of nano-scale devices
|
KR20070086766A
(ko)
*
|
2004-12-01 |
2007-08-27 |
몰레큘러 임프린츠 인코퍼레이티드 |
임프린트 리소그래피 공정용 열관리를 위한 노출 방법
|
US7357876B2
(en)
*
|
2004-12-01 |
2008-04-15 |
Molecular Imprints, Inc. |
Eliminating printability of sub-resolution defects in imprint lithography
|
US7281919B2
(en)
*
|
2004-12-07 |
2007-10-16 |
Molecular Imprints, Inc. |
System for controlling a volume of material on a mold
|
CN100468814C
(zh)
*
|
2004-12-15 |
2009-03-11 |
鸿富锦精密工业(深圳)有限公司 |
有机发光显示器
|
US7125495B2
(en)
*
|
2004-12-20 |
2006-10-24 |
Palo Alto Research Center, Inc. |
Large area electronic device with high and low resolution patterned film features
|
US7676088B2
(en)
*
|
2004-12-23 |
2010-03-09 |
Asml Netherlands B.V. |
Imprint lithography
|
US7490547B2
(en)
*
|
2004-12-30 |
2009-02-17 |
Asml Netherlands B.V. |
Imprint lithography
|
US20060144274A1
(en)
*
|
2004-12-30 |
2006-07-06 |
Asml Netherlands B.V. |
Imprint lithography
|
US20060144814A1
(en)
*
|
2004-12-30 |
2006-07-06 |
Asml Netherlands B.V. |
Imprint lithography
|
US20060145398A1
(en)
*
|
2004-12-30 |
2006-07-06 |
Board Of Regents, The University Of Texas System |
Release layer comprising diamond-like carbon (DLC) or doped DLC with tunable composition for imprint lithography templates and contact masks
|
US7686970B2
(en)
|
2004-12-30 |
2010-03-30 |
Asml Netherlands B.V. |
Imprint lithography
|
US7354698B2
(en)
*
|
2005-01-07 |
2008-04-08 |
Asml Netherlands B.V. |
Imprint lithography
|
US20070299176A1
(en)
*
|
2005-01-28 |
2007-12-27 |
Markley Thomas J |
Photodefinable low dielectric constant material and method for making and using same
|
US7636999B2
(en)
*
|
2005-01-31 |
2009-12-29 |
Molecular Imprints, Inc. |
Method of retaining a substrate to a wafer chuck
|
US7635263B2
(en)
*
|
2005-01-31 |
2009-12-22 |
Molecular Imprints, Inc. |
Chucking system comprising an array of fluid chambers
|
US20060177535A1
(en)
*
|
2005-02-04 |
2006-08-10 |
Molecular Imprints, Inc. |
Imprint lithography template to facilitate control of liquid movement
|
WO2006084202A2
(en)
*
|
2005-02-03 |
2006-08-10 |
The University Of North Carolina At Chapel Hill |
Low surface energy polymeric material for use in liquid crystal displays
|
US7922474B2
(en)
*
|
2005-02-17 |
2011-04-12 |
Asml Netherlands B.V. |
Imprint lithography
|
US8097400B2
(en)
*
|
2005-02-22 |
2012-01-17 |
Hewlett-Packard Development Company, L.P. |
Method for forming an electronic device
|
JP2006245072A
(ja)
*
|
2005-02-28 |
2006-09-14 |
Canon Inc |
パターン転写用モールドおよび転写装置
|
US7277619B2
(en)
*
|
2005-03-04 |
2007-10-02 |
Hewlett-Packard Development Company, L.P. |
Nano-imprinted photonic crystal waveguide
|
US7523701B2
(en)
*
|
2005-03-07 |
2009-04-28 |
Asml Netherlands B.V. |
Imprint lithography method and apparatus
|
EP1700680A1
(de)
*
|
2005-03-09 |
2006-09-13 |
EPFL Ecole Polytechnique Fédérale de Lausanne |
Die Entformung erleichternde Formwerkzeuge aus Fluorpolymer zur Reproduktion von Nano- und Mikromustern
|
US7611348B2
(en)
*
|
2005-04-19 |
2009-11-03 |
Asml Netherlands B.V. |
Imprint lithography
|
US7762186B2
(en)
*
|
2005-04-19 |
2010-07-27 |
Asml Netherlands B.V. |
Imprint lithography
|
JP5286784B2
(ja)
*
|
2005-04-21 |
2013-09-11 |
旭硝子株式会社 |
光硬化性組成物、微細パターン形成体およびその製造方法
|
KR101352360B1
(ko)
|
2005-04-27 |
2014-01-15 |
오브듀캇 아베 |
물체에 패턴을 전사하기 위한 수단
|
JP4742665B2
(ja)
*
|
2005-04-28 |
2011-08-10 |
旭硝子株式会社 |
エッチング処理された処理基板の製造方法
|
JP4736522B2
(ja)
*
|
2005-04-28 |
2011-07-27 |
旭硝子株式会社 |
エッチング処理された処理基板の製造方法
|
US20070228608A1
(en)
*
|
2006-04-03 |
2007-10-04 |
Molecular Imprints, Inc. |
Preserving Filled Features when Vacuum Wiping
|
US7767129B2
(en)
*
|
2005-05-11 |
2010-08-03 |
Micron Technology, Inc. |
Imprint templates for imprint lithography, and methods of patterning a plurality of substrates
|
US7442029B2
(en)
*
|
2005-05-16 |
2008-10-28 |
Asml Netherlands B.V. |
Imprint lithography
|
US20060266916A1
(en)
*
|
2005-05-25 |
2006-11-30 |
Molecular Imprints, Inc. |
Imprint lithography template having a coating to reflect and/or absorb actinic energy
|
US20060267231A1
(en)
*
|
2005-05-27 |
2006-11-30 |
Asml Netherlands B.V. |
Imprint lithography
|
US7708924B2
(en)
*
|
2005-07-21 |
2010-05-04 |
Asml Netherlands B.V. |
Imprint lithography
|
US7692771B2
(en)
*
|
2005-05-27 |
2010-04-06 |
Asml Netherlands B.V. |
Imprint lithography
|
US7418902B2
(en)
*
|
2005-05-31 |
2008-09-02 |
Asml Netherlands B.V. |
Imprint lithography including alignment
|
JP3958344B2
(ja)
*
|
2005-06-07 |
2007-08-15 |
キヤノン株式会社 |
インプリント装置、インプリント方法及びチップの製造方法
|
KR101117987B1
(ko)
*
|
2005-06-07 |
2012-03-06 |
엘지디스플레이 주식회사 |
평판표시소자의 제조장치 및 방법
|
US7927089B2
(en)
*
|
2005-06-08 |
2011-04-19 |
Canon Kabushiki Kaisha |
Mold, apparatus including mold, pattern transfer apparatus, and pattern forming method
|
US7854873B2
(en)
*
|
2005-06-10 |
2010-12-21 |
Obducat Ab |
Imprint stamp comprising cyclic olefin copolymer
|
DE602005012068D1
(de)
*
|
2005-06-10 |
2009-02-12 |
Obducat Ab |
Kopieren eines Musters mit Hilfe eines Zwischenstempels
|
US7377764B2
(en)
*
|
2005-06-13 |
2008-05-27 |
Asml Netherlands B.V. |
Imprint lithography
|
US20060284156A1
(en)
*
|
2005-06-16 |
2006-12-21 |
Thomas Happ |
Phase change memory cell defined by imprint lithography
|
DE102005045331A1
(de)
*
|
2005-06-16 |
2006-12-28 |
Süss MicroTec AG |
Entfernen von dünnen strukturierten Polymerschichten durch atmosphärisches Plasma
|
US7256131B2
(en)
*
|
2005-07-19 |
2007-08-14 |
Molecular Imprints, Inc. |
Method of controlling the critical dimension of structures formed on a substrate
|
US8557351B2
(en)
*
|
2005-07-22 |
2013-10-15 |
Molecular Imprints, Inc. |
Method for adhering materials together
|
US7759407B2
(en)
*
|
2005-07-22 |
2010-07-20 |
Molecular Imprints, Inc. |
Composition for adhering materials together
|
US8846195B2
(en)
*
|
2005-07-22 |
2014-09-30 |
Canon Nanotechnologies, Inc. |
Ultra-thin polymeric adhesion layer
|
US8808808B2
(en)
|
2005-07-22 |
2014-08-19 |
Molecular Imprints, Inc. |
Method for imprint lithography utilizing an adhesion primer layer
|
US20070023976A1
(en)
*
|
2005-07-26 |
2007-02-01 |
Asml Netherlands B.V. |
Imprint lithography
|
WO2007133235A2
(en)
*
|
2005-08-08 |
2007-11-22 |
Liquidia Technologies, Inc. |
Micro and nano-structure metrology
|
EP2537657A3
(de)
|
2005-08-09 |
2016-05-04 |
The University of North Carolina At Chapel Hill |
Verfahren und Materialien zur Herstellung mikrofluidischer Vorrichtungen
|
US7766640B2
(en)
*
|
2005-08-12 |
2010-08-03 |
Hewlett-Packard Development Company, L.P. |
Contact lithography apparatus, system and method
|
US7665981B2
(en)
*
|
2005-08-25 |
2010-02-23 |
Molecular Imprints, Inc. |
System to transfer a template transfer body between a motion stage and a docking plate
|
US20070064384A1
(en)
*
|
2005-08-25 |
2007-03-22 |
Molecular Imprints, Inc. |
Method to transfer a template transfer body between a motion stage and a docking plate
|
US20070074635A1
(en)
*
|
2005-08-25 |
2007-04-05 |
Molecular Imprints, Inc. |
System to couple a body and a docking plate
|
KR100758699B1
(ko)
*
|
2005-08-29 |
2007-09-14 |
재단법인서울대학교산학협력재단 |
고종횡비 나노구조물 형성방법 및 이를 이용한 미세패턴형성방법
|
US7488771B2
(en)
*
|
2005-09-02 |
2009-02-10 |
International Business Machines Corporation |
Stabilization of vinyl ether materials
|
US7419611B2
(en)
*
|
2005-09-02 |
2008-09-02 |
International Business Machines Corporation |
Processes and materials for step and flash imprint lithography
|
JP4330168B2
(ja)
*
|
2005-09-06 |
2009-09-16 |
キヤノン株式会社 |
モールド、インプリント方法、及びチップの製造方法
|
US7316554B2
(en)
|
2005-09-21 |
2008-01-08 |
Molecular Imprints, Inc. |
System to control an atmosphere between a body and a substrate
|
US20070077763A1
(en)
*
|
2005-09-30 |
2007-04-05 |
Molecular Imprints, Inc. |
Deposition technique to planarize a multi-layer structure
|
US8603381B2
(en)
*
|
2005-10-03 |
2013-12-10 |
Massachusetts Insitute Of Technology |
Nanotemplate arbitrary-imprint lithography
|
US8142703B2
(en)
*
|
2005-10-05 |
2012-03-27 |
Molecular Imprints, Inc. |
Imprint lithography method
|
JP4533358B2
(ja)
*
|
2005-10-18 |
2010-09-01 |
キヤノン株式会社 |
インプリント方法、インプリント装置およびチップの製造方法
|
US8011915B2
(en)
|
2005-11-04 |
2011-09-06 |
Asml Netherlands B.V. |
Imprint lithography
|
US7677877B2
(en)
*
|
2005-11-04 |
2010-03-16 |
Asml Netherlands B.V. |
Imprint lithography
|
US7878791B2
(en)
*
|
2005-11-04 |
2011-02-01 |
Asml Netherlands B.V. |
Imprint lithography
|
US7906058B2
(en)
*
|
2005-12-01 |
2011-03-15 |
Molecular Imprints, Inc. |
Bifurcated contact printing technique
|
US7803308B2
(en)
*
|
2005-12-01 |
2010-09-28 |
Molecular Imprints, Inc. |
Technique for separating a mold from solidified imprinting material
|
US7422981B2
(en)
*
|
2005-12-07 |
2008-09-09 |
Canon Kabushiki Kaisha |
Method for manufacturing semiconductor device by using dual damascene process and method for manufacturing article having communicating hole
|
US7670529B2
(en)
*
|
2005-12-08 |
2010-03-02 |
Molecular Imprints, Inc. |
Method and system for double-sided patterning of substrates
|
US7670530B2
(en)
*
|
2006-01-20 |
2010-03-02 |
Molecular Imprints, Inc. |
Patterning substrates employing multiple chucks
|
JP4827513B2
(ja)
*
|
2005-12-09 |
2011-11-30 |
キヤノン株式会社 |
加工方法
|
ATE549294T1
(de)
|
2005-12-09 |
2012-03-15 |
Obducat Ab |
Vorrichtung und verfahren zum transfer von mustern mit zwischenstempel
|
US20070138699A1
(en)
*
|
2005-12-21 |
2007-06-21 |
Asml Netherlands B.V. |
Imprint lithography
|
US7517211B2
(en)
|
2005-12-21 |
2009-04-14 |
Asml Netherlands B.V. |
Imprint lithography
|
TWI432904B
(zh)
*
|
2006-01-25 |
2014-04-01 |
Dow Corning |
用於微影技術之環氧樹脂調配物
|
WO2007126412A2
(en)
|
2006-03-03 |
2007-11-08 |
The Board Of Trustees Of The University Of Illinois |
Methods of making spatially aligned nanotubes and nanotube arrays
|
US8001924B2
(en)
|
2006-03-31 |
2011-08-23 |
Asml Netherlands B.V. |
Imprint lithography
|
US8850980B2
(en)
|
2006-04-03 |
2014-10-07 |
Canon Nanotechnologies, Inc. |
Tessellated patterns in imprint lithography
|
US8142850B2
(en)
|
2006-04-03 |
2012-03-27 |
Molecular Imprints, Inc. |
Patterning a plurality of fields on a substrate to compensate for differing evaporation times
|
WO2007117524A2
(en)
*
|
2006-04-03 |
2007-10-18 |
Molecular Imprints, Inc. |
Method of concurrently patterning a substrate having a plurality of fields and alignment marks
|
US7802978B2
(en)
|
2006-04-03 |
2010-09-28 |
Molecular Imprints, Inc. |
Imprinting of partial fields at the edge of the wafer
|
US8012395B2
(en)
*
|
2006-04-18 |
2011-09-06 |
Molecular Imprints, Inc. |
Template having alignment marks formed of contrast material
|
US7547398B2
(en)
*
|
2006-04-18 |
2009-06-16 |
Molecular Imprints, Inc. |
Self-aligned process for fabricating imprint templates containing variously etched features
|
WO2007124007A2
(en)
*
|
2006-04-21 |
2007-11-01 |
Molecular Imprints, Inc. |
Method for detecting a particle in a nanoimprint lithography system
|
KR20070105040A
(ko)
*
|
2006-04-25 |
2007-10-30 |
엘지.필립스 엘시디 주식회사 |
레지스트 조성물, 이를 이용한 레지스트 패턴 형성방법 및이를 이용하여 제조된 어레이 기판
|
WO2007127984A2
(en)
*
|
2006-04-28 |
2007-11-08 |
Polyset Company, Inc. |
Siloxane epoxy polymers for redistribution layer applications
|
US8215946B2
(en)
|
2006-05-18 |
2012-07-10 |
Molecular Imprints, Inc. |
Imprint lithography system and method
|
JP2007329276A
(ja)
*
|
2006-06-07 |
2007-12-20 |
Tokyo Ohka Kogyo Co Ltd |
ナノインプリントリソグラフィによるレジストパターンの形成方法
|
US20080181958A1
(en)
*
|
2006-06-19 |
2008-07-31 |
Rothrock Ginger D |
Nanoparticle fabrication methods, systems, and materials
|
US20070298176A1
(en)
*
|
2006-06-26 |
2007-12-27 |
Dipietro Richard Anthony |
Aromatic vinyl ether based reverse-tone step and flash imprint lithography
|
US8015939B2
(en)
*
|
2006-06-30 |
2011-09-13 |
Asml Netherlands B.V. |
Imprintable medium dispenser
|
US8318253B2
(en)
*
|
2006-06-30 |
2012-11-27 |
Asml Netherlands B.V. |
Imprint lithography
|
CN100400555C
(zh)
*
|
2006-08-25 |
2008-07-09 |
南京大学 |
紫外光固化复合物材料及应用
|
US7946837B2
(en)
*
|
2006-10-06 |
2011-05-24 |
Asml Netherlands B.V. |
Imprint lithography
|
US7830498B2
(en)
*
|
2006-10-10 |
2010-11-09 |
Hewlett-Packard Development Company, L.P. |
Hydraulic-facilitated contact lithography apparatus, system and method
|
US7768628B2
(en)
*
|
2006-10-12 |
2010-08-03 |
Hewlett-Packard Development Company, L.P. |
Contact lithography apparatus and method
|
US7618752B2
(en)
*
|
2006-10-12 |
2009-11-17 |
Hewlett-Packard Development Company, L.P. |
Deformation-based contact lithography systems, apparatus and methods
|
US20080102380A1
(en)
*
|
2006-10-30 |
2008-05-01 |
Mangat Pawitter S |
High density lithographic process
|
US20080110557A1
(en)
*
|
2006-11-15 |
2008-05-15 |
Molecular Imprints, Inc. |
Methods and Compositions for Providing Preferential Adhesion and Release of Adjacent Surfaces
|
KR101308441B1
(ko)
*
|
2006-11-29 |
2013-09-16 |
엘지디스플레이 주식회사 |
박막 패턴의 제조장치 및 이를 이용한 박막 패턴의제조방법
|
KR101370969B1
(ko)
*
|
2006-11-30 |
2014-03-10 |
엘지디스플레이 주식회사 |
광경화성의 유기 물질
|
US20080131705A1
(en)
*
|
2006-12-01 |
2008-06-05 |
International Business Machines Corporation |
Method and system for nanostructure placement using imprint lithography
|
TW200839432A
(en)
*
|
2006-12-05 |
2008-10-01 |
Nano Terra Inc |
Method for patterning a surface
|
EP2104954B1
(de)
|
2007-01-17 |
2022-03-16 |
The Board of Trustees of the University of Illinois |
Durch montage auf druckbasis hergestellte optische systeme
|
US20100151031A1
(en)
*
|
2007-03-23 |
2010-06-17 |
Desimone Joseph M |
Discrete size and shape specific organic nanoparticles designed to elicit an immune response
|
EP2604344A3
(de)
*
|
2007-03-28 |
2014-07-16 |
BioNano Genomics, Inc. |
Verfahren zur makromolekularen Analyse mittels Nanokanalanordnungen
|
US20080264672A1
(en)
*
|
2007-04-26 |
2008-10-30 |
Air Products And Chemicals, Inc. |
Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same
|
US7641467B2
(en)
*
|
2007-05-02 |
2010-01-05 |
Asml Netherlands B.V. |
Imprint lithography
|
JP2009001002A
(ja)
|
2007-05-24 |
2009-01-08 |
Univ Waseda |
モールド、その製造方法および転写微細パターンを有する基材の製造方法
|
US8142702B2
(en)
*
|
2007-06-18 |
2012-03-27 |
Molecular Imprints, Inc. |
Solvent-assisted layer formation for imprint lithography
|
US20090014917A1
(en)
*
|
2007-07-10 |
2009-01-15 |
Molecular Imprints, Inc. |
Drop Pattern Generation for Imprint Lithography
|
JP2009034926A
(ja)
*
|
2007-08-02 |
2009-02-19 |
Sumitomo Electric Ind Ltd |
樹脂パターン形成方法
|
JP5473266B2
(ja)
*
|
2007-08-03 |
2014-04-16 |
キヤノン株式会社 |
インプリント方法および基板の加工方法、基板の加工方法による半導体デバイスの製造方法
|
US20090038636A1
(en)
*
|
2007-08-09 |
2009-02-12 |
Asml Netherlands B.V. |
Cleaning method
|
US7854877B2
(en)
|
2007-08-14 |
2010-12-21 |
Asml Netherlands B.V. |
Lithography meandering order
|
US8144309B2
(en)
*
|
2007-09-05 |
2012-03-27 |
Asml Netherlands B.V. |
Imprint lithography
|
NL1036034A1
(nl)
|
2007-10-11 |
2009-04-15 |
Asml Netherlands Bv |
Imprint lithography.
|
US8119052B2
(en)
*
|
2007-11-02 |
2012-02-21 |
Molecular Imprints, Inc. |
Drop pattern generation for imprint lithography
|
SG185929A1
(en)
*
|
2007-11-21 |
2012-12-28 |
Molecular Imprints Inc |
Porous template and imprinting stack for nano-imprint lithography
|
US7906274B2
(en)
*
|
2007-11-21 |
2011-03-15 |
Molecular Imprints, Inc. |
Method of creating a template employing a lift-off process
|
US7986493B2
(en)
*
|
2007-11-28 |
2011-07-26 |
Seagate Technology Llc |
Discrete track magnetic media with domain wall pinning sites
|
US8945444B2
(en)
*
|
2007-12-04 |
2015-02-03 |
Canon Nanotechnologies, Inc. |
High throughput imprint based on contact line motion tracking control
|
WO2009073857A1
(en)
|
2007-12-06 |
2009-06-11 |
Intevac, Inc. |
System and method for commercial fabrication of patterned media
|
JP4909913B2
(ja)
*
|
2008-01-10 |
2012-04-04 |
株式会社東芝 |
インプリントマスクの製造方法および半導体装置の製造方法
|
JP5433152B2
(ja)
*
|
2008-01-18 |
2014-03-05 |
東京応化工業株式会社 |
室温インプリント用膜形成組成物、並びに構造体の製造方法及び構造体
|
US9323143B2
(en)
*
|
2008-02-05 |
2016-04-26 |
Canon Nanotechnologies, Inc. |
Controlling template surface composition in nano-imprint lithography
|
US8361371B2
(en)
*
|
2008-02-08 |
2013-01-29 |
Molecular Imprints, Inc. |
Extrusion reduction in imprint lithography
|
US20090212012A1
(en)
*
|
2008-02-27 |
2009-08-27 |
Molecular Imprints, Inc. |
Critical dimension control during template formation
|
WO2009111641A1
(en)
|
2008-03-05 |
2009-09-11 |
The Board Of Trustees Of The University Of Illinois |
Stretchable and foldable electronic devices
|
US8187515B2
(en)
*
|
2008-04-01 |
2012-05-29 |
Molecular Imprints, Inc. |
Large area roll-to-roll imprint lithography
|
US8470701B2
(en)
*
|
2008-04-03 |
2013-06-25 |
Advanced Diamond Technologies, Inc. |
Printable, flexible and stretchable diamond for thermal management
|
EP2280813B1
(de)
*
|
2008-04-18 |
2017-06-07 |
Massachusetts Institute Of Technology |
Druckmustererzeugung für unregelmässige flächen
|
WO2010005707A1
(en)
*
|
2008-06-16 |
2010-01-14 |
The Board Of Trustees Of The University Of Illinois |
Medium scale carbon nanotube thin film integrated circuits on flexible plastic substrates
|
US8043085B2
(en)
|
2008-08-19 |
2011-10-25 |
Asml Netherlands B.V. |
Imprint lithography
|
NL2003347A
(en)
*
|
2008-09-11 |
2010-03-16 |
Asml Netherlands Bv |
Imprint lithography.
|
US20100072671A1
(en)
*
|
2008-09-25 |
2010-03-25 |
Molecular Imprints, Inc. |
Nano-imprint lithography template fabrication and treatment
|
US8470188B2
(en)
*
|
2008-10-02 |
2013-06-25 |
Molecular Imprints, Inc. |
Nano-imprint lithography templates
|
US8389862B2
(en)
|
2008-10-07 |
2013-03-05 |
Mc10, Inc. |
Extremely stretchable electronics
|
US8097926B2
(en)
|
2008-10-07 |
2012-01-17 |
Mc10, Inc. |
Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy
|
US8886334B2
(en)
*
|
2008-10-07 |
2014-11-11 |
Mc10, Inc. |
Systems, methods, and devices using stretchable or flexible electronics for medical applications
|
US8372726B2
(en)
*
|
2008-10-07 |
2013-02-12 |
Mc10, Inc. |
Methods and applications of non-planar imaging arrays
|
WO2010042653A1
(en)
*
|
2008-10-07 |
2010-04-15 |
Mc10, Inc. |
Catheter balloon having stretchable integrated circuitry and sensor array
|
NL2003380A
(en)
*
|
2008-10-17 |
2010-04-20 |
Asml Netherlands Bv |
Imprint lithography apparatus and method.
|
US8415010B2
(en)
*
|
2008-10-20 |
2013-04-09 |
Molecular Imprints, Inc. |
Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
|
US8586126B2
(en)
|
2008-10-21 |
2013-11-19 |
Molecular Imprints, Inc. |
Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement
|
US8512797B2
(en)
*
|
2008-10-21 |
2013-08-20 |
Molecular Imprints, Inc. |
Drop pattern generation with edge weighting
|
US20100104852A1
(en)
*
|
2008-10-23 |
2010-04-29 |
Molecular Imprints, Inc. |
Fabrication of High-Throughput Nano-Imprint Lithography Templates
|
US8877073B2
(en)
*
|
2008-10-27 |
2014-11-04 |
Canon Nanotechnologies, Inc. |
Imprint lithography template
|
US8361546B2
(en)
*
|
2008-10-30 |
2013-01-29 |
Molecular Imprints, Inc. |
Facilitating adhesion between substrate and patterned layer
|
US20100112220A1
(en)
*
|
2008-11-03 |
2010-05-06 |
Molecular Imprints, Inc. |
Dispense system set-up and characterization
|
CN101477304B
(zh)
|
2008-11-04 |
2011-08-17 |
南京大学 |
在复杂形状表面复制高分辨率纳米结构的压印方法
|
US20100109195A1
(en)
|
2008-11-05 |
2010-05-06 |
Molecular Imprints, Inc. |
Release agent partition control in imprint lithography
|
WO2010063504A2
(en)
*
|
2008-12-04 |
2010-06-10 |
Asml Netherlands B.V. |
Imprint lithography apparatus and method
|
EP2199855B1
(de)
*
|
2008-12-19 |
2016-07-20 |
Obducat |
Verfahren und Prozesse zur Modifizierung von Polymermaterialoberflächeninteraktionen
|
EP2199854B1
(de)
*
|
2008-12-19 |
2015-12-16 |
Obducat AB |
Hybridpolymerform für nanoimprintverfahren und verfahren zu seiner herstellung
|
JP5692992B2
(ja)
*
|
2008-12-19 |
2015-04-01 |
キヤノン株式会社 |
構造体の製造方法及びインクジェットヘッドの製造方法
|
NL2003871A
(en)
*
|
2009-02-04 |
2010-08-05 |
Asml Netherlands Bv |
Imprint lithography.
|
NL2003875A
(en)
|
2009-02-04 |
2010-08-05 |
Asml Netherlands Bv |
Imprint lithography method and apparatus.
|
WO2010098102A1
(ja)
|
2009-02-27 |
2010-09-02 |
三井化学株式会社 |
転写体およびその製造方法
|
NL2004265A
(en)
|
2009-04-01 |
2010-10-04 |
Asml Netherlands Bv |
Imprint lithography apparatus and method.
|
NL2004266A
(en)
|
2009-04-27 |
2010-10-28 |
Asml Netherlands Bv |
An actuator.
|
EP2430652B1
(de)
|
2009-05-12 |
2019-11-20 |
The Board of Trustees of the University of Illionis |
Bedruckte anordnungen aus ultradünnen und mikrofeinen anorganischen leds für verformbare und semitransparente anzeigen
|
NL2004409A
(en)
*
|
2009-05-19 |
2010-11-22 |
Asml Netherlands Bv |
Imprint lithography apparatus.
|
JP5574802B2
(ja)
*
|
2009-06-03 |
2014-08-20 |
キヤノン株式会社 |
構造体の製造方法
|
JP5060517B2
(ja)
*
|
2009-06-24 |
2012-10-31 |
東京エレクトロン株式会社 |
インプリントシステム
|
NL2004735A
(en)
*
|
2009-07-06 |
2011-01-10 |
Asml Netherlands Bv |
Imprint lithography apparatus and method.
|
NL2004680A
(en)
*
|
2009-07-06 |
2011-01-10 |
Asml Netherlands Bv |
Imprint lithography apparatus.
|
NL2004681A
(en)
*
|
2009-07-06 |
2011-01-10 |
Asml Netherlands Bv |
Imprint lithography apparatus.
|
NL2004685A
(en)
*
|
2009-07-27 |
2011-01-31 |
Asml Netherlands Bv |
Imprint lithography apparatus and method.
|
NL2004932A
(en)
*
|
2009-07-27 |
2011-01-31 |
Asml Netherlands Bv |
Imprint lithography template.
|
NL2004945A
(en)
*
|
2009-08-14 |
2011-02-15 |
Asml Netherlands Bv |
Imprint lithography apparatus and method.
|
NL2004949A
(en)
*
|
2009-08-21 |
2011-02-22 |
Asml Netherlands Bv |
Inspection method and apparatus.
|
CN102482364B
(zh)
|
2009-08-26 |
2013-08-28 |
三井化学株式会社 |
含氟环状烯烃聚合物组合物、由该组合物获得的转印体及其制造方法
|
US8499810B2
(en)
*
|
2009-08-27 |
2013-08-06 |
Transfer Devices Inc. |
Molecular transfer lithography apparatus and method for transferring patterned materials to a substrate
|
JP5515516B2
(ja)
*
|
2009-08-27 |
2014-06-11 |
大日本印刷株式会社 |
ナノインプリント方法、パターン形成体、及びナノインプリント装置
|
NL2005007A
(en)
|
2009-08-28 |
2011-03-01 |
Asml Netherlands Bv |
Imprint lithography method and apparatus.
|
JP5443103B2
(ja)
*
|
2009-09-10 |
2014-03-19 |
株式会社東芝 |
パターン形成方法
|
NL2005254A
(en)
*
|
2009-09-22 |
2011-03-23 |
Asml Netherlands Bv |
Imprint lithography method and apparatus.
|
NL2005259A
(en)
*
|
2009-09-29 |
2011-03-30 |
Asml Netherlands Bv |
Imprint lithography.
|
NL2005263A
(en)
*
|
2009-09-29 |
2011-03-30 |
Asml Netherlands Bv |
Imprint lithography.
|
US9723122B2
(en)
|
2009-10-01 |
2017-08-01 |
Mc10, Inc. |
Protective cases with integrated electronics
|
US20110218756A1
(en)
*
|
2009-10-01 |
2011-09-08 |
Mc10, Inc. |
Methods and apparatus for conformal sensing of force and/or acceleration at a person's head
|
NL2005265A
(en)
*
|
2009-10-07 |
2011-04-11 |
Asml Netherlands Bv |
Imprint lithography apparatus and method.
|
US20110084417A1
(en)
*
|
2009-10-08 |
2011-04-14 |
Molecular Imprints, Inc. |
Large area linear array nanoimprinting
|
NL2005266A
(en)
|
2009-10-28 |
2011-05-02 |
Asml Netherlands Bv |
Imprint lithography.
|
US20110165412A1
(en)
*
|
2009-11-24 |
2011-07-07 |
Molecular Imprints, Inc. |
Adhesion layers in nanoimprint lithograhy
|
WO2011064020A1
(en)
|
2009-11-24 |
2011-06-03 |
Asml Netherlands B.V. |
Alignment and imprint lithography
|
NL2005436A
(en)
*
|
2009-11-30 |
2011-05-31 |
Asml Netherlands Bv |
Inspection method and apparatus.
|
WO2011064021A1
(en)
|
2009-11-30 |
2011-06-03 |
Asml Netherlands B.V. |
Imprint lithography apparatus and method
|
TWI458126B
(zh)
*
|
2009-12-10 |
2014-10-21 |
Nat Inst Chung Shan Science & Technology |
以奈米壓印形成發光元件之薄膜結構的製造方法
|
US9936574B2
(en)
|
2009-12-16 |
2018-04-03 |
The Board Of Trustees Of The University Of Illinois |
Waterproof stretchable optoelectronics
|
US10441185B2
(en)
|
2009-12-16 |
2019-10-15 |
The Board Of Trustees Of The University Of Illinois |
Flexible and stretchable electronic systems for epidermal electronics
|
WO2011084450A1
(en)
|
2009-12-16 |
2011-07-14 |
The Board Of Trustees Of The University Of Illinois |
Electrophysiology in-vivo using conformal electronics
|
US9625811B2
(en)
|
2009-12-18 |
2017-04-18 |
Asml Netherlands B.V. |
Imprint lithography
|
NL2005735A
(en)
*
|
2009-12-23 |
2011-06-27 |
Asml Netherlands Bv |
Imprint lithographic apparatus and imprint lithographic method.
|
JP5033867B2
(ja)
*
|
2009-12-28 |
2012-09-26 |
株式会社日立ハイテクノロジーズ |
微細構造体、微細構造体の製造方法、及び微細構造体製造用の重合性樹脂組成物
|
JP5532939B2
(ja)
*
|
2010-01-14 |
2014-06-25 |
大日本印刷株式会社 |
光インプリント用のモールドおよびこれを用いた光インプリント方法
|
US8616873B2
(en)
*
|
2010-01-26 |
2013-12-31 |
Molecular Imprints, Inc. |
Micro-conformal templates for nanoimprint lithography
|
TW201144091A
(en)
*
|
2010-01-29 |
2011-12-16 |
Molecular Imprints Inc |
Ultra-compliant nanoimprint lithography templates
|
JP2011165950A
(ja)
*
|
2010-02-10 |
2011-08-25 |
Toshiba Corp |
パターン検証方法、パターン生成方法、デバイス製造方法、パターン検証プログラム及びパターン検証装置
|
NL2005865A
(en)
*
|
2010-02-16 |
2011-08-17 |
Asml Netherlands Bv |
Imprint lithography.
|
NL2005975A
(en)
|
2010-03-03 |
2011-09-06 |
Asml Netherlands Bv |
Imprint lithography.
|
CN104224171B
(zh)
|
2010-03-17 |
2017-06-09 |
伊利诺伊大学评议会 |
基于生物可吸收基质的可植入生物医学装置
|
NL2005992A
(en)
*
|
2010-03-22 |
2011-09-23 |
Asml Netherlands Bv |
Imprint lithography.
|
NL2006004A
(en)
*
|
2010-03-25 |
2011-09-27 |
Asml Netherlands Bv |
Imprint lithography.
|
JP5408014B2
(ja)
*
|
2010-04-14 |
2014-02-05 |
大日本印刷株式会社 |
接触角の測定方法およびこれを用いたナノインプリント方法
|
NL2006454A
(en)
|
2010-05-03 |
2011-11-07 |
Asml Netherlands Bv |
Imprint lithography method and apparatus.
|
KR101675843B1
(ko)
|
2010-05-04 |
2016-11-30 |
엘지디스플레이 주식회사 |
평판 표시 소자 및 그 제조 방법
|
NL2006747A
(en)
|
2010-07-26 |
2012-01-30 |
Asml Netherlands Bv |
Imprint lithography alignment method and apparatus.
|
JP2013538447A
(ja)
|
2010-08-05 |
2013-10-10 |
エーエスエムエル ネザーランズ ビー.ブイ. |
インプリントリソグラフィ
|
US9310700B2
(en)
|
2010-08-13 |
2016-04-12 |
Asml Netherlands B.V. |
Lithography method and apparatus
|
US9274441B2
(en)
|
2010-08-16 |
2016-03-01 |
Asml Netherlands B.V. |
Inspection method for imprint lithography and apparatus therefor
|
NL2007160A
(en)
|
2010-08-26 |
2012-02-28 |
Asml Netherlands Bv |
Imprint lithography method and imprintable medium.
|
JP5760412B2
(ja)
*
|
2010-12-08 |
2015-08-12 |
大日本印刷株式会社 |
インプリント方法およびインプリント装置
|
US8450131B2
(en)
|
2011-01-11 |
2013-05-28 |
Nanohmics, Inc. |
Imprinted semiconductor multiplex detection array
|
WO2012097163A1
(en)
|
2011-01-14 |
2012-07-19 |
The Board Of Trustees Of The University Of Illinois |
Optical component array having adjustable curvature
|
WO2012158709A1
(en)
|
2011-05-16 |
2012-11-22 |
The Board Of Trustees Of The University Of Illinois |
Thermally managed led arrays assembled by printing
|
EP2712491B1
(de)
|
2011-05-27 |
2019-12-04 |
Mc10, Inc. |
Flexible elektronische struktur
|
EP2713863B1
(de)
|
2011-06-03 |
2020-01-15 |
The Board of Trustees of the University of Illionis |
Anpassbare aktiv multiplexierte elektrodenanordnung mit hochdichter oberfläche zur elektrophysiologischen messung am gehirn
|
CN102508408B
(zh)
*
|
2011-10-27 |
2014-09-10 |
无锡英普林纳米科技有限公司 |
一种双固化型纳米压印传递层材料
|
WO2013089867A2
(en)
|
2011-12-01 |
2013-06-20 |
The Board Of Trustees Of The University Of Illinois |
Transient devices designed to undergo programmable transformations
|
CN105283122B
(zh)
|
2012-03-30 |
2020-02-18 |
伊利诺伊大学评议会 |
可共形于表面的可安装于附肢的电子器件
|
TW201411692A
(zh)
*
|
2012-04-23 |
2014-03-16 |
Nanocrystal Asia Inc |
以壓印方式製造選擇性成長遮罩之方法
|
US9171794B2
(en)
|
2012-10-09 |
2015-10-27 |
Mc10, Inc. |
Embedding thin chips in polymer
|
CN104884487B
(zh)
|
2012-12-28 |
2018-01-05 |
东洋合成工业株式会社 |
树脂组合物、树脂模具、光压印方法、以及集成电路与光学元件的制造方法
|
WO2014136731A1
(ja)
|
2013-03-04 |
2014-09-12 |
東洋合成工業株式会社 |
組成物、樹脂モールド、光インプリント方法、光学素子の製造方法、及び電子素子の製造方法
|
JP5744260B2
(ja)
*
|
2014-02-21 |
2015-07-08 |
東洋合成工業株式会社 |
光硬化性組成物、モールド、樹脂、光学素子の製造方法及び半導体集積回路の製造方法
|
CN117452641A
(zh)
|
2014-09-29 |
2024-01-26 |
奇跃公司 |
可穿戴显示系统
|
KR20170101961A
(ko)
|
2014-12-30 |
2017-09-06 |
쓰리엠 이노베이티브 프로퍼티즈 컴파니 |
전기 도체
|
NZ773833A
(en)
|
2015-03-16 |
2022-07-01 |
Magic Leap Inc |
Methods and systems for diagnosing and treating health ailments
|
JP6011671B2
(ja)
*
|
2015-04-02 |
2016-10-19 |
大日本印刷株式会社 |
インプリント用基板およびインプリント方法
|
CN107533286B
(zh)
|
2015-04-29 |
2022-02-08 |
3M创新有限公司 |
溶胀性成膜组合物及采用所述溶胀性成膜组合物进行纳米压印光刻的方法
|
JP2018524566A
(ja)
|
2015-06-01 |
2018-08-30 |
ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ |
代替的uvセンシング手法
|
AU2016270807A1
(en)
|
2015-06-01 |
2017-12-14 |
The Board Of Trustees Of The University Of Illinois |
Miniaturized electronic systems with wireless power and near-field communication capabilities
|
KR20240014621A
(ko)
|
2015-06-15 |
2024-02-01 |
매직 립, 인코포레이티드 |
가상 및 증강 현실 시스템들 및 방법들
|
US10488753B2
(en)
|
2015-09-08 |
2019-11-26 |
Canon Kabushiki Kaisha |
Substrate pretreatment and etch uniformity in nanoimprint lithography
|
US20170066208A1
(en)
|
2015-09-08 |
2017-03-09 |
Canon Kabushiki Kaisha |
Substrate pretreatment for reducing fill time in nanoimprint lithography
|
US10925543B2
(en)
|
2015-11-11 |
2021-02-23 |
The Board Of Trustees Of The University Of Illinois |
Bioresorbable silicon electronics for transient implants
|
US10095106B2
(en)
*
|
2016-03-31 |
2018-10-09 |
Canon Kabushiki Kaisha |
Removing substrate pretreatment compositions in nanoimprint lithography
|
US10134588B2
(en)
|
2016-03-31 |
2018-11-20 |
Canon Kabushiki Kaisha |
Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
|
US10620539B2
(en)
|
2016-03-31 |
2020-04-14 |
Canon Kabushiki Kaisha |
Curing substrate pretreatment compositions in nanoimprint lithography
|
IL299497B2
(en)
|
2016-04-08 |
2024-02-01 |
Magic Leap Inc |
Augmented reality systems and methods with variable focus lens elements
|
WO2017197020A1
(en)
|
2016-05-12 |
2017-11-16 |
Magic Leap, Inc. |
Distributed light manipulation over imaging waveguide
|
US10509313B2
(en)
|
2016-06-28 |
2019-12-17 |
Canon Kabushiki Kaisha |
Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography
|
CN116736631A
(zh)
|
2016-07-14 |
2023-09-12 |
莫福托尼克斯控股有限公司 |
用于使用柔性压模压印不连续基板的设备
|
CN106542494B
(zh)
*
|
2016-09-26 |
2017-12-26 |
西北工业大学 |
一种用于制备多层不等高微纳结构的方法
|
JP7237830B2
(ja)
|
2016-11-18 |
2023-03-13 |
マジック リープ, インコーポレイテッド |
交差格子を用いた導波管光マルチプレクサ
|
US11067860B2
(en)
|
2016-11-18 |
2021-07-20 |
Magic Leap, Inc. |
Liquid crystal diffractive devices with nano-scale pattern and methods of manufacturing the same
|
KR102581320B1
(ko)
|
2016-11-18 |
2023-09-20 |
매직 립, 인코포레이티드 |
넓은 입사 각도 범위들의 광을 방향전환시키기 위한 다중층 액정 회절 격자들
|
IL303676B1
(en)
|
2016-11-18 |
2024-02-01 |
Magic Leap Inc |
Liquid crystal refraction lattices vary spatially
|
EP3552057B1
(de)
|
2016-12-08 |
2022-01-05 |
Magic Leap, Inc. |
Diffraktive vorrichtungen auf basis von cholesterischem flüssigkristall
|
EP3555700B1
(de)
|
2016-12-14 |
2023-09-13 |
Magic Leap, Inc. |
Strukturierung von flüssigkristallen unter verwendung von weichdruck-replikation von oberflächenausrichtungsmustern
|
US10371896B2
(en)
|
2016-12-22 |
2019-08-06 |
Magic Leap, Inc. |
Color separation in planar waveguides using dichroic filters
|
EP4250242A3
(de)
|
2017-01-23 |
2023-11-29 |
Magic Leap, Inc. |
Okular für systeme mit virtueller, erweiterter oder gemischter realität
|
AU2018225146A1
(en)
|
2017-02-23 |
2019-08-29 |
Magic Leap, Inc. |
Display system with variable power reflector
|
US10317793B2
(en)
|
2017-03-03 |
2019-06-11 |
Canon Kabushiki Kaisha |
Substrate pretreatment compositions for nanoimprint lithography
|
JP7300996B2
(ja)
|
2017-03-21 |
2023-06-30 |
マジック リープ, インコーポレイテッド |
回折光学要素を使用した眼結像装置
|
CA3075096A1
(en)
|
2017-09-21 |
2019-03-28 |
Magic Leap, Inc. |
Augmented reality display with waveguide configured to capture images of eye and/or environment
|
US10684407B2
(en)
*
|
2017-10-30 |
2020-06-16 |
Facebook Technologies, Llc |
Reactivity enhancement in ion beam etcher
|
JP7407111B2
(ja)
|
2017-12-15 |
2023-12-28 |
マジック リープ, インコーポレイテッド |
拡張現実ディスプレイシステムのための接眼レンズ
|
CN111527448A
(zh)
|
2018-01-26 |
2020-08-11 |
莫福托尼克斯控股有限公司 |
对不连续基底进行纹理化的方法和设备
|
JP7233174B2
(ja)
*
|
2018-05-17 |
2023-03-06 |
キヤノン株式会社 |
インプリント装置、物品製造方法、平坦化層形成装置、情報処理装置、及び、決定方法
|
CN112385321A
(zh)
|
2018-06-28 |
2021-02-19 |
3M创新有限公司 |
在柔性基底上制备金属图案的方法
|
US11137536B2
(en)
|
2018-07-26 |
2021-10-05 |
Facebook Technologies, Llc |
Bragg-like gratings on high refractive index material
|
DK3662325T3
(da)
|
2018-10-12 |
2021-02-01 |
Morphotonics B V |
Fleksibelt stempel med afstemmelig højdimensionel stabilitet
|
US11237393B2
(en)
|
2018-11-20 |
2022-02-01 |
Magic Leap, Inc. |
Eyepieces for augmented reality display system
|
CN114286962A
(zh)
|
2019-06-20 |
2022-04-05 |
奇跃公司 |
用于增强现实显示系统的目镜
|
US11226446B2
(en)
|
2020-05-06 |
2022-01-18 |
Facebook Technologies, Llc |
Hydrogen/nitrogen doping and chemically assisted etching of high refractive index gratings
|
IL300038A
(en)
|
2020-07-31 |
2023-03-01 |
Morphotonics Holding B V |
Apparatus and process for duplicating texture
|
WO2023084082A1
(en)
|
2021-11-15 |
2023-05-19 |
Morphotonics Holding B.V. |
Multi-textured stamp
|