DE60029445D1 - Verfahren zur strukturierung von polymerschichten, und anwendung der verfahren - Google Patents

Verfahren zur strukturierung von polymerschichten, und anwendung der verfahren

Info

Publication number
DE60029445D1
DE60029445D1 DE60029445T DE60029445T DE60029445D1 DE 60029445 D1 DE60029445 D1 DE 60029445D1 DE 60029445 T DE60029445 T DE 60029445T DE 60029445 T DE60029445 T DE 60029445T DE 60029445 D1 DE60029445 D1 DE 60029445D1
Authority
DE
Germany
Prior art keywords
polymer
stamp
thin film
material surface
patterning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60029445T
Other languages
English (en)
Other versions
DE60029445T2 (de
Inventor
Olle Inganaes
Tobias Nyberg
Tomas Granlund
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ensurge Micropower ASA
Original Assignee
Thin Film Electronics ASA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thin Film Electronics ASA filed Critical Thin Film Electronics ASA
Publication of DE60029445D1 publication Critical patent/DE60029445D1/de
Application granted granted Critical
Publication of DE60029445T2 publication Critical patent/DE60029445T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/06—Transferring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
DE60029445T 1999-05-12 2000-05-12 Verfahren zur strukturierung von polymerschichten, und anwendung der verfahren Expired - Fee Related DE60029445T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
NO992295 1999-05-12
NO19992295A NO311797B1 (no) 1999-05-12 1999-05-12 Fremgangsmåter til mönstring av polymerfilmer og anvendelse av fremgangsmåtene
PCT/NO2000/000157 WO2000070406A1 (en) 1999-05-12 2000-05-12 Methods for patterning polymer films, and use of the methods

Publications (2)

Publication Number Publication Date
DE60029445D1 true DE60029445D1 (de) 2006-08-31
DE60029445T2 DE60029445T2 (de) 2007-02-08

Family

ID=19903327

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60029445T Expired - Fee Related DE60029445T2 (de) 1999-05-12 2000-05-12 Verfahren zur strukturierung von polymerschichten, und anwendung der verfahren

Country Status (13)

Country Link
US (1) US6966997B1 (de)
EP (1) EP1192505B1 (de)
JP (1) JP3469204B2 (de)
KR (1) KR100453255B1 (de)
CN (1) CN100354754C (de)
AT (1) ATE333666T1 (de)
AU (1) AU4628600A (de)
DE (1) DE60029445T2 (de)
DK (1) DK1192505T3 (de)
ES (1) ES2267533T3 (de)
NO (1) NO311797B1 (de)
RU (1) RU2217785C2 (de)
WO (1) WO2000070406A1 (de)

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US7179396B2 (en) * 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
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DE112004002472T5 (de) * 2003-12-17 2008-08-28 Sumitomo Chemical Co. Ltd. Organische Vorrichtung zur Licht-Licht-Umwandlung
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US8911749B2 (en) 2007-04-16 2014-12-16 Corium International, Inc. Vaccine delivery via microneedle arrays
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US20080309900A1 (en) * 2007-06-12 2008-12-18 Micron Technology, Inc. Method of making patterning device, patterning device for making patterned structure, and method of making patterned structure
WO2009094786A1 (en) * 2008-01-31 2009-08-06 Acadia University Device and method for collecting a sample from a wet environment
US8652393B2 (en) * 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
WO2010061206A1 (en) * 2008-11-03 2010-06-03 Cambridge Enterprise Limited Method of patterning an electronic of photonic material
JP5195439B2 (ja) * 2009-01-07 2013-05-08 ソニー株式会社 印刷方法および表示装置の製造方法
GB0912034D0 (en) * 2009-07-10 2009-08-19 Cambridge Entpr Ltd Patterning
GB0913456D0 (en) 2009-08-03 2009-09-16 Cambridge Entpr Ltd Printed electronic device
US20130068723A1 (en) * 2009-12-30 2013-03-21 Matthew S. Stay Method of Using a Mask to Provide a Patterned Substrate
KR101184161B1 (ko) 2010-04-15 2012-09-18 한남대학교 산학협력단 소프트 리소그래피를 이용하여 패턴화된 금 표면의 표면 개질 방법
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US8242012B2 (en) 2010-07-28 2012-08-14 International Business Machines Corporation Integrated circuit structure incorporating a conductor layer with both top surface and sidewall passivation and a method of forming the integrated circuit structure
US9534206B2 (en) 2010-12-16 2017-01-03 General Electric Company Cell carrier, associated methods for making cell carrier and culturing cells using the same
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WO2014021991A1 (en) * 2012-07-31 2014-02-06 New York University Covalently patterned graphene surfaces by a force accelerated cycloaddition reaction
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CN105073178B (zh) 2012-12-21 2019-07-30 考里安国际公司 用于治疗剂递送的微阵列及其使用方法
CN103030104A (zh) * 2012-12-25 2013-04-10 江苏大学 一种制备超疏油表面的二步成形法
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EP2968118B1 (de) 2013-03-15 2022-02-09 Corium, Inc. Mikroarray zur freisetzung therapeutischer wirkstoffe und verfahren zur verwendung
JP2016512754A (ja) 2013-03-15 2016-05-09 コリウム インターナショナル， インコーポレイテッド 治療剤の送達のためのマイクロアレイ、使用方法および製造方法
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Also Published As

Publication number Publication date
ATE333666T1 (de) 2006-08-15
CN100354754C (zh) 2007-12-12
NO992295L (no) 2000-11-13
DK1192505T3 (da) 2006-11-20
JP2002544373A (ja) 2002-12-24
AU4628600A (en) 2000-12-05
NO992295D0 (no) 1999-05-12
KR20020026161A (ko) 2002-04-06
WO2000070406A1 (en) 2000-11-23
JP3469204B2 (ja) 2003-11-25
NO311797B1 (no) 2002-01-28
RU2217785C2 (ru) 2003-11-27
DE60029445T2 (de) 2007-02-08
KR100453255B1 (ko) 2004-10-15
EP1192505B1 (de) 2006-07-19
CN1350659A (zh) 2002-05-22
ES2267533T3 (es) 2007-03-16
EP1192505A1 (de) 2002-04-03
US6966997B1 (en) 2005-11-22

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