DE60042187D1 - Bond-typ Halbleitersubstrat, lichtemittierendes Halbleiterbauelement und Herstellungsverfahren - Google Patents
Bond-typ Halbleitersubstrat, lichtemittierendes Halbleiterbauelement und HerstellungsverfahrenInfo
- Publication number
- DE60042187D1 DE60042187D1 DE60042187T DE60042187T DE60042187D1 DE 60042187 D1 DE60042187 D1 DE 60042187D1 DE 60042187 T DE60042187 T DE 60042187T DE 60042187 T DE60042187 T DE 60042187T DE 60042187 D1 DE60042187 D1 DE 60042187D1
- Authority
- DE
- Germany
- Prior art keywords
- bond
- manufacturing
- emitting device
- semiconductor substrate
- type semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/10—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/16—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/185—Joining of semiconductor bodies for junction formation
- H01L21/187—Joining of semiconductor bodies for junction formation by direct bonding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12041—LED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16298599 | 1999-06-09 | ||
JP17413899A JP2001007389A (ja) | 1999-06-21 | 1999-06-21 | 半導体発光素子の製造方法 |
JP2000089754A JP3977572B2 (ja) | 1999-06-09 | 2000-03-28 | 接着型半導体基板および半導体発光素子並びにこれらの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60042187D1 true DE60042187D1 (de) | 2009-06-25 |
Family
ID=27322093
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60042187T Expired - Lifetime DE60042187D1 (de) | 1999-06-09 | 2000-06-08 | Bond-typ Halbleitersubstrat, lichtemittierendes Halbleiterbauelement und Herstellungsverfahren |
Country Status (4)
Country | Link |
---|---|
US (6) | US6465809B1 (de) |
EP (1) | EP1065734B1 (de) |
DE (1) | DE60042187D1 (de) |
TW (1) | TW502458B (de) |
Families Citing this family (79)
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TW502458B (en) | 1999-06-09 | 2002-09-11 | Toshiba Corp | Bonding type semiconductor substrate, semiconductor light emission element and manufacturing method thereof |
JP4091261B2 (ja) * | 2000-10-31 | 2008-05-28 | 株式会社東芝 | 半導体発光素子及びその製造方法 |
JP3910817B2 (ja) * | 2000-12-19 | 2007-04-25 | ユーディナデバイス株式会社 | 半導体受光装置 |
US7233028B2 (en) * | 2001-02-23 | 2007-06-19 | Nitronex Corporation | Gallium nitride material devices and methods of forming the same |
TWI294699B (en) * | 2006-01-27 | 2008-03-11 | Epistar Corp | Light emitting device and method of forming the same |
TW541732B (en) * | 2002-08-28 | 2003-07-11 | Arima Optoelectronics Corp | Manufacturing method of LED having transparent substrate |
JP4116387B2 (ja) * | 2002-09-30 | 2008-07-09 | 株式会社東芝 | 半導体発光素子 |
US7041529B2 (en) * | 2002-10-23 | 2006-05-09 | Shin-Etsu Handotai Co., Ltd. | Light-emitting device and method of fabricating the same |
US6786390B2 (en) * | 2003-02-04 | 2004-09-07 | United Epitaxy Company Ltd. | LED stack manufacturing method and its structure thereof |
CN101556985B (zh) | 2003-04-30 | 2017-06-09 | 克利公司 | 具有小型光学元件的高功率发光器封装 |
JP3737494B2 (ja) * | 2003-06-10 | 2006-01-18 | 株式会社東芝 | 半導体発光素子及びその製造方法並びに半導体発光装置 |
EP1649514B1 (de) * | 2003-07-30 | 2014-01-01 | Panasonic Corporation | Licht emittierendes halbleiterbauelement, licht emittierendes modul und beleuchtungsvorrichtung |
KR101014720B1 (ko) * | 2004-01-19 | 2011-02-16 | 엘지전자 주식회사 | 반도체 레이저 다이오드 제조 방법 |
US7791061B2 (en) * | 2004-05-18 | 2010-09-07 | Cree, Inc. | External extraction light emitting diode based upon crystallographic faceted surfaces |
US7332365B2 (en) * | 2004-05-18 | 2008-02-19 | Cree, Inc. | Method for fabricating group-III nitride devices and devices fabricated using method |
US7534633B2 (en) * | 2004-07-02 | 2009-05-19 | Cree, Inc. | LED with substrate modifications for enhanced light extraction and method of making same |
JP4250576B2 (ja) * | 2004-08-24 | 2009-04-08 | 株式会社東芝 | 半導体発光素子 |
JP2006066449A (ja) * | 2004-08-24 | 2006-03-09 | Toshiba Corp | 半導体発光素子 |
JP4518886B2 (ja) * | 2004-09-09 | 2010-08-04 | シャープ株式会社 | 半導体素子の製造方法 |
JP2006080314A (ja) * | 2004-09-09 | 2006-03-23 | Canon Inc | 結合基板の製造方法 |
US8174037B2 (en) | 2004-09-22 | 2012-05-08 | Cree, Inc. | High efficiency group III nitride LED with lenticular surface |
US7737459B2 (en) * | 2004-09-22 | 2010-06-15 | Cree, Inc. | High output group III nitride light emitting diodes |
US8513686B2 (en) | 2004-09-22 | 2013-08-20 | Cree, Inc. | High output small area group III nitride LEDs |
US7259402B2 (en) * | 2004-09-22 | 2007-08-21 | Cree, Inc. | High efficiency group III nitride-silicon carbide light emitting diode |
JP2006156950A (ja) * | 2004-10-29 | 2006-06-15 | Sharp Corp | 半導体発光素子の製造方法 |
US8288942B2 (en) | 2004-12-28 | 2012-10-16 | Cree, Inc. | High efficacy white LED |
KR100763402B1 (ko) * | 2005-01-07 | 2007-10-05 | 엘지전자 주식회사 | 조명 장치 |
US7932111B2 (en) * | 2005-02-23 | 2011-04-26 | Cree, Inc. | Substrate removal process for high light extraction LEDs |
KR100638732B1 (ko) * | 2005-04-15 | 2006-10-30 | 삼성전기주식회사 | 수직구조 질화물 반도체 발광소자의 제조방법 |
KR100638825B1 (ko) | 2005-05-23 | 2006-10-27 | 삼성전기주식회사 | 수직구조 반도체 발광 소자 및 그 제조 방법 |
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US8674375B2 (en) * | 2005-07-21 | 2014-03-18 | Cree, Inc. | Roughened high refractive index layer/LED for high light extraction |
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US20070181927A1 (en) * | 2006-02-03 | 2007-08-09 | Yedinak Joseph A | Charge balance insulated gate bipolar transistor |
TWI303115B (en) * | 2006-04-13 | 2008-11-11 | Epistar Corp | Semiconductor light emitting device |
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JP2009538536A (ja) | 2006-05-26 | 2009-11-05 | クリー エル イー ディー ライティング ソリューションズ インコーポレイテッド | 固体発光デバイス、および、それを製造する方法 |
EP2029936B1 (de) | 2006-05-31 | 2015-07-29 | Cree, Inc. | Beleuchtungsvorrichtung und beleuchtungsverfahren |
JP5003033B2 (ja) * | 2006-06-30 | 2012-08-15 | 住友電気工業株式会社 | GaN薄膜貼り合わせ基板およびその製造方法、ならびにGaN系半導体デバイスおよびその製造方法 |
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-
2000
- 2000-06-08 TW TW089111181A patent/TW502458B/zh not_active IP Right Cessation
- 2000-06-08 EP EP00304862A patent/EP1065734B1/de not_active Expired - Lifetime
- 2000-06-08 US US09/589,452 patent/US6465809B1/en not_active Expired - Lifetime
- 2000-06-08 DE DE60042187T patent/DE60042187D1/de not_active Expired - Lifetime
-
2002
- 2002-08-05 US US10/211,707 patent/US6815312B2/en not_active Expired - Lifetime
-
2004
- 2004-10-12 US US10/961,066 patent/US7217635B2/en not_active Expired - Lifetime
-
2007
- 2007-01-10 US US11/621,638 patent/US7364982B2/en not_active Expired - Lifetime
-
2008
- 2008-03-05 US US12/042,561 patent/US20080308827A1/en not_active Abandoned
-
2012
- 2012-08-27 US US13/595,284 patent/US8829488B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1065734B1 (de) | 2009-05-13 |
US20020185648A1 (en) | 2002-12-12 |
US20050066880A1 (en) | 2005-03-31 |
EP1065734A2 (de) | 2001-01-03 |
US6465809B1 (en) | 2002-10-15 |
US20080308827A1 (en) | 2008-12-18 |
US20070111473A1 (en) | 2007-05-17 |
TW502458B (en) | 2002-09-11 |
EP1065734A3 (de) | 2001-12-19 |
US7217635B2 (en) | 2007-05-15 |
US20130020681A1 (en) | 2013-01-24 |
US7364982B2 (en) | 2008-04-29 |
US8829488B2 (en) | 2014-09-09 |
US6815312B2 (en) | 2004-11-09 |
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