DE60045239D1 - Rastermikroskopspitzen benutzendes verfahren - Google Patents
Rastermikroskopspitzen benutzendes verfahrenInfo
- Publication number
- DE60045239D1 DE60045239D1 DE60045239T DE60045239T DE60045239D1 DE 60045239 D1 DE60045239 D1 DE 60045239D1 DE 60045239 T DE60045239 T DE 60045239T DE 60045239 T DE60045239 T DE 60045239T DE 60045239 D1 DE60045239 D1 DE 60045239D1
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- useful procedure
- raster
- patterning compound
- raster microscopes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece
- G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
- G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
- G03F9/7061—Scanning probe microscopy, e.g. AFM, scanning tunneling microscopy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/007—Processes for applying liquids or other fluent materials using an electrostatic field
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q80/00—Applications, other than SPM, of scanning-probe techniques
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/165—Monolayers, e.g. Langmuir-Blodgett
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/855—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure
- Y10S977/857—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure including coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/863—Atomic force probe
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/875—Scanning probe structure with tip detail
- Y10S977/877—Chemically functionalized
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/24—Nuclear magnetic resonance, electron spin resonance or other spin effects or mass spectrometry
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11513399P | 1999-01-07 | 1999-01-07 | |
US15763399P | 1999-10-04 | 1999-10-04 | |
PCT/US2000/000319 WO2000041213A1 (en) | 1999-01-07 | 2000-01-07 | Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60045239D1 true DE60045239D1 (de) | 2010-12-30 |
Family
ID=26812875
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60045239T Expired - Lifetime DE60045239D1 (de) | 1999-01-07 | 2000-01-07 | Rastermikroskopspitzen benutzendes verfahren |
Country Status (12)
Country | Link |
---|---|
US (5) | US6635311B1 (de) |
EP (1) | EP1157407B1 (de) |
JP (2) | JP3963650B2 (de) |
KR (1) | KR100668591B1 (de) |
CN (2) | CN1284719C (de) |
AT (1) | ATE488858T1 (de) |
AU (1) | AU778568B2 (de) |
CA (1) | CA2358215C (de) |
DE (1) | DE60045239D1 (de) |
HK (2) | HK1041744B (de) |
TW (1) | TW473767B (de) |
WO (1) | WO2000041213A1 (de) |
Families Citing this family (142)
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WO1999040434A1 (en) | 1998-02-04 | 1999-08-12 | Invitrogen Corporation | Microarrays and uses therefor |
US6897073B2 (en) * | 1998-07-14 | 2005-05-24 | Zyomyx, Inc. | Non-specific binding resistant protein arrays and methods for making the same |
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US6635311B1 (en) | 1999-01-07 | 2003-10-21 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or products thereby |
US20020122873A1 (en) | 2000-01-05 | 2002-09-05 | Mirkin Chad A. | Nanolithography methods and products therefor and produced thereby |
US6827979B2 (en) * | 1999-01-07 | 2004-12-07 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
US20030073250A1 (en) * | 1999-05-21 | 2003-04-17 | Eric Henderson | Method and apparatus for solid state molecular analysis |
AU2001259512B2 (en) | 2000-05-04 | 2007-03-01 | Yale University | High density protein arrays for screening of protein activity |
ATE402760T1 (de) * | 2000-08-15 | 2008-08-15 | Bioforce Nanosciences Inc | Vorrichtung zur bildung von nanomolekularen netzwerken |
AU2002239740A1 (en) | 2000-10-20 | 2002-06-11 | Chad A. Mirkin | Nanolithography methods and products therefor and produced thereby |
JP3544353B2 (ja) * | 2000-11-27 | 2004-07-21 | 独立行政法人 科学技術振興機構 | 金属カルコゲナイド超微粒子の作製方法 |
AU2002337637A1 (en) * | 2001-01-26 | 2003-01-08 | Northwestern University | Method and device utilizing driving force to deliver deposition compound |
US6817293B2 (en) * | 2001-03-28 | 2004-11-16 | Dainippon Printing Co., Ltd. | Patterning method with micro-contact printing and its printed product |
WO2002085846A1 (fr) * | 2001-04-17 | 2002-10-31 | Japan Science And Technology Corporation | Polymercaptopolyphenyles et procede de synthese associe |
US6642129B2 (en) * | 2001-07-26 | 2003-11-04 | The Board Of Trustees Of The University Of Illinois | Parallel, individually addressable probes for nanolithography |
CA2462833C (en) * | 2001-10-02 | 2012-07-03 | Northwestern University | Protein and peptide nanoarrays |
TWI311155B (en) * | 2001-11-30 | 2009-06-21 | Northwestern Universit | Direct write nanolithographic deposition of nucleic acids from scanning probe microscopic tips |
US7361310B1 (en) | 2001-11-30 | 2008-04-22 | Northwestern University | Direct write nanolithographic deposition of nucleic acids from nanoscopic tips |
CN100345059C (zh) * | 2001-12-17 | 2007-10-24 | 西北大学 | 采用直写纳米刻蚀印刷的固态部件的图案化 |
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US7998528B2 (en) * | 2002-02-14 | 2011-08-16 | Massachusetts Institute Of Technology | Method for direct fabrication of nanostructures |
US7279046B2 (en) * | 2002-03-27 | 2007-10-09 | Nanoink, Inc. | Method and apparatus for aligning patterns on a substrate |
AU2003298516A1 (en) | 2002-05-21 | 2004-04-23 | Northwestern University | Electrostatically driven lithography |
AU2003300257A1 (en) * | 2002-05-21 | 2004-05-04 | Northwestern University | Peptide and protein arrays and direct-write lithographic printing of peptides and proteins |
US20050239193A1 (en) * | 2002-05-30 | 2005-10-27 | Bioforce Nanosciences, Inc. | Device and method of use for detection and characterization of microorganisms and microparticles |
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US7098056B2 (en) * | 2002-08-09 | 2006-08-29 | Nanoink, Inc. | Apparatus, materials, and methods for fabrication and catalysis |
US7005378B2 (en) * | 2002-08-26 | 2006-02-28 | Nanoink, Inc. | Processes for fabricating conductive patterns using nanolithography as a patterning tool |
US8071168B2 (en) * | 2002-08-26 | 2011-12-06 | Nanoink, Inc. | Micrometric direct-write methods for patterning conductive material and applications to flat panel display repair |
US7223438B2 (en) * | 2002-09-17 | 2007-05-29 | Northwestern University | Patterning magnetic nanostructures |
US7491422B2 (en) * | 2002-10-21 | 2009-02-17 | Nanoink, Inc. | Direct-write nanolithography method of transporting ink with an elastomeric polymer coated nanoscopic tip to form a structure having internal hollows on a substrate |
US7691541B2 (en) * | 2002-10-21 | 2010-04-06 | Nanoink, Inc. | Methods for additive repair of phase shift masks by selectively depositing nanometer-scale engineered structures on defective phase shifters |
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US7321012B2 (en) | 2003-02-28 | 2008-01-22 | The University Of Connecticut | Method of crosslinking intrinsically conductive polymers or intrinsically conductive polymer precursors and the articles obtained therefrom |
US7217396B2 (en) * | 2003-05-05 | 2007-05-15 | The Board Of Trustees Of The University Of Illinois | Microfabricated micro fluid channels |
US20040228962A1 (en) * | 2003-05-16 | 2004-11-18 | Chang Liu | Scanning probe microscopy probe and method for scanning probe contact printing |
US7326380B2 (en) | 2003-07-18 | 2008-02-05 | Northwestern University | Surface and site-specific polymerization by direct-write lithography |
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EP1732993A2 (de) * | 2003-10-30 | 2006-12-20 | Applied Medical Resources Corporation | Oberflächenbehandlungen und -modifikationen unter einsatz von nanostrukturstoffen |
US7528929B2 (en) | 2003-11-14 | 2009-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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CN1654230B (zh) * | 2004-02-10 | 2010-05-12 | 中国科学院上海应用物理研究所 | 以动态组合模式“蘸笔”纳米刻蚀技术制造纳米图形的方法 |
US20080138927A1 (en) * | 2004-03-11 | 2008-06-12 | The University Of Vermont And State Agricultural College | Systems and Methods for Fabricating Crystalline Thin Structures Using Meniscal Growth Techniques |
US20050221081A1 (en) * | 2004-03-23 | 2005-10-06 | Liu Gang-Yu | Stabilization of self-assembled monolayers |
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US7253409B2 (en) * | 2004-07-20 | 2007-08-07 | The Board Of Trustees Of The Leland Stanford Junior University | Electrochemical nano-patterning using ionic conductors |
US20060242740A1 (en) * | 2004-08-11 | 2006-10-26 | California Institute Of Technology | Method and device for surfactant activated Dip-Pen Nanolithography |
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EP1812714B1 (de) * | 2004-11-19 | 2008-03-26 | ebm-papst St. Georgen GmbH & Co. KG | Anordnung mit einem luefter und einer pumpe |
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CN101003357B (zh) * | 2007-01-12 | 2011-01-19 | 哈尔滨工业大学 | 基于原子力显微镜恒力模式的纳米微小结构加工方法 |
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- 2000-01-07 JP JP2000592858A patent/JP3963650B2/ja not_active Expired - Fee Related
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- 2000-01-07 CN CNB008039879A patent/CN1284719C/zh not_active Expired - Fee Related
- 2000-01-07 EP EP00911560A patent/EP1157407B1/de not_active Expired - Lifetime
- 2000-01-07 WO PCT/US2000/000319 patent/WO2000041213A1/en active IP Right Grant
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- 2000-01-07 CN CN2006101389900A patent/CN101003355B/zh not_active Expired - Fee Related
- 2000-01-07 AU AU33440/00A patent/AU778568B2/en not_active Ceased
- 2000-01-07 KR KR1020017008631A patent/KR100668591B1/ko not_active IP Right Cessation
- 2000-03-21 TW TW089100167A patent/TW473767B/zh not_active IP Right Cessation
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US8163345B2 (en) | 2012-04-24 |
EP1157407A4 (de) | 2003-01-29 |
JP2002539955A (ja) | 2002-11-26 |
CN101003355B (zh) | 2010-09-01 |
US6635311B1 (en) | 2003-10-21 |
EP1157407B1 (de) | 2010-11-17 |
AU778568B2 (en) | 2004-12-09 |
HK1041744A1 (en) | 2002-07-19 |
HK1110298A1 (en) | 2008-07-11 |
US7569252B2 (en) | 2009-08-04 |
JP2007276109A (ja) | 2007-10-25 |
US20120295029A1 (en) | 2012-11-22 |
TW473767B (en) | 2002-01-21 |
CA2358215C (en) | 2012-07-31 |
EP1157407A1 (de) | 2001-11-28 |
CA2358215A1 (en) | 2000-07-13 |
CN101003355A (zh) | 2007-07-25 |
WO2000041213A1 (en) | 2000-07-13 |
US20040028814A1 (en) | 2004-02-12 |
KR20010110413A (ko) | 2001-12-13 |
US20100098857A1 (en) | 2010-04-22 |
CN1341274A (zh) | 2002-03-20 |
US8247032B2 (en) | 2012-08-21 |
HK1041744B (zh) | 2011-07-08 |
KR100668591B1 (ko) | 2007-01-17 |
US20100040847A1 (en) | 2010-02-18 |
AU3344000A (en) | 2000-07-24 |
CN1284719C (zh) | 2006-11-15 |
WO2000041213A9 (en) | 2001-10-04 |
JP3963650B2 (ja) | 2007-08-22 |
ATE488858T1 (de) | 2010-12-15 |
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