DE60045698D1 - Antireflexzusammensetzung einer Hartmaske - Google Patents

Antireflexzusammensetzung einer Hartmaske

Info

Publication number
DE60045698D1
DE60045698D1 DE60045698T DE60045698T DE60045698D1 DE 60045698 D1 DE60045698 D1 DE 60045698D1 DE 60045698 T DE60045698 T DE 60045698T DE 60045698 T DE60045698 T DE 60045698T DE 60045698 D1 DE60045698 D1 DE 60045698D1
Authority
DE
Germany
Prior art keywords
hard mask
antireflection composition
antireflection
composition
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60045698T
Other languages
English (en)
Inventor
Edward K Pavelchek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Electronic Materials LLC
Original Assignee
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co LLC filed Critical Shipley Co LLC
Application granted granted Critical
Publication of DE60045698D1 publication Critical patent/DE60045698D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane
DE60045698T 1999-06-11 2000-06-06 Antireflexzusammensetzung einer Hartmaske Expired - Lifetime DE60045698D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/330,417 US6890448B2 (en) 1999-06-11 1999-06-11 Antireflective hard mask compositions

Publications (1)

Publication Number Publication Date
DE60045698D1 true DE60045698D1 (de) 2011-04-21

Family

ID=23289686

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60045698T Expired - Lifetime DE60045698D1 (de) 1999-06-11 2000-06-06 Antireflexzusammensetzung einer Hartmaske

Country Status (6)

Country Link
US (2) US6890448B2 (de)
EP (1) EP1061560B1 (de)
JP (1) JP4879384B2 (de)
KR (1) KR100696399B1 (de)
DE (1) DE60045698D1 (de)
TW (1) TW466581B (de)

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US20030209515A1 (en) 2003-11-13
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US7018717B2 (en) 2006-03-28
TW466581B (en) 2001-12-01
KR100696399B1 (ko) 2007-03-20
EP1061560A3 (de) 2001-10-04
JP2001053068A (ja) 2001-02-23
US6890448B2 (en) 2005-05-10
EP1061560B1 (de) 2011-03-09
KR20010007323A (ko) 2001-01-26

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