DE60100978D1 - Verfahren zur Herstellung eines feinen hydrophoben Siliziumdioxidpulvers - Google Patents

Verfahren zur Herstellung eines feinen hydrophoben Siliziumdioxidpulvers

Info

Publication number
DE60100978D1
DE60100978D1 DE60100978T DE60100978T DE60100978D1 DE 60100978 D1 DE60100978 D1 DE 60100978D1 DE 60100978 T DE60100978 T DE 60100978T DE 60100978 T DE60100978 T DE 60100978T DE 60100978 D1 DE60100978 D1 DE 60100978D1
Authority
DE
Germany
Prior art keywords
producing
silica powder
hydrophobic silica
fine hydrophobic
fine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60100978T
Other languages
English (en)
Other versions
DE60100978T2 (de
Inventor
Yasuaki Nozawa
Kiyoshi Shirasuna
Hidekazu Uehara
Keiji Shibata
Susumu Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Application granted granted Critical
Publication of DE60100978D1 publication Critical patent/DE60100978D1/de
Publication of DE60100978T2 publication Critical patent/DE60100978T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3081Treatment with organo-silicon compounds
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/90Other properties not specified above
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991Coated
    • Y10T428/2993Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
DE60100978T 2000-08-31 2001-08-31 Verfahren zur Herstellung eines feinen hydrophoben Siliziumdioxidpulvers Expired - Lifetime DE60100978T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000262227A JP3674683B2 (ja) 2000-08-31 2000-08-31 疎水性二酸化珪素微粉末の製造方法
JP2000026227 2000-08-31

Publications (2)

Publication Number Publication Date
DE60100978D1 true DE60100978D1 (de) 2003-11-20
DE60100978T2 DE60100978T2 (de) 2004-09-09

Family

ID=18749942

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60100978T Expired - Lifetime DE60100978T2 (de) 2000-08-31 2001-08-31 Verfahren zur Herstellung eines feinen hydrophoben Siliziumdioxidpulvers

Country Status (4)

Country Link
US (1) US6696034B2 (de)
EP (1) EP1184425B1 (de)
JP (1) JP3674683B2 (de)
DE (1) DE60100978T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040171034A1 (en) * 2002-05-03 2004-09-02 Brian Agnew Compositions and methods for detection and isolation of phosphorylated molecules
US7052541B2 (en) * 2002-06-19 2006-05-30 Board Of Regents, The University Of Texas System Color compositions
DE10308722A1 (de) * 2003-02-28 2004-09-09 Degussa Ag Homogenisierung von nanoskaligen Pulvern
DE10349284A1 (de) * 2003-10-23 2005-06-16 Wacker-Chemie Gmbh Ultrareine fumed Silica
DE102004036573A1 (de) * 2004-07-28 2006-03-23 Ge Bayer Silicones Gmbh & Co. Kg Verwendung lichtaktivierbarer, härtbarer Silikonzusammensetzungen zur Herstellung von dickwandigen Formartikeln oder dickwandigen Beschichtungen
US7892643B2 (en) * 2004-09-30 2011-02-22 Cabot Corporation Metal and oxides thereof and methods to make same
US7425235B2 (en) * 2005-02-11 2008-09-16 The Board Of Regents Of The University Of Texas System Color compositions and methods of manufacture
CA2615514A1 (en) * 2005-06-17 2006-12-28 The Board Of Regents Of The University Of Texas System Organic/inorganic lewis acid composite materials
CN102773149B (zh) * 2011-05-10 2014-03-19 中国矿业大学(北京) 一种粉石英矿的选矿提纯方法
CN102513031B (zh) * 2011-11-30 2014-04-16 广州吉必盛科技实业有限公司 一种脱酸工艺及其设备
DE102012203826A1 (de) 2012-03-12 2013-09-12 Wacker Chemie Ag Verfahren zur Oberflächenmodifikation von partikulären Feststoffen
CN103406344B (zh) * 2013-08-28 2015-04-08 河北宁晋松宫半导体有限公司 一种线切碎硅片杂质的处理方法
US9724663B2 (en) * 2014-08-05 2017-08-08 Board Of Regents, The University Of Texas System Systems and methods of continuously producing encapsulated liquid water
CN106629742B (zh) * 2016-11-15 2019-08-06 浙江富士特硅材料有限公司 一种疏水型气相二氧化硅的制备方法
CN108394910B (zh) * 2018-05-15 2020-02-14 湖北兴瑞硅材料有限公司 气相白炭黑生产原料混配的方法
CN110002452B (zh) * 2019-05-23 2022-04-12 南京特粒材料科技有限公司 一种中空多孔二氧化硅微球、制备方法及应用
DE112020006779T5 (de) 2020-02-20 2023-03-02 Guangzhou Huifu Research Institute Co., Ltd. Kombinationsbehandlungsvorrichtung und -verfahren zur Oberflächenmodifikation vom Gasphasen-Siliziumdioxid

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1163784C2 (de) 1962-03-30 1973-05-03 Degussa Verfahren zur Oberflaechenbehandlung von hochdispersen Oxyden
DE3211431A1 (de) 1982-03-27 1983-09-29 Degussa Ag, 6000 Frankfurt Verfahren zur hydrophobierung von pyrogen hergestelltem siliciumdioxid
US4554147A (en) * 1984-04-02 1985-11-19 General Electric Company Method for treating fumed silica
US5342597A (en) * 1990-11-14 1994-08-30 Cabot Corporation Process for uniformly moisturizing fumed silica
DE4240741A1 (de) 1992-12-03 1994-06-09 Wacker Chemie Gmbh Verfahren zur Hydrophobierung von pyrogen hergestelltem Siliciumdioxid
US5736245A (en) * 1994-06-17 1998-04-07 Lucent Technologies Inc. Chemical treatment for silica-containing glass surfaces
US5919298A (en) * 1998-01-12 1999-07-06 Dow Corning Corporation Method for preparing hydrophobic fumed silica

Also Published As

Publication number Publication date
US6696034B2 (en) 2004-02-24
DE60100978T2 (de) 2004-09-09
JP2002069330A (ja) 2002-03-08
EP1184425A1 (de) 2002-03-06
US20020025288A1 (en) 2002-02-28
JP3674683B2 (ja) 2005-07-20
EP1184425B1 (de) 2003-10-15

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