DE60142714D1 - Photolithographisch gemusterte ausserflächige Spulenstrukturen und Verfahren zur Erzeugung - Google Patents

Photolithographisch gemusterte ausserflächige Spulenstrukturen und Verfahren zur Erzeugung

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Publication number
DE60142714D1
DE60142714D1 DE60142714T DE60142714T DE60142714D1 DE 60142714 D1 DE60142714 D1 DE 60142714D1 DE 60142714 T DE60142714 T DE 60142714T DE 60142714 T DE60142714 T DE 60142714T DE 60142714 D1 DE60142714 D1 DE 60142714D1
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DE
Germany
Prior art keywords
substrate
photolithographically patterned
coil structures
production
methods
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60142714T
Other languages
English (en)
Inventor
Christopher L Chua
Francesco Lemmi
Koenraad F Schuylenbergh
Jeng Ping Lu
David K Fork
Eric Peeters
Decai Sun
Donald L Smith
Linda T Romano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Corp
Original Assignee
Xerox Corp
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Publication date
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Application granted granted Critical
Publication of DE60142714D1 publication Critical patent/DE60142714D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
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    • G01R1/02General constructional details
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    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
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DE60122343D1 (de) 2006-09-28
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EP1301827B1 (de) 2006-08-16
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US6947291B2 (en) 2005-09-20
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EP1301827A4 (de) 2003-07-09
US20050270135A1 (en) 2005-12-08
ATE336738T1 (de) 2006-09-15
US20030027081A1 (en) 2003-02-06
AU2001261322A1 (en) 2001-11-26
DE60122343T2 (de) 2006-12-14
EP1729174A1 (de) 2006-12-06
US20030179064A1 (en) 2003-09-25
US6856225B1 (en) 2005-02-15
US7000315B2 (en) 2006-02-21
TW501151B (en) 2002-09-01

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