DE602004025893D1 - Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE602004025893D1
DE602004025893D1 DE200460025893 DE602004025893T DE602004025893D1 DE 602004025893 D1 DE602004025893 D1 DE 602004025893D1 DE 200460025893 DE200460025893 DE 200460025893 DE 602004025893 T DE602004025893 T DE 602004025893T DE 602004025893 D1 DE602004025893 D1 DE 602004025893D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200460025893
Other languages
English (en)
Inventor
Christiaan Alexander Hoogendam
Erik Roelof Loopstra
Bob Streefkerk
Bernard Gellrich
Andreas Wurmbrand
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
ASML Netherlands BV
Original Assignee
Carl Zeiss SMT GmbH
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, ASML Netherlands BV filed Critical Carl Zeiss SMT GmbH
Publication of DE602004025893D1 publication Critical patent/DE602004025893D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE200460025893 2003-10-28 2004-10-26 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung Active DE602004025893D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03256809 2003-10-28

Publications (1)

Publication Number Publication Date
DE602004025893D1 true DE602004025893D1 (de) 2010-04-22

Family

ID=34639339

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200460025893 Active DE602004025893D1 (de) 2003-10-28 2004-10-26 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (7)

Country Link
US (6) US7352433B2 (de)
JP (1) JP4146828B2 (de)
KR (1) KR100632891B1 (de)
CN (1) CN1612051B (de)
DE (1) DE602004025893D1 (de)
SG (1) SG111309A1 (de)
TW (1) TWI263261B (de)

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US20150015858A1 (en) 2015-01-15
US9182679B2 (en) 2015-11-10
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JP2005136413A (ja) 2005-05-26
US20120086926A1 (en) 2012-04-12
US7352433B2 (en) 2008-04-01
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US8860922B2 (en) 2014-10-14
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US20080204679A1 (en) 2008-08-28
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SG111309A1 (en) 2005-05-30
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US8810771B2 (en) 2014-08-19
KR20050040765A (ko) 2005-05-03

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