DE602004026968D1 - Vorrichtung und Verfahren zum Abgeben von Vorläufermaterial - Google Patents

Vorrichtung und Verfahren zum Abgeben von Vorläufermaterial

Info

Publication number
DE602004026968D1
DE602004026968D1 DE200460026968 DE602004026968T DE602004026968D1 DE 602004026968 D1 DE602004026968 D1 DE 602004026968D1 DE 200460026968 DE200460026968 DE 200460026968 DE 602004026968 T DE602004026968 T DE 602004026968T DE 602004026968 D1 DE602004026968 D1 DE 602004026968D1
Authority
DE
Germany
Prior art keywords
volume
lid
protrusion
precursor
precursor material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200460026968
Other languages
English (en)
Inventor
Charles Michael Birtcher
Richard J Dunning
Robert Daniel Clark
Arthur Kenneth Hochberg
Thomas Andrew Steidl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Products and Chemicals Inc
Original Assignee
Air Products and Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Products and Chemicals Inc filed Critical Air Products and Chemicals Inc
Publication of DE602004026968D1 publication Critical patent/DE602004026968D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0391—Affecting flow by the addition of material or energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/4891—With holder for solid, flaky or pulverized material to be dissolved or entrained
DE200460026968 2003-08-19 2004-08-17 Vorrichtung und Verfahren zum Abgeben von Vorläufermaterial Active DE602004026968D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US49618703P 2003-08-19 2003-08-19
US58729504P 2004-07-12 2004-07-12
US10/902,778 US7261118B2 (en) 2003-08-19 2004-08-02 Method and vessel for the delivery of precursor materials

Publications (1)

Publication Number Publication Date
DE602004026968D1 true DE602004026968D1 (de) 2010-06-17

Family

ID=34069125

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200460026968 Active DE602004026968D1 (de) 2003-08-19 2004-08-17 Vorrichtung und Verfahren zum Abgeben von Vorläufermaterial

Country Status (10)

Country Link
US (1) US7261118B2 (de)
EP (1) EP1508631B1 (de)
JP (1) JP4012181B2 (de)
KR (1) KR100590463B1 (de)
CN (1) CN100523289C (de)
AT (1) ATE466969T1 (de)
DE (1) DE602004026968D1 (de)
IL (1) IL163536A0 (de)
SG (2) SG109618A1 (de)
TW (1) TWI257436B (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7601225B2 (en) 2002-06-17 2009-10-13 Asm International N.V. System for controlling the sublimation of reactants
US7300038B2 (en) * 2002-07-23 2007-11-27 Advanced Technology Materials, Inc. Method and apparatus to help promote contact of gas with vaporized material
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US6909839B2 (en) 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material
JP4312555B2 (ja) * 2003-09-18 2009-08-12 富士フイルム株式会社 真空蒸着用ルツボおよび蛍光体シート製造装置
GB2432371B (en) * 2005-11-17 2011-06-15 Epichem Ltd Improved bubbler for the transportation of substances by a carrier gas
FI121430B (fi) * 2006-04-28 2010-11-15 Beneq Oy Kuuma lähde
DE102006022534A1 (de) * 2006-05-15 2007-11-22 Aixtron Ag Quellenbehälter einse VPE-Reaktors
DE102006023046B4 (de) * 2006-05-17 2009-02-05 Qimonda Ag Verfahren und Ausgangsmaterial zum Bereitstellen eines gasförmigen Precursors
EP2038456B1 (de) * 2006-06-09 2014-03-05 Soitec Anlage und verfahren zur grossvolumigen abscheidung von galliumnitrid
US20080018004A1 (en) * 2006-06-09 2008-01-24 Air Products And Chemicals, Inc. High Flow GaCl3 Delivery
KR100840783B1 (ko) 2006-08-21 2008-06-23 삼성전자주식회사 전구체 기화 방법 및 장치, 및 이를 이용한 유전막 형성방법
US20080241805A1 (en) * 2006-08-31 2008-10-02 Q-Track Corporation System and method for simulated dosimetry using a real time locating system
WO2008045972A2 (en) * 2006-10-10 2008-04-17 Asm America, Inc. Precursor delivery system
US9109287B2 (en) * 2006-10-19 2015-08-18 Air Products And Chemicals, Inc. Solid source container with inlet plenum
US9481944B2 (en) 2006-11-22 2016-11-01 Soitec Gas injectors including a funnel- or wedge-shaped channel for chemical vapor deposition (CVD) systems and CVD systems with the same
US9481943B2 (en) * 2006-11-22 2016-11-01 Soitec Gallium trichloride injection scheme
EP2055804A1 (de) * 2007-10-29 2009-05-06 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Verfahren zur Herstellung einer Abscheidung aus einer Dampfphase
US8343583B2 (en) * 2008-07-10 2013-01-01 Asm International N.V. Method for vaporizing non-gaseous precursor in a fluidized bed
CN102597310B (zh) 2009-11-02 2015-02-04 西格玛-奥吉奇有限责任公司 固态前体输送组件以及相关方法
US9809711B2 (en) 2012-01-17 2017-11-07 Versum Materials Us, Llc Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process
US20130243968A1 (en) 2012-03-16 2013-09-19 Air Products And Chemicals, Inc. Catalyst synthesis for organosilane sol-gel reactions
US9598766B2 (en) 2012-05-27 2017-03-21 Air Products And Chemicals, Inc. Vessel with filter
WO2013181521A2 (en) 2012-05-31 2013-12-05 Advanced Technology Materials, Inc. Source reagent-based delivery of fluid with high material flux for batch deposition
US9347696B2 (en) * 2012-06-05 2016-05-24 Applied Materials, Inc. Compact ampoule thermal management system
WO2014018740A1 (en) * 2012-07-25 2014-01-30 William Kimmerle Chemical precursor bubbler assembly
US10170297B2 (en) 2013-08-22 2019-01-01 Versum Materials Us, Llc Compositions and methods using same for flowable oxide deposition
US10443128B2 (en) * 2015-04-18 2019-10-15 Versum Materials Us, Llc Vessel and method for delivery of precursor materials
KR101606681B1 (ko) * 2016-01-13 2016-03-28 (주)서일퍼시픽 이동식 기침 유발기
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US11926894B2 (en) 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
KR102344996B1 (ko) * 2017-08-18 2021-12-30 삼성전자주식회사 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법
US10597773B2 (en) * 2017-08-22 2020-03-24 Praxair Technology, Inc. Antimony-containing materials for ion implantation
KR102555932B1 (ko) 2018-06-15 2023-07-13 버슘머트리얼즈 유에스, 엘엘씨 실록산 조성물 및 이 조성물을 실리콘 함유 필름을 증착시키기 위해 사용하는 방법
JP7376278B2 (ja) 2018-08-16 2023-11-08 エーエスエム・アイピー・ホールディング・ベー・フェー 固体原料昇華器
CN109576675B (zh) * 2019-01-15 2021-08-13 北京北方华创微电子装备有限公司 原子层沉积装置及方法
US11624113B2 (en) 2019-09-13 2023-04-11 Asm Ip Holding B.V. Heating zone separation for reactant evaporation system
US20220275506A1 (en) * 2021-02-26 2022-09-01 Entegris, Inc. Solids vaporizer

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4723967A (en) * 1987-04-27 1988-02-09 Advanced Technology Materials, Inc. Valve block and container for semiconductor source reagent dispensing and/or purification
JPH01168331A (ja) * 1987-12-24 1989-07-03 Mitsui Toatsu Chem Inc 有機金属化合物の飽和方法
DE3801147A1 (de) * 1988-01-16 1989-07-27 Philips Patentverwaltung Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms
JPH0269389A (ja) * 1988-08-31 1990-03-08 Toyo Stauffer Chem Co 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法
US5227340A (en) * 1990-02-05 1993-07-13 Motorola, Inc. Process for fabricating semiconductor devices using a solid reactant source
JPH0632695A (ja) 1992-07-14 1994-02-08 Fujitsu Ltd バブラー
US5276585A (en) * 1992-11-16 1994-01-04 Thermalloy, Inc. Heat sink mounting apparatus
US5381605A (en) * 1993-01-08 1995-01-17 Photonics Research Incorporated Method and apparatus for delivering gas
US5377429A (en) * 1993-04-19 1995-01-03 Micron Semiconductor, Inc. Method and appartus for subliming precursors
US5607002A (en) * 1993-04-28 1997-03-04 Advanced Delivery & Chemical Systems, Inc. Chemical refill system for high purity chemicals
US5707424A (en) * 1994-10-13 1998-01-13 Advanced Technology Materials, Inc. Process system with integrated gas storage and delivery unit
JP3417751B2 (ja) * 1995-02-13 2003-06-16 株式会社東芝 半導体装置の製造方法
US5989305A (en) * 1995-03-09 1999-11-23 Shin-Etsu Chemical Co., Ltd. Feeder of a solid organometallic compound
US5674574A (en) * 1996-05-20 1997-10-07 Micron Technology, Inc. Vapor delivery system for solid precursors and method regarding same
US6058012A (en) * 1996-08-26 2000-05-02 Compaq Computer Corporation Apparatus, method and system for thermal management of an electronic system having semiconductor devices
US6077356A (en) * 1996-12-17 2000-06-20 Advanced Technology Materials, Inc. Reagent supply vessel for chemical vapor deposition
US6089184A (en) * 1997-06-11 2000-07-18 Tokyo Electron Limited CVD apparatus and CVD method
US6520218B1 (en) * 1998-09-03 2003-02-18 Advanced Technology Materials, Inc. Container chemical guard
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
JP2000345345A (ja) * 1999-06-04 2000-12-12 Mitsubishi Electric Corp Ｃｖｄ装置およびｃｖｄ装置用気化装置
US6444038B1 (en) * 1999-12-27 2002-09-03 Morton International, Inc. Dual fritted bubbler
KR100360494B1 (ko) * 1999-09-21 2002-11-13 삼성전자 주식회사 기화장치
US6244331B1 (en) * 1999-10-22 2001-06-12 Intel Corporation Heatsink with integrated blower for improved heat transfer
GB9929279D0 (en) 1999-12-11 2000-02-02 Epichem Ltd An improved method of and apparatus for the delivery of precursors in the vapour phase to a plurality of epitaxial reactor sites
DE60106675T2 (de) * 2000-05-31 2005-12-01 Shipley Co., L.L.C., Marlborough Verdampfer
US6837251B1 (en) * 2000-06-21 2005-01-04 Air Products And Chemicals, Inc. Multiple contents container assembly for ultrapure solvent purging
US6581649B2 (en) * 2001-07-13 2003-06-24 L'air Liquide - Societe Anonyme A'directiore Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude Methods and apparatus for delivering high purity liquids with low vapor pressure
US7780785B2 (en) * 2001-10-26 2010-08-24 Applied Materials, Inc. Gas delivery apparatus for atomic layer deposition
US20030111014A1 (en) * 2001-12-18 2003-06-19 Donatucci Matthew B. Vaporizer/delivery vessel for volatile/thermally sensitive solid and liquid compounds
JP2003318170A (ja) 2002-04-26 2003-11-07 Japan Pionics Co Ltd 気化器
JP3822135B2 (ja) 2002-05-13 2006-09-13 日本パイオニクス株式会社 気化供給装置
US7601225B2 (en) 2002-06-17 2009-10-13 Asm International N.V. System for controlling the sublimation of reactants
US7186385B2 (en) 2002-07-17 2007-03-06 Applied Materials, Inc. Apparatus for providing gas to a processing chamber
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US6915592B2 (en) * 2002-07-29 2005-07-12 Applied Materials, Inc. Method and apparatus for generating gas to a processing chamber
US6797337B2 (en) * 2002-08-19 2004-09-28 Micron Technology, Inc. Method for delivering precursors
US6740586B1 (en) * 2002-11-06 2004-05-25 Advanced Technology Materials, Inc. Vapor delivery system for solid precursors and method of using same
US6909839B2 (en) * 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material

Also Published As

Publication number Publication date
KR20050020643A (ko) 2005-03-04
TW200525046A (en) 2005-08-01
US20050039794A1 (en) 2005-02-24
SG109618A1 (en) 2005-03-30
US7261118B2 (en) 2007-08-28
KR100590463B1 (ko) 2006-06-19
EP1508631A1 (de) 2005-02-23
ATE466969T1 (de) 2010-05-15
CN100523289C (zh) 2009-08-05
JP2005101564A (ja) 2005-04-14
TWI257436B (en) 2006-07-01
JP4012181B2 (ja) 2007-11-21
IL163536A0 (en) 2005-12-18
SG130188A1 (en) 2007-03-20
EP1508631B1 (de) 2010-05-05
CN1611636A (zh) 2005-05-04

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