DE602005009661D1 - Verfahren zur bereitstellung eines dünnfilms mit einer räumlich in einem mikrometrischen oder nanometrischen massstab auf einem substrat strukturierten chemischen zusammensetzung - Google Patents

Verfahren zur bereitstellung eines dünnfilms mit einer räumlich in einem mikrometrischen oder nanometrischen massstab auf einem substrat strukturierten chemischen zusammensetzung

Info

Publication number
DE602005009661D1
DE602005009661D1 DE602005009661T DE602005009661T DE602005009661D1 DE 602005009661 D1 DE602005009661 D1 DE 602005009661D1 DE 602005009661 T DE602005009661 T DE 602005009661T DE 602005009661 T DE602005009661 T DE 602005009661T DE 602005009661 D1 DE602005009661 D1 DE 602005009661D1
Authority
DE
Germany
Prior art keywords
substrate
thin film
providing
roomed
micrometric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602005009661T
Other languages
English (en)
Inventor
Massimiliano Cavallini
Fabio Biscarini
Molina Daniel Ruiz
Segura Jordi Gomez
Miro' Jaume Veciana
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Consejo Superior de Investigaciones Cientificas CSIC
Scriba Nanotecnologie Srl
Original Assignee
Consejo Superior de Investigaciones Cientificas CSIC
Scriba Nanotecnologie Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consejo Superior de Investigaciones Cientificas CSIC, Scriba Nanotecnologie Srl filed Critical Consejo Superior de Investigaciones Cientificas CSIC
Publication of DE602005009661D1 publication Critical patent/DE602005009661D1/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/0085—Manufacture of substrate-free structures using moulds and master templates, e.g. for hot-embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12556—Organic component
    • Y10T428/12569—Synthetic resin
DE602005009661T 2004-02-17 2005-02-15 Verfahren zur bereitstellung eines dünnfilms mit einer räumlich in einem mikrometrischen oder nanometrischen massstab auf einem substrat strukturierten chemischen zusammensetzung Expired - Fee Related DE602005009661D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT000076A ITBO20040076A1 (it) 2004-02-17 2004-02-17 Metodo per la realizzazione di un film sottile di composizione chimica spazialmente strutturata su scala micrometrica o nanometrica su un supporto
PCT/EP2005/001494 WO2005078521A2 (en) 2004-02-17 2005-02-15 Method for providing a thin film having a chemical composition that is spatially structured on a micrometric or nanometric scale on a substrate

Publications (1)

Publication Number Publication Date
DE602005009661D1 true DE602005009661D1 (de) 2008-10-23

Family

ID=34856885

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005009661T Expired - Fee Related DE602005009661D1 (de) 2004-02-17 2005-02-15 Verfahren zur bereitstellung eines dünnfilms mit einer räumlich in einem mikrometrischen oder nanometrischen massstab auf einem substrat strukturierten chemischen zusammensetzung

Country Status (8)

Country Link
US (1) US20070182060A1 (de)
EP (1) EP1716452B1 (de)
CN (1) CN1926472A (de)
AT (1) ATE408174T1 (de)
DE (1) DE602005009661D1 (de)
ES (1) ES2314629T3 (de)
IT (1) ITBO20040076A1 (de)
WO (1) WO2005078521A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7510946B2 (en) * 2003-03-17 2009-03-31 Princeton University Method for filling of nanoscale holes and trenches and for planarizing of a wafer surface
ITBO20060340A1 (it) * 2006-05-09 2007-11-10 Scriba Nanotecnologie Srl Dispositivo e metodo per la realizzazione di un substrato strutturato su scala micrometrica o nanometrica
US20140170786A1 (en) 2012-12-13 2014-06-19 Juanita N. Kurtin Ceramic composition having dispersion of nano-particles therein and methods of fabricating same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3933536A (en) * 1972-11-03 1976-01-20 General Electric Company Method of making magnets by polymer-coating magnetic powder
US5953629A (en) * 1995-06-09 1999-09-14 Vacuum Metallurgical Co., Ltd. Method of thin film forming on semiconductor substrate
JPH11204742A (ja) * 1998-01-20 1999-07-30 Sony Corp メモリ及び情報機器
US6517995B1 (en) * 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
US6486413B1 (en) * 1999-11-17 2002-11-26 Ebara Corporation Substrate coated with a conductive layer and manufacturing method thereof
EP1184898A1 (de) * 1999-11-30 2002-03-06 Ebara Corporation Methode und apparat zur formung einer dünnen metallschicht
US6936181B2 (en) * 2001-10-11 2005-08-30 Kovio, Inc. Methods for patterning using liquid embossing
US7232650B2 (en) * 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
TWI297513B (en) * 2005-10-06 2008-06-01 Ind Tech Res Inst Electrode and method for forming the same
US20090020924A1 (en) * 2007-02-21 2009-01-22 Iowa State University Research Foundation, Inc. Drying-mediated self-assembly of ordered or hierarchically ordered micro- and sub-micro scale structures and their uses as multifunctional materials
US7846642B2 (en) * 2007-08-17 2010-12-07 The University Of Massachusetts Direct incident beam lithography for patterning nanoparticles, and the articles formed thereby

Also Published As

Publication number Publication date
CN1926472A (zh) 2007-03-07
WO2005078521A8 (en) 2006-03-16
ES2314629T3 (es) 2009-03-16
EP1716452B1 (de) 2008-09-10
US20070182060A1 (en) 2007-08-09
EP1716452A2 (de) 2006-11-02
WO2005078521A2 (en) 2005-08-25
ITBO20040076A1 (it) 2004-05-17
WO2005078521A3 (en) 2006-05-26
ATE408174T1 (de) 2008-09-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee