DE60232556D1 - Mehrschichtiges Gitter für Monochromatisierung und Spektroskopie - Google Patents

Mehrschichtiges Gitter für Monochromatisierung und Spektroskopie

Info

Publication number
DE60232556D1
DE60232556D1 DE60232556T DE60232556T DE60232556D1 DE 60232556 D1 DE60232556 D1 DE 60232556D1 DE 60232556 T DE60232556 T DE 60232556T DE 60232556 T DE60232556 T DE 60232556T DE 60232556 D1 DE60232556 D1 DE 60232556D1
Authority
DE
Germany
Prior art keywords
monochromatization
spectroscopy
multilayer lattice
lattice
multilayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60232556T
Other languages
English (en)
Inventor
Vladimir V Martynov
Yuriy Platonov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osmic Inc
Original Assignee
Osmic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osmic Inc filed Critical Osmic Inc
Application granted granted Critical
Publication of DE60232556D1 publication Critical patent/DE60232556D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
DE60232556T 2001-06-29 2002-06-27 Mehrschichtiges Gitter für Monochromatisierung und Spektroskopie Expired - Lifetime DE60232556D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/896,458 US6510200B1 (en) 2001-06-29 2001-06-29 Multi-layer structure with variable bandpass for monochromatization and spectroscopy

Publications (1)

Publication Number Publication Date
DE60232556D1 true DE60232556D1 (de) 2009-07-16

Family

ID=25406246

Family Applications (2)

Application Number Title Priority Date Filing Date
DE60221394T Expired - Lifetime DE60221394T2 (de) 2001-06-29 2002-06-27 Mehrschichtgitter für die monochromatisierung und spektroskopie
DE60232556T Expired - Lifetime DE60232556D1 (de) 2001-06-29 2002-06-27 Mehrschichtiges Gitter für Monochromatisierung und Spektroskopie

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE60221394T Expired - Lifetime DE60221394T2 (de) 2001-06-29 2002-06-27 Mehrschichtgitter für die monochromatisierung und spektroskopie

Country Status (4)

Country Link
US (2) US6510200B1 (de)
EP (2) EP1688765B1 (de)
DE (2) DE60221394T2 (de)
WO (1) WO2003003380A1 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6510200B1 (en) * 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
EP1496521A1 (de) * 2003-07-09 2005-01-12 ASML Netherlands B.V. Spiegel und Lithographiegerät mit Spiegel
US7570424B2 (en) 2004-12-06 2009-08-04 Moxtek, Inc. Multilayer wire-grid polarizer
US20080055719A1 (en) * 2006-08-31 2008-03-06 Perkins Raymond T Inorganic, Dielectric Grid Polarizer
US7961393B2 (en) 2004-12-06 2011-06-14 Moxtek, Inc. Selectively absorptive wire-grid polarizer
US7800823B2 (en) 2004-12-06 2010-09-21 Moxtek, Inc. Polarization device to polarize and further control light
JP4479535B2 (ja) * 2005-02-21 2010-06-09 セイコーエプソン株式会社 光学素子の製造方法
EP1966636A2 (de) * 2005-12-22 2008-09-10 Université Jean-Monnet Spiegelstruktur und laservorrichtung mit einer derartigen spiegelstruktur
JP2009535670A (ja) * 2006-05-02 2009-10-01 ホログラム インダストリーズ 光学セキュリティ・マーキング部品、該部品を製造するための方法、該部品を備えるシステム、および該部品をチェックするための読み取り機
EP1855127A1 (de) 2006-05-12 2007-11-14 Rolic AG Optisch wirksame Oberflächenreliefmikrostrukturen und Verfahren zu ihrer Herstellung
US8755113B2 (en) 2006-08-31 2014-06-17 Moxtek, Inc. Durable, inorganic, absorptive, ultra-violet, grid polarizer
US7864426B2 (en) * 2007-02-13 2011-01-04 Xradia, Inc. High aspect-ratio X-ray diffractive structure stabilization methods and systems
US7672430B2 (en) * 2007-05-15 2010-03-02 Lawrence Livermore National Security, Llc Area X-ray or UV camera system for high-intensity beams
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
US8227778B2 (en) * 2008-05-20 2012-07-24 Komatsu Ltd. Semiconductor exposure device using extreme ultra violet radiation
JP5061063B2 (ja) * 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光用ミラーおよび極端紫外光源装置
US8287003B2 (en) * 2008-06-02 2012-10-16 Pollard Banknote Limited Partnership Lottery ticket with a registered holographic layer
US8248696B2 (en) 2009-06-25 2012-08-21 Moxtek, Inc. Nano fractal diffuser
US8537967B2 (en) * 2009-09-10 2013-09-17 University Of Washington Short working distance spectrometer and associated devices, systems, and methods
US8913321B2 (en) 2010-09-21 2014-12-16 Moxtek, Inc. Fine pitch grid polarizer
US8611007B2 (en) 2010-09-21 2013-12-17 Moxtek, Inc. Fine pitch wire grid polarizer
US8873144B2 (en) 2011-05-17 2014-10-28 Moxtek, Inc. Wire grid polarizer with multiple functionality sections
US8913320B2 (en) 2011-05-17 2014-12-16 Moxtek, Inc. Wire grid polarizer with bordered sections
US8922890B2 (en) 2012-03-21 2014-12-30 Moxtek, Inc. Polarizer edge rib modification
US9151881B2 (en) * 2012-11-12 2015-10-06 Kla-Tencor Corporation Phase grating for mask inspection system
US9939682B2 (en) 2013-02-15 2018-04-10 E-Vision, Llc Liquid crystal alignment layers and method of fabrication
US9348076B2 (en) 2013-10-24 2016-05-24 Moxtek, Inc. Polarizer with variable inter-wire distance
CN105700134B (zh) * 2016-04-08 2018-10-26 同济大学 一种x射线宽光谱多层膜闪耀光栅设计方法
KR102539143B1 (ko) 2016-09-21 2023-06-01 삼성전자주식회사 분광기 및 분광기 모듈

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3980883A (en) * 1973-05-15 1976-09-14 National Research Development Corporation X-ray diffraction gratings
JPS6034742B2 (ja) * 1976-02-20 1985-08-10 ミノルタ株式会社 光学的ロ−パスフイルタ−
US4693933A (en) 1983-06-06 1987-09-15 Ovonic Synthetic Materials Company, Inc. X-ray dispersive and reflective structures and method of making the structures
US4727000A (en) 1983-06-06 1988-02-23 Ovonic Synthetic Materials Co., Inc. X-ray dispersive and reflective structures
US4717632A (en) 1983-08-22 1988-01-05 Ovonic Synthetic-Materials Company, Inc. Adhesion and composite wear resistant coating and method
US4716083A (en) 1983-09-23 1987-12-29 Ovonic Synthetic Materials Company Disordered coating
US4525853A (en) 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
US4785470A (en) 1983-10-31 1988-11-15 Ovonic Synthetic Materials Company, Inc. Reflectivity and resolution X-ray dispersive and reflective structures for carbon, beryllium and boron analysis
US4656347A (en) * 1984-01-30 1987-04-07 Nippon Telegraph & Telephone Public Corporation Diffraction grating position adjuster using a grating and a reflector
US4643951A (en) 1984-07-02 1987-02-17 Ovonic Synthetic Materials Company, Inc. Multilayer protective coating and method
US4724169A (en) 1984-10-09 1988-02-09 Ovonic Synthetic Materials Company, Inc. Method of producing multilayer coatings on a substrate
US4675889A (en) 1985-07-08 1987-06-23 Ovonic Synthetic Materials Company, Inc. Multiple wavelength X-ray dispersive devices and method of making the devices
US4777090A (en) 1986-11-03 1988-10-11 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
US4728193A (en) * 1986-12-11 1988-03-01 Hughes Aircraft Company Precision automatic mask-wafer alignment system
US4783374A (en) 1987-11-16 1988-11-08 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
US4828356A (en) * 1987-12-22 1989-05-09 Hughes Aircraft Company Method for fabrication of low efficiency diffraction gratings and product obtained thereby
US4867785A (en) 1988-05-09 1989-09-19 Ovonic Synthetic Materials Company, Inc. Method of forming alloy particulates having controlled submicron crystallite size distributions
US4915463A (en) * 1988-10-18 1990-04-10 The United States Of America As Represented By The Department Of Energy Multilayer diffraction grating
US5082621A (en) 1990-07-31 1992-01-21 Ovonic Synthetic Materials Company, Inc. Neutron reflecting supermirror structure
US5167912A (en) 1990-07-31 1992-12-01 Ovonic Synthetic Materials Company, Inc. Neutron reflecting supermirror structure
US5458084A (en) * 1992-04-16 1995-10-17 Moxtek, Inc. X-ray wave diffraction optics constructed by atomic layer epitaxy
US5384817A (en) * 1993-07-12 1995-01-24 Ovonic Synthetic Materials Company X-ray optical element and method for its manufacture
US5646976A (en) 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons
JP3167095B2 (ja) * 1995-07-04 2001-05-14 キヤノン株式会社 照明装置とこれを有する露光装置や顕微鏡装置、ならびにデバイス生産方法
US5907436A (en) * 1995-09-29 1999-05-25 The Regents Of The University Of California Multilayer dielectric diffraction gratings
US5757882A (en) 1995-12-18 1998-05-26 Osmic, Inc. Steerable x-ray optical system
JPH1082904A (ja) * 1996-09-06 1998-03-31 Hitachi Koki Co Ltd 奇数多ビーム発生素子
US6014423A (en) 1998-02-19 2000-01-11 Osmic, Inc. Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
US6041099A (en) 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
US6069934A (en) 1998-04-07 2000-05-30 Osmic, Inc. X-ray diffractometer with adjustable image distance
US6389100B1 (en) 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
US6421417B1 (en) 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
US6330301B1 (en) 1999-12-17 2001-12-11 Osmic, Inc. Optical scheme for high flux low-background two-dimensional small angle x-ray scattering
US6510200B1 (en) * 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy

Also Published As

Publication number Publication date
EP1688765A2 (de) 2006-08-09
EP1399927A4 (de) 2005-01-26
US6510200B1 (en) 2003-01-21
US6809864B2 (en) 2004-10-26
EP1399927B1 (de) 2007-07-25
DE60221394D1 (de) 2007-09-06
EP1399927A1 (de) 2004-03-24
US20030072412A1 (en) 2003-04-17
DE60221394T2 (de) 2008-04-17
WO2003003380A1 (en) 2003-01-09
EP1688765B1 (de) 2009-06-03
US20030002622A1 (en) 2003-01-02
EP1688765A3 (de) 2006-08-23

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