DE60233780D1 - Lithographischer Apparat und Verfahren zur Herstellung eines Artikels - Google Patents

Lithographischer Apparat und Verfahren zur Herstellung eines Artikels

Info

Publication number
DE60233780D1
DE60233780D1 DE60233780T DE60233780T DE60233780D1 DE 60233780 D1 DE60233780 D1 DE 60233780D1 DE 60233780 T DE60233780 T DE 60233780T DE 60233780 T DE60233780 T DE 60233780T DE 60233780 D1 DE60233780 D1 DE 60233780D1
Authority
DE
Germany
Prior art keywords
article
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60233780T
Other languages
English (en)
Inventor
Hendrikus Herman Marie Cox
Frank Auer
Der Wijst Marc Wilhelmus Maria Van
Bastiaan Stephanus Hendrikus Jansen
Dominicus Jacobus Petr Franken
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60233780D1 publication Critical patent/DE60233780D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
DE60233780T 2001-12-21 2002-12-19 Lithographischer Apparat und Verfahren zur Herstellung eines Artikels Expired - Lifetime DE60233780D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01310781A EP1321822A1 (de) 2001-12-21 2001-12-21 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Publications (1)

Publication Number Publication Date
DE60233780D1 true DE60233780D1 (de) 2009-11-05

Family

ID=8182566

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60233780T Expired - Lifetime DE60233780D1 (de) 2001-12-21 2002-12-19 Lithographischer Apparat und Verfahren zur Herstellung eines Artikels

Country Status (8)

Country Link
US (1) US6788386B2 (de)
EP (2) EP1321822A1 (de)
JP (1) JP3813923B2 (de)
KR (1) KR100588119B1 (de)
CN (1) CN1285971C (de)
DE (1) DE60233780D1 (de)
SG (1) SG120906A1 (de)
TW (1) TWI290664B (de)

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Also Published As

Publication number Publication date
TW200411331A (en) 2004-07-01
SG120906A1 (en) 2006-04-26
US6788386B2 (en) 2004-09-07
KR100588119B1 (ko) 2006-06-09
EP1321822A1 (de) 2003-06-25
CN1285971C (zh) 2006-11-22
KR20030076200A (ko) 2003-09-26
CN1442755A (zh) 2003-09-17
TWI290664B (en) 2007-12-01
JP3813923B2 (ja) 2006-08-23
JP2003203860A (ja) 2003-07-18
EP1321823A2 (de) 2003-06-25
EP1321823A3 (de) 2005-02-09
US20030197914A1 (en) 2003-10-23
EP1321823B1 (de) 2009-09-23

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