DE60328301D1 - Eisensilicid-sputtertarget und herstellungsverfahren dafür - Google Patents

Eisensilicid-sputtertarget und herstellungsverfahren dafür

Info

Publication number
DE60328301D1
DE60328301D1 DE60328301T DE60328301T DE60328301D1 DE 60328301 D1 DE60328301 D1 DE 60328301D1 DE 60328301 T DE60328301 T DE 60328301T DE 60328301 T DE60328301 T DE 60328301T DE 60328301 D1 DE60328301 D1 DE 60328301D1
Authority
DE
Germany
Prior art keywords
manufacturing
method therefor
sputter target
iron silicide
silicide sputter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60328301T
Other languages
English (en)
Inventor
Kunihiro Oda
Ryo Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mining Holdings Inc
Eneos Corp
Original Assignee
Nippon Mining and Metals Co Ltd
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining and Metals Co Ltd, Nippon Mining Co Ltd filed Critical Nippon Mining and Metals Co Ltd
Application granted granted Critical
Publication of DE60328301D1 publication Critical patent/DE60328301D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/58085Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicides
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    • C04B35/626Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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    • B22CASTING; POWDER METALLURGY
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DE60328301T 2002-09-11 2003-09-01 Eisensilicid-sputtertarget und herstellungsverfahren dafür Expired - Lifetime DE60328301D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002265447A JP4388263B2 (ja) 2002-09-11 2002-09-11 珪化鉄スパッタリングターゲット及びその製造方法
PCT/JP2003/011152 WO2004024977A1 (ja) 2002-09-11 2003-09-01 珪化鉄スパッタリングターゲット及びその製造方法

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DE60328301D1 true DE60328301D1 (de) 2009-08-20

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Country Status (6)

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US (2) US8173093B2 (de)
EP (1) EP1548148B1 (de)
JP (1) JP4388263B2 (de)
KR (1) KR100689597B1 (de)
DE (1) DE60328301D1 (de)
WO (1) WO2004024977A1 (de)

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TWI538737B (zh) * 2007-08-31 2016-06-21 阿普托麥克股份有限公司 材料沉積總成
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US7972583B2 (en) 2011-07-05
EP1548148A1 (de) 2005-06-29
US20060057014A1 (en) 2006-03-16
US20110044838A1 (en) 2011-02-24
EP1548148A4 (de) 2008-05-28
US8173093B2 (en) 2012-05-08
EP1548148B1 (de) 2009-07-08
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