DE68921370D1 - Electronzyklotronresonanz-Ionenquelle. - Google Patents

Electronzyklotronresonanz-Ionenquelle.

Info

Publication number: DE68921370D1
Authority: DE; Germany
Prior art keywords: ion source; cyclotron resonance; electron cyclotron; resonance ion; electron
Prior art date: 1988-06-03
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE68921370T

Other languages

English (en)

Other versions

DE68921370T2 (de

Inventor

James E Hipple

Gerry Dionne

Yasuhiro Torii

Masaru Shimada

Iwao Watanabe

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nippon Telegraph and Telephone Corp

Eaton Corp

Original Assignee

Nippon Telegraph and Telephone Corp

Eaton Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-06-03

Filing date

1989-05-24

Publication date

1995-04-06

1989-05-24 Application filed by Nippon Telegraph and Telephone Corp, Eaton Corp filed Critical Nippon Telegraph and Telephone Corp

1995-04-06 Publication of DE68921370D1 publication Critical patent/DE68921370D1/de

1995-10-19 Application granted granted Critical

1995-10-19 Publication of DE68921370T2 publication Critical patent/DE68921370T2/de

2009-05-25 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation

DE68921370T 1988-06-03 1989-05-24 Electronzyklotronresonanz-Ionenquelle. Expired - Lifetime DE68921370T2 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US07/202,141 US4883968A (en)	1988-06-03	1988-06-03	Electron cyclotron resonance ion source

Publications (2)

Publication Number	Publication Date
DE68921370D1 true DE68921370D1 (de)	1995-04-06
DE68921370T2 DE68921370T2 (de)	1995-10-19

Family

ID=22748653

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE68921370T Expired - Lifetime DE68921370T2 (de)	1988-06-03	1989-05-24	Electronzyklotronresonanz-Ionenquelle.

Country Status (7)

Country	Link
US (1)	US4883968A (de)
EP (1)	EP0344969B1 (de)
JP (1)	JP2903118B2 (de)
KR (1)	KR910010099B1 (de)
CA (1)	CA1321229C (de)
DE (1)	DE68921370T2 (de)
ES (1)	ES2068890T3 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE68926923T2 (de) *	1988-03-16	1996-12-19	Hitachi Ltd	Mikrowellenionenquelle
US5146138A (en) *	1988-04-05	1992-09-08	Mitsubishi Denki Kabushiki Kaisha	Plasma processor
US5115167A (en) *	1988-04-05	1992-05-19	Mitsubishi Denki Kabushiki Kaisha	Plasma processor
GB9009319D0 (en) *	1990-04-25	1990-06-20	Secr Defence	Gaseous radical source
US5134299A (en) *	1991-03-13	1992-07-28	Eaton Corporation	Ion beam implantation method and apparatus for particulate control
JP2700280B2 (ja) *	1991-03-28	1998-01-19	理化学研究所	イオンビーム発生装置および成膜装置および成膜方法
US5218210A (en) *	1992-02-18	1993-06-08	Eaton Corporation	Broad beam flux density control
US5420415A (en)	1994-06-29	1995-05-30	Eaton Corporation	Structure for alignment of an ion source aperture with a predetermined ion beam path
US5523652A (en)	1994-09-26	1996-06-04	Eaton Corporation	Microwave energized ion source for ion implantation
US5554853A (en) *	1995-03-10	1996-09-10	Krytek Corporation	Producing ion beams suitable for ion implantation and improved ion implantation apparatus and techniques
US5661308A (en) *	1996-05-30	1997-08-26	Eaton Corporation	Method and apparatus for ion formation in an ion implanter
US5821677A (en) *	1996-12-05	1998-10-13	Eaton Corporation	Ion source block filament with laybrinth conductive path
US6053875A (en) *	1998-01-13	2000-04-25	Rosenbaum; Marvin	Removable tip for an acoustic reflectometer
US6590324B1 (en) *	1999-09-07	2003-07-08	Veeco Instruments, Inc.	Charged particle beam extraction and formation apparatus
US6452338B1 (en)	1999-12-13	2002-09-17	Semequip, Inc.	Electron beam ion source with integral low-temperature vaporizer
US7064491B2 (en) *	2000-11-30	2006-06-20	Semequip, Inc.	Ion implantation system and control method
US20050242293A1 (en) *	2003-01-07	2005-11-03	Benveniste Victor M	Mounting mechanism for plasma extraction aperture
JP4795755B2 (ja) *	2005-08-25	2011-10-19	株式会社日立ハイテクノロジーズ	半導体基板の製造装置
JP2010517233A (ja) *	2007-01-25	2010-05-20	エヌエフエイビー・リミテッド	改良された粒子ビーム発生装置
FR2933532B1 (fr) *	2008-07-02	2010-09-03	Commissariat Energie Atomique	Dispositif generateur d'ions a resonance cyclotronique electronique
US7842931B2 (en) *	2008-09-25	2010-11-30	Axcelis Technologies, Inc.	Extraction electrode manipulator
US20100290575A1 (en)	2009-05-15	2010-11-18	Rosenthal Glenn B	Particle beam isotope generator apparatus, system and method
FR2995493B1 (fr) *	2012-09-11	2014-08-22	Hydromecanique & Frottement	Dispositif pour generer un plasma presentant une etendue importante le long d'un axe par resonnance cyclotronique electronique rce a partir d'un milieu gazeux
US9177708B2 (en)	2013-06-14	2015-11-03	Varian Semiconductor Equipment Associates, Inc.	Annular cooling fluid passage for magnets
US9244245B2 (en)	2013-11-08	2016-01-26	Institut National D'optique	Auto-centering of an optical element within a barrel
EP3172607B1 (de) *	2014-07-25	2022-07-20	Institut National d'Optique	Optische anordnungen mit neigungskontrollierter montage eines optischen elements in einem lauf
EP3198322B1 (de)	2014-09-22	2022-05-11	Institut National d'Optique	Lagerung eines optischen elements in einem lauf mit einem flexiblen ring
WO2016154755A1 (en)	2015-03-31	2016-10-06	Institut National D'optique	Optical assembly with translatable centered sleeve
JP6231039B2 (ja) *	2015-04-22	2017-11-15	住友重機械工業株式会社	サイクロトロン及び超伝導電磁石

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS6043620B2 (ja) *	1982-11-25	1985-09-28	日新ハイボルテージ株式会社	マイクロ波イオン源
US4793961A (en) *	1983-07-26	1988-12-27	The United States Of America As Represented By The Department Of Energy	Method and source for producing a high concentration of positively charged molecular hydrogen or deuterium ions
FR2550681B1 (fr) *	1983-08-12	1985-12-06	Centre Nat Rech Scient	Source d'ions a au moins deux chambres d'ionisation, en particulier pour la formation de faisceaux d'ions chimiquement reactifs
US4714834A (en) *	1984-05-09	1987-12-22	Atomic Energy Of Canada, Limited	Method and apparatus for generating ion beams
JPH0616384B2 (ja) *	1984-06-11	1994-03-02	日本電信電話株式会社	マイクロ波イオン源
JPS61107643A (ja) *	1984-10-30	1986-05-26	Hitachi Ltd	蒸発炉付イオン源
JPS63257166A (ja) *	1987-04-13	1988-10-25	Nippon Telegr & Teleph Corp <Ntt>	マイクロ波イオン源

1988
- 1988-06-03 US US07/202,141 patent/US4883968A/en not_active Expired - Lifetime
1989
- 1989-05-24 EP EP89305275A patent/EP0344969B1/de not_active Expired - Lifetime
- 1989-05-24 DE DE68921370T patent/DE68921370T2/de not_active Expired - Lifetime
- 1989-05-24 ES ES89305275T patent/ES2068890T3/es not_active Expired - Lifetime
- 1989-05-31 JP JP1135968A patent/JP2903118B2/ja not_active Expired - Lifetime
- 1989-06-01 CA CA000601416A patent/CA1321229C/en not_active Expired - Lifetime
- 1989-06-02 KR KR1019890007580A patent/KR910010099B1/ko not_active IP Right Cessation

Also Published As

Publication number	Publication date
US4883968A (en)	1989-11-28
KR910010099B1 (ko)	1991-12-16
JP2903118B2 (ja)	1999-06-07
ES2068890T3 (es)	1995-05-01
CA1321229C (en)	1993-08-10
EP0344969B1 (de)	1995-03-01
EP0344969A1 (de)	1989-12-06
JPH0230038A (ja)	1990-01-31
KR900000951A (ko)	1990-01-31
DE68921370T2 (de)	1995-10-19

Legal Events

Date	Code	Title	Description
1996-03-28	8364	No opposition during term of opposition

Publication	Publication Date	Title
DE68921370D1 (de)	1995-04-06	Electronzyklotronresonanz-Ionenquelle.
DE68926923D1 (de)	1996-09-19	Mikrowellenionenquelle
DE68925898T2 (de)	1996-08-29	Grossflächige uniforme elektronenquelle
DE3689349D1 (de)	1994-01-13	Ionenquelle.
DE3580991D1 (de)	1991-02-07	Emissionsplasmaquelle.
DE59010044D1 (de)	1996-02-22	Ionen-Zyklotron-Resonanz-Spektrometer
DE3580521D1 (de)	1990-12-20	Mikrowellen-ionenquelle.
DE69019741T2 (de)	1995-09-28	Ionenstrahlkanone.
DE3783432D1 (de)	1993-02-18	End-hall-ionenquelle.
DE3771782D1 (de)	1991-09-05	Elektronenspektrometer.
DE69207212D1 (de)	1996-02-08	Hochfrequenz-ionenquelle
DE3584105D1 (de)	1991-10-24	Ionenquelle.
DE3773003D1 (de)	1991-10-24	Massenspektrometer mit induktiv angekoppelter plasmaquelle.
DE3583534D1 (de)	1991-08-29	Ionen-zyklotronresonanz-spektrometer.
DE3689428T2 (de)	1994-06-23	Elektronenstrahlquelle.
DE3881418D1 (de)	1993-07-08	Hohlkathoden-ionenquellen.
FR2546358B1 (fr)	1985-07-05	Source d'ions a resonance cyclotronique des electrons
DE69029156D1 (de)	1997-01-02	Elektronenvervielfacher mit reduzierter Ionenrückwirkung
DE3689232D1 (de)	1993-12-02	Ionenquelle.
DE3881579D1 (de)	1993-07-15	Ionenquelle.
DE59107831D1 (de)	1996-06-27	Ionenquelle
DE3783476T2 (de)	1993-05-19	Massenspektrometer mit getrennter ionenquelle.
DE68919004D1 (de)	1994-12-01	Elektronenmikroskop.
KR900017084A (ko)	1990-11-15	이온원
DE3762470D1 (de)	1990-05-31	Elektronzyklotronresonanz-ionenquelle.