DE68928315D1 - Methode zur messung der dicke eines überzugs auf einem substrat - Google Patents

Methode zur messung der dicke eines überzugs auf einem substrat

Info

Publication number
DE68928315D1
DE68928315D1 DE68928315T DE68928315T DE68928315D1 DE 68928315 D1 DE68928315 D1 DE 68928315D1 DE 68928315 T DE68928315 T DE 68928315T DE 68928315 T DE68928315 T DE 68928315T DE 68928315 D1 DE68928315 D1 DE 68928315D1
Authority
DE
Germany
Prior art keywords
coating
photons
pct
energy level
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE68928315T
Other languages
English (en)
Other versions
DE68928315T2 (de
Inventor
Dominique Gignoux
Roland Gouel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Radiometrie Corp
Original Assignee
DMC BOYLE Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DMC BOYLE Ltd filed Critical DMC BOYLE Ltd
Publication of DE68928315D1 publication Critical patent/DE68928315D1/de
Application granted granted Critical
Publication of DE68928315T2 publication Critical patent/DE68928315T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G01B15/025—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness by measuring absorption
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence
DE68928315T 1988-05-13 1989-05-12 Methode zur messung der dicke eines überzugs auf einem substrat Expired - Lifetime DE68928315T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB888811459A GB8811459D0 (en) 1988-05-13 1988-05-13 Method & apparatus for measuring thickness of coating on substrate
PCT/GB1989/000518 WO1989011095A1 (en) 1988-05-13 1989-05-12 Method and apparatus for measuring the thickness of a coating on a substrate

Publications (2)

Publication Number Publication Date
DE68928315D1 true DE68928315D1 (de) 1997-10-16
DE68928315T2 DE68928315T2 (de) 1999-06-10

Family

ID=10636913

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68928315T Expired - Lifetime DE68928315T2 (de) 1988-05-13 1989-05-12 Methode zur messung der dicke eines überzugs auf einem substrat

Country Status (7)

Country Link
US (1) US5113421A (de)
EP (1) EP0422017B1 (de)
JP (1) JP2849665B2 (de)
AT (1) ATE158077T1 (de)
DE (1) DE68928315T2 (de)
GB (1) GB8811459D0 (de)
WO (1) WO1989011095A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4021617C2 (de) * 1990-07-06 1993-12-02 Kugelfischer G Schaefer & Co Vorrichtung zum kontinuierlichen Messen des Eisengehaltes in Zinkschichten
JPH04331308A (ja) * 1991-03-05 1992-11-19 Permelec Electrode Ltd 箔厚み連続測定装置
EP0539611A1 (de) * 1991-10-26 1993-05-05 FAG Kugelfischer Georg Schäfer Aktiengesellschaft Messvorrichtung
EP0539612A1 (de) * 1991-10-26 1993-05-05 FAG Kugelfischer Georg Schäfer Aktiengesellschaft Verfahren zur kontinuierlichen Abstandsmessung eines beschichteten Trägermaterials zu einer die Material-Beschichtungsstärke messenden Einrichtung
US5534106A (en) * 1994-07-26 1996-07-09 Kabushiki Kaisha Toshiba Apparatus for processing semiconductor wafers
GB9417419D0 (en) 1994-08-30 1994-10-19 Mackenzie Innes Method of measuring film thickness and monitoring liquid flow using backscattered x-rays and gamma-rays
US5483568A (en) * 1994-11-03 1996-01-09 Kabushiki Kaisha Toshiba Pad condition and polishing rate monitor using fluorescence
US5708692A (en) * 1996-12-03 1998-01-13 The Babcock & Wilcox Company Measurement system for chromium content in chromized layers and the like
DE19739321C2 (de) * 1997-09-09 2001-09-27 Helmut Fischer Gmbh & Co Verfahren und Einrichtung zum Bestimmen der Meßunsicherheit bei Röntgenfluoreszenz-Schichtdickenmessungen
JPH11218418A (ja) * 1998-02-03 1999-08-10 Seiko Instruments Inc インライン蛍光ｘ線膜厚モニタ
RU2194272C2 (ru) * 1998-04-29 2002-12-10 Баранов Александр Михайлович Способ контроля параметров пленочных покрытий и поверхностей в реальном времени и устройство его осуществления
EP1076222A1 (de) * 1999-08-10 2001-02-14 Corus Aluminium Walzprodukte GmbH Röntgenfluoreszenz-Messung der Dicke von Aluminiumblech
US6611576B1 (en) 2001-02-12 2003-08-26 Advanced Micro Devices, Inc. Automated control of metal thickness during film deposition
US6788760B1 (en) * 2002-03-28 2004-09-07 Kla-Tencor Technologies Corporation Methods and apparatus for characterizing thin films
JP4262734B2 (ja) * 2005-09-14 2009-05-13 株式会社リガク 蛍光ｘ線分析装置および方法
CN101248349B (zh) * 2005-09-22 2011-08-10 杰富意钢铁株式会社 镀锌钢板的冲压成形性评价方法
KR101109050B1 (ko) 2010-04-02 2012-02-29 주식회사 아이에스피 형광엑스선을 이용한 비접촉식 두께 측정장치
CN102200434B (zh) * 2011-04-02 2012-10-10 清华大学 一种板带材的厚度凸度检测装置
DE102018103171A1 (de) 2017-11-23 2019-05-23 Tdk Electronics Ag Verfahren zum Bestimmen von Eigenschaften einer Beschichtung auf einer transparenten Folie, Verfahren zur Herstellung einer Kondensatorfolie und Einrichtung zum Bestimmen von Eigenschaften einer Beschichtung auf einer transparenten Folie
CN110132188B (zh) * 2019-06-19 2020-11-10 中国人民解放军空军工程大学 一种基于多元素x射线特征光谱综合分析的涂渗层厚度计算方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2926257A (en) * 1955-05-16 1960-02-23 Friedman Herbert Method of measuring the thickness of thin coatings
US3562525A (en) * 1967-06-29 1971-02-09 Minnesota Mining & Mfg X-ray fludrescence gauging employing a single x-ray source and a reference sample for comparative measurements
US3497691A (en) * 1967-06-30 1970-02-24 Ohmart Corp Dual mode fluorescence and backscatter coating thickness measuring gauge
US3952197A (en) * 1975-02-14 1976-04-20 Samson James A R Ion chambers
US4047029A (en) * 1976-07-02 1977-09-06 Allport John J Self-compensating X-ray or γ-ray thickness gauge
US4350889A (en) * 1980-09-17 1982-09-21 International Paper Company X-Ray fluorescent analysis with matrix compensation
DE3129049A1 (de) * 1981-07-23 1983-02-24 Hoesch Werke Ag, 4600 Dortmund Verfahren und vorrichtung zur zerstoerungsfreien bestimmung der dicke der eisen-zinn-zwischenschicht an elektrolytisch verzinntem blech
JPS58223047A (ja) * 1982-06-18 1983-12-24 Sumitomo Metal Ind Ltd 螢光ｘ線分析方法
JPS59195146A (ja) * 1983-04-19 1984-11-06 Sumitomo Metal Ind Ltd メツキ被膜の螢光ｘ線分析法
JPS60202339A (ja) * 1984-03-27 1985-10-12 Sumitomo Metal Ind Ltd 螢光ｘ線分析方法
EP0197157B1 (de) * 1984-10-05 1991-07-10 Kawasaki Steel Corporation Verfahren zur bestimmung der dicke und der zusammensetzung eines legierungsfilms
GB8515552D0 (en) * 1985-06-19 1985-07-24 Boyle Controls Ltd Coating weight & thickness gauges
JPS623650A (ja) * 1985-06-28 1987-01-09 Sumitomo Metal Ind Ltd 蛍光ｘ線分析方法
US4891520A (en) * 1987-09-05 1990-01-02 Hitachi, Ltd. Radiation detector
US5029337A (en) * 1989-01-19 1991-07-02 Tava Corporation Method for measuring coating thickness

Also Published As

Publication number Publication date
ATE158077T1 (de) 1997-09-15
JP2849665B2 (ja) 1999-01-20
DE68928315T2 (de) 1999-06-10
US5113421A (en) 1992-05-12
WO1989011095A1 (en) 1989-11-16
EP0422017A1 (de) 1991-04-17
GB8811459D0 (en) 1988-06-15
JPH03505251A (ja) 1991-11-14
EP0422017B1 (de) 1997-09-10

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication related to discontinuation of the patent is to be deleted
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: HONEYWELL -MEASUREX DATA MEASUREMENT CORP., GAITHE

8328 Change in the person/name/address of the agent

Free format text: THALMEIR, A., DIPL.-PHYS. UNIV., PAT.-ANW., 82166 GRAEFELFING